AU2001292775A1 - A method for quantifying the texture homogeneity of a polycrystalline material - Google Patents

A method for quantifying the texture homogeneity of a polycrystalline material

Info

Publication number
AU2001292775A1
AU2001292775A1 AU2001292775A AU9277501A AU2001292775A1 AU 2001292775 A1 AU2001292775 A1 AU 2001292775A1 AU 2001292775 A AU2001292775 A AU 2001292775A AU 9277501 A AU9277501 A AU 9277501A AU 2001292775 A1 AU2001292775 A1 AU 2001292775A1
Authority
AU
Australia
Prior art keywords
quantifying
polycrystalline material
texture homogeneity
homogeneity
texture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001292775A
Other languages
English (en)
Inventor
David P. Field
Christopher A. Michaluk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cabot Corp
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Corp filed Critical Cabot Corp
Publication of AU2001292775A1 publication Critical patent/AU2001292775A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/20Metals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Food Science & Technology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating And Analyzing Materials By Characteristic Methods (AREA)
AU2001292775A 2000-09-20 2001-09-19 A method for quantifying the texture homogeneity of a polycrystalline material Abandoned AU2001292775A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/665,845 2000-09-20
US09/665,845 US6462339B1 (en) 2000-09-20 2000-09-20 Method for quantifying the texture homogeneity of a polycrystalline material
PCT/US2001/029235 WO2002025271A2 (en) 2000-09-20 2001-09-19 A method for quantifying the texture homogeneity of a polycrystalline material

Publications (1)

Publication Number Publication Date
AU2001292775A1 true AU2001292775A1 (en) 2002-04-02

Family

ID=24671787

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001292775A Abandoned AU2001292775A1 (en) 2000-09-20 2001-09-19 A method for quantifying the texture homogeneity of a polycrystalline material

Country Status (8)

Country Link
US (1) US6462339B1 (zh)
EP (1) EP1325315A2 (zh)
JP (1) JP2004509356A (zh)
KR (1) KR20030036809A (zh)
CN (1) CN1236303C (zh)
AU (1) AU2001292775A1 (zh)
CA (1) CA2423406A1 (zh)
WO (1) WO2002025271A2 (zh)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6348113B1 (en) * 1998-11-25 2002-02-19 Cabot Corporation High purity tantalum, products containing the same, and methods of making the same
US6887356B2 (en) * 2000-11-27 2005-05-03 Cabot Corporation Hollow cathode target and methods of making same
GB0117892D0 (en) * 2001-07-23 2001-09-12 Oxford Instr Analytical Ltd Method of analysing crystalline texture
EP2338335A1 (en) * 2003-10-31 2011-06-29 Ishihara Sangyo Kaisha, Ltd. Preparation of fungicidal benzoylpyridine derivatives
US20070144623A1 (en) * 2004-02-18 2007-06-28 Wickersham Charles E Jr Ultrasonic method for detecting banding in metals
US8252126B2 (en) * 2004-05-06 2012-08-28 Global Advanced Metals, Usa, Inc. Sputter targets and methods of forming same by rotary axial forging
US7998287B2 (en) 2005-02-10 2011-08-16 Cabot Corporation Tantalum sputtering target and method of fabrication
US20060201589A1 (en) * 2005-03-11 2006-09-14 Honeywell International Inc. Components comprising metallic material, physical vapor deposition targets, thin films, and methods of forming metallic components
JP4797509B2 (ja) * 2005-08-22 2011-10-19 株式会社Ihi 破壊原因推定装置及び破壊原因推定方法
CZ308045B6 (cs) 2006-03-07 2019-11-20 Cabot Corp Způsob výroby kovového výrobku a kovová deska, vyrobená tímto způsobem
US9095885B2 (en) * 2007-08-06 2015-08-04 H.C. Starck Inc. Refractory metal plates with improved uniformity of texture
US8250895B2 (en) * 2007-08-06 2012-08-28 H.C. Starck Inc. Methods and apparatus for controlling texture of plates and sheets by tilt rolling
WO2010051040A1 (en) * 2008-11-03 2010-05-06 Tosoh Smd, Inc. Method of making a sputter target and sputter targets made thereby
CN101819150A (zh) * 2010-04-21 2010-09-01 天津钢铁集团有限公司 一种连铸坯成分偏析的分析方法
CN103376339B (zh) * 2012-04-27 2015-05-20 中国科学院沈阳自动化研究所 一种基于原子力显微术的石墨烯晶向快速检测方法
CN103928363B (zh) * 2014-04-11 2016-09-07 常州天合光能有限公司 一种硅片晶向检测方法及检测装置
CN103926262A (zh) * 2014-04-18 2014-07-16 武汉钢铁(集团)公司 汽车板织构的评价方法
US9785862B2 (en) 2014-08-18 2017-10-10 International Business Machines Corporation System and method for feeling surface roughness through microscopic data
SG11201810892XA (en) * 2017-03-30 2019-01-30 Jx Nippon Mining & Metals Corp Tantalum sputtering target
KR102282885B1 (ko) * 2020-03-06 2021-07-29 한국전기안전공사 Ebsd를 이용한 구리 용융흔 결정 방위 분석 방법 및 시스템
CN111664977B (zh) * 2020-05-28 2022-03-04 哈尔滨工业大学 一种丝织构薄膜残余应力检测方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4990779A (en) * 1989-06-06 1991-02-05 Nippon Steel Corporation Method and apparatus for evaluating strains in crystals
US5466934A (en) * 1995-01-18 1995-11-14 Adams; Brent L. Method and apparatus for identification of crystallographic defects
US5576543A (en) * 1995-08-21 1996-11-19 Texsem Laboratories, Inc. Method and apparatus for determining crystallographic characteristics

Also Published As

Publication number Publication date
KR20030036809A (ko) 2003-05-09
WO2002025271A2 (en) 2002-03-28
JP2004509356A (ja) 2004-03-25
CN1476533A (zh) 2004-02-18
CA2423406A1 (en) 2002-03-28
US6462339B1 (en) 2002-10-08
EP1325315A2 (en) 2003-07-09
CN1236303C (zh) 2006-01-11
WO2002025271A3 (en) 2003-05-08

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