AU504747B2 - Measuring metal layer thickness, process & apparatus for - Google Patents

Measuring metal layer thickness, process & apparatus for

Info

Publication number
AU504747B2
AU504747B2 AU78814/75A AU7881475A AU504747B2 AU 504747 B2 AU504747 B2 AU 504747B2 AU 78814/75 A AU78814/75 A AU 78814/75A AU 7881475 A AU7881475 A AU 7881475A AU 504747 B2 AU504747 B2 AU 504747B2
Authority
AU
Australia
Prior art keywords
test sample
metal
metal coating
article
bath solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU78814/75A
Other languages
English (en)
Other versions
AU7881475A (en
Inventor
G Herrmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kollmorgen Corp
Original Assignee
Kollmorgen Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kollmorgen Corp filed Critical Kollmorgen Corp
Publication of AU7881475A publication Critical patent/AU7881475A/en
Application granted granted Critical
Publication of AU504747B2 publication Critical patent/AU504747B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/203—Measuring back scattering

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Chemically Coating (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Investigating And Analyzing Materials By Characteristic Methods (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
AU78814/75A 1974-03-05 1975-03-05 Measuring metal layer thickness, process & apparatus for Expired AU504747B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEDE241092 1974-03-05
DE2410927A DE2410927C3 (de) 1974-03-05 1974-03-05 Meßsonde für Schichtdickenmessungen und Verfahren zur Messung der Schichtdicke bzw. der Abscheidungsgeschwindigkeit mittels dieser Sonde

Publications (2)

Publication Number Publication Date
AU7881475A AU7881475A (en) 1976-09-09
AU504747B2 true AU504747B2 (en) 1979-10-25

Family

ID=5909389

Family Applications (1)

Application Number Title Priority Date Filing Date
AU78814/75A Expired AU504747B2 (en) 1974-03-05 1975-03-05 Measuring metal layer thickness, process & apparatus for

Country Status (14)

Country Link
US (1) US4073964A (enExample)
JP (1) JPS5831521B2 (enExample)
AT (1) AT358292B (enExample)
AU (1) AU504747B2 (enExample)
CA (1) CA1022279A (enExample)
CH (1) CH615502A5 (enExample)
DE (1) DE2410927C3 (enExample)
ES (2) ES435290A1 (enExample)
FR (1) FR2263494B1 (enExample)
GB (1) GB1471121A (enExample)
IT (1) IT1045537B (enExample)
NL (1) NL7502625A (enExample)
SE (1) SE7502246L (enExample)
ZA (1) ZA75712B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4141780A (en) * 1977-12-19 1979-02-27 Rca Corporation Optically monitoring the thickness of a depositing layer
CA1096145A (en) * 1978-06-09 1981-02-24 Brian H. Henshaw Button construction
US4477484A (en) * 1982-12-10 1984-10-16 International Business Machines Corporation Electroless plating monitor
JPS62259009A (ja) * 1985-12-12 1987-11-11 Mitsubishi Heavy Ind Ltd 放射性物質の除去状態測定方法
EP0362240A4 (en) * 1987-05-27 1990-11-28 Electrolytic Zinc Company Of Australasia Limited Controlling processes for the electrolytic recovery of metals
DE3737489A1 (de) * 1987-11-02 1989-05-18 Schering Ag Verfahren zur kontrolle und/oder steuerung von metallisierungsprozessen und vorrichtung hierfuer
US4886552A (en) * 1988-09-09 1989-12-12 United Technologies Corporation Method for monitoring the removal of a metallic contaminant from the surface of a metallic article
US6684172B1 (en) * 2001-12-27 2004-01-27 Advanced Micro Devices, Inc. Sensor to predict void free films using various grating structures and characterize fill performance
US20130037405A1 (en) * 2007-10-05 2013-02-14 Intermolecular Inc. Method and System for Combinatorial Electroplating and Characterization

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3019336A (en) * 1956-06-25 1962-01-30 American Can Co Method of and apparatus for measuring coating amounts
US3147169A (en) * 1961-02-23 1964-09-01 Grumman Aircraft Engineering C Apparatus for determining thickness during chemical milling
US3503817A (en) * 1966-01-24 1970-03-31 Fmc Corp Process for controlling metal etching operation
US3475242A (en) * 1966-12-19 1969-10-28 Fmc Corp Process and apparatus for controlling metal etching operation
DE2039634B2 (de) * 1970-08-10 1972-03-09 Grundig Emv Verfahren zur messung der abscheidungsgeschwindigkeit von metallabscheidungen in reduktiven und galvanischen metalli sierungsbaedern sowie eine vorrichtung zur durchfuehrung dieses verfahrens

Also Published As

Publication number Publication date
ZA75712B (en) 1976-01-28
JPS50129430A (enExample) 1975-10-13
FR2263494A1 (enExample) 1975-10-03
JPS5831521B2 (ja) 1983-07-06
GB1471121A (en) 1977-04-21
DE2410927B2 (de) 1978-03-09
US4073964A (en) 1978-02-14
DE2410927A1 (de) 1975-09-18
AU7881475A (en) 1976-09-09
AT358292B (de) 1980-08-25
ES435290A1 (es) 1976-12-01
IT1045537B (it) 1980-05-10
CH615502A5 (enExample) 1980-01-31
ES436462A1 (es) 1977-01-01
ATA92075A (de) 1980-01-15
NL7502625A (nl) 1975-09-09
DE2410927C3 (de) 1978-11-16
FR2263494B1 (enExample) 1978-04-21
SE7502246L (enExample) 1975-09-08
CA1022279A (en) 1977-12-06

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