AU2001278941A1 - System and method for characterizing optical systems using holographic reticles - Google Patents

System and method for characterizing optical systems using holographic reticles

Info

Publication number
AU2001278941A1
AU2001278941A1 AU2001278941A AU7894101A AU2001278941A1 AU 2001278941 A1 AU2001278941 A1 AU 2001278941A1 AU 2001278941 A AU2001278941 A AU 2001278941A AU 7894101 A AU7894101 A AU 7894101A AU 2001278941 A1 AU2001278941 A1 AU 2001278941A1
Authority
AU
Australia
Prior art keywords
optical systems
characterizing optical
reticles
holographic
holographic reticles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001278941A
Inventor
Matthew E. Hansen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML US Inc
Original Assignee
ASML US Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML US Inc filed Critical ASML US Inc
Publication of AU2001278941A1 publication Critical patent/AU2001278941A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
    • G11B7/0065—Recording, reproducing or erasing by using optical interference patterns, e.g. holograms
AU2001278941A 2000-07-19 2001-07-19 System and method for characterizing optical systems using holographic reticles Abandoned AU2001278941A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US21918700P 2000-07-19 2000-07-19
US60219187 2000-07-19
PCT/US2001/022518 WO2002006899A2 (en) 2000-07-19 2001-07-19 Method for characterizing optical systems using holographic reticles

Publications (1)

Publication Number Publication Date
AU2001278941A1 true AU2001278941A1 (en) 2002-01-30

Family

ID=22818235

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001278941A Abandoned AU2001278941A1 (en) 2000-07-19 2001-07-19 System and method for characterizing optical systems using holographic reticles

Country Status (5)

Country Link
EP (1) EP1301830A2 (en)
JP (1) JP4599029B2 (en)
KR (2) KR100956670B1 (en)
AU (1) AU2001278941A1 (en)
WO (1) WO2002006899A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10131534B4 (en) * 2001-06-29 2007-07-19 Infineon Technologies Ag Method for producing a mask for exposure
US6885429B2 (en) * 2002-06-28 2005-04-26 Asml Holding N.V. System and method for automated focus measuring of a lithography tool
AT414285B (en) * 2004-09-28 2006-11-15 Femtolasers Produktions Gmbh MULTI-REFLECTION DELAY RANGE FOR A LASER BEAM AND RESONATOR BZW. SHORT-PULSE LASER DEVICE WITH SUCH A DELAYED TRACK
US11803130B2 (en) 2019-08-09 2023-10-31 Asml Netherlands B.V. Phase modulators in alignment to decrease mark size
JP2022544187A (en) 2019-08-09 2022-10-17 エーエスエムエル ネザーランズ ビー．ブイ． Measurement device and phase modulation device therefor
GB2598604B (en) * 2020-09-04 2023-01-18 Envisics Ltd A holographic projector
US20230314185A1 (en) * 2022-03-31 2023-10-05 Apple Inc. Optical Sensor Module Including an Interferometric Sensor and Extended Depth of Focus Optics

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3829219A (en) * 1973-03-30 1974-08-13 Itek Corp Shearing interferometer
JPS5597220A (en) * 1979-01-19 1980-07-24 Dainippon Printing Co Ltd Method of producing metal filter
JPS61190368A (en) * 1985-02-20 1986-08-25 Matsushita Electric Ind Co Ltd Formation of fine pattern
JP2922958B2 (en) * 1990-02-13 1999-07-26 株式会社日立製作所 Magnification projection exposure method and apparatus
JPH03263313A (en) * 1990-03-13 1991-11-22 Mitsubishi Electric Corp Interference aligner
US5128530A (en) * 1991-05-28 1992-07-07 Hughes Aircraft Company Piston error estimation method for segmented aperture optical systems while observing arbitrary unknown extended scenes
JPH05217856A (en) * 1992-01-31 1993-08-27 Fujitsu Ltd Method and apparatus for exposure
JPH08286009A (en) * 1995-04-13 1996-11-01 Sumitomo Electric Ind Ltd Device for forming chirp grating
CA2688799C (en) * 1996-11-15 2014-09-30 Marsupial Holdings, Inc. In-line holographic mask for micromachining
JPH10270330A (en) * 1997-03-27 1998-10-09 Hitachi Ltd Method and device for forming pattern
JP4032501B2 (en) * 1998-04-22 2008-01-16 株式会社ニコン Method for measuring imaging characteristics of projection optical system and projection exposure apparatus
JPH11354014A (en) * 1998-06-08 1999-12-24 Ricoh Co Ltd Manufacture of field emission type electron source
JP2000150347A (en) * 1998-11-11 2000-05-30 Hitachi Ltd Manufacture of semiconductor integrated circuit device
US6379868B1 (en) * 1999-04-01 2002-04-30 Agere Systems Guardian Corp. Lithographic process for device fabrication using dark-field illumination

Also Published As

Publication number Publication date
KR100956670B1 (en) 2010-05-10
WO2002006899A2 (en) 2002-01-24
EP1301830A2 (en) 2003-04-16
WO2002006899A3 (en) 2002-06-20
KR100886897B1 (en) 2009-03-05
JP2004504634A (en) 2004-02-12
KR20020072531A (en) 2002-09-16
KR20080091263A (en) 2008-10-09
JP4599029B2 (en) 2010-12-15

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