AU2002365226A1 - Planarized microelectronic substrates - Google Patents
Planarized microelectronic substratesInfo
- Publication number
- AU2002365226A1 AU2002365226A1 AU2002365226A AU2002365226A AU2002365226A1 AU 2002365226 A1 AU2002365226 A1 AU 2002365226A1 AU 2002365226 A AU2002365226 A AU 2002365226A AU 2002365226 A AU2002365226 A AU 2002365226A AU 2002365226 A1 AU2002365226 A1 AU 2002365226A1
- Authority
- AU
- Australia
- Prior art keywords
- uncured
- temperature
- composition
- layer
- glass transition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/303—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups H01B3/38 or H01B3/302
- H01B3/306—Polyimides or polyesterimides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
- C08G61/10—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aromatic carbon atoms, e.g. polyphenylenes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/44—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
- H01B3/441—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from alkenes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
- H05K2203/0759—Forming a polymer layer by liquid coating, e.g. a non-metallic protective coating or an organic bonding layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1105—Heating or thermal processing not related to soldering, firing, curing or laminating, e.g. for shaping the substrate or during finish plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/14—Related to the order of processing steps
- H05K2203/1476—Same or similar kind of process performed in phases, e.g. coarse patterning followed by fine patterning
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
- H05K3/4676—Single layer compositions
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Liquid Crystal (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Inorganic Insulating Materials (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US33805401P | 2001-11-07 | 2001-11-07 | |
| US60/338,054 | 2001-11-07 | ||
| PCT/US2002/035756 WO2003064495A2 (en) | 2001-11-07 | 2002-11-06 | Planarized microelectronic substrates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2002365226A1 true AU2002365226A1 (en) | 2003-09-02 |
Family
ID=27662938
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2002365226A Abandoned AU2002365226A1 (en) | 2001-11-07 | 2002-11-06 | Planarized microelectronic substrates |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7771779B2 (https=) |
| EP (1) | EP1444284B1 (https=) |
| JP (1) | JP2005516406A (https=) |
| KR (1) | KR100876301B1 (https=) |
| CN (1) | CN1307233C (https=) |
| AT (1) | ATE342929T1 (https=) |
| AU (1) | AU2002365226A1 (https=) |
| DE (1) | DE60215533T2 (https=) |
| TW (1) | TWI267525B (https=) |
| WO (1) | WO2003064495A2 (https=) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000040637A1 (en) * | 1999-01-08 | 2000-07-13 | The Dow Chemical Company | Low dielectric constant polymers having good adhesion and toughness and articles made with such polymers |
| US7122079B2 (en) * | 2004-02-27 | 2006-10-17 | Molecular Imprints, Inc. | Composition for an etching mask comprising a silicon-containing material |
| US7157036B2 (en) | 2003-06-17 | 2007-01-02 | Molecular Imprints, Inc | Method to reduce adhesion between a conformable region and a pattern of a mold |
| US7307118B2 (en) | 2004-11-24 | 2007-12-11 | Molecular Imprints, Inc. | Composition to reduce adhesion between a conformable region and a mold |
| US8076386B2 (en) | 2004-02-23 | 2011-12-13 | Molecular Imprints, Inc. | Materials for imprint lithography |
| US7906180B2 (en) | 2004-02-27 | 2011-03-15 | Molecular Imprints, Inc. | Composition for an etching mask comprising a silicon-containing material |
| US20060062922A1 (en) | 2004-09-23 | 2006-03-23 | Molecular Imprints, Inc. | Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor |
| DE102005047414B4 (de) | 2005-02-21 | 2012-01-05 | Infineon Technologies Ag | Magnetoresistives Sensormodul und Verfahren zum Herstellen desselben |
| KR101157953B1 (ko) * | 2005-06-30 | 2012-06-22 | 엘지디스플레이 주식회사 | 액정표시장치 및 그의 제조방법 |
| US8808808B2 (en) | 2005-07-22 | 2014-08-19 | Molecular Imprints, Inc. | Method for imprint lithography utilizing an adhesion primer layer |
| US8557351B2 (en) | 2005-07-22 | 2013-10-15 | Molecular Imprints, Inc. | Method for adhering materials together |
| US7759407B2 (en) | 2005-07-22 | 2010-07-20 | Molecular Imprints, Inc. | Composition for adhering materials together |
| KR100826104B1 (ko) * | 2006-12-29 | 2008-04-29 | 제일모직주식회사 | 고 내에칭성 반사방지 하드마스크 조성물 및 이를 이용한패턴화된 재료 형상의 제조방법 |
| KR101564676B1 (ko) * | 2008-02-01 | 2015-11-02 | 가부시키가이샤 후지미인코퍼레이티드 | 연마용 조성물 및 이를 이용한 연마 방법 |
| US8415010B2 (en) * | 2008-10-20 | 2013-04-09 | Molecular Imprints, Inc. | Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers |
| US8822274B2 (en) * | 2012-10-04 | 2014-09-02 | Texas Instruments Incorporated | Packaged IC having printed dielectric adhesive on die pad |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5002808A (en) * | 1988-03-23 | 1991-03-26 | The Dow Chemical Company | Adhesion methods employing benzocyclobutene-based organosilane adhesion aids |
| US5312994A (en) | 1993-04-02 | 1994-05-17 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Phenylethynyl endcapping reagents and reactive diluents |
| US5965679A (en) * | 1996-09-10 | 1999-10-12 | The Dow Chemical Company | Polyphenylene oligomers and polymers |
| WO2000031183A1 (en) * | 1998-11-24 | 2000-06-02 | The Dow Chemical Company | A composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom |
| WO2000040637A1 (en) * | 1999-01-08 | 2000-07-13 | The Dow Chemical Company | Low dielectric constant polymers having good adhesion and toughness and articles made with such polymers |
| US6440642B1 (en) | 1999-09-15 | 2002-08-27 | Shipley Company, L.L.C. | Dielectric composition |
| US6359091B1 (en) * | 1999-11-22 | 2002-03-19 | The Dow Chemical Company | Polyarylene compositions with enhanced modulus profiles |
| US6696358B2 (en) * | 2001-01-23 | 2004-02-24 | Honeywell International Inc. | Viscous protective overlayers for planarization of integrated circuits |
-
2002
- 2002-11-06 WO PCT/US2002/035756 patent/WO2003064495A2/en not_active Ceased
- 2002-11-06 CN CNB028257340A patent/CN1307233C/zh not_active Expired - Lifetime
- 2002-11-06 DE DE60215533T patent/DE60215533T2/de not_active Expired - Lifetime
- 2002-11-06 JP JP2003564109A patent/JP2005516406A/ja active Pending
- 2002-11-06 AT AT02804825T patent/ATE342929T1/de not_active IP Right Cessation
- 2002-11-06 US US10/494,240 patent/US7771779B2/en active Active
- 2002-11-06 KR KR1020047007014A patent/KR100876301B1/ko not_active Expired - Lifetime
- 2002-11-06 EP EP02804825A patent/EP1444284B1/en not_active Expired - Lifetime
- 2002-11-06 AU AU2002365226A patent/AU2002365226A1/en not_active Abandoned
- 2002-11-07 TW TW091132806A patent/TWI267525B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TW200300146A (en) | 2003-05-16 |
| KR20040053289A (ko) | 2004-06-23 |
| CN1307233C (zh) | 2007-03-28 |
| WO2003064495A2 (en) | 2003-08-07 |
| TWI267525B (en) | 2006-12-01 |
| JP2005516406A (ja) | 2005-06-02 |
| WO2003064495A3 (en) | 2003-12-04 |
| EP1444284A2 (en) | 2004-08-11 |
| ATE342929T1 (de) | 2006-11-15 |
| KR100876301B1 (ko) | 2008-12-31 |
| DE60215533D1 (de) | 2006-11-30 |
| US7771779B2 (en) | 2010-08-10 |
| EP1444284B1 (en) | 2006-10-18 |
| US20040241338A1 (en) | 2004-12-02 |
| DE60215533T2 (de) | 2007-04-05 |
| CN1606582A (zh) | 2005-04-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| AU2002365226A1 (en) | Planarized microelectronic substrates | |
| KR100342575B1 (ko) | 기재의 평탄화 방법, 피막 부착 기재 및 반도체 장치의 제조방법 | |
| WO2002069381A3 (en) | Method of fabricating low-dielectric constant interlevel dielectric films for beol interconnects with enhanced adhesion and low-defect density | |
| US6153525A (en) | Methods for chemical mechanical polish of organic polymer dielectric films | |
| JP2005503467A5 (https=) | ||
| WO2002000561A3 (en) | Process for making an abrasion resistant coating onto an organic glass substrate | |
| JPWO1998021750A1 (ja) | 基材の平坦化方法、被膜付基材および半導体装置の製造方法 | |
| JPH05146755A (ja) | シリカ前駆物質での下地のコーテイング方法 | |
| CN1802265A (zh) | 正性双层压印光刻法及其所用组合物 | |
| WO2003074197A3 (en) | Hot melt coating composition for film transfer and casting process | |
| US20030044532A1 (en) | Process for preparing porous low dielectric constant material | |
| WO2003068878A3 (en) | Dual cure coating composition and processes for using the same | |
| JP2005516406A5 (https=) | ||
| CN111675973A (zh) | 一种玻璃布胶带用浅颜色热熔压敏胶及其制备方法 | |
| US7304276B2 (en) | Thick film heater integrated with low temperature components and method of making the same | |
| CA2432102A1 (en) | Apparatus and related method for rapid cure of sol-gel coatings | |
| EP0807318B1 (en) | Process for producing a glass-coated article and article produced thereby | |
| ATE284373T1 (de) | Kohlenstoffkacheln mit feuerfester beschichtung für hochtemperaturanwendungen | |
| TW202205499A (zh) | 晶片承載結構與晶片安裝方法 | |
| WO2004063415A3 (en) | Methods for coating surfaces with metal and products made thereby | |
| WO2002094453A3 (en) | Powder coated porous substrate and a method for powder coating a porous substrate | |
| EP0899780A3 (en) | Method for forming insulating thin films | |
| CN120941843B (zh) | 一种灶台隔油膜及其制备方法 | |
| JPS6019790B2 (ja) | 光硬化型接着性組成物とそれを用いて被着体を接着する方法 | |
| KR910006043B1 (ko) | 자외선을 이용한 포토레지스트 평탄화 공정방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |