AU465865B2 - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
AU465865B2
AU465865B2 AU60214/73A AU6021473A AU465865B2 AU 465865 B2 AU465865 B2 AU 465865B2 AU 60214/73 A AU60214/73 A AU 60214/73A AU 6021473 A AU6021473 A AU 6021473A AU 465865 B2 AU465865 B2 AU 465865B2
Authority
AU
Australia
Prior art keywords
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU60214/73A
Other languages
English (en)
Other versions
AU6021473A (en
Inventor
CORNELIS WILLEM LAMBRECHTS ROELOF HERMAN WILEM SALTERS and RENE MARIE GERARDUS WIJNHOVEN LIEUWE BOONSTRA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of AU6021473A publication Critical patent/AU6021473A/en
Application granted granted Critical
Publication of AU465865B2 publication Critical patent/AU465865B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D89/00Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
    • H10D89/211Design considerations for internal polarisation
    • H10D89/213Design considerations for internal polarisation in field-effect devices
    • H10D89/215Design considerations for internal polarisation in field-effect devices comprising arrangements for charge pumping or biasing substrates
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05FSYSTEMS FOR REGULATING ELECTRIC OR MAGNETIC VARIABLES
    • G05F3/00Non-retroactive systems for regulating electric variables by using an uncontrolled element, or an uncontrolled combination of elements, such element or such combination having self-regulating properties
    • G05F3/02Regulating voltage or current
    • G05F3/08Regulating voltage or current wherein the variable is DC
    • G05F3/10Regulating voltage or current wherein the variable is DC using uncontrolled devices with non-linear characteristics
    • G05F3/16Regulating voltage or current wherein the variable is DC using uncontrolled devices with non-linear characteristics being semiconductor devices
    • G05F3/20Regulating voltage or current wherein the variable is DC using uncontrolled devices with non-linear characteristics being semiconductor devices using diode- transistor combinations
    • G05F3/205Substrate bias-voltage generators
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/40Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
    • H10D84/401Combinations of FETs or IGBTs with BJTs
    • H10D84/403Combinations of FETs or IGBTs with BJTs and with one or more of diodes, resistors or capacitors
    • H10D84/406Combinations of FETs or IGBTs with vertical BJTs and with one or more of diodes, resistors or capacitors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Nonlinear Science (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Automation & Control Theory (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Semiconductor Memories (AREA)
  • Bipolar Transistors (AREA)
AU60214/73A 1972-09-15 1973-09-11 Semiconductor device Expired AU465865B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7212509A NL7212509A (en, 2012) 1972-09-15 1972-09-15

Publications (2)

Publication Number Publication Date
AU6021473A AU6021473A (en) 1975-03-13
AU465865B2 true AU465865B2 (en) 1975-10-09

Family

ID=19816940

Family Applications (1)

Application Number Title Priority Date Filing Date
AU60214/73A Expired AU465865B2 (en) 1972-09-15 1973-09-11 Semiconductor device

Country Status (9)

Country Link
US (1) US4255677A (en, 2012)
JP (1) JPS5244715B2 (en, 2012)
AU (1) AU465865B2 (en, 2012)
CA (1) CA993571A (en, 2012)
DE (1) DE2341899C3 (en, 2012)
FR (1) FR2200634B1 (en, 2012)
GB (1) GB1450167A (en, 2012)
IT (1) IT996680B (en, 2012)
NL (1) NL7212509A (en, 2012)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2620973A1 (de) * 1975-06-30 1977-01-27 Ibm Halbleiterschaltungsanordnung zur fet-substratvorspannungserzeugung
DE2839073C2 (de) * 1978-09-07 1983-02-17 Siemens AG, 1000 Berlin und 8000 München Dynamische Stromquelle für Halbleiterbausteine und ihre Verwendung
JPS55162257A (en) * 1979-06-05 1980-12-17 Fujitsu Ltd Semiconductor element having substrate bias generator circuit
JPS6038028B2 (ja) * 1979-07-23 1985-08-29 三菱電機株式会社 基板電位発生装置
JPS5619676A (en) * 1979-07-26 1981-02-24 Fujitsu Ltd Semiconductor device
DE3067215D1 (en) * 1979-12-13 1984-04-26 Fujitsu Ltd Charge-pumping semiconductor memory cell comprising a charge-storage region and memory device using such a cell
JPS5771222U (en, 2012) * 1980-10-16 1982-04-30
US4559548A (en) * 1981-04-07 1985-12-17 Tokyo Shibaura Denki Kabushiki Kaisha CMOS Charge pump free of parasitic injection
JPS58122766A (ja) * 1982-01-14 1983-07-21 Toshiba Corp 半導体装置
US4704625A (en) * 1982-08-05 1987-11-03 Motorola, Inc. Capacitor with reduced voltage variability
US4670669A (en) * 1984-08-13 1987-06-02 International Business Machines Corporation Charge pumping structure for a substrate bias generator
ATE75877T1 (de) * 1985-08-26 1992-05-15 Siemens Ag Integrierte schaltung in komplementaerer schaltungstechnik mit einem substratvorspannungs- generator und einer schottky-diode.
US5286986A (en) * 1989-04-13 1994-02-15 Kabushiki Kaisha Toshiba Semiconductor device having CCD and its peripheral bipolar transistors
JPH07105458B2 (ja) * 1989-11-21 1995-11-13 株式会社東芝 複合型集積回路素子
JP2968836B2 (ja) * 1990-11-30 1999-11-02 日本テキサス・インスツルメンツ株式会社 半導体基板電位発生回路
US5364801A (en) * 1990-12-17 1994-11-15 Texas Instruments Incorporated Method of forming a charge pump circuit
US6825878B1 (en) 1998-12-08 2004-11-30 Micron Technology, Inc. Twin P-well CMOS imager

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3816769A (en) * 1969-12-17 1974-06-11 Integrated Photomatrix Ltd Method and circuit element for the selective charging of a semiconductor diffusion region
US3673428A (en) * 1970-09-18 1972-06-27 Rca Corp Input transient protection for complementary insulated gate field effect transistor integrated circuit device
AU461729B2 (en) * 1971-01-14 1975-06-05 Rca Corporation Charge coupled circuits
BE789501A (fr) * 1971-09-30 1973-03-29 Siemens Ag Condensateur electrique dans un circuit integre, utilise notamment comme memoire pour une memoire a semiconducteur

Also Published As

Publication number Publication date
FR2200634B1 (en, 2012) 1978-01-06
DE2341899A1 (de) 1974-03-21
DE2341899C3 (de) 1979-10-04
DE2341899B2 (de) 1979-02-08
JPS4969273A (en, 2012) 1974-07-04
NL7212509A (en, 2012) 1974-03-19
JPS5244715B2 (en, 2012) 1977-11-10
AU6021473A (en) 1975-03-13
US4255677A (en) 1981-03-10
GB1450167A (en) 1976-09-22
FR2200634A1 (en, 2012) 1974-04-19
CA993571A (en) 1976-07-20
IT996680B (it) 1975-12-10

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