AU2001280971A1 - Three-axes sensor and a method of making same - Google Patents
Three-axes sensor and a method of making sameInfo
- Publication number
- AU2001280971A1 AU2001280971A1 AU2001280971A AU8097101A AU2001280971A1 AU 2001280971 A1 AU2001280971 A1 AU 2001280971A1 AU 2001280971 A AU2001280971 A AU 2001280971A AU 8097101 A AU8097101 A AU 8097101A AU 2001280971 A1 AU2001280971 A1 AU 2001280971A1
- Authority
- AU
- Australia
- Prior art keywords
- making same
- axes sensor
- axes
- sensor
- making
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C3/00—Assembling of devices or systems from individually processed components
- B81C3/002—Aligning microparts
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/5642—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using vibrating bars or beams
- G01C19/5656—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using vibrating bars or beams the devices involving a micromechanical structure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/0802—Details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/0894—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by non-contact electron transfer, i.e. electron tunneling
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/18—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration in two or more dimensions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/0036—Switches making use of microelectromechanical systems [MEMS]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/0242—Gyroscopes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/025—Inertial sensors not provided for in B81B2201/0235 - B81B2201/0242
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0174—Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing
- B81C2201/019—Bonding or gluing multiple substrate layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/03—Bonding two components
- B81C2203/033—Thermal bonding
- B81C2203/036—Fusion bonding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/05—Aligning components to be assembled
- B81C2203/058—Aligning components using methods not provided for in B81C2203/051 - B81C2203/052
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
- G01P2015/0822—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass
- G01P2015/084—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass the mass being suspended at more than one of its sides, e.g. membrane-type suspension, so as to permit multi-axis movement of the mass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
- G01P2015/0822—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass
- G01P2015/084—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass the mass being suspended at more than one of its sides, e.g. membrane-type suspension, so as to permit multi-axis movement of the mass
- G01P2015/0842—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass the mass being suspended at more than one of its sides, e.g. membrane-type suspension, so as to permit multi-axis movement of the mass the mass being of clover leaf shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H59/00—Electrostatic relays; Electro-adhesion relays
- H01H59/0009—Electrostatic relays; Electro-adhesion relays making use of micromechanics
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Radar, Positioning & Navigation (AREA)
- Remote Sensing (AREA)
- Pressure Sensors (AREA)
- Measuring Fluid Pressure (AREA)
- Gyroscopes (AREA)
- Micromachines (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/629,683 US6674141B1 (en) | 2000-08-01 | 2000-08-01 | Single crystal, tunneling and capacitive, three-axes sensor using eutectic bonding and a method of making same |
US09/629,683 | 2000-08-01 | ||
PCT/US2001/024200 WO2002010684A2 (en) | 2000-08-01 | 2001-07-30 | Three-axes sensor and a method of making same |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001280971A1 true AU2001280971A1 (en) | 2002-02-13 |
Family
ID=24524048
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001280971A Abandoned AU2001280971A1 (en) | 2000-08-01 | 2001-07-30 | Three-axes sensor and a method of making same |
Country Status (6)
Country | Link |
---|---|
US (2) | US6674141B1 (en) |
EP (1) | EP1305570A2 (en) |
JP (1) | JP2004505264A (en) |
AU (1) | AU2001280971A1 (en) |
TW (1) | TW529060B (en) |
WO (1) | WO2002010684A2 (en) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050048688A1 (en) * | 2000-12-07 | 2005-03-03 | Patel Satyadev R. | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US6946314B2 (en) * | 2001-01-02 | 2005-09-20 | The Charles Stark Draper Laboratory, Inc. | Method for microfabricating structures using silicon-on-insulator material |
US7381630B2 (en) * | 2001-01-02 | 2008-06-03 | The Charles Stark Draper Laboratory, Inc. | Method for integrating MEMS device and interposer |
US6835589B2 (en) * | 2002-11-14 | 2004-12-28 | International Business Machines Corporation | Three-dimensional integrated CMOS-MEMS device and process for making the same |
AU2003901914A0 (en) * | 2003-04-22 | 2003-05-08 | Quantum Precision Instruments Pty Ltd | Quantum tunnelling transducer device |
US6949985B2 (en) * | 2003-07-30 | 2005-09-27 | Cindy Xing Qiu | Electrostatically actuated microwave MEMS switch |
US7030768B2 (en) * | 2003-09-30 | 2006-04-18 | Wanie Andrew J | Water softener monitoring device |
US7302858B2 (en) * | 2004-09-24 | 2007-12-04 | Kevin Walsh | MEMS capacitive cantilever strain sensor, devices, and formation methods |
US8916942B2 (en) * | 2010-05-13 | 2014-12-23 | Valtion Teknillinen Tutkimuskeskus | Microelectromechanical resonator and a method for producing the same |
US8635765B2 (en) * | 2011-06-15 | 2014-01-28 | International Business Machines Corporation | Method of forming micro-electrical-mechanical structure (MEMS) |
US8650955B2 (en) | 2012-01-18 | 2014-02-18 | The United States Of America As Represented By The Secretary Of The Navy | Time domain switched gyroscope |
US8957355B1 (en) * | 2012-01-26 | 2015-02-17 | The Boeing Company | Inertial measurement unit apparatus for use with guidance systems |
US8875576B2 (en) | 2012-03-21 | 2014-11-04 | The United States Of America As Represented By The Secretary Of The Navy | Apparatus and method for providing an in-plane inertial device with integrated clock |
US8991250B2 (en) | 2012-09-11 | 2015-03-31 | The United States Of America As Represented By Secretary Of The Navy | Tuning fork gyroscope time domain inertial sensor |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
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US5265470A (en) | 1987-11-09 | 1993-11-30 | California Institute Of Technology | Tunnel effect measuring systems and particle detectors |
US5210714A (en) | 1988-10-14 | 1993-05-11 | International Business Machines Corporation | Distance-controlled tunneling transducer and direct access storage unit employing the transducer |
US5015850A (en) | 1989-06-20 | 1991-05-14 | The Board Of Trustees Of The Leland Stanford Junior University | Microfabricated microscope assembly |
DE69102590T2 (en) | 1990-05-18 | 1994-10-06 | British Aerospace | Inertial sensors. |
JP3069923B2 (en) | 1991-06-17 | 2000-07-24 | キヤノン株式会社 | Cantilever probe, atomic force microscope, information recording / reproducing device |
US5313835A (en) | 1991-12-19 | 1994-05-24 | Motorola, Inc. | Integrated monolithic gyroscopes/accelerometers with logic circuits |
DE4305033A1 (en) | 1992-02-21 | 1993-10-28 | Siemens Ag | Micro-mechanical relay with hybrid drive - has electrostatic drive combined with piezoelectric drive for high force operation and optimum response |
JP3152005B2 (en) * | 1993-03-17 | 2001-04-03 | 株式会社村田製作所 | Manufacturing method of semiconductor acceleration sensor |
EP0619495B1 (en) | 1993-04-05 | 1997-05-21 | Siemens Aktiengesellschaft | Process for manufacturing tunnel effect sensors |
US5354985A (en) | 1993-06-03 | 1994-10-11 | Stanford University | Near field scanning optical and force microscope including cantilever and optical waveguide |
US5475318A (en) | 1993-10-29 | 1995-12-12 | Robert B. Marcus | Microprobe |
US5729074A (en) * | 1994-03-24 | 1998-03-17 | Sumitomo Electric Industries, Ltd. | Micro mechanical component and production process thereof |
US5666190A (en) * | 1994-04-12 | 1997-09-09 | The Board Of Trustees Of The Leland Stanford, Jr. University | Method of performing lithography using cantilever array |
US6075585A (en) | 1994-04-12 | 2000-06-13 | The Board Of Trustees Of The Leland Stanford, Jr. University | Vibrating probe for a scanning probe microscope |
US5596194A (en) * | 1994-08-19 | 1997-01-21 | Hughes Aircraft Company | Single-wafer tunneling sensor and low-cost IC manufacturing method |
US5646348A (en) | 1994-08-29 | 1997-07-08 | The Charles Stark Draper Laboratory, Inc. | Micromechanical sensor with a guard band electrode and fabrication technique therefor |
JP3182301B2 (en) | 1994-11-07 | 2001-07-03 | キヤノン株式会社 | Microstructure and method for forming the same |
US5883387A (en) | 1994-11-15 | 1999-03-16 | Olympus Optical Co., Ltd. | SPM cantilever and a method for manufacturing the same |
JP2897671B2 (en) | 1995-01-25 | 1999-05-31 | 日本電気株式会社 | Field emission cold cathode |
US5659195A (en) | 1995-06-08 | 1997-08-19 | The Regents Of The University Of California | CMOS integrated microsensor with a precision measurement circuit |
GB9524241D0 (en) * | 1995-11-28 | 1996-01-31 | Smiths Industries Plc | Rate sensors |
US5894090A (en) | 1996-05-31 | 1999-04-13 | California Institute Of Technology | Silicon bulk micromachined, symmetric, degenerate vibratorygyroscope, accelerometer and sensor and method for using the same |
US5992233A (en) * | 1996-05-31 | 1999-11-30 | The Regents Of The University Of California | Micromachined Z-axis vibratory rate gyroscope |
US5747804A (en) | 1996-09-13 | 1998-05-05 | Raytheon Company | Method and apparatus for sensing infrared radiation utilizing a micro-electro-mechanical sensor |
JP3639684B2 (en) | 1997-01-13 | 2005-04-20 | キヤノン株式会社 | Evanescent wave detection microprobe and method for manufacturing the same, probe including the microprobe and method for manufacturing the same, evanescent wave detection device including the microprobe, near-field scanning optical microscope, and information reproducing device |
JP3493974B2 (en) * | 1997-10-01 | 2004-02-03 | オムロン株式会社 | Electrostatic micro relay |
US5929497A (en) | 1998-06-11 | 1999-07-27 | Delco Electronics Corporation | Batch processed multi-lead vacuum packaging for integrated sensors and circuits |
US6126311A (en) * | 1998-11-02 | 2000-10-03 | Claud S. Gordon Company | Dew point sensor using mems |
US6091125A (en) | 1998-12-02 | 2000-07-18 | Northeastern University | Micromechanical electronic device |
US6229190B1 (en) | 1998-12-18 | 2001-05-08 | Maxim Integrated Products, Inc. | Compensated semiconductor pressure sensor |
US6174820B1 (en) * | 1999-02-16 | 2001-01-16 | Sandia Corporation | Use of silicon oxynitride as a sacrificial material for microelectromechanical devices |
US6337027B1 (en) * | 1999-09-30 | 2002-01-08 | Rockwell Science Center, Llc | Microelectromechanical device manufacturing process |
US6563184B1 (en) | 2000-08-01 | 2003-05-13 | Hrl Laboratories, Llc | Single crystal tunneling sensor or switch with silicon beam structure and a method of making same |
US6580138B1 (en) | 2000-08-01 | 2003-06-17 | Hrl Laboratories, Llc | Single crystal, dual wafer, tunneling sensor or switch with silicon on insulator substrate and a method of making same |
US6555404B1 (en) | 2000-08-01 | 2003-04-29 | Hrl Laboratories, Llc | Method of manufacturing a dual wafer tunneling gyroscope |
-
2000
- 2000-08-01 US US09/629,683 patent/US6674141B1/en not_active Expired - Fee Related
-
2001
- 2001-07-04 TW TW090116335A patent/TW529060B/en not_active IP Right Cessation
- 2001-07-30 AU AU2001280971A patent/AU2001280971A1/en not_active Abandoned
- 2001-07-30 EP EP01959412A patent/EP1305570A2/en not_active Withdrawn
- 2001-07-30 WO PCT/US2001/024200 patent/WO2002010684A2/en not_active Application Discontinuation
- 2001-07-30 JP JP2002516567A patent/JP2004505264A/en active Pending
-
2003
- 2003-08-11 US US10/639,289 patent/US6835587B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO2002010684A2 (en) | 2002-02-07 |
US6674141B1 (en) | 2004-01-06 |
JP2004505264A (en) | 2004-02-19 |
WO2002010684A3 (en) | 2002-04-25 |
US20040048403A1 (en) | 2004-03-11 |
TW529060B (en) | 2003-04-21 |
US6835587B2 (en) | 2004-12-28 |
EP1305570A2 (en) | 2003-05-02 |
WO2002010684A9 (en) | 2003-03-27 |
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