KR100956670B1 - Method for making a holographic reticle - Google Patents

Abstract

According to the present invention, the characteristic evaluation of the optical system is obtained quickly and easily in a single acquisition step by obtaining image data in the image space of a predetermined area. The reticle and image plane are positioned inclined to each other such that a plurality of feature pattern sets comprising a periodic pattern or a diffraction grating are imaged in a space of a predetermined region including a focal depth. The metrology tool is used to analyze the detected or recorded image in the space of a given area through the depth of focus in a single step or exposure to determine the imaging characteristics of the optical system. Thus, focal, top curvature, astigmatism, spherical aberration, coma and / or focal plane deviation can be determined. The invention is particularly applicable to semiconductor fabrication and the photolithographic techniques used therein, and allows rapid evaluation of the characteristics of an optical system with a single exposure with dramatically increased data quality and a continuous coverage of the entire parameter space. In an embodiment, the test reticle is manufactured in a holographic manner by interfering two or more optical radiations. The generated interference pattern is recorded on the reticle and used to test the optical system. The geometry of the holographic interference pattern is tightly controlled by the characteristics of the interfering rays, which is more accurate than conventional reticle recording techniques.

Description

METHOD FOR MAKING A HOLOGRAPHIC RETICLE}

FIELD OF THE INVENTION The present invention relates to the characterization of optical systems, in particular focus, field curvature, astigmatism, spherical aberrations using holographically produced reticles. ), Rapid and precise characterization of optical systems, including coma and / or focus plane deviation.

Photolithography is often used in the manufacture of semiconductor devices and other electronic equipment. In photolithography, high quality projection optics are often used to image (draw) features on a reticle onto a photosensitive substrate, such as a wafer covered with a resist. As the size of the feature pattern desired to be reproduced continues to decrease, the optical system or projection optics must be constantly maintained and verified for image quality.

Often, the performance of optical systems or projection optics is difficult to obtain without time-consuming techniques. In general, multiple exposures of the photosensitive substrate at different locations in the image field and at different focal depths are necessary to characterize the optical system. The optical system is then characterized by collecting information obtained from inspection of the multi-processed image. Multiple exposures and correspondingly processed images are each acquired sequentially. As a result, focus errors, scan errors, and transient variations on the parameters of the optical system during the measurement are mixed.

In the case of scan and focus errors, noise is introduced into the data. In the case of a temporary change, valid data is not recoverable. In addition, data is extracted discretely rather than continuously across a range of parameters. As a result, a quantization error arises from the evaluation of data values between adjacent samples.

There is a need to improve the apparatus and methods used to characterize optical systems in response to the increasing manufacturing throughput and performance requirements of projection optics capable of imaging reduced feature patterns. It is also a device that can be used to quickly and easily evaluate the characteristics of the performance of an optical system and provide fast and easy high-precision data or information obtained and processed simultaneously without the need to perform multiple exposures and processing of multiple images. And the need to develop a method.

The present invention includes methods and apparatus for simultaneously acquiring characterization information of an optical system by using a predetermined area of space for a relatively short time or with a single exposure.

Test reticles having a plurality of feature patterns of different orientations, sizes, and line shapes are imaged with the optical system to be characterized. The object plane on which the reticle is located or the image plane from which the characterization data is obtained is inclined or positioned at an angle within the space of the corresponding three-dimensional region. Reticles having a plurality of feature patterns are imaged with the optical system to be characterized. In this way, within the space of the predetermined region, an envelope of the characteristic pattern quality through the focus is obtained through the depth of focus. This feature pattern quality envelope is obtained simultaneously by acquiring image data of the reticle in a plane inclined with respect to the reticle plane. The characteristic pattern corresponding to the generated image of the reticle is analyzed with a metrology technique, which may include an interference tool, to obtain the characteristics of the optical system. The characteristics of the optical system obtainable include focus, top curvature, astigmatism, coma, distortion, telecentricity and / or focal plane deviations; And information about variation in spherical aberration and interference.

In an embodiment, the test reticle described above is manufactured in a holographic manner. Specifically, holographic reticles are produced by interfering two or more optical radiations to generate an interference region having periodic interference pattern (s). The interference pattern is recorded on a reticle blank using any of a variety of recording techniques such as photographic film, photoresist and the like. The geometry of the periodic interference pattern is tightly controlled by the nature of the interfering optical beam. Specifically, the geometry is controlled by the wavelength of the light beam, the wavefront variation and the geometry of the exposure apparatus (ie, the relative angle of the optical radiation before and after the interference). These factors can all be controlled more precisely than e-beam or laser recording tools that are recorded in series. In addition, much larger reticle regions can be recorded in a single attempt using holographic patterning. In this way, writing errors caused by combining sub-fields with each other are completely avoided.

Thus, an advantage of the present invention is that the optical system is characterized quickly and in a single exposure or imaging operation.

An advantage of the present invention is that the data required for the characterization of the optical system is obtained quickly.

Another advantage of the present invention is that data insensitive to focus, scan and transient errors associated with the prior art is obtained quickly.

An advantage of the present invention is that the reticle writing error is reduced or eliminated by holographically patterning the test reticle as compared to an e-beam or laser reticle recording tool.

An advantage of the present invention is that holographically patterned reticles can print a much smaller linewidth than conventional reticle recording tools.

An advantage of the present invention is that pitch uniformity for periodic diffraction gratings can be tightly controlled by holographically patterning test reticles. For example, chirped or continuously variable pitch patterns can be generated with significant accuracy. This provides an inspection of the optical system performance for precisely controlled continuous line size, line orientation and pattern pitch.

An advantage of the present invention is that the phase shift of the periodic structure can be precisely controlled. Phase shifting structures are important in the characterization of unique optical aberrations that cause shifts in feature patterns in the image plane.

It is a feature of the present invention that information or data is obtained over the entire image space of a given area.

Another feature of the invention is that the reticle is in a different plane than the plane from which the data is acquired in image space.

Another feature of the invention is that the vertical line from the reticle and / or image plane interceptor is not collinear with the axis of the optical system.

These and other objects, advantages and features will be readily apparent upon consideration of the following detailed description.

1. Characterization of optical systems

1a schematically illustrates the invention. Photolithography system 10 is shown generally. An illumination source 12 is via the optical system or projection optics 18 onto the photosensitive substrate or photosensitive substrate 22 in the image space 20 in a reticle or object 14 in the space or area 14 of the reticle. 16) is used to project the image. The reticle 16 is located in a plane that is inclined with respect to the photosensitive substrate 22. The reticle 16 and the photosensitive substrate 22 may be inclined in a variety of different ways. Preferably, the positioning of the reticle 16 or wafer 22 is such that the reticle 16 or wafer 22 extends through the object area or focal depth of the optical system or projection optics 18. Imaging data recorded by the photosensitive substrate 22 provides information that enables the characterization of the optical system or projection optics 18. Information for determining spherical aberration and coherence variations and imaging characteristics such as focal, top curve, astigmatism, coma and / or focal plane deviation can be obtained. Image quality of the entire image field through focus can be obtained in a single imaging or exposure operation in a relatively short time. The entire image of the reticle can be analyzed with metrology techniques to characterize the optical system or projection optics 18. As such, the optical system or projection optics 18 is characterized by a depth of focus in the x and y field directions and in the z direction. Although the photosensitive substrate 22 has been pointed out as a way of recording electromagnetic radiation through the reticle 16, for example, a charge coupled device (CCD) array, a position sensitive detector (PSD) or an equivalent detector Any device for detecting electromagnetic radiation, such as a photoreceptive sensor, may be used.

Instead, a demodulation device can be used to generate the interference pattern. 1B is a schematic diagram of a photolithographic system having a demodulation device 24. Demodulation device 24 may be a demodulation reticle, an electro-optic demodulating device, an acoustic-optic demodulating device, or other demodulation device.

The interference pattern is advantageous in that it can be visually observed to detect optical aberrations and to support adjustments to the photolithographic system 10 in real time.

The interference pattern may comprise a Moire fringe pattern. The moire pattern may exhibit a global broadening change and a local distortion change from the nominal pattern.

Next to the demodulation device 24 may be a photosensitive substrate 22, CCD array, PSD or equivalent detector as described above. Instead, the detector array may be patterned in a lithographic or holographic manner to generate an integrated detector module. Multiplexing of the parameter space can be used to detect focus, astigmatism, coma distortion, magnification, etc. without the need for an expensive and time consuming photo recording system as described below.

FIG. 2 shows an object space or reticle space 114 that is an example of the object 14 of FIG. 1A. Within the object or reticle space 114 is a reticle 116 comprising a plurality of different periodic feature patterns 116a-116e. Each of the plurality of different periodic patterns or feature patterns 116a-116e may include diffraction grating patterns of varying line shapes, feature patterns, sizes, and orientations to obtain different imaging information or data to characterize the optical system. Periodic feature patterns or structures need to be periodic but need not be diffraction gratings. Reticle 16 may be inclined within object or reticle space 114 by an angle 124. Thus, the reticle 116 is located in the reticle or object space 114 over a range of depths z ₁ .

3 is a perspective view showing the photosensitive substrate 122 positioned at an angle to the photo acquisition substrate or the data acquisition plane of the image space 120. The photosensitive substrate 122 is positioned at an angle 126 in the photosensitive substrate or image space 120. The photosensitive substrate 122 extends through a predetermined range of depth z ₂ . The depth z ₂ of this range is within and beyond the depth of focus of the optical system or projection optics. The photosensitive substrate 122 is shown inclined at an angle 126 that is composited with the inclination angle 124 of the reticle 116 shown in FIG. The reticle 116 and photosensitive substrate 122 may be angled or inclined in different ways with respect to each other, and the inclinations shown in FIGS. 2 and 3 are merely examples of suitable inclinations or angles that may be used in the present invention. Should be understood. In obtaining useful characterization data for an optical system according to the present disclosure, one plane is inclined relative to another plane and the degree and nature of the inclined positioning of the two planes is dependent upon the shape and amount of desired characterization data. It may only be necessary to be determined by it. For example, the plane of the reticle need not be inclined, but the plane of the photosensitive substrate is made to be inclined or inclined relative to the plane of the reticle. Instead, those skilled in the art will recognize that the above description of the placement relationship between the reticle and the photosensitive substrate can also be applied to the similar arrangement relationship between the reticle and the demodulation device 24 described above with reference to FIG. 1B.

4 is a plan view showing a reticle 216 having a plurality of different periodic feature patterns, patterns, structures, or gratings formed thereon. Reticle 216 is an example of reticle 16 of FIG. 1A. Different periodic feature patterns may be grouped by forming different sets of feature patterns that can be used to obtain different imaging information for characterizing the optical system. For example, the reticle 216 may include a plurality of different line shapes, feature patterns, sizes, and orientations that may constitute four feature pattern sets. For example, the first feature pattern set 216a includes a basket weave, the second feature pattern set 216b includes a plurality of horizontal lines and vertical lines, and the third feature pattern set 216c includes a second weave. A horizontal line and vertical line having different spacing and size with respect to the feature pattern set 216b, the fourth feature pattern set 216d includes a different set of horizontal line and vertical line, and the fifth feature pattern set 216e A basket weave, which may be the same as or different from the one feature pattern set 216a, is included. Reticle 216 includes a plurality of different feature pattern sets that may include different lines and spacing or diffraction gratings over the entire image field for imaging onto an inclined plane in object space. Detection and analysis of the image in a plane traversing the image space results in the acquisition of optical system characterization data that can be used to determine the performance or imaging characterization of the optical system.

5A is an example of another feature pattern set 316c that can be placed on a portion of the reticle and imaged onto a photosensitive substrate. The feature pattern set 316c may include a center field having a width w ₁ including multiple or staggered rows or stripes forming a predetermined pattern. For example, row 330 has vertical lines spaced thereon, row 332 has horizontal lines spaced thereon, row 334 has diagonal lines spaced -45 ° thereon, and row 336 has It has a diagonal of + 45 ° on it. Stripes or rows 330, 332, 334, 336 may form a pattern extending along the length L of feature pattern set 316c formed on a portion of the reticle as shown in FIG. 5A. The corners of the feature pattern set 316c may be formed from columns or vertical stripes 328. Within column 328 is a basket weave pattern. The basket weave in column 328 may be formed from a partially deliverable section or portion. The overall width of the feature pattern set 316c is w ₂ . By way of example, the feature pattern set 316c may have dimensions having a total width w ₂ of approximately 5 mm, a central width w ₁ of approximately 4.5 mm, and a length L of approximately 27 mm. Each row or stripe may be approximately 50 μm in height or width. Each line width in the row may be on the order of 200 nm. The feature pattern set 316c is provided by way of example. Other feature pattern sets may be used to determine the characteristics of the optical system without departing from the spirit and scope of the invention.

5B illustrates another feature pattern set 316d that may be used on a portion of the reticle. The feature pattern set 316d includes a pattern of horizontal lines, vertical lines, and diagonal lines. Stripe or row 330 'has a vertical pattern thereon. Row or stripe 334 'has a plurality of diagonal lines of -45 degrees, and row or stripe 336' has a plurality of diagonal lines of +45 degrees thereon. The plurality of rows or stripes are repeated in a horizontal, vertical, -45 °, + 45 ° pattern along the length of the feature pattern set 316d. Other rows or patterns may be placed within a set of feature patterns depending on the characteristics of the optical system in which they want to be detected or determined.

6 shows processing of information obtained from imaging of a reticle with an optical system or projection optics to be characterized. Image plane 420 is detected or recorded onto the photosensitive substrate. The image plane has a plurality of images including feature pattern set images 420a through 420e imaged by the reticle as shown in FIG. The data obtained from the image plane 420 inclined relative to the reticle plane is derived over the entire image field plane where it is desired for the interferometer to be recorded onto the photosensitive substrate using the preferred metrology tool 40. Metrology tool 40 may detect or derive information, such as interference patterns, that are determined or detected from an image of a set of feature patterns on the reticle. An image is formed on the image plane 420 and can be recorded on the photosensitive substrate. Instead, the image formed on the image plane 420 can be observed in real time by using a demodulation device such as demodulation device 24 as shown in FIG. 1B. Signal processor 42 coupled to metrology tool 40 analyzes and processes different images of different feature pattern sets 420a through 420e. The processed signal from the signal processor 42 is provided to the optical system characterization device 44. Thus, different aberrations of the optical system can be determined. For example, astigmatism can be determined as a function of the difference in the optimal focus of the periodic pattern or lattice orientation. Coma can be determined as a function of the second distortion signature versus focus. Spherical aberration can be determined as a function of the difference in optimal focus between line size versus field position. The recorded data is then transferred to different metrology tools such as white light, dark-field microscope, large aperture interferometer, laser microscope interferometer or interferometric microscope. Can be analyzed.

Figure 7 is a block diagram illustrating the steps of the high level method of one embodiment of the present invention. Step 510 represents imaging a reticle with a periodic diffraction grating or pattern formed thereon in a plane inclined relative to the reticle plane with the optical system to be characterized. The periodicity pattern may comprise different diffraction grating patterns, each different diffraction grating pattern is designed to determine certain characteristics of the optical system. Step 512 represents recording data representing an image of a periodic pattern or diffraction grating detected in a plane inclined relative to the reticle plane. An image of the periodic pattern or diffraction grating may be recorded into the photosensitive substrate or by electronic means as will be apparent to one skilled in the art, or may be provided for viewing in real time by using a demodulation device. Step 514 represents analyzing the recorded data in an interference manner to determine imaging characteristics of the optical system. Data representing the periodicity pattern or diffraction grating (s) is analyzed with interference techniques to obtain the characteristics of the optical system. The optical system can be characterized over the entire field and at different focal depths in a single operation.

8-13 illustrate the application of the inventive concept to different embodiments for characterizing optical systems by determining different optical properties such as different aberrations including top curvature and astigmatism and spherical aberration.

FIG. 8A shows a space 620 of a predetermined area, which is an example of the space 20 of the predetermined area of FIG. 1A. Within the space 620 of a given area, electromagnetic radiation representing the image can be detected. For example, the photosensitive substrate 622 or demodulation device (such as demodulation device 24 as shown in FIG. 1B) is located in the space 620 of the predetermined region at an angle θ from the x-y plane. The image from the optical system (such as system 10 from FIG. 1A) is projected onto photosensitive substrate 622. The image projected onto the photosensitive substrate 622 is an image of a plurality of feature pattern sets or spaced lines placed on the reticle as shown in the previous figures. The use of the photosensitive substrate 622 is described in the preferred embodiment, but any photoreceptor or demodulator may be placed within the space 620 of a given area to receive and detect electromagnetic radiation representing an image of the reticle. It should be understood that there is.

FIG. 8B illustrates detection of top curvature using a photosensitive substrate 622 or demodulation device (not shown) positioned as shown in FIG. 8A. Line 631 represents the top surface curvature for the optical system to be characterized, and the width d of line 631 represents the depth of focus of the optical system to be characterized. Thus, by using a reticle having a plurality of feature patterns imaged onto the photosensitive substrate by tilting the photosensitive substrate in the space 620 of the predetermined region, the top surface curvature and the field depth can be quickly and easily determined. By selecting appropriate feature patterns and orientations on the reticle, additional information characterizing the optical system can be obtained with a single exposure of the photosensitive substrate or with a single data acquisition of the acceptance of electromagnetic radiation within the space of a given area.

Line 631 may be created with a periodic pattern or a diffraction grating reticle imaged on the inclined photosensitive substrate 622. Periodic patterns or diffraction grating strips or lines 631 will occur below the center of the field. Line 631 is narrow enough to define the center strip of the field, but should be calculated wide enough to include several resolvable points in the direction of the x axis. This is a function of the pixel density of the detector array, charge coupled device or position sensing detector used to observe the strip or line 631. Phase-shifting interferometer may be used. Data can be obtained by positioning the photosensitive substrate 622 at a Retrow angle with respect to the phase shift interferometer. The redraw angle is the angle at which retro-diffraction causes electromagnetic radiation from the interferometer to return to the interferometer. The peak of the intensity map obtained by the phase shift interferometer is the point of optimal focus of the optical system to be characterized. These peaks include ridges in the y axis direction. As the field is traversed in the y-axis direction, the meandering of this ridge in the x direction indicates top curvature. The strength of this procedure lies in the ability to simultaneously acquire intensity data at points across space 620 in a given area. Calibration, scaling and extraction of the data is easy. This method uses the intensity of re-diffraction. Top curvature can also be detected using the phase of retro-reflection. In this method, the photosensitive substrate is positioned perpendicular to the axis of the phase shift interferometer. The acquired phase map includes the resist height of the feature pattern at each point on the photosensitive substrate. In the direction of the x axis, the quality of the feature pattern is a function of the focus curve. In the direction of the y axis, the shift of the optimal focus for the magnitude and orientation of any feature pattern is a function of field position. Top curvature and astigmatism can be derived from a comparison of curve shifts as a function of the orientation of the orthogonal feature pattern as will be apparent to those skilled in the art.

9A and 9B schematically illustrate the detection of astigmatism according to the present invention. 9A shows a pattern that can be repeatedly reproduced on a reticle or mask or provided for viewing by a demodulation device (such as demodulation device 24 as shown in FIG. 1B) used to detect astigmatism. It is shown schematically. Portion 716 includes a rectangular grid or line pattern. Vertical lines 730 are staggered or alternate between the horizontal lines 732. Vertical line 730 and horizontal line 732 are perpendicular to each other.

FIG. 9B shows an image formed on a photosensitive substrate inclined in a space of a predetermined region or a demodulation device (not shown) corresponding thereto, as shown in FIG. 8A. The portion of the periodic pattern or diffraction grating 716 ′ imaged on the feature pattern set or photosensitive substrate has a lateral dimension f representing the depth of field. Crossing the dimension f representing the depth of field, different image qualities will be obtained with the optimal image quality located at the highest point along the dimension f. Envelope 735 is formed. Envelope 735 represents image quality in dimension f along the depth of focus of recorded image 732 ′ of horizontal line 732 shown in FIG. 9A. Likewise, the vertical line 730 shown in FIG. 9A is represented by the recorded image 730 '. An envelope 733 is formed that represents the image quality of the depth of focus for the recorded image 730 'of the vertical line 730 on a portion of the reticle 716 as shown in FIG. 9A. The optimal image quality is graphically represented by the highest point along envelopes 733 and 735. Any astigmatism in the optical system at the image location is represented by a distance a indicating the formation of different images of the horizontal and vertical lines. Axial separation of the tangent and agittal image planes can be detected by different points of focus indicated by envelopes 733 and 735. Lateral shifts of the different points of these focal points are represented by distance a.

Many different feature pattern sets, periodic patterns or diffraction gratings can be used in accordance with the present invention. 10A and 10B illustrate other feature pattern sets, periodic patterns, or diffraction gratings that can be used to determine astigmatism of an optical system. FIG. 10A is a top view illustrating a reticle or mask 817 having a plurality of stripes 816 each including a reticle pattern or feature pattern set. FIG. 10B schematically illustrates either the periodic pattern of the reticle or the diffraction grating 816 on which the reticle 817 shown in FIG. 10A is formed. A feature pattern set, periodic pattern, or diffraction grating 816 is formed from a plurality of columns of the periodic pattern or diffraction grating. Pairs of adjacent columns of the periodic pattern or diffraction grating are formed from pairs of rectangular lines. For example, column 830 is formed from vertical lines, and column 832 is formed from horizontal lines. Vertical lines and horizontal lines are perpendicular to each other. Column 836 is formed from a diagonal of + 45 ° and column 838 is formed from a diagonal of -45 °. Thus, the lines in columns 836, 834 are perpendicular to each other. The staggering of the columns with different line orientations as shown in FIG. 10B provides information about the aberration of the optical system to be characterized. Aberrations of a substantial portion of the field can be detected simultaneously with practicing the present invention.

11A and 11B are simplified schematic diagrams illustrating the use of a line or feature pattern set to determine astigmatism in accordance with the present invention. In this embodiment of the present invention, the line or feature pattern set is arranged in columns rather than rows. 11 shows a partial plan view of the reticle pattern 916. The reticle pattern is formed from a plurality of feature pattern sets or lines, some of which are formed by columns of lines that alternate between horizontal and vertical orientations. Column 930 is formed from a plurality of vertical lines, and column 932 is formed from a plurality of horizontal lines. The image formed from the portion 916 of the reticle is used to detect astigmatism when projected into image space. In this embodiment, the photosensitive substrate used to record the image of the reticle portion 916 is inclined relative to the reticle portion 916 from the x-y plane and rotated about the y axis. Instead, a demodulation device (such as demodulation device 24 as shown in FIG. 1B) may be configured correspondingly to the reticle. Figure 11B schematically illustrates the detection and analysis of an image in image space to determine astigmatism at field positions. Since the photosensitive substrate on which the image is recorded is inclined from the x-y plane and rotated about the y axis, the x direction represents the depth of focus as shown in FIG. The height in the z direction shown in Fig. 11B indicates image quality at different focal depths. Bar 930 ′ in FIG. 11B represents the image quality of the alternating column 930 of vertical lines shown in FIG. 11A. Image quality increases and decreases along the depth of focus, and optimal image quality is centered to some extent. Thus, an envelope 933 representing the image quality of column 930 of the vertical line is formed. Similarly, as shown in Fig. 11B, the image quality of the column 932 of the horizontal line is represented by the bar 932 ', and the height of the bar 932' in the z direction represents the image quality. Image quality increases and decreases along the depth of focus in the x direction. Thus, the envelope 935 of the bar 932 'representing the image quality of the column 932 of the vertical line on the reticle portion 916 shown in FIG. 11A can be determined. The image of column 930 of vertical lines represented by bars 930 'is staggered between the images of column 932 of horizontal lines represented by bars 932'. If there is no astigmatism at the field position of the optical system to be characterized, the envelopes 933 and 935 will coincide. However, any astigmatism can be detected by the relative shift between the envelopes 933 and 935 represented by the distance a '.

9A, 9B, 11A and 11B illustrate different techniques for obtaining the same information using different embodiments of the present invention. Disclosed herein are aberrations of an optical system in a single step or exposure in that it simultaneously forms an image of a plurality of different feature pattern sets, periodic patterns or diffraction gratings on a reticle to record an image generated within a given area of space. Enables detection and characterization of The disclosure of the present invention can be used to determine different aberrations of an optical system according to different feature pattern sets, periodic patterns, or diffraction gratings used in some of the reticles.

Figure 12 shows a portion 1016 of a reticle having a feature pattern set or line pattern that can be used to detect spherical aberration. Reticle portion 1016 represents alternating lines of columns 1030 and 1032 having different line spacing or width. For example, the line spacing of column 1030 may be 300 nm, and the line spacing of column 1032 may be 100 nm. Reticle pattern portion 1016 shown in FIG. 12 is similar to reticle pattern portion 716 shown in FIG. 9A. However, when reticle pattern portion 716 uses line orientation to detect astigmatism, reticle pattern portion 1016 uses line width or spacing to detect spherical aberration. They all detect the image of each reticle pattern portion in the space of the predetermined region with different focal depths, such as when the photosensitive substrate is inclined in the space of the predetermined image region. In addition, they can all be read into the interferometer in a single step with differently imaged lines containing information representing the aberration of the optical system. For the reticle pattern portion 1016, the image quality will vary along the depth of focus for different line widths. Thus, an envelope representing image quality as a function of focal depth for each different linewidth section will be shifted according to any spherical aberration. It should be understood that different reticle portions having different line patterns across the portion of the reticle can be used to detect various different aberrations at different locations in the field. Different parts of these reticle patterns can be incorporated into a single reticle to simultaneously detect and measure top curvature and different aberrations.

13 shows a reticle (eg, divided into a plurality of different sections having sections 1119a to 1119d, among others, which may have different reticle pattern portions configured to simultaneously detect different aberrations across the field to characterize the optical system). 1117 is shown. For example, magnification can be measured as the angle of rediffraction. The nominal diffraction light beam angle associated with the pitch of the normal feature pattern can be measured differently from the nominal angle between the corrected nominal pitch substrate, the corrected prism or the surfaces. Distortion remaining after magnification can be measured as a corrected phase map. The correction reflects the relationship between normal periodic pattern or diffraction grating pitch, interferometer wavelength and in-plane distortion of local re-diffracted ray angle, IPD and geometrical constraints. Coma is measured by the induced image shift through the focus, which is regarded as a second order distortion across the inclined field through the depth of focus of the optical system.

14 is a perspective view of an interference analysis or map of a substrate that is covered or photosensitive with a basket weave or a staggered or crossed periodic pattern or an image of a diffraction grating. Instead, this analysis can be performed by observing the pattern in real time by using a demodulation device (such as demodulation device 24 as shown in FIG. 1B). A basket weave or cross periodic pattern or diffraction grating is a reticle with lines that are orthogonal over the entire field. The entire field of the optical system can be characterized by exposing the reticle over the field onto an inclined photosensitive substrate. The photosensitive substrate must be inclined such that the entire field is within the depth of focus of the optical system. Because of the inclination, the x axis of FIG. 14 represents the focus and field position in the x direction. The y axis represents the field position in the y direction. The z axis represents the pitch change between the periodic patterns or lines of the diffraction grating as a result of the aberration or distortion of the optical system. Surface contour 1221 provides information of the imaging characteristics of the optical system. The optical system can be characterized globally by interpreting the entire field or locally by interpreting the field of the desired portion.

Figure 15 is a graph showing the different imaging characteristics and distortions or aberrations that can be obtained to characterize an optical system using this embodiment of the present invention. Arrow 1202 represents coma and is illustrated by a generally or entirely curved surface contour 1221 shown in FIG. Arrow 1204 represents telecentricity and is shown as a predetermined slope of the x-y plane with respect to the y axis of the surface contour 1221 shown in FIG. Arrow 1206 represents an overall or average magnification and is shown as a predetermined slope of the x-y plane with respect to the x axis of the surface contour 1221 shown in FIG. Arrow 1208 represents the y distortion signal or local change in magnification and is shown by local change in surface contour 1221 shown in FIG. In the absence of aberrations or distortions over the entire field, the interference map will represent a smooth, non-sloped surface.

16A-16D are schematic perspective views of different distortions or aberrations of the optical system to be characterized graphically shown in FIG. 15. Figure 16A shows a line with a predetermined slope of the x-y plane with respect to the x axis. This slope represents the overall magnification. Thus, if there is no overall magnification in the field, there is no slope of the x-y plane with respect to the x axis. Figure 16B shows a line with a curved or secondary bow through the focal point. This focal or curved surface through the x direction represents coma. Figure 16c shows a line with a predetermined slope of the x-y plane with respect to the y axis. This slope represents the telecentricity. Figure 16D shows a line with local curved surfaces. This curve represents the distortion symbol or local change of magnification as a function of field position. These features or characteristics can be derived independently from the degree of interference shown in FIG. Thus, the entire field of the optical system can be characterized in a single step without the need for multiple exposures or separate analysis.

Figure 17 is a plan view of an exposed photosensitive substrate illustrating one embodiment of the present invention for determining an optimal focus of an optical system. An image of the reticle is projected onto the photosensitive substrate 1322 over the field of the optical system. Instead, the image of the reticle can be provided for viewing in real time by using a demodulation device (such as demodulation device 24 as shown in FIG. 1B). The reticle projects an image of the periodic pattern or diffraction grating pattern of the basket weave along the two longitudinal edges 1328 of the rectangular field. The photosensitive substrate 1322 is inclined with respect to the longitudinal axis such that a relatively narrow first band 1311 is printed laterally across the photosensitive substrate in two longitudinal edges 1328 during the first exposure. Next, the photosensitive substrate 1322 is shifted by a predetermined distance coaxial with the optical axis in the z direction extending into the drawing sheet of Fig. 17, so that the relatively narrow second band 1331 'has two longitudinal edges during the second exposure. Printed laterally across the photosensitive substrate. The location of the optimal focus for the optical system can be determined by analyzing the positions of the first and second printed bands 1331, 1331 ′. This analysis is performed using a geometric shape that can be easily determined or derived depending on the distance that is shifted. For example, the focal position for the center of the field at point M is obtained by measuring the distances OA and O'A '. These numbers calculate the position of the exposed first print band 1331 relative to the predetermined field center M. Interpolation of the focus values for the two exposures forming the first and second bands 1331, 1331 ′ yields the focus values for the field center at M. This focal figure only follows the optical axis. The tilt error about the lateral axis is corrected by measuring the distance AB along the substrate. The inclination is expressed in nm of the focal shift as determined by the focal difference between two exposures with respect to mm of the substrate as determined by the distance AB. Using this gradient value, the line segment AA 'or B- is obtained by measuring the distance difference between the curvature or inclination of the longitudinal axis between the distances OA and O'A' or the distances OB and O'B '. B ') is determined by measuring the angle θ. From the measurements of these four distances, the substrate is aligned to the optimal point plane with redundancy for measurement error correction or averaging. Instead, these numbers can be derived from the following formula. Where M 'lies on the midpoint of line 1333 midway between line segment A-A' and line B-B ', and the IFS is along the z or optical axis between the two exposures. Induced focus shift or intentional shift, IT is induced tilt or intentional shift with respect to the lateral axis. Then, the slope S is H / W; The focus error FE is IFS / AB x MM '; Slope error (TE) for the longitudinal axis is (IFS / AB) -IT; The tilt or bend error (BE) for the lateral axis is S x IFS / AB.

Figure 18 illustrates the use of one embodiment of the present invention for detecting spherical aberration. Curve or line 1402 represents the resist depth as a function of focus. Due to the inclination through the focus when exposing the photosensitive substrate, the periodic pattern or diffraction grating formed on the photosensitive substrate by the treated resist has a varying depth. This depth is maximum at the optimum focus and decreases as the focus deteriorates. The asymmetry of the curve or line 1402 in the region 1404 represents spherical aberration. Thus, the present invention can be applied to detecting spherical aberration of an optical system.

19A and 19B illustrate another embodiment of the present invention for determining the initial placement of a reticle in an optical system to obtain optimized imaging. 19A and 19B, the photosensitive substrate 1522 is exposed by the reticle 1516. Instead, the image of the reticle is provided for viewing in real time by using a demodulation device (such as demodulation device 24 as shown in FIG. 1B). The reticle is inclined from the x-y plane with respect to the x axis. The photosensitive substrate 1522 is preferably inclined from the x-y plane with respect to the y axis. Thus, the reticle 1516 and the photosensitive substrate 1522 are inclined at right angles to each other, as in the embodiment shown in FIG. Reticle 1516 has a plurality of perpendicularly staggered lines with different line widths. For example, line 1531 has a relatively narrow vertical line width, and line 1533 has a relatively wide vertical line width. The vertical lines 1531 and 1533 are alternately or staggered in the x direction. The relatively narrow horizontal line 1534 and the relatively wide horizontal line 1536 are alternately or staggered in the y direction. Grid patterns of alternating or staggered horizontal and vertical lines with different widths are formed. The grating pattern on the reticle 1516 is imaged through the reticle position due to the inclination of the reticle 1516 onto the photosensitive substrate 1522 through focus due to the inclination of the photosensitive substrate 1522 during exposure. The processed photosensitive substrate 1522 will have a locus of optimal focal position as a function of line width or feature pattern size. This trajectory is determined by examining the image including the resist depth. In general, the maximum resist depth determines the maximum focus. Instead, the trajectory of the optimal focus position may be determined by analyzing the visualized pattern generated by the demodulation device (such as demodulation device 24 as shown in FIG. 1B). In other words, at the optimal focus, the resist is more fully exposed and therefore has a greater depth. The position at which the optimum focal position for each different line width intersects represents the preferred position for the reticle to minimize aberrations, in particular spherical aberration. Referring to Figure 19A, the intersection of lines 1502 and 1504 represents the optimal position for reticle 1506 to minimize spherical aberration. Line 1506 represents the location or plane of the optimal location for positioning of the reticle 1516 to obtain an optimal image or minimize spherical aberration. For example, as shown along the left longitudinal edge of the photosensitive substrate of FIG. 19, if reticle 1516 of FIG. 19B is inclined by one unit with respect to the x-axis, line 1506 is 0.4 to obtain the optimal reticle imaging. Indicates that it must be located in units. Line 1506 is shown parallel to the oblique or x axis of the reticle. While only two different alternating or staggered linewidths are shown, it should be understood that any number of different linewidths may be alternating or staggered.

Although the present invention has been shown and described with respect to different embodiments and different feature pattern sets or line patterns, clearly different feature pattern sets or line patterns can be used and arranged in different ways to characterize the optical system. However, all embodiments of the present invention simultaneously image various different pattern portions in the space of a given area with different focal depths. The recorded images of the plurality of pattern portions at different depths are analyzed in an interference manner to characterize the optical system. This interference analysis is preferably performed in a single step so that the data obtained from the interference analysis of the recorded image of the reticle provides a near complete characterization of the optical system. Thus, the present invention avoids the need to sequentially select and analyze different positions within the field of the optical system. As a result, the disclosure of the present invention results in a very rapid and powerful characterization of the optical system.

Accordingly, it is understood that the methods and apparatus of the present invention enable the characterization of an optical system with a single exposure or imaging step or real time observation to determine the focal, top curvature, astigmatism, coma and / or focal plane deviation of the optical system. shall. The invention is particularly applicable to the characterization of photolithographic optical devices used to print masks or reticle patterns onto photosensitive substrates. The present invention determines the optimal focus by detecting the envelope of the feature pattern quality through focus, not through evaluation of image quality or line quality at individual sample points (x, y, focus) of the three-dimensional array. The present invention produces continuous data through the focus and reticle object position.

Thus, the present invention has the advantage of being insensitive to the normal focal plane in that focus self-seeking, i.e., the field of the exposed wafer or photosensitive substrate will always print the region of optimal focus if it interferes with the depth of focus. The invention has the advantage of providing high sensitivity, low noise and fast acquisition of exposure characterization parameters in a single exposure. The present invention obviates the need for a sliced focal plane with associated time-consuming multiple exposure and focus slicing errors.

In the test, sensitivity and noise levels were regularly obtained above the 5 nm level. These low levels cannot be obtained using the prior art. Prior art generally worsens with decreasing line width. However, the present invention has the advantage that it becomes stronger as the line width is reduced. This occurs because the present invention relies on solving envelopes of feature pattern quality rather than linewidth images.

The present invention can obtain full field data in a relatively short time of several seconds. This is an important feature in photolithographic tools that use extreme UV because of their small line size and thermally variable time constants. The ability of the present invention to use full field exposure in a single shot eliminates alignment timing errors due to scanning acquisition of data. The use of a plurality of different feature pattern sets with multiplexed feature pattern orientation, size, and line shape enables determination of focal position, astigmatism, top curvature, and focus depth. In addition, the present invention can calculate information about coma, spherical aberration and variation in interference.

The present invention enables rapid characterization of an optical system in that it includes a lithographic recording process and multiplexed periodic feature patterns imaged by the imaging system to be tested, including a metrology tool for analyzing the printed image. The feature pattern set may be grouped or isolated different line shapes, shapes, sizes and orientations. The present invention images these feature pattern sets through and beyond the depth of focus of the imaging system in a single exposure. The quality of the envelope or feature pattern through the focus is printed and analyzed. This analysis may include data evaluation of the overall focal depth as in the case of auto-correlation and cross-correlation analysis. Instead, the analysis can identify the asymmetry or slope of the maximum or minimum of the whole. This is in contrast to the prior art, which analyzes individual feature patterns at predetermined and therefore not optimal discrete focus positions.

The quality of a particular set of feature patterns through focus can be used to determine flat focus, top curvature, astigmatism, spherical aberration, partial interference, distortion, and coma, depending on the orientation and / or size of the selected feature pattern shape. have. In the case of astigmatism, different line orientations can be staggered below the field and read by dark field or interference microscopy. Instead, different line orientations can be staggered across the field and read by an interference microscope or an atomic force microscope. In the case of distortion, the feature pattern can be read using a full field interferometer.

Accordingly, it should be understood that the present invention greatly advances the ability to quickly and easily evaluate the properties of projection optical devices used in optical systems, particularly photolithography for the manufacture of semiconductor wafers. From a single exposure, data acquisition or observation step, useful information can be obtained that characterizes the optical system at a single point in time. This greatly increases manufacturing capacity and yield in that imaging performance is maintained at a high level.

2. Holographic Test Reticle

As described herein, test reticles with a plurality of periodic patterns and other structures are used to characterize optical systems (such as optical devices) under test. For example, as shown in FIG. 1, optical system 18 is imaged in a pattern on test reticle 16 to generate image data that is recorded on substrate 22. Substrate 22 is irradiated to retrieve image data including focus, top curvature, astigmatism, coma, focal plane deviation, spherical aberration and coherence variation, which are subsequently processed to determine parameters for the optical system.

Since the test reticle 16 is used to test the quality of the optical system 18, the pattern on the test reticle 16 is preferably as accurate as possible so that actual characterization can be made. Specifically, it is important that the lines and spaces of the diffraction gratings on the test reticle (eg, see FIG. 4) have the correct dimensions and placement. If the diffraction grating is not accurate, it is difficult to determine whether the aberration recorded on the substrate 22 is caused by the optical system 18 or by the test reticle 16.

Conventional means for manufacturing a reticle including a test reticle include an e-beam recording tool and a laser recording tool. These prior art generally records large patterns of subfields that are subsequently joined together to form a large composite field pattern. When subfields are combined with each other, a reticle write error may occur. At line widths below 100 nm of lithographic tools with very high numerical aperture (VHNA), these recording errors have been a limiting factor in the ability to test optical imaging systems.

Accordingly, the following discussion describes a method and system for manufacturing a holographic test reticle in accordance with the present invention. The holographic reticle is formed by interfering two or more optical radiations to form an interference region having a periodic interference pattern, such as the diffraction grating and other test structures described above. Next, the interference pattern is recorded on the reticle blank using various recording techniques such as photoresist. The geometry of the interference pattern is tightly controlled by the nature of the interfering optical radiation. Specifically, it is controlled by the wavelength of the geometric rays, the wavefront variation and the geometry of the exposure apparatus (ie the relative angle of the optical radiation before and after the interference). All of these factors can be controlled much more accurately than e-beam or laser recording techniques that are continuously recorded. In addition, much larger reticle regions can be recorded in a single trial using this holographic technique. In this way, writing errors caused by combining the e-beams with each other are completely avoided.

20 shows a holographic reticle including a laser 2002, a splitter 2006, a wavefront manipulation optic 2010, a reticle blank 2016 with an interference region 2012 and a photoresist 2014. A system 2000 for recording the data is shown. Referring to flowchart 2100 (see FIG. 21), this system 2000 will be described as follows.

In step 2102, laser 2002 generates coherent optical radiation 2004.

In step 2104, splitter 2006 splits optical radiation 2004 into two or more light rays 2008a and 2008b. Two rays 2008a and 2008b are shown for ease of illustration and description. However, multiple rays 2008 may be generated. Here, the number of rays depends on the shape of the desired interference pattern.

In step 2106, the wavefront adjustment optics 2010 adjusts the wavefront of one or more light rays 2008 to generate light rays 2011a and 2011b. A typical optical device 2010 includes various optical components used to alter the wavefront of a laser beam generally, and includes lenses, expanders, collimators, spatial filters, mirrors, and the like. This is not restrictive. As a specific example, the spatial filtering of square waves generated by light rays converging through pinholes will generate a strictly controlled wavefront called by wavelength, wavefront divergence angle, propagation distance and ray intersection angle. In addition, the optical device 2010 is arranged such that the generated light beam 2010 subsequently interferes to generate an interference region.

Generated light rays 2011a and 2011b have wavefronts that generate a desired interference pattern during subsequent light interference. The particular form of wavefront for each ray 2011 depends on the particular interference pattern desired. Typical wavefronts include, but are not limited to, cylindrical wavefronts, planar wavefronts, spherical wavefronts, and the like. The specific wavefront combinations and associated interference patterns will be discussed further here.

In step 2108, light rays 2011a and 2011b interfere to generate an interference region 2012 having an associated interference pattern. FIG. 20 shows two ray interferences for ease of illustration and description. However, the scope of the present invention includes a plurality of ray interferences. Here, the number of rays depends on the shape of the desired interference pattern.

In step 2110, photoresist 2014 on reticle 2016 records the interference pattern associated with interference region 2012. Other forms of recording media, including but not limited to photographic films, holographic films, photo-refractive media, photopolymers, and other known means for recording interference patterns understood by those skilled in the art. May be used.

In step 2112, photoresist 2014 is developed to generate a test reticle having a desired interference pattern.

In step 2114, an optical system such as the optical system 18 shown in FIG. 1 is tested using a holographic test reticle.

There are a number of advantages to holographic recording of test reticles, some of which will be discussed as follows. First, holographic patterning is more accurate than e-beam technology because the generated interference pattern is determined by the wavelength of the light beam, the wavefront variation of the interference light, and the geometry of the exposure apparatus. Both of these factors can be controlled more accurately in conventional e-beam and laser recording techniques, reducing the reticle writing errors associated with the prior art.

Due to the increased accuracy, common periodic structures (eg diffraction gratings) in optical performance tests are easily generated using holographic techniques. For example, in a linear diffraction grating, the linewidth pitch uniformity is precisely controlled so that distortion is minimized. In addition, in the chirped diffraction grating, the variable pitch pattern can be generated with significant accuracy. Thus, the optical system can be tested over precisely controlled continuous line size, line orientation and pattern pitch. In addition, the phase shift of the periodic structure can be accurately controlled. Phase shifted diffraction gratings are useful for the characterization of unique optical aberrations in optical systems that produce feature pattern shifts in the image plane.

Additionally, holographic patterning can print much smaller linewidths than conventional reticle recording tools, including e-beam and laser recording tools. For example, e-beam technology is currently limited to 100 nm or more, but holographic patterning can print line widths that are less than 100 nm and on the order of 50 nm.

2a. Specific placement and interference patterns

Specific embodiments of patterning holographic reticles and generated interference patterns will be described as follows. These examples are for illustrative purposes only and are not intended to be limiting. Other embodiments will be understood by those skilled in the art according to the discussion provided herein. These other embodiments are within the scope and spirit of the present invention.

Fig. 22A shows an example of holographic patterning (or recording) according to the interference of two spherical rays. Referring to Figure 22A, optical expanders 2204a and 2204b receive optical radiation 2202a and 2202b. Expanders 2204a and 2204b adjust light rays 2202a and 2202b to have an enlarged spherical wavefront, shown as light rays 2206a and 2206b. Light rays 2206a and 2206b interfere to produce an interference region 2208 having a substantially linear diffraction grating pattern as shown. The linear diffraction grating pattern is recorded on the reticle blank 2210. The linewidth and spacing (also called pitch uniformity) of the diffraction grating pattern is strictly controlled by the wavelength of the light beam and the angle at which the light interference occurs. When a laser is used as the light source, the optical wavelength is extremely accurate and stable. Thus, the pitch uniformity of the generated diffraction gratings is also very accurate and stable and is improved over that achieved with e-beam or laser recording techniques.

In FIG. 22A, the spherical magnifying light beam is shown to form a linear diffraction grating for illustrative purposes only and not intended to be limiting. Other embodiments will be understood by those skilled in the art. For example, long path length quasi-plane wave beams can be used to improve pitch uniformity. Instead, additional optics can be used to collimate the beam to generate plane waves. In other words, a linear diffraction grating can be generated by interfering collimated light rays.

22B shows a simulation involving the interference pattern 2212 caused by two spherical ray interferences. This simulation shows a change in pitch uniformity over pattern 2212. Box 2214 at the center of interference pattern 2212 highlights areas with constant pitch uniformity. In other words, line width and spacing are substantially constant within box 2214. In contrast, box 2216 highlights an area of pattern 2212 with variable (but controlled) pitch uniformity. Specifically, the line width and spacing of the box 2216 increases at a predetermined controlled rate. This is known as a chirped diffraction grating. Likewise, other portions of pattern 2212 have linewidths and spacing that decrease at a controlled rate.

23A-23E illustrate holographic reticle patterning to generate an interference pattern with a chirped diffraction grating. As noted above, the chirped diffraction grating has a series of continuous variable lines and spaces as further shown in FIGS. 23B-23E. Chirped diffraction gratings are useful for determining image distortion of an optical system over multiple linewidths and intervals without requiring multiple exposures.

Referring to Figure 23A, a holographic reticle device 2300 illustrates an off-axis cylindrical and plane wave beam combination that is off-axis useful for generating an interference pattern with a chirped diffraction grating. . Radiation 2310a, 2310b having a planar wavefront is projected onto the bottom of the reticle 2306 as shown. Additionally, mirror 2302 projects radiation 2304a and 2304b onto reticle 2306 at angles α and β with respect to light rays 2310a and 2310b. Rays 2304a and 2304b preferably have a cylindrical wavefront and meet at point 2308. Light rays 2310a, 2310b; 2304a, 2304b interfere to produce an interference region having a chirped diffraction grating pattern. Here, the properties of the chirped diffraction grating are governed by the geometry of the cylindrical divergence and the interference light wavelength.

Figures 23B-23E illustrate typical chirped diffraction gratings. Specifically, FIG. 23B shows a cylindrical annular plate diffraction grating 2312. Here, the line width and spacing are maximum at the center of the diffraction grating and decrease from the center of the diffraction grating to the edge of the diffraction grating. 23C shows a cylindrical annular plate diffraction grating 2314. Here, the line width and spacing are increased to be minimum at the center of the diffraction grating and maximum at the edge of the diffraction grating. FIG. 23D shows staggered chirped diffraction gratings 2316 including a plurality of chirped diffraction gratings 2318a through 2318e. Staggered diffraction grating 2316 is generated by taking multiple exposures of component diffraction grating 2318 and moving the reticle blank in the y direction between exposures. Staggered diffraction grating 2316 allows image distortion to be measured simultaneously at multiple field points of the optical system under test. Fig. 23E shows a circular annular plate array.

As noted above, the properties of the chirped diffraction grating generated in a holographic manner (such as pitch variation) are governed by the geometry and wavelength of the interference beam. As a result, the chirped diffraction grating generated in a holographic manner changes continuously and smoothly across its size. In contrast, discrete patterning methods generally vary the linewidth and pitch of the diffraction grating as a function of scanned, rastered or pixelated patterning. These discrete serial methods suffer from temporal fluctuations in patterning beam position, stage position and coupling accuracy.

FIG. 23F illustrates focus determination of an optical system using staggered chirped diffraction grating 2316. Specifically, focal curves 2320a through 2320e are generated by imaging the optical system under test (such as optical system 18 of FIG. 1) using staggered chirped diffraction grating 2316. Each curve 2320 represents a depth of focus (in the z direction of FIG. 1A) corresponding to the line width of adjacent diffraction grating 2318. One of the line widths of the diffraction grating 2318 is arbitrarily selected to provide a reference focus (such as line width 2322) and the depth of focus for the other line widths is plotted relative to the reference focus as shown.

FIG. 24 shows an atomic force micrograph of an actual crossed diffraction grating 2400 patterned on a holographic test reticle. Crossed diffraction grating 2400 is observed at an angle of 45 ° and has two sets of orthogonal lines (ie, double geometry).

Figure 25 illustrates a holographic hexagonal pattern 2500 that has lines of three different orientations (i.e. triple symmetry) so that image distortion in these orientations is measured simultaneously. This allows the image distortion of the optical system to be measured simultaneously in these three orientations. The present invention is not limited to triple symmetry since n symmetry will be discussed below.

Figure 26 shows a polygonal diffraction grating 2600 as a result of interference / combination of multiple plane wave rays. Diffraction grating 2600 includes intersecting lines in the x-y plane that intersect at relative angles of 0 °, 45 °, 90 °, and 135 °. The present invention is not limited to this geometry. As shown below, multiple ray interferences can be used to generate complex sub-micron geometries on a reticle having a double, triple or quadruple, generalized n geometry. . These n-n pattern can be used to examine optical system parameters depending on the line orientation. The advantage of generating these patterns holographically is that the spatial relationship between the periodic structures is strictly limited. In addition, these n-fold patterns are important for separating the combination of separable distortion, coma or other image shift aberrations as azimuthally-dependent asymmetric aberrations of the pupil plane of the optical system.

In an embodiment, the intersection line of the diffraction grating 2400 has a sinusoidal amplitude whose intensity varies according to the function [sin (x + y) * sin (xy) * sin (x) * sin (y)] ² . As will be appreciated by those skilled in the art, other intensity distributions can be used, including two binary on-off lines. These other amplitude functions are within the scope and spirit of the present invention.

FIG. 27 shows a tread plate array 2700 that takes n of geometry up to the limit. The annular plate array 2700 includes circles with variable linewidth and spacing (ie, chirped). Because of the circular orientation of the array 2700, image distortion for all possible line orientations can be measured simultaneously and with a single test reticle. In an embodiment, the annular plate array 2700 is generated by combining / interfering two optical radiations to form a spherical ray.

2b. Phase Shift Interference Pattern

FIG. 28 illustrates holographically patterned diffraction gratings 2082 to 2806 collectively showing examples of pitch change and phase change for a periodic diffraction grating. Specifically, the diffraction gratings 2802 and 2804 illustrate pitch variations that occur because the line width and spacing of the diffraction gratings 2802 are much smaller than the pitch of the diffraction grating 2804. Diffraction gratings 2804 and 2806 illustrate phase changes that occur because the lines of diffraction grating 2806 are shifted in the x direction with respect to the lines of diffraction grating 2804.

Instead, the duty cycle (or line to space ratio) of the diffraction grating can vary continuously or stepwise while maintaining the same diffraction grating pitch. FIG. 29A shows a reticle with a holographic pattern of a constant pitch diffraction grating with a variable duty cycle. In Fig. 29A, the reticle 2900 has a constant pitch diffraction grating 2902. However, in profile A 2904, the duty cycle of the diffraction grating 2902 is a 1: 1 line to space ratio, while in profile B 2906, the duty cycle of the diffraction grating 2902 is a 3: 1 line to space ratio. to be. Having such a holographic pattern with a constant pitch on one reticle 2900 causes the entire pattern to be interfered in a single diffraction angle in an interfering fashion. By testing a photolithographic system with a set of holographic patterns each having a constant pitch on one reticle, aberrations are identified based on various induced image shifts and focal shifts generated as a function of line-to-space duty cycle. And separated.

29B and 29C illustrate how the holographic pattern of the reticle 2900 is formed. 29B shows a uniform diffraction grating pattern 2908. 29C shows a pattern with variations in exposure intensity 2910. In FIG. 29C, the exposure intensity is large at the bottom portion 2912 and small at the upper portion 2914. The exposure intensity between the bottom portion 2912 and the top portion 2914 varies continuously with a gentle transition between the values of these two portions 2912 and 2914. The holographic reticle pattern 2900 is formed by superimposing a uniform diffraction grating pattern 2908 on a pattern having a variation in exposure intensity 2910. Those skilled in the art will appreciate that any of a variety of duty cycle patterns may be generated by superimposing a pattern with variations in exposure intensity on a uniform diffraction grating pattern. In particular, the pattern having the variation in the exposure intensity is not limited to the transition of the exposure intensity from the high value to the low value across the span of the pattern.

30 illustrates a phase control system 3000 that forms a controlled phase shift, such as a phase shift between the diffraction gratings 2804 and 2806 of FIG. This control system 3000 includes optical detectors 3004 and 3006, control inputs 3008 and difference module 3010. The control system 3000 can be operated as a fringe locking capacity or can be used to utilize intentional diffraction grating phase shift based on the control signal 3008.

Optical detectors 3004 and 3006 are placed to measure light intensity at different points of holographic interference pattern 3002, generating intensity signals 3005 and 3007. In an embodiment of the invention, detectors 3004 and 3006 are optical detector diodes or equivalent devices that generate an electrical signal proportional to the intensity of the detected light beam.

The difference module 3010 receives the intensity signals 3005 and 3007 and the control signal 3008. The difference module 3010 determines the difference signal 3011 by adding the control signal 3008 to the intensity signal 3005 and then subtracting the intensity signal 3007. During fringe locking, the control signal 3008 is substantially zero, so the difference signal 3011 represents the difference between the light intensity measured by the detectors 3004, 3006. If the difference signal 3011 is approximately zero, the detectors 3004 and 3006 receive approximately the same light intensity, thus monitoring the same corresponding position on each fringe. If difference signal 3011 is not approximately zero, detectors 3004 and 3006 do not bridge the same portion of the light fringe.

The difference signal 3011 is used to control another optical device (not shown) that shifts the phase of one of the interference rays used to form the mirror, crystal or interference pattern 3002. If the difference signal 3011 is approximately zero, no action is taken. If the difference signal 3011 is not approximately zero, the interference beam is out of phase to shift the phase of the interference (or fringe) pattern 3002. For fringe locking, the fringe pattern 3002 is phase shifted such that the detectors 3004 and 3006 detect the equivalent intensity of the light beams, causing the difference signal 3011 to be approximately zero. Fringe locking is useful for making small modifications due to vibrations and other random disturbances. In contrast to fringe locking, intentional phase shift is introduced into fringe pattern 3002 even when signals 3005 and 3007 are identical by introducing a non-zero control signal 3008 as discussed further below.

As shown in Figure 31, the phase control system 3000 may be incorporated into the reticle recording system 3100 to record holographic test reticles having a diffraction grating with controlled relative phase shifts. Reticle recording system 3100 is similar to system 2000 (see FIG. 20) with the addition of phase controller 3000 and phase shifter 3102. Phase controller 3000 analyzes interference region 2012 and generates a difference signal 3011 based on interference region 2012 and control signal input 3008 as described above. The difference signal 3011 controls the phase shifting device 3012 in the adjusting optics 2010 which shifts the phase of the light beam 2011 to generate a phase shift in the interference region 2012 based on the control signal 3008. . Thus, the interference region 2012 can be phase shifted by various magnitudes by changing the control signal 3008. Phase shift device 3012 may be a mirror, quartz or other optical device useful for phase shifting optical rays. Other particular embodiments of the device 3012 include a reflective, refractive, diffractive array; Electro-deformable devices; Acoustic-optic devices; Nano-actuated optic devices such as, but not limited to, piezo-driven mirrors or bimorph-driven mirrors; Nano-deformable mirrors that are reflective, diffractive or refractive; MEMS mirror arrays; Electric strain hologram; And an electronic fringe locking system.

Additionally, multiple phase shifted diffraction gratings (as shown in FIG. 28) may be generated using system 3100 by exposing the reticle blank multiple times using different voltages for control signal 3008. Can be. Flowchart 3200 (see Figure 32) illustrates the generation of multiple phase shifted diffraction gratings in more detail.

Referring to Fig. 32, in step 3202, the voltage of the control signal 3008 is set to the reference voltage. In step 3204, the reticle blank is exposed to the holographic interference region to record a reference diffraction grating corresponding to the reference voltage. In step 3206, the reticle blank is moved in a direction perpendicular to the desired phase shift of the diffraction grating. For example, in Fig. 28, when the diffraction grating 2804 is printed first, the reticle will be moved in the y direction to print the diffraction grating 2806. In step 3208, the voltage of the control signal 3008 is changed to perform the phase shift of the holographic interference region. In step 3210, the reticle blank is reexposed to the holographic interference region (phase shifted) to record the diffraction grating out of phase with respect to the reference diffraction grating generated in step 3204. Steps 3206-3210 can be repeated many times to generate multiple diffraction gratings with relative phase shifts. Using this technique, extremely accurate phase shifts between diffraction gratings can be realized. In an embodiment, the phase shift of the fine portion of the line width may be achieved. For line widths less than a micron, it is possible to achieve a controlled phase shift in the dB range.

2c. Reticle Reading Analysis

As discussed, the test reticle described herein is preferably used to test the optical system. For example, as shown in FIG. 1, optical system 18 is imaged with a test reticle 16. Here, the test reticle 16 is a test reticle manufactured in a holographic manner. The generated image data is recorded on the photosensitive substrate 22 which can later be analyzed to derive information characterizing the optical system 18. Instead, the generated image data can be provided to be observed in real time by using a demodulation device.

As shown in FIG. 7, the photosensitive substrate 22 is analyzed using interference techniques to determine the characteristics of the optical system under test. The generated degree of interference represents the change in phase front of the light beam diffracted in an interference manner from the exposed substrate 22.

FIG. 33 shows an exemplary interference diagram 3300 showing an in-phase wavefront of diffracted light rays for a 3x3 field array of optical devices under test. The interference degree 3300 includes nine blocks (corresponding to a 3x3 array) outlined by a horn, such as a typical horn 3302. Each block features slopes and pistons that quantify the aberrations and distortions of the array field of the optical system under test. Non-uniform distortion parameters can be analyzed according to local piston and tilt. Specifically, the slope represents the angle of the block and the telecentricity of the optical system under test and the magnification of the reflected light beam. The piston represents the height of the block and represents the transition difference of the reflected in-phase wavefront and the phase shift generated by the optical system under test.

Once characterized, the distortion and aberration for the optical system can be plotted against the optical linewidth. For example, graph 3400 (see FIG. 34) shows coma induced distortion versus optical linewidth. Other optical system characteristics can be quantified and plotted for the optical linewidth. These include, but are not limited to, Zernike aberration, focal, top curvature, astigmatism, coma, distortion, telecentricity, focal plane deviation, spherical aberration, and interference variation. As such, the non-uniform distortion parameter can be detected as a function of linewidth variation. Those skilled in the art will appreciate that a nonlinear in-phase wavefront can be implemented in a single holographic reticle by using a chirped diffraction grating structure.

Graph 3400 shows an example of how image shift can occur as a function of linewidth and aberration form. Similar graphs prepared for the characteristics of the graph 3400 and other optical systems are prepared from data obtained at the optimal focal position of the photoless graphics system. However, the size of the image offset is greatly affected by partial coherence (PC) of the optical illumination used to image the lithographic feature pattern. 35A and 35B show how partial interference affects the image offset. Graph 3500A (see FIG. 35A) shows image shift as a function of focus for various line widths where partial interference of optical illumination is 0.6. Graph 3500B (see FIG. 35B) shows the image shift as a function of focus for various line widths where the partial interference of optical illumination is 0.3. Those skilled in the art will appreciate that comparing the relative bias differences due to different partial interference conditions is another way of solving high order aberrations from low order aberrations.

Measurement of relative image shift as a function of linewidth can be simplified by using reticles with varying line widths such that each line width is an integer multiple of the base linewidth size. Table 3600 (see Figure 36) shows the relationship between linewidth and diffraction order for different diffraction angles. Diffraction angles are shown as letters. For example, consider a reticle having line widths in dimensions of 100 nm, 200 nm, 300 nm, 400 nm and 600 nm. In this case, the second order diffraction of the 200 nm linewidth will be at the same angle as the first order diffraction of the 100 nm linewidth. Likewise, the third order diffraction of 600 nm linewidth will be at the same angle as the first order diffraction of 200 nm linewidth. As such, reticles having a set of linewidths can be measured for relative image shift at the same interference angle. Under certain test conditions, this allows all data to be collected at a single sample angle. This improves the speed at which the test can be performed. It also improves the strength and sensitivity of the collected data.

3. Conclusion

Herein, embodiments of the method and components of the present invention have been described. As mentioned elsewhere, these examples are described for illustration and description only and should not be construed as limiting. Other possible embodiments are within the scope of the present invention. Such other embodiments based on the disclosure contained herein will be apparent to those skilled in the art. As such, the breadth and scope of the present invention should not be limited by any of the above-described exemplary embodiments, but should be defined only in accordance with the appended claims and their equivalents.

The accompanying drawings, which are incorporated herein and form part of the specification, illustrate the invention, and together with the description, illustrate the principles of the invention and further serve to enable those skilled in the art to practice the invention.

1A is a schematic diagram of a photolithographic system.

1B is a schematic diagram of a photolithographic system having a demodulation device 24.

2 is a perspective view of a reticle or object space.

3 is a perspective view of a photosensitive substrate or image space.

4 is a plan view showing a test reticle having a plurality of periodic structures or patterns formed thereon.

5A is a plan view showing one type of diffraction grating or periodic pattern or structure.

Fig. 5B is a plan view showing another form of diffraction grating or periodic pattern or structure.

6 schematically illustrates the acquisition of data used to characterize an optical system.

Figure 7 is a block diagram illustrating the steps of the high level method of one embodiment of the present invention.

8A schematically shows a space of a predetermined area.

8B is a schematic plan view of an image formed on a photosensitive substrate.

9A is a schematic plan view of one embodiment of a portion of a pattern on a reticle.

9B is a schematic perspective view showing detection of astigmatism based on the embodiment shown in FIG. 9A.

10A is a schematic plan view illustrating the reticle.

Fig. 10B is a schematic plan view showing a part of the reticle pattern.

11A is a schematic plan view of another embodiment of a portion of a pattern on a reticle.

FIG. 11B is a schematic perspective view showing detection of astigmatism based on the embodiment shown in FIG. 11A. FIG.

12 is a schematic plan view showing a portion of a reticle pattern used to detect spherical aberration.

13 is a schematic plan view showing a reticle divided into different feature pattern sets or pattern portions for detecting different aberrations used to characterize an optical system.

Figure 14 is a perspective view of a graph of an interferometer map illustrating the detection of distortion or aberration of an optical system in one embodiment of the present invention.

Figure 15 is a graph showing different distortions or aberrations that may be detected in one embodiment of the present invention.

16A to 16D show different distortions or aberrations shown in FIG. 15 in a perspective view of the graph.

Fig. 17 is a plan view of a photosensitive substrate showing one embodiment of the present invention used to obtain an optimal focus of an optical system.

18 is a graph showing detection of spherical aberration in one embodiment of the present invention.

19A is a schematic plan view illustrating one embodiment of the present invention for determining an optimal placement of a reticle for enhanced imaging.

Fig. 19B is a schematic plan view of the reticle used in one embodiment of the present invention shown in Fig. 19A.

Figure 20 illustrates a holographic reticle recording system according to one embodiment of the present invention.

Figure 21 shows a flowchart for recording a holographic reticle according to an embodiment of the present invention.

Figure 22A illustrates two spherical ray interferences caused by holographic patterning in accordance with one embodiment of the present invention.

Figure 22B illustrates pitch uniformity for two spherical ray interferences in accordance with one embodiment of the present invention.

Figure 23A illustrates a system for generating a chirped diffraction grating using holographic patterning in accordance with an embodiment of the present invention.

23B-23D illustrate various chirped diffraction gratings generated by holographic patterning according to one embodiment of the invention.

Fig. 23E shows a circular zone plate array.

Figure 23f illustrates focus determination of an optical system using an interlaced chirped diffraction grating in accordance with an embodiment of the present invention.

Figure 24 shows an atomic force micrograph of a cross-grating holographically patterned pattern on a test reticle in accordance with one embodiment of the present invention.

Figure 25 illustrates a holographic hexagonal pattern generated by holographic patterning in accordance with an embodiment of the present invention.

Figure 26 illustrates a polygonal diffraction grating generated by holographic patterning according to one embodiment of the present invention.

Figure 27 illustrates an annular plate array generated by holographic patterning according to one embodiment of the present invention.

Figure 28 illustrates a holographic patterned diffraction grating collectively representing pitch changes and phase changes in accordance with one embodiment of the present invention.

FIG. 29A shows a reticle with a holographic pattern with a constant pitch with varying duty cycles.

29B and 29C illustrate how the holographic pattern of the reticle 2900 is formed.

30 illustrates a phase control system for accurately controlling the phase shift of a diffraction grating generated in a holographic manner according to an embodiment of the present invention.

Figure 31 illustrates a holographic reticle recording system with an accurate phase shift control in accordance with an embodiment of the present invention.

Figure 32 shows a flowchart 3200 for changing the phase shift of the diffraction grating generated in a holographic manner in accordance with one embodiment of the present invention.

33 illustrates an interferogram according to an embodiment of the present invention.

Figure 34 shows a graph of distortion versus optical linewidth for an optical system under test in accordance with an embodiment of the present invention.

35A and 35B show how partial interference affects the image offset.

Figure 36 shows how the measurement of relative image shift as a function of linewidth can be simplified by using a reticle with various linewidths such that each linewidth is an integer multiple of the baseline width size.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described with reference to the drawings, wherein like reference numerals represent the same or functionally similar elements.

Claims (37)

A method of making a holographic reticle that characterizes an optical system, Receiving two coherent optical radiation; Adjusting the first light beam to have a cylindrical wavefront; Adjusting the second light beam to have a plane wave wavefront; An interference step of interfering the two light rays to generate an interference region of optical radiation having an interference pattern; And Recording the interference pattern on a recording medium to produce the holographic reticle; Wherein the holographic reticle is adapted to calculate information about optical parameters of the optical system, thereby characterizing the optical system. The method of claim 1, wherein prior to receiving the two coherent optical radiations, Receiving a single coherent optical radiation; Separating the single beam into two or more optical radiations. The method of claim 1, wherein in the interference step, the interference region has a diffraction grating. 4. The method of claim 3, wherein the diffraction grating includes linewidths and spacings based on the coherent light beam. delete delete delete delete delete delete delete delete The method of claim 1, further comprising: adjusting the wavefront of one or more of the light beams prior to the interference step according to a desired interference pattern prior to the interference step. Method further comprising a. 14. The method of claim 13, wherein adjusting further comprises expanding the light beam to generate two divergent spherical wavefronts that generate an interference pattern with a linear diffraction grating. delete delete delete delete delete The method of claim 1, further comprising, after the recording step, manufacturing a test reticle having the interference pattern. The method of claim 20, wherein the manufacturing step, Exposing a photoresist deposited on a reticle with the interference pattern; Developing the photoresist such that the reticle reflects the interference pattern Method further comprising a. The method of claim 1, wherein the step of interfering comprises the step of interfering such that the interference region has a diffraction grating, Following the interference step, further comprising forming phase shifts between adjacent diffraction grating patches to monitor for image shift aberrations. The method of claim 22, wherein forming the phase shifts is: Phase shifting the holographic reference ray with respect to the object ray Method comprising a. delete delete delete delete delete delete delete A method of making a holographic reticle that characterizes an optical system, Receiving two coherent optical radiation; Adjusting the wavefront of one or more of the beams to produce a desired interference pattern; The adjusting step is: Adjusting the first light beam to have a cylindrical wavefront; And Adjusting the second light beam to have a plane wave wavefront; An interference step of interfering the two light rays to generate an interference region of optical radiation having an interference pattern; And Recording the interference pattern on a recording medium to produce the holographic reticle; Wherein the holographic reticle is adapted to calculate information about optical parameters of the optical system, thereby characterizing the optical system. 32. The method of claim 31, wherein the adjusting further comprises expanding the two rays to produce two diverging spherical wavefronts that generate an interference pattern with a linear diffraction grating. 32. The method of claim 31, wherein said adjusting further comprises spatially filtering said one or more rays. delete 32. The method of claim 31, wherein the interference step further comprises an interference step of interfering the first and second light beams to generate an interference pattern to have a chirped diffraction grating pattern with controlled pitch variation. How to feature. 32. The method of claim 31, wherein adjusting Adjusting the first light beam to have a spherical wavefront; Adjusting the second ray to have a plane wave wavefront Method further comprising a. delete

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