ZA75712B - Process and apparatus for controlling metal thickness and deposition and degradation rates - Google Patents
Process and apparatus for controlling metal thickness and deposition and degradation ratesInfo
- Publication number
- ZA75712B ZA75712B ZA00750712A ZA75712A ZA75712B ZA 75712 B ZA75712 B ZA 75712B ZA 00750712 A ZA00750712 A ZA 00750712A ZA 75712 A ZA75712 A ZA 75712A ZA 75712 B ZA75712 B ZA 75712B
- Authority
- ZA
- South Africa
- Prior art keywords
- deposition
- metal thickness
- degradation rates
- controlling metal
- controlling
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
- G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/203—Measuring back scattering
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Chemically Coating (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Investigating And Analyzing Materials By Characteristic Methods (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2410927A DE2410927C3 (de) | 1974-03-05 | 1974-03-05 | Meßsonde für Schichtdickenmessungen und Verfahren zur Messung der Schichtdicke bzw. der Abscheidungsgeschwindigkeit mittels dieser Sonde |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ZA75712B true ZA75712B (en) | 1976-01-28 |
Family
ID=5909389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ZA00750712A ZA75712B (en) | 1974-03-05 | 1975-02-04 | Process and apparatus for controlling metal thickness and deposition and degradation rates |
Country Status (14)
| Country | Link |
|---|---|
| US (1) | US4073964A (xx) |
| JP (1) | JPS5831521B2 (xx) |
| AT (1) | AT358292B (xx) |
| AU (1) | AU504747B2 (xx) |
| CA (1) | CA1022279A (xx) |
| CH (1) | CH615502A5 (xx) |
| DE (1) | DE2410927C3 (xx) |
| ES (2) | ES435290A1 (xx) |
| FR (1) | FR2263494B1 (xx) |
| GB (1) | GB1471121A (xx) |
| IT (1) | IT1045537B (xx) |
| NL (1) | NL7502625A (xx) |
| SE (1) | SE7502246L (xx) |
| ZA (1) | ZA75712B (xx) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4141780A (en) * | 1977-12-19 | 1979-02-27 | Rca Corporation | Optically monitoring the thickness of a depositing layer |
| CA1096145A (en) * | 1978-06-09 | 1981-02-24 | Brian H. Henshaw | Button construction |
| US4477484A (en) * | 1982-12-10 | 1984-10-16 | International Business Machines Corporation | Electroless plating monitor |
| JPS62259009A (ja) * | 1985-12-12 | 1987-11-11 | Mitsubishi Heavy Ind Ltd | 放射性物質の除去状態測定方法 |
| JPH02504529A (ja) * | 1987-05-27 | 1990-12-20 | コモンウェルス サイエンティフィック アンド インダストリアル リサーチ オーガニゼーション | 金属類の電解回収の制御方法 |
| DE3737489A1 (de) * | 1987-11-02 | 1989-05-18 | Schering Ag | Verfahren zur kontrolle und/oder steuerung von metallisierungsprozessen und vorrichtung hierfuer |
| US4886552A (en) * | 1988-09-09 | 1989-12-12 | United Technologies Corporation | Method for monitoring the removal of a metallic contaminant from the surface of a metallic article |
| US6684172B1 (en) * | 2001-12-27 | 2004-01-27 | Advanced Micro Devices, Inc. | Sensor to predict void free films using various grating structures and characterize fill performance |
| US20130037405A1 (en) * | 2007-10-05 | 2013-02-14 | Intermolecular Inc. | Method and System for Combinatorial Electroplating and Characterization |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3019336A (en) * | 1956-06-25 | 1962-01-30 | American Can Co | Method of and apparatus for measuring coating amounts |
| US3147169A (en) * | 1961-02-23 | 1964-09-01 | Grumman Aircraft Engineering C | Apparatus for determining thickness during chemical milling |
| US3503817A (en) * | 1966-01-24 | 1970-03-31 | Fmc Corp | Process for controlling metal etching operation |
| US3475242A (en) * | 1966-12-19 | 1969-10-28 | Fmc Corp | Process and apparatus for controlling metal etching operation |
| DE2039634B2 (de) * | 1970-08-10 | 1972-03-09 | Grundig Emv | Verfahren zur messung der abscheidungsgeschwindigkeit von metallabscheidungen in reduktiven und galvanischen metalli sierungsbaedern sowie eine vorrichtung zur durchfuehrung dieses verfahrens |
-
1974
- 1974-03-05 DE DE2410927A patent/DE2410927C3/de not_active Expired
-
1975
- 1975-02-04 ZA ZA00750712A patent/ZA75712B/xx unknown
- 1975-02-06 AT AT92075A patent/AT358292B/de not_active IP Right Cessation
- 1975-02-11 GB GB571575A patent/GB1471121A/en not_active Expired
- 1975-02-19 CH CH203875A patent/CH615502A5/de not_active IP Right Cessation
- 1975-02-25 CA CA220,726A patent/CA1022279A/en not_active Expired
- 1975-02-25 IT IT48325/75A patent/IT1045537B/it active
- 1975-02-27 SE SE7502246A patent/SE7502246L/xx unknown
- 1975-03-03 US US05/555,030 patent/US4073964A/en not_active Expired - Lifetime
- 1975-03-04 FR FR7506653A patent/FR2263494B1/fr not_active Expired
- 1975-03-04 ES ES435290A patent/ES435290A1/es not_active Expired
- 1975-03-05 AU AU78814/75A patent/AU504747B2/en not_active Expired
- 1975-03-05 NL NL7502625A patent/NL7502625A/xx not_active Application Discontinuation
- 1975-03-05 JP JP50027562A patent/JPS5831521B2/ja not_active Expired
- 1975-04-09 ES ES436462A patent/ES436462A1/es not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| AU7881475A (en) | 1976-09-09 |
| JPS50129430A (xx) | 1975-10-13 |
| FR2263494B1 (xx) | 1978-04-21 |
| DE2410927B2 (de) | 1978-03-09 |
| FR2263494A1 (xx) | 1975-10-03 |
| IT1045537B (it) | 1980-05-10 |
| GB1471121A (en) | 1977-04-21 |
| AU504747B2 (en) | 1979-10-25 |
| US4073964A (en) | 1978-02-14 |
| CA1022279A (en) | 1977-12-06 |
| DE2410927C3 (de) | 1978-11-16 |
| ES436462A1 (es) | 1977-01-01 |
| ATA92075A (de) | 1980-01-15 |
| NL7502625A (nl) | 1975-09-09 |
| CH615502A5 (xx) | 1980-01-31 |
| SE7502246L (xx) | 1975-09-08 |
| DE2410927A1 (de) | 1975-09-18 |
| ES435290A1 (es) | 1976-12-01 |
| JPS5831521B2 (ja) | 1983-07-06 |
| AT358292B (de) | 1980-08-25 |
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