BE536994A - Procédé pour la production de formes d'impression - Google Patents
Procédé pour la production de formes d'impressionInfo
- Publication number
- BE536994A BE536994A BE536994A BE536994A BE536994A BE 536994 A BE536994 A BE 536994A BE 536994 A BE536994 A BE 536994A BE 536994 A BE536994 A BE 536994A BE 536994 A BE536994 A BE 536994A
- Authority
- BE
- Belgium
- Prior art keywords
- production
- printing forms
- printing
- forms
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
- C07D233/64—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms, e.g. histidine
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
- C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
- C07D235/06—Benzimidazoles; Hydrogenated benzimidazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached in position 2
- C07D235/08—Radicals containing only hydrogen and carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
- C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
- C07D235/06—Benzimidazoles; Hydrogenated benzimidazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached in position 2
- C07D235/10—Radicals substituted by halogen atoms or nitro radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
- C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
- C07D235/06—Benzimidazoles; Hydrogenated benzimidazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached in position 2
- C07D235/14—Radicals substituted by nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
- C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
- C07D235/18—Benzimidazoles; Hydrogenated benzimidazoles with aryl radicals directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
- C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
- C07D235/20—Two benzimidazolyl-2 radicals linked together directly or via a hydrocarbon or substituted hydrocarbon radical
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Plural Heterocyclic Compounds (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK21738A DE950618C (de) | 1954-04-03 | 1954-04-03 | Verfahren zur Herstellung von Druckformen aus lichtempfindlichem Material, welches aus einem metallischen Traeger und einer darauf haftenden kolloidfreien lichtempfindlichen Schicht besteht |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE536994A true BE536994A (fr) | 1956-04-15 |
Family
ID=7216268
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE536994A BE536994A (fr) | 1954-04-03 | 1955-03-31 | Procédé pour la production de formes d'impression |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3061435A (fr) |
| BE (1) | BE536994A (fr) |
| CH (1) | CH334345A (fr) |
| DE (1) | DE950618C (fr) |
| FR (1) | FR1125519A (fr) |
| GB (1) | GB765909A (fr) |
| NL (2) | NL96874C (fr) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1258265B (de) * | 1960-02-05 | 1968-01-04 | Eastman Kodak Co | Lichtempfindliche photographische Schicht |
| DE1447733B2 (de) * | 1963-12-23 | 1977-04-21 | Hoechst Ag, 6000 Frankfurt | 2-(3,5-dihydroxyphenyl)-benzimidazolderivate |
| US3519424A (en) * | 1966-02-25 | 1970-07-07 | Eastman Kodak Co | Photosensitive compounds and elements |
| GB1230772A (fr) * | 1967-03-31 | 1971-05-05 | ||
| DE3409888A1 (de) * | 1984-03-17 | 1985-09-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches aufzeichnungsmaterial und dessen verwendung in einem verfahren zum herstellen einer druckform oder einer gedruckten schaltung |
| DE3609318A1 (de) * | 1986-03-20 | 1987-09-24 | Basf Ag | Phenanthroimidazol-verbindungen, verfahren zu ihrer herstellung und ihre verwendung |
| USD426958S (en) | 1998-04-08 | 2000-06-27 | Colgate-Palmolive Company | Standup toothbrush |
| US20070259875A1 (en) * | 2006-04-28 | 2007-11-08 | Atwal Karnail S | Triaryl substituted imidazole derivatives and taste-inhibiting uses thereof |
| KR102558780B1 (ko) | 2016-04-15 | 2023-07-26 | 베크만 컬터, 인코포레이티드 | 광활성 거대분자 및 그의 용도 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE763721C (de) * | 1942-02-19 | 1953-10-05 | Kalle & Co Ag | Lichtempfindliche Schichten |
| DE876951C (de) * | 1942-09-02 | 1953-05-18 | Kalle & Co Ag | Lichtempfindliches Material zur Herstellung von Druckformen |
| DE857888C (de) * | 1943-01-14 | 1952-12-04 | Kalle & Co Ag | Lichtempfindliches, zur Herstellung von Flachdruckformen geeignetes Material |
| DE879055C (de) * | 1943-04-03 | 1953-06-08 | Kalle & Co Ag | Verfahren zur Herstellung von Druckformen |
| DE879056C (de) * | 1943-04-08 | 1953-06-08 | Kalle & Co Ag | Verfahren zur Herstellung von Flachdruckformen |
| DE858195C (de) * | 1943-08-30 | 1952-12-04 | Kalle & Co Ag | Lichtempfindliche Kolloid-Schichten zur Herstellung von Gerbbildern |
| NL70798C (fr) * | 1948-10-15 | |||
| NL78723C (fr) * | 1949-07-23 | |||
| DE875437C (de) * | 1949-07-30 | 1953-05-04 | Kalle & Co Ag | Verfahren zur Herstellung von Druckformen mit Hilfe von Diazoverbindungen |
| DE893748C (de) * | 1949-07-30 | 1953-10-19 | Kalle & Co Ag | Verfahren zur Herstellung von Druckformen mit Hilfe von Diazoverbindungen |
| DE879205C (de) * | 1949-09-13 | 1953-06-11 | Kalle & Co Ag | Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen und dafuer verwendbares licht-empfindliches Material |
| NL87830C (fr) * | 1950-05-19 | |||
| DE885198C (de) * | 1951-04-17 | 1953-06-18 | Kalle & Co Ag | Schichten fuer photomechanische Reproduktion und Verfahren zur Herstellung von Druckformen |
| DE900172C (de) * | 1951-06-30 | 1953-12-21 | Kalle & Co Ag | Verfahren zur Herstellung von besonders als Druckformen verwendbaren Reproduktionen von Originalen mit Hilfe von Diazoverbindungen |
| DE901129C (de) * | 1951-07-17 | 1954-01-07 | Kalle & Co Ag | Lichtempfindliches Material fuer die photomechanische Bilderzeugung |
| DE901500C (de) * | 1951-08-08 | 1954-01-11 | Kalle & Co Ag | Lichtempfindliche Schichten auf Material zur photomechanischen Reproduktion |
| DE903529C (de) * | 1951-09-01 | 1954-02-08 | Kalle & Co Ag | Lichtempfindliche Schichten |
-
0
- NL NL196090D patent/NL196090A/xx unknown
- NL NL96874D patent/NL96874C/xx active
-
1954
- 1954-04-03 DE DEK21738A patent/DE950618C/de not_active Expired
-
1955
- 1955-03-14 GB GB7432/55A patent/GB765909A/en not_active Expired
- 1955-03-24 CH CH334345D patent/CH334345A/de unknown
- 1955-03-30 FR FR1125519D patent/FR1125519A/fr not_active Expired
- 1955-03-31 BE BE536994A patent/BE536994A/fr unknown
-
1957
- 1957-09-05 US US682084A patent/US3061435A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US3061435A (en) | 1962-10-30 |
| NL96874C (fr) | |
| FR1125519A (fr) | 1956-10-31 |
| CH334345A (de) | 1958-11-30 |
| GB765909A (en) | 1957-01-16 |
| DE950618C (de) | 1956-10-11 |
| NL196090A (fr) |
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