AU2002230793A1 - Method and apparatus for cleaning a deposition chamber - Google Patents

Method and apparatus for cleaning a deposition chamber

Info

Publication number
AU2002230793A1
AU2002230793A1 AU2002230793A AU3079302A AU2002230793A1 AU 2002230793 A1 AU2002230793 A1 AU 2002230793A1 AU 2002230793 A AU2002230793 A AU 2002230793A AU 3079302 A AU3079302 A AU 3079302A AU 2002230793 A1 AU2002230793 A1 AU 2002230793A1
Authority
AU
Australia
Prior art keywords
cleaning
deposition chamber
deposition
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002230793A
Inventor
Hoa T. Kieu
Walter Schoenleber
Ingo Wilke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of AU2002230793A1 publication Critical patent/AU2002230793A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
AU2002230793A 2000-10-31 2001-10-30 Method and apparatus for cleaning a deposition chamber Abandoned AU2002230793A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US70269700A 2000-10-31 2000-10-31
US09/702,697 2000-10-31
PCT/US2001/048051 WO2002037543A2 (en) 2000-10-31 2001-10-30 Method and apparatus for cleaning a deposition chamber

Publications (1)

Publication Number Publication Date
AU2002230793A1 true AU2002230793A1 (en) 2002-05-15

Family

ID=24822237

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002230793A Abandoned AU2002230793A1 (en) 2000-10-31 2001-10-30 Method and apparatus for cleaning a deposition chamber

Country Status (2)

Country Link
AU (1) AU2002230793A1 (en)
WO (1) WO2002037543A2 (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0441368B1 (en) * 1990-02-09 1996-05-08 Applied Materials, Inc. Method and device for removing excess material from a sputtering chamber
JP2644912B2 (en) * 1990-08-29 1997-08-25 株式会社日立製作所 Vacuum processing apparatus and operating method thereof
US5380414A (en) * 1993-06-11 1995-01-10 Applied Materials, Inc. Shield and collimator pasting deposition chamber with a wafer support periodically used as an acceptor
JPH0892764A (en) * 1994-09-22 1996-04-09 Nec Kyushu Ltd Sputtering device
US6103069A (en) * 1997-03-31 2000-08-15 Applied Materials, Inc. Chamber design with isolation valve to preserve vacuum during maintenance
TW460943B (en) * 1997-06-11 2001-10-21 Applied Materials Inc Reduction of mobile ion and metal contamination in HDP-CVD chambers using chamber seasoning film depositions

Also Published As

Publication number Publication date
WO2002037543A3 (en) 2003-03-27
WO2002037543A2 (en) 2002-05-10

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