BE506677A - - Google Patents

Info

Publication number
BE506677A
BE506677A BE506677DA BE506677A BE 506677 A BE506677 A BE 506677A BE 506677D A BE506677D A BE 506677DA BE 506677 A BE506677 A BE 506677A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of BE506677A publication Critical patent/BE506677A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
BE506677D 1950-10-31 BE506677A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK7867A DE865860C (de) 1950-10-31 1950-10-31 Lichtempfindliche Schichten fuer die photomechanische Reproduktion

Publications (1)

Publication Number Publication Date
BE506677A true BE506677A (da)

Family

ID=7211722

Family Applications (1)

Application Number Title Priority Date Filing Date
BE506677D BE506677A (da) 1950-10-31

Country Status (8)

Country Link
US (1) US3046120A (da)
AT (1) AT175151B (da)
BE (1) BE506677A (da)
CH (1) CH300348A (da)
DE (1) DE865860C (da)
FR (1) FR1044248A (da)
GB (1) GB711626A (da)
NL (1) NL78779C (da)

Families Citing this family (103)

* Cited by examiner, † Cited by third party
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BE506677A (da) * 1950-10-31
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US4191573A (en) * 1974-10-09 1980-03-04 Fuji Photo Film Co., Ltd. Photosensitive positive image forming process with two photo-sensitive layers
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US4040891A (en) * 1976-06-30 1977-08-09 Ibm Corporation Etching process utilizing the same positive photoresist layer for two etching steps
DE2653428C3 (de) * 1976-11-24 1979-05-17 Claus Koenig Kg, 8520 Erlangen Farbfolie zum Herstellen einer Vorlage für Werbezwecke
JPS549619A (en) * 1977-06-23 1979-01-24 Oji Paper Co Photosensitive composition
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JPS561044A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
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DE3100077A1 (de) 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
DE3127754A1 (de) * 1981-07-14 1983-02-03 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
US4600684A (en) * 1983-02-10 1986-07-15 Oki Electric Industry Co., Ltd. Process for forming a negative resist using high energy beam
US4609615A (en) * 1983-03-31 1986-09-02 Oki Electric Industry Co., Ltd. Process for forming pattern with negative resist using quinone diazide compound
JPS6032045A (ja) * 1983-08-01 1985-02-19 Sanyo Kokusaku Pulp Co Ltd 多色画像形成材料およびその画像形成方法
GB8430377D0 (en) * 1984-12-01 1985-01-09 Ciba Geigy Ag Modified phenolic resins
GB8505402D0 (en) * 1985-03-02 1985-04-03 Ciba Geigy Ag Modified phenolic resins
DE3685766T2 (de) * 1985-04-18 1993-02-11 Fuji Chem Ind Co Ltd Photolackbildherstellungsverfahren.
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DE3629122A1 (de) * 1986-08-27 1988-03-10 Hoechst Ag Verfahren zur herstellung eines o-naphthochinondiazidsulfonsaeureesters und diesen enthaltendes lichtempfindliches gemisch
US4871644A (en) * 1986-10-01 1989-10-03 Ciba-Geigy Corporation Photoresist compositions with a bis-benzotriazole
US4777109A (en) * 1987-05-11 1988-10-11 Robert Gumbinner RF plasma treated photosensitive lithographic printing plates
US5037720A (en) * 1987-07-21 1991-08-06 Hoechst Celanese Corporation Hydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and use
GB8729510D0 (en) * 1987-12-18 1988-02-03 Ucb Sa Photosensitive compositions containing phenolic resins & diazoquinone compounds
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
US5238771A (en) * 1988-05-31 1993-08-24 Konica Corporation Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive
DE3822522A1 (de) * 1988-07-04 1990-03-22 Hoechst Ag 1,2-naphthochinon-2-diazid-sulfonsaeureamide und lichtempfindliche gemische, die diese enthalten
DE68928903T2 (de) * 1988-10-03 1999-08-12 Konica Corp., Tokio/Tokyo Lichtempfindliche Zusammensetzung
US5753406A (en) * 1988-10-18 1998-05-19 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
US5356758A (en) * 1988-12-28 1994-10-18 Texas Instruments Incorporated Method and apparatus for positively patterning a surface-sensitive resist on a semiconductor wafer
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
DE69129955T2 (de) * 1990-05-02 1998-12-24 Mitsubishi Chemical Corp., Tokio/Tokyo Photolackzusammensetzung
JP2639853B2 (ja) * 1990-05-18 1997-08-13 富士写真フイルム株式会社 新規キノンジアジド化合物及びそれを含有する感光性組成物
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JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JP3503839B2 (ja) 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
JPH0876380A (ja) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd ポジ型印刷版組成物
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
US5529880A (en) * 1995-03-29 1996-06-25 Shipley Company, L.L.C. Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound
US5589553A (en) * 1995-03-29 1996-12-31 Shipley Company, L.L.C. Esterification product of aromatic novolak resin with quinone diazide sulfonyl group
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JP3506295B2 (ja) 1995-12-22 2004-03-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版
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US5858626A (en) 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
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JP2002511955A (ja) 1997-07-05 2002-04-16 コダック・ポリクローム・グラフィックス・エルエルシー パターン形成方法
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JP4015946B2 (ja) 2000-10-30 2007-11-28 シークエノム・インコーポレーテツド 基板上にサブマイクロリットルの体積を供給する方法及び装置
EP2036721B1 (en) 2000-11-30 2011-02-09 FUJIFILM Corporation Planographic printing plate precursor
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FR2843558B1 (fr) 2002-08-13 2004-10-29 Jean Marie Nouel Procede de copie d'une plaque pour impression en offset humide
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JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
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JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
CN101855026A (zh) 2007-11-14 2010-10-06 富士胶片株式会社 干燥涂布膜的方法和制造平版印刷版前体的方法
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
US8883401B2 (en) 2009-09-24 2014-11-11 Fujifilm Corporation Lithographic printing original plate
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506677A (da) * 1950-10-31

Also Published As

Publication number Publication date
GB711626A (en) 1954-07-07
US3046120A (en) 1962-07-24
FR1044248A (fr) 1953-11-16
DE865860C (de) 1953-02-05
NL78779C (da) 1955-03-15
AT175151B (de) 1953-06-10
CH300348A (de) 1954-07-31

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