AU2003226168A1 - Fluorochemical treatment for silicon articles - Google Patents

Fluorochemical treatment for silicon articles

Info

Publication number
AU2003226168A1
AU2003226168A1 AU2003226168A AU2003226168A AU2003226168A1 AU 2003226168 A1 AU2003226168 A1 AU 2003226168A1 AU 2003226168 A AU2003226168 A AU 2003226168A AU 2003226168 A AU2003226168 A AU 2003226168A AU 2003226168 A1 AU2003226168 A1 AU 2003226168A1
Authority
AU
Australia
Prior art keywords
fluorochemical treatment
silicon articles
articles
silicon
fluorochemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003226168A
Other languages
English (en)
Inventor
Larry D. Boardman
Timothy D. Dunbar
Cheryl L. S. Elsbernd
Miguel A. Guerra
George G. I. Moore
Mark J. Pellerite
Lawrence A. Zazzera
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of AU2003226168A1 publication Critical patent/AU2003226168A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00912—Treatments or methods for avoiding stiction of flexible or moving parts of MEMS
    • B81C1/0096—For avoiding stiction when the device is in use, i.e. after manufacture has been completed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0002—Arrangements for avoiding sticking of the flexible or moving parts
    • B81B3/0005—Anti-stiction coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Micromachines (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AU2003226168A 2002-05-31 2003-04-01 Fluorochemical treatment for silicon articles Abandoned AU2003226168A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/160,738 US6841079B2 (en) 2002-05-31 2002-05-31 Fluorochemical treatment for silicon articles
US10/160,738 2002-05-31
PCT/US2003/009894 WO2003101888A2 (en) 2002-05-31 2003-04-01 Fluorochemical treatment for silicon articles

Publications (1)

Publication Number Publication Date
AU2003226168A1 true AU2003226168A1 (en) 2003-12-19

Family

ID=29709726

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003226168A Abandoned AU2003226168A1 (en) 2002-05-31 2003-04-01 Fluorochemical treatment for silicon articles

Country Status (7)

Country Link
US (1) US6841079B2 (enExample)
EP (1) EP1513763A2 (enExample)
JP (1) JP2005528234A (enExample)
CN (1) CN1314693C (enExample)
AU (1) AU2003226168A1 (enExample)
CA (1) CA2487715A1 (enExample)
WO (1) WO2003101888A2 (enExample)

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US20050249956A1 (en) * 2004-05-07 2005-11-10 Naiyong Jing Stain repellent optical hard coating
WO2005111157A1 (en) * 2004-05-07 2005-11-24 3M Innovative Properties Company Stain repellent optical hard coating
US20050272599A1 (en) * 2004-06-04 2005-12-08 Kenneth Kramer Mold release layer
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US7471439B2 (en) 2005-11-23 2008-12-30 Miradia, Inc. Process of forming a micromechanical system containing an anti-stiction gas-phase lubricant
US7723812B2 (en) 2005-11-23 2010-05-25 Miradia, Inc. Preferentially deposited lubricant to prevent anti-stiction in micromechanical systems
US7463404B2 (en) * 2005-11-23 2008-12-09 Miradia, Inc. Method of using a preferentially deposited lubricant to prevent anti-stiction in micromechanical systems
US7616370B2 (en) * 2005-11-23 2009-11-10 Miradia, Inc. Preferentially deposited lubricant to prevent anti-stiction in micromechanical systems
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EP3636696A1 (en) 2011-05-04 2020-04-15 Cornell University Multiblock copolymer films, methods of making same and uses thereof
KR102054653B1 (ko) 2012-08-21 2019-12-11 크라토스 엘엘씨 Ｉｖａ족 관능화된 입자 및 이의 사용 방법
US9290380B2 (en) 2012-12-18 2016-03-22 Freescale Semiconductor, Inc. Reducing MEMS stiction by deposition of nanoclusters
FR3000069B1 (fr) * 2012-12-21 2015-02-06 Bluestar Silicones France Procede d'hydrosilylation d'un siloxane photocatalyse par un compose polyoxometallate
WO2015087902A1 (ja) * 2013-12-13 2015-06-18 旭硝子株式会社 含フッ素エーテル組成物、その製造方法、コーティング液、表面処理層を有する基材およびその製造方法
KR20160125441A (ko) * 2014-02-21 2016-10-31 크라토스 엘엘씨 관능화된 iva족 입자 골격을 위한 나노규소 물질 제조
KR101719340B1 (ko) 2016-01-27 2017-03-23 제이에스아이실리콘주식회사 지문 돋보임 방지 피막용 친수성 및 친유성 기 실리콘 결합제 및 이의 제조 방법
CA3022510C (en) 2016-04-28 2023-12-19 Terapore Technologies, Inc. Charged isoporous materials for electrostatic separations
JP2019520682A (ja) 2016-07-05 2019-07-18 クラトス・エル・エル・シー 不動態化されたプレリチウム化ミクロン及びサブミクロンｉｖａ族元素粒子及びこの調製方法
EP3541500B1 (en) 2016-11-17 2021-12-08 Shethji, Jayraj K. Isoporous self-assembled block copolymer films containing high molecular weight hydrophilic additives and methods of making the same
JP7053678B2 (ja) 2017-02-22 2022-04-12 テラポア テクノロジーズ，インコーポレイテッド リガンド結合ｍｂｐ膜、使用及び製造方法
WO2018183909A1 (en) 2017-03-31 2018-10-04 Kratos LLC Precharged negative electrode material for secondary battery
KR102590260B1 (ko) * 2017-05-12 2023-10-18 테라포어 테크놀로지스, 인코포레이티드 내화학성 플루오린화 다중블록 중합체 구조체, 제조 방법 및 사용
MX2020003098A (es) 2017-09-19 2020-07-28 Terapore Tech Inc Estructura entrelazada isoporosa de copolimero de bloques quimicamente resistente.
CN111971115B (zh) 2018-03-12 2025-08-19 特拉波雷技术有限公司 具有大孔隙的均孔介孔不对称嵌段共聚物材料及其制造方法
US10626013B2 (en) * 2018-04-04 2020-04-21 Canon Kabushiki Kaisha Anti-wetting coating for Si-based MEMS fluidic device, and method of application of same
KR20180099609A (ko) 2018-08-29 2018-09-05 제이에스아이실리콘주식회사 플루오로알킬기 또는 퍼플루오로알킬 이더기 치환 비스(실릴)알칸 실리콘 결합제 및 그의 제조방법
CN111074349A (zh) * 2019-07-12 2020-04-28 杭州师范大学 一种光催化含氟单体修饰制备超疏水多孔硅的方法
CN117800801A (zh) * 2023-12-19 2024-04-02 河南师范大学 一种合成单氟烯烃类化合物的方法

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Also Published As

Publication number Publication date
EP1513763A2 (en) 2005-03-16
US6841079B2 (en) 2005-01-11
WO2003101888A2 (en) 2003-12-11
CN1314693C (zh) 2007-05-09
CN1668528A (zh) 2005-09-14
US20030226818A1 (en) 2003-12-11
CA2487715A1 (en) 2003-12-11
JP2005528234A (ja) 2005-09-22
WO2003101888A3 (en) 2004-09-10

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase