AU2003276374A1 - Fluorine-free metallic complexes for gas-phase chemical metal deposition - Google Patents

Fluorine-free metallic complexes for gas-phase chemical metal deposition

Info

Publication number
AU2003276374A1
AU2003276374A1 AU2003276374A AU2003276374A AU2003276374A1 AU 2003276374 A1 AU2003276374 A1 AU 2003276374A1 AU 2003276374 A AU2003276374 A AU 2003276374A AU 2003276374 A AU2003276374 A AU 2003276374A AU 2003276374 A1 AU2003276374 A1 AU 2003276374A1
Authority
AU
Australia
Prior art keywords
gas
fluorine
phase chemical
metal deposition
metallic complexes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003276374A
Other languages
English (en)
Inventor
Pascal Doppelt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Original Assignee
Centre National de la Recherche Scientifique CNRS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS filed Critical Centre National de la Recherche Scientifique CNRS
Publication of AU2003276374A1 publication Critical patent/AU2003276374A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F1/00—Compounds containing elements of Groups 1 or 11 of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F1/00—Compounds containing elements of Groups 1 or 11 of the Periodic Table
    • C07F1/005—Compounds containing elements of Groups 1 or 11 of the Periodic Table without C-Metal linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F1/00—Compounds containing elements of Groups 1 or 11 of the Periodic Table
    • C07F1/08—Copper compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
AU2003276374A 2002-09-30 2003-09-25 Fluorine-free metallic complexes for gas-phase chemical metal deposition Abandoned AU2003276374A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR02/12059 2002-09-30
FR0212059A FR2845088B1 (fr) 2002-09-30 2002-09-30 Nouveaux complexes metalliques exempts de fluor pour le depot chimique de metaux en phase gazeuse
PCT/FR2003/002820 WO2004029061A1 (fr) 2002-09-30 2003-09-25 Complexes metalliques exempts de fluor pour le depot chimique de metaux en phase gazeuse

Publications (1)

Publication Number Publication Date
AU2003276374A1 true AU2003276374A1 (en) 2004-04-19

Family

ID=31985326

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003276374A Abandoned AU2003276374A1 (en) 2002-09-30 2003-09-25 Fluorine-free metallic complexes for gas-phase chemical metal deposition

Country Status (9)

Country Link
US (1) US7238820B2 (enExample)
EP (1) EP1551851B1 (enExample)
JP (1) JP4634800B2 (enExample)
AT (1) ATE334990T1 (enExample)
AU (1) AU2003276374A1 (enExample)
CA (1) CA2500386C (enExample)
DE (1) DE60307304T2 (enExample)
FR (1) FR2845088B1 (enExample)
WO (1) WO2004029061A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8758867B2 (en) * 2007-09-17 2014-06-24 L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés George Claude Neutral ligand containing precursors and methods for deposition of a metal containing film
CN103839604A (zh) * 2014-02-26 2014-06-04 京东方科技集团股份有限公司 导电膜及其制备方法、阵列基板
JP7497022B2 (ja) * 2020-06-24 2024-06-10 国立研究開発法人産業技術総合研究所 アルキニルシランの製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5085731A (en) * 1991-02-04 1992-02-04 Air Products And Chemicals, Inc. Volatile liquid precursors for the chemical vapor deposition of copper
FR2760743B1 (fr) * 1997-03-13 1999-07-23 Centre Nat Rech Scient Nouveaux precurseurs de cuivre(i) pour depot chimique en phase gazeuse de cuivre metallique
US6838573B1 (en) * 2004-01-30 2005-01-04 Air Products And Chemicals, Inc. Copper CVD precursors with enhanced adhesion properties

Also Published As

Publication number Publication date
ATE334990T1 (de) 2006-08-15
US7238820B2 (en) 2007-07-03
FR2845088A1 (fr) 2004-04-02
US20060121709A1 (en) 2006-06-08
CA2500386C (fr) 2012-03-13
EP1551851B1 (fr) 2006-08-02
CA2500386A1 (fr) 2004-04-08
DE60307304T2 (de) 2007-10-11
DE60307304D1 (de) 2006-09-14
JP4634800B2 (ja) 2011-02-16
FR2845088B1 (fr) 2004-12-03
WO2004029061A1 (fr) 2004-04-08
EP1551851A1 (fr) 2005-07-13
JP2006501280A (ja) 2006-01-12

Similar Documents

Publication Publication Date Title
ZA200305082B (en) Production of zinc oxide from complex sulfide concentrates using chloride processing.
MY140214A (en) Appliance transparency
MXPA03006055A (es) Nuevos compuestos de n-fenilpirrolbisfosfano y sus complejos de metal.
WO2004108072A3 (en) Delivery of immune response modifier compounds using metal-containing particulate support materials
AU2003259792A1 (en) Preparation of metal complexes
IL158866A0 (en) Use of il-18 inhibitors for the treatment or prevention of sepsis
IL162005A0 (en) Copper deposition using copper formate complexes
MXPA03011197A (es) Benzoilsufonamidas y sulfonilbenzamidinas que se usan como agentes antitumorales.
PL369530A1 (en) Chemical compounds
MY143678A (en) Polishing composition for noble metals
AU2002235928A1 (en) Method for coating metallic surfaces and use of the substrates coated in this manner
AU2003213375A1 (en) Electroluminescent element containing metal coordination compound
ITMI20021128A1 (it) Elettrodo per sviluppo di gas e metodo per il suo ottenimento
FI20020835A0 (fi) Menetelmä jalometallirikasteen jalostamiseksi
AU2003290592A1 (en) Antitumor benzoylsulfonamides
TW200504402A (en) Antimicrobial lenses, processes to prepare them and methods of their use
AU2003218346A1 (en) Influence of surface geometry on metal properties
MXPA04003755A (es) Endoprotesis vasculares.
AU2003276374A1 (en) Fluorine-free metallic complexes for gas-phase chemical metal deposition
IL166611A0 (en) Pyrrolyl complexes of copper for copper metal deposition
TW200616749A (en) Welding wire
GB0206371D0 (en) Metallic conductor and cryogenic device
GB0113920D0 (en) Composition
ZA200204186B (en) Precious metal processing.
AUPR415601A0 (en) Electrowinning of metals from metal ores

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase