AU2001273136A1 - Fluid pressure imprint lithography - Google Patents

Fluid pressure imprint lithography

Info

Publication number
AU2001273136A1
AU2001273136A1 AU2001273136A AU7313601A AU2001273136A1 AU 2001273136 A1 AU2001273136 A1 AU 2001273136A1 AU 2001273136 A AU2001273136 A AU 2001273136A AU 7313601 A AU7313601 A AU 7313601A AU 2001273136 A1 AU2001273136 A1 AU 2001273136A1
Authority
AU
Australia
Prior art keywords
fluid pressure
imprint lithography
pressure imprint
lithography
fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001273136A
Inventor
Stephen Y. Chou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanonex Corp
Original Assignee
Nanonex Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanonex Corp filed Critical Nanonex Corp
Publication of AU2001273136A1 publication Critical patent/AU2001273136A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/003—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor characterised by the choice of material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • B29C2043/023—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves
    • B29C2043/025—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves forming a microstructure, i.e. fine patterning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C2043/3205—Particular pressure exerting means for making definite articles
    • B29C2043/3222—Particular pressure exerting means for making definite articles pressurized gas, e.g. air
    • B29C2043/3233—Particular pressure exerting means for making definite articles pressurized gas, e.g. air exerting pressure on mould parts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C2043/3205—Particular pressure exerting means for making definite articles
    • B29C2043/3238—Particular pressure exerting means for making definite articles pressurized liquid acting directly or indirectly on the material to be formed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/56—Compression moulding under special conditions, e.g. vacuum
    • B29C2043/566—Compression moulding under special conditions, e.g. vacuum in a specific gas atmosphere, with or without pressure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023—Microembossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/945—Special, e.g. metal
AU2001273136A 2000-07-18 2001-07-02 Fluid pressure imprint lithography Abandoned AU2001273136A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09618174 2000-07-18
US09/618,174 US6482742B1 (en) 2000-07-18 2000-07-18 Fluid pressure imprint lithography
PCT/US2001/021005 WO2002007199A1 (en) 2000-07-18 2001-07-02 Fluid pressure imprint lithography

Publications (1)

Publication Number Publication Date
AU2001273136A1 true AU2001273136A1 (en) 2002-01-30

Family

ID=24476613

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001273136A Abandoned AU2001273136A1 (en) 2000-07-18 2001-07-02 Fluid pressure imprint lithography

Country Status (7)

Country Link
US (3) US6482742B1 (en)
EP (1) EP1325513A4 (en)
JP (1) JP3987795B2 (en)
KR (1) KR100873587B1 (en)
CN (1) CN1299332C (en)
AU (1) AU2001273136A1 (en)
WO (1) WO2002007199A1 (en)

Families Citing this family (390)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080217813A1 (en) * 1995-11-15 2008-09-11 Chou Stephen Y Release surfaces, particularly for use in nanoimprint lithography
US20040036201A1 (en) * 2000-07-18 2004-02-26 Princeton University Methods and apparatus of field-induced pressure imprint lithography
US20030080471A1 (en) * 2001-10-29 2003-05-01 Chou Stephen Y. Lithographic method for molding pattern with nanoscale features
US8728380B2 (en) * 1995-11-15 2014-05-20 Regents Of The University Of Minnesota Lithographic method for forming a pattern
US6713238B1 (en) * 1998-10-09 2004-03-30 Stephen Y. Chou Microscale patterning and articles formed thereby
ATE495241T1 (en) 1998-10-09 2011-01-15 Arborgen Llc MATERIALS AND METHODS FOR MODIFYING PLANT LIGNIN CONTENT
US6334960B1 (en) * 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
US6939474B2 (en) * 1999-07-30 2005-09-06 Formfactor, Inc. Method for forming microelectronic spring structures on a substrate
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US7432634B2 (en) 2000-10-27 2008-10-07 Board Of Regents, University Of Texas System Remote center compliant flexure device
SE515607C2 (en) * 1999-12-10 2001-09-10 Obducat Ab Device and method for fabrication of structures
EP2264522A3 (en) 2000-07-16 2011-12-14 The Board of Regents of The University of Texas System Method of forming a pattern on a substrate
WO2002006902A2 (en) 2000-07-17 2002-01-24 Board Of Regents, The University Of Texas System Method and system of automatic fluid dispensing for imprint lithography processes
US20050160011A1 (en) * 2004-01-20 2005-07-21 Molecular Imprints, Inc. Method for concurrently employing differing materials to form a layer on a substrate
US20050037143A1 (en) * 2000-07-18 2005-02-17 Chou Stephen Y. Imprint lithography with improved monitoring and control and apparatus therefor
US20100236705A1 (en) * 2000-07-18 2010-09-23 Chou Stephen Y Fluidic and Microdevice Apparatus and Methods For Bonding Components Thereof
US7717696B2 (en) * 2000-07-18 2010-05-18 Nanonex Corp. Apparatus for double-sided imprint lithography
US7635262B2 (en) * 2000-07-18 2009-12-22 Princeton University Lithographic apparatus for fluid pressure imprint lithography
US7322287B2 (en) * 2000-07-18 2008-01-29 Nanonex Corporation Apparatus for fluid pressure imprint lithography
US20080164638A1 (en) * 2006-11-28 2008-07-10 Wei Zhang Method and apparatus for rapid imprint lithography
AU2001286573A1 (en) 2000-08-21 2002-03-04 Board Of Regents, The University Of Texas System Flexure based macro motion translation stage
WO2002067055A2 (en) 2000-10-12 2002-08-29 Board Of Regents, The University Of Texas System Template for room temperature, low pressure micro- and nano-imprint lithography
DE10059178C2 (en) * 2000-11-29 2002-11-07 Siemens Production & Logistics Method for producing semiconductor modules and module produced using the method
AUPR245201A0 (en) * 2001-01-10 2001-02-01 Silverbrook Research Pty Ltd An apparatus and method (WSM05)
US7019924B2 (en) * 2001-02-16 2006-03-28 Komag, Incorporated Patterned medium and recording head
EP1417474B1 (en) * 2001-07-25 2021-12-29 The Trustees Of Princeton University Nanochannel arrays and their preparation and use for high throughput macromolecular analysis
US9678038B2 (en) 2001-07-25 2017-06-13 The Trustees Of Princeton University Nanochannel arrays and their preparation and use for high throughput macromolecular analysis
US20030071016A1 (en) * 2001-10-11 2003-04-17 Wu-Sheng Shih Patterned structure reproduction using nonsticking mold
US6936181B2 (en) * 2001-10-11 2005-08-30 Kovio, Inc. Methods for patterning using liquid embossing
US6743368B2 (en) * 2002-01-31 2004-06-01 Hewlett-Packard Development Company, L.P. Nano-size imprinting stamp using spacer technique
KR20040081164A (en) * 2002-02-01 2004-09-20 코닌클리케 필립스 일렉트로닉스 엔.브이. Structured polymer substrate for ink-jet printing of OLED matrix
US6716754B2 (en) * 2002-03-12 2004-04-06 Micron Technology, Inc. Methods of forming patterns and molds for semiconductor constructions
EP1485944B1 (en) 2002-03-15 2012-06-13 Princeton University Radiation assisted direct imprint lithography
CA2380114C (en) * 2002-04-04 2010-01-19 Obducat Aktiebolag Imprint method and device
US7652574B2 (en) * 2002-04-08 2010-01-26 Sayegh Adel O Article surveillance tag having a vial
JP4799861B2 (en) 2002-04-16 2011-10-26 プリンストン ユニバーシティ Gradient structure for interface between microfluidic and nanofluid, and its manufacturing and use
US6897089B1 (en) 2002-05-17 2005-05-24 Micron Technology, Inc. Method and system for fabricating semiconductor components using wafer level contact printing
JP2005527974A (en) * 2002-05-24 2005-09-15 ワイ． チョウ，スティーヴン， Method and apparatus for field induced pressure imprint lithography
US6876784B2 (en) * 2002-05-30 2005-04-05 Nanoopto Corporation Optical polarization beam combiner/splitter
US7235464B2 (en) * 2002-05-30 2007-06-26 International Business Machines Corporation Patterning method
US7386205B2 (en) * 2002-06-17 2008-06-10 Jian Wang Optical device and method for making same
US7283571B2 (en) * 2002-06-17 2007-10-16 Jian Wang Method and system for performing wavelength locking of an optical transmission source
US6859303B2 (en) 2002-06-18 2005-02-22 Nanoopto Corporation Optical components exhibiting enhanced functionality and method of making same
US7179079B2 (en) * 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US20080160129A1 (en) * 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
US6926929B2 (en) 2002-07-09 2005-08-09 Molecular Imprints, Inc. System and method for dispensing liquids
US6908861B2 (en) 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US7442336B2 (en) * 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US6900881B2 (en) 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US6916584B2 (en) * 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7027156B2 (en) * 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
JP2005534981A (en) 2002-08-01 2005-11-17 ナノオプト コーポレーション Precision phase lag device and method of manufacturing the same
US6911385B1 (en) * 2002-08-22 2005-06-28 Kovio, Inc. Interface layer for the fabrication of electronic devices
US7071088B2 (en) * 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US20040132301A1 (en) * 2002-09-12 2004-07-08 Harper Bruce M. Indirect fluid pressure imprinting
US6939120B1 (en) * 2002-09-12 2005-09-06 Komag, Inc. Disk alignment apparatus and method for patterned media production
KR100492851B1 (en) * 2002-09-26 2005-06-02 주식회사 미뉴타텍 Method for fabricating micro pattern on surface by using buckling phenomenon
US20040065252A1 (en) * 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US20050167894A1 (en) * 2002-10-08 2005-08-04 Wu-Sheng Shih Patterned structure reproduction using nonsticking mold
US7013064B2 (en) * 2002-10-09 2006-03-14 Nanoopto Corporation Freespace tunable optoelectronic device and method
US6920272B2 (en) * 2002-10-09 2005-07-19 Nanoopto Corporation Monolithic tunable lasers and reflectors
US6980282B2 (en) * 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US7641840B2 (en) 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
US7147790B2 (en) * 2002-11-27 2006-12-12 Komag, Inc. Perpendicular magnetic discrete track recording disk
US20050036223A1 (en) * 2002-11-27 2005-02-17 Wachenschwanz David E. Magnetic discrete track recording disk
US20040197712A1 (en) * 2002-12-02 2004-10-07 Jacobson Joseph M. System for contact printing
US7750059B2 (en) 2002-12-04 2010-07-06 Hewlett-Packard Development Company, L.P. Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure
US7365103B2 (en) * 2002-12-12 2008-04-29 Board Of Regents, The University Of Texas System Compositions for dark-field polymerization and method of using the same for imprint lithography processes
US20040112862A1 (en) * 2002-12-12 2004-06-17 Molecular Imprints, Inc. Planarization composition and method of patterning a substrate using the same
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
AU2003300865A1 (en) * 2002-12-13 2004-07-09 Molecular Imprints, Inc. Magnification corrections employing out-of-plane distortions on a substrate
GB0229191D0 (en) * 2002-12-14 2003-01-22 Plastic Logic Ltd Embossing of polymer devices
CN101118362A (en) * 2002-12-16 2008-02-06 伊英克公司 Backplanes for electro-optic displays
US7371975B2 (en) * 2002-12-18 2008-05-13 Intel Corporation Electronic packages and components thereof formed by substrate-imprinting
US6974775B2 (en) * 2002-12-31 2005-12-13 Intel Corporation Method and apparatus for making an imprinted conductive circuit using semi-additive plating
US20040126547A1 (en) * 2002-12-31 2004-07-01 Coomer Boyd L. Methods for performing substrate imprinting using thermoset resin varnishes and products formed therefrom
WO2004072692A2 (en) * 2003-02-10 2004-08-26 Nanoopto Corporation Universal broadband polarizer, devices incorporating same, and method of making same
US7510946B2 (en) * 2003-03-17 2009-03-31 Princeton University Method for filling of nanoscale holes and trenches and for planarizing of a wafer surface
JP4340086B2 (en) 2003-03-20 2009-10-07 株式会社日立製作所 Nanoprinting stamper and fine structure transfer method
US7186656B2 (en) 2004-05-21 2007-03-06 Molecular Imprints, Inc. Method of forming a recessed structure employing a reverse tone process
WO2004086471A1 (en) * 2003-03-27 2004-10-07 Korea Institute Of Machinery & Materials Uv nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization
US20040209123A1 (en) * 2003-04-17 2004-10-21 Bajorek Christopher H. Method of fabricating a discrete track recording disk using a bilayer resist for metal lift-off
TW570290U (en) * 2003-05-02 2004-01-01 Ind Tech Res Inst Uniform pressing device for nanometer transfer-print
TW568349U (en) * 2003-05-02 2003-12-21 Ind Tech Res Inst Parallelism adjusting device for nano-transferring
US6926921B2 (en) * 2003-05-05 2005-08-09 Hewlett-Packard Development Company, L.P. Imprint lithography for superconductor devices
US6951173B1 (en) 2003-05-14 2005-10-04 Molecular Imprints, Inc. Assembly and method for transferring imprint lithography templates
ATE487579T1 (en) * 2003-05-14 2010-11-15 Molecular Imprints Inc METHOD, SYSTEM, HOLDER AND ARRANGEMENT FOR TRANSFERRING TEMPLATES IN IMPRINT LITHOGRAPHY PROCESSES
WO2004114016A2 (en) * 2003-06-09 2004-12-29 Princeton University Office Of Technology Licensing And Intellectual Property Imprint lithography with improved monitoring and control and apparatus therefor
WO2004109401A1 (en) 2003-06-09 2004-12-16 Canon Kabushiki Kaisha Process for producing structure, structure thereof, and magnetic recording medium
JP2005008909A (en) * 2003-06-16 2005-01-13 Canon Inc Structure manufacturing method
US7307118B2 (en) 2004-11-24 2007-12-11 Molecular Imprints, Inc. Composition to reduce adhesion between a conformable region and a mold
US20040258355A1 (en) * 2003-06-17 2004-12-23 Jian Wang Micro-structure induced birefringent waveguiding devices and methods of making same
US20060108710A1 (en) * 2004-11-24 2006-05-25 Molecular Imprints, Inc. Method to reduce adhesion between a conformable region and a mold
US7157036B2 (en) * 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7150622B2 (en) 2003-07-09 2006-12-19 Molecular Imprints, Inc. Systems for magnification and distortion correction for imprint lithography processes
JP2005045168A (en) * 2003-07-25 2005-02-17 Tokyo Electron Ltd In-print method and in-print device
JP4190371B2 (en) 2003-08-26 2008-12-03 Ｔｄｋ株式会社 Uneven pattern forming stamper, uneven pattern forming method, and magnetic recording medium
US7588657B2 (en) * 2003-09-29 2009-09-15 Princeton University Pattern-free method of making line gratings
US8211214B2 (en) 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US7090716B2 (en) * 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US7261830B2 (en) * 2003-10-16 2007-08-28 Molecular Imprints, Inc. Applying imprinting material to substrates employing electromagnetic fields
US7122482B2 (en) 2003-10-27 2006-10-17 Molecular Imprints, Inc. Methods for fabricating patterned features utilizing imprint lithography
JP2007516862A (en) * 2003-11-12 2007-06-28 モレキュラー・インプリンツ・インコーポレーテッド Distributing geometry and conductive templates for fast filling and throughput
US20050098534A1 (en) * 2003-11-12 2005-05-12 Molecular Imprints, Inc. Formation of conductive templates employing indium tin oxide
US20050106321A1 (en) * 2003-11-14 2005-05-19 Molecular Imprints, Inc. Dispense geometery to achieve high-speed filling and throughput
US20050112505A1 (en) * 2003-11-25 2005-05-26 Huang Wen C. Field-assisted micro- and nano-fabrication method
EP1538482B1 (en) * 2003-12-05 2016-02-17 Obducat AB Device and method for large area lithography
US7153360B2 (en) * 2003-12-16 2006-12-26 Hewlett-Packard Development Company, Lp. Template and methods for forming photonic crystals
KR100572207B1 (en) * 2003-12-18 2006-04-19 주식회사 디지탈바이오테크놀러지 Bonding method of plastic microchip
US7632087B2 (en) * 2003-12-19 2009-12-15 Wd Media, Inc. Composite stamper for imprint lithography
KR100965424B1 (en) * 2003-12-27 2010-06-24 엘지디스플레이 주식회사 Method And Apparatus For Fabricating Flat Panel Display
US7255805B2 (en) * 2004-01-12 2007-08-14 Hewlett-Packard Development Company, L.P. Photonic structures, devices, and methods
US20050151300A1 (en) * 2004-01-13 2005-07-14 Harper Bruce M. Workpiece isothermal imprinting
US20050150862A1 (en) * 2004-01-13 2005-07-14 Harper Bruce M. Workpiece alignment assembly
US20050151282A1 (en) * 2004-01-13 2005-07-14 Harper Bruce M. Workpiece handler and alignment assembly
US20050156353A1 (en) * 2004-01-15 2005-07-21 Watts Michael P. Method to improve the flow rate of imprinting material
KR100566700B1 (en) * 2004-01-15 2006-04-03 삼성전자주식회사 Method for forming mask pattern, template for forming mask pattern and method for forming template
US20050158419A1 (en) * 2004-01-15 2005-07-21 Watts Michael P. Thermal processing system for imprint lithography
US20050155554A1 (en) * 2004-01-20 2005-07-21 Saito Toshiyuki M. Imprint embossing system
US7686606B2 (en) * 2004-01-20 2010-03-30 Wd Media, Inc. Imprint embossing alignment system
US7329114B2 (en) * 2004-01-20 2008-02-12 Komag, Inc. Isothermal imprint embossing system
US9307648B2 (en) 2004-01-21 2016-04-05 Microcontinuum, Inc. Roll-to-roll patterning of transparent and metallic layers
US7462292B2 (en) * 2004-01-27 2008-12-09 Hewlett-Packard Development Company, L.P. Silicon carbide imprint stamp
US7060625B2 (en) * 2004-01-27 2006-06-13 Hewlett-Packard Development Company, L.P. Imprint stamp
JPWO2005075184A1 (en) * 2004-02-04 2007-10-11 住友重機械工業株式会社 Pressure molding apparatus, mold and pressure molding method
US7056834B2 (en) * 2004-02-10 2006-06-06 Hewlett-Packard Development Company, L.P. Forming a plurality of thin-film devices using imprint lithography
US7019835B2 (en) * 2004-02-19 2006-03-28 Molecular Imprints, Inc. Method and system to measure characteristics of a film disposed on a substrate
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US20050189676A1 (en) * 2004-02-27 2005-09-01 Molecular Imprints, Inc. Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
US7906180B2 (en) 2004-02-27 2011-03-15 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US7730834B2 (en) * 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
JP4481698B2 (en) * 2004-03-29 2010-06-16 キヤノン株式会社 Processing equipment
US8235302B2 (en) * 2004-04-20 2012-08-07 Nanolnk, Inc. Identification features
US7140861B2 (en) 2004-04-27 2006-11-28 Molecular Imprints, Inc. Compliant hard template for UV imprinting
JP2008507114A (en) * 2004-04-27 2008-03-06 ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ Composite patterning device for soft lithography
EP1594001B1 (en) * 2004-05-07 2015-12-30 Obducat AB Device and method for imprint lithography
US20050253307A1 (en) * 2004-05-11 2005-11-17 Molecualr Imprints, Inc. Method of patterning a conductive layer on a substrate
US8025831B2 (en) * 2004-05-24 2011-09-27 Agency For Science, Technology And Research Imprinting of supported and free-standing 3-D micro- or nano-structures
US7307697B2 (en) 2004-05-28 2007-12-11 Board Of Regents, The University Of Texas System Adaptive shape substrate support system
JP4954498B2 (en) * 2004-06-01 2012-06-13 株式会社半導体エネルギー研究所 Method for manufacturing semiconductor device
TWI366218B (en) * 2004-06-01 2012-06-11 Semiconductor Energy Lab Method for manufacturing semiconductor device
KR101193918B1 (en) * 2004-06-03 2012-10-29 몰레큘러 임프린츠 인코퍼레이티드 Fluid dispensing and drop-on-demand dispensing for nano-scale menufacturing
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
JP4574240B2 (en) * 2004-06-11 2010-11-04 キヤノン株式会社 Processing apparatus, processing method, device manufacturing method
US20070228593A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. Residual Layer Thickness Measurement and Correction
TWI325851B (en) * 2004-06-18 2010-06-11 Hon Hai Prec Ind Co Ltd Method and device of manufacturing optical element
US7320584B1 (en) 2004-07-07 2008-01-22 Komag, Inc. Die set having sealed compliant member
US7785526B2 (en) * 2004-07-20 2010-08-31 Molecular Imprints, Inc. Imprint alignment method, system, and template
US7195950B2 (en) * 2004-07-21 2007-03-27 Hewlett-Packard Development Company, L.P. Forming a plurality of thin-film devices
US20060029548A1 (en) * 2004-07-22 2006-02-09 Amir Pelleg Methods of diagnosing, monitoring and treating pulmonary diseases
US20060017876A1 (en) * 2004-07-23 2006-01-26 Molecular Imprints, Inc. Displays and method for fabricating displays
US7309225B2 (en) * 2004-08-13 2007-12-18 Molecular Imprints, Inc. Moat system for an imprint lithography template
US7105452B2 (en) * 2004-08-13 2006-09-12 Molecular Imprints, Inc. Method of planarizing a semiconductor substrate with an etching chemistry
US7939131B2 (en) 2004-08-16 2011-05-10 Molecular Imprints, Inc. Method to provide a layer with uniform etch characteristics
US7282550B2 (en) * 2004-08-16 2007-10-16 Molecular Imprints, Inc. Composition to provide a layer with uniform etch characteristics
US20070164476A1 (en) * 2004-09-01 2007-07-19 Wei Wu Contact lithography apparatus and method employing substrate deformation
US7641468B2 (en) * 2004-09-01 2010-01-05 Hewlett-Packard Development Company, L.P. Imprint lithography apparatus and method employing an effective pressure
DK1789848T3 (en) * 2004-09-08 2010-10-25 Nil Technology Aps Flexible nano-embossed piston
US7041604B2 (en) * 2004-09-21 2006-05-09 Molecular Imprints, Inc. Method of patterning surfaces while providing greater control of recess anisotropy
US7252777B2 (en) * 2004-09-21 2007-08-07 Molecular Imprints, Inc. Method of forming an in-situ recessed structure
US7241395B2 (en) * 2004-09-21 2007-07-10 Molecular Imprints, Inc. Reverse tone patterning on surfaces having planarity perturbations
US7205244B2 (en) 2004-09-21 2007-04-17 Molecular Imprints Patterning substrates employing multi-film layers defining etch-differential interfaces
US7547504B2 (en) 2004-09-21 2009-06-16 Molecular Imprints, Inc. Pattern reversal employing thick residual layers
SG147417A1 (en) * 2004-09-21 2008-11-28 Molecular Imprints Inc Method of forming an in-situ recessed structure
US20060062922A1 (en) 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
US7244386B2 (en) 2004-09-27 2007-07-17 Molecular Imprints, Inc. Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom
US20060081557A1 (en) * 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
US8721952B2 (en) * 2004-11-16 2014-05-13 International Business Machines Corporation Pneumatic method and apparatus for nano imprint lithography having a conforming mask
CN100395121C (en) * 2004-11-19 2008-06-18 鸿富锦精密工业（深圳）有限公司 Hot-press printing method
US20080088050A1 (en) * 2004-11-22 2008-04-17 Jun Yorita Processing Method,Processing Apparatus And Microstructure Manufactured In Accordance With This Method
US7630067B2 (en) 2004-11-30 2009-12-08 Molecular Imprints, Inc. Interferometric analysis method for the manufacture of nano-scale devices
EP1820619A4 (en) 2004-11-30 2010-07-07 Asahi Glass Co Ltd Mold and process for production of substrates having transferred micropatterns thereon
US7292326B2 (en) 2004-11-30 2007-11-06 Molecular Imprints, Inc. Interferometric analysis for the manufacture of nano-scale devices
US20070231421A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. Enhanced Multi Channel Alignment
WO2006060757A2 (en) 2004-12-01 2006-06-08 Molecular Imprints, Inc. Eliminating printability of sub-resolution defects in imprint lithography
WO2006060758A2 (en) * 2004-12-01 2006-06-08 Molecular Imprints, Inc. Methods of exposure for the purpose of thermal management for imprint lithography processes
US7811505B2 (en) 2004-12-07 2010-10-12 Molecular Imprints, Inc. Method for fast filling of templates for imprint lithography using on template dispense
JP2006165371A (en) * 2004-12-09 2006-06-22 Canon Inc Transfer apparatus and device manufacturing method
KR100616292B1 (en) 2004-12-15 2006-08-28 주식회사 디엠에스 apparatus for making etching area on substrate
US7410591B2 (en) * 2004-12-16 2008-08-12 Asml Holding N.V. Method and system for making a nano-plate for imprint lithography
US7399422B2 (en) * 2005-11-29 2008-07-15 Asml Holding N.V. System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby
US7331283B2 (en) * 2004-12-16 2008-02-19 Asml Holding N.V. Method and apparatus for imprint pattern replication
US7363854B2 (en) * 2004-12-16 2008-04-29 Asml Holding N.V. System and method for patterning both sides of a substrate utilizing imprint lithography
US7409759B2 (en) * 2004-12-16 2008-08-12 Asml Holding N.V. Method for making a computer hard drive platen using a nano-plate
US8069782B2 (en) * 2004-12-20 2011-12-06 Nanoink, Inc. Stamps with micrometer- and nanometer-scale features and methods of fabrication thereof
US7676088B2 (en) * 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
KR100633019B1 (en) * 2004-12-24 2006-10-12 한국기계연구원 Method for releasing process of stamp and substrate in nano/microimprint lithography process and structure thereof
US7490547B2 (en) * 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
KR100632556B1 (en) * 2005-01-28 2006-10-11 삼성전기주식회사 Method for fabricating printed circuit board
US7635263B2 (en) 2005-01-31 2009-12-22 Molecular Imprints, Inc. Chucking system comprising an array of fluid chambers
US20060177535A1 (en) * 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography template to facilitate control of liquid movement
US20060177532A1 (en) * 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography method to control extrusion of a liquid from a desired region on a substrate
US7636999B2 (en) 2005-01-31 2009-12-29 Molecular Imprints, Inc. Method of retaining a substrate to a wafer chuck
US7798801B2 (en) * 2005-01-31 2010-09-21 Molecular Imprints, Inc. Chucking system for nano-manufacturing
KR101117985B1 (en) * 2005-02-02 2012-03-06 엘지디스플레이 주식회사 Fabricating apparatus for flat display device and method threrby
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US8097400B2 (en) * 2005-02-22 2012-01-17 Hewlett-Packard Development Company, L.P. Method for forming an electronic device
TWI261308B (en) * 2005-03-02 2006-09-01 Ind Tech Res Inst Micro-nanometer transfer printer
US7523701B2 (en) * 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
KR100729427B1 (en) * 2005-03-07 2007-06-15 주식회사 디엠에스 Apparatus for making etching area on substrate
CN1831644B (en) * 2005-03-07 2010-12-22 财团法人工业技术研究院 Micronano transfer device
US7281920B2 (en) * 2005-03-28 2007-10-16 Komag, Inc. Die set utilizing compliant gasket
US7762186B2 (en) * 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US7611348B2 (en) * 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
CN101160331B (en) * 2005-04-21 2010-12-15 旭硝子株式会社 Photocurable composition, micropattern-formed product and its production process
TWI271777B (en) * 2005-04-27 2007-01-21 Ind Tech Res Inst Uniform pressing micro-nano transfer printing apparatus
JP4736522B2 (en) * 2005-04-28 2011-07-27 旭硝子株式会社 Method of manufacturing processed substrate processed by etching
JP4742665B2 (en) * 2005-04-28 2011-08-10 旭硝子株式会社 Method of manufacturing processed substrate processed by etching
WO2006121906A1 (en) * 2005-05-10 2006-11-16 Dow Corning Corporation Sub-micron decal transfer lithography
US7767129B2 (en) * 2005-05-11 2010-08-03 Micron Technology, Inc. Imprint templates for imprint lithography, and methods of patterning a plurality of substrates
US7442029B2 (en) * 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
US20060266916A1 (en) * 2005-05-25 2006-11-30 Molecular Imprints, Inc. Imprint lithography template having a coating to reflect and/or absorb actinic energy
US20060267231A1 (en) * 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7708924B2 (en) * 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US7692771B2 (en) * 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) * 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
JP2007019485A (en) * 2005-06-07 2007-01-25 Obducat Ab Separating device and separating method
US7377764B2 (en) * 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US20080202360A1 (en) * 2005-06-13 2008-08-28 Korea Institute Of Machinery & Materials Imprinting Apparatus For Forming Pattern at Uniform Contact by Additional Constant Pressure
KR101048712B1 (en) * 2005-06-24 2011-07-14 엘지디스플레이 주식회사 Micro pattern formation method using soft mold
US7256131B2 (en) * 2005-07-19 2007-08-14 Molecular Imprints, Inc. Method of controlling the critical dimension of structures formed on a substrate
US7759407B2 (en) 2005-07-22 2010-07-20 Molecular Imprints, Inc. Composition for adhering materials together
US8557351B2 (en) 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
US8808808B2 (en) 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
US20070023976A1 (en) * 2005-07-26 2007-02-01 Asml Netherlands B.V. Imprint lithography
JP2009505845A (en) * 2005-08-10 2009-02-12 プレジデント・アンド・フエローズ・オブ・ハーバード・カレツジ Method of using nanotransfer printing stamps with conductive coded sidewalls
US20070035717A1 (en) 2005-08-12 2007-02-15 Wei Wu Contact lithography apparatus, system and method
US7766640B2 (en) * 2005-08-12 2010-08-03 Hewlett-Packard Development Company, L.P. Contact lithography apparatus, system and method
US20070074635A1 (en) * 2005-08-25 2007-04-05 Molecular Imprints, Inc. System to couple a body and a docking plate
US20070064384A1 (en) * 2005-08-25 2007-03-22 Molecular Imprints, Inc. Method to transfer a template transfer body between a motion stage and a docking plate
US7665981B2 (en) 2005-08-25 2010-02-23 Molecular Imprints, Inc. System to transfer a template transfer body between a motion stage and a docking plate
KR100758699B1 (en) * 2005-08-29 2007-09-14 재단법인서울대학교산학협력재단 Method for forming high aspect ratio nanostructure and method for forming nano pattern using the same
US20090039563A1 (en) * 2005-08-30 2009-02-12 Riken Method of forming fine pattern
JP2008294009A (en) * 2005-09-05 2008-12-04 Scivax Kk Method of microfabrication under controlled pressure, and microfabrication apparatus
US7670534B2 (en) 2005-09-21 2010-03-02 Molecular Imprints, Inc. Method to control an atmosphere between a body and a substrate
US7491049B2 (en) * 2005-09-30 2009-02-17 Hon Hai Precision Industry Co., Ltd. Apparatus for hot embossing lithography
US8142703B2 (en) * 2005-10-05 2012-03-27 Molecular Imprints, Inc. Imprint lithography method
US20070267764A1 (en) * 2005-10-25 2007-11-22 Dai Nippon Printing Co., Ltd. Mold for photocuring nano-imprint and its fabrication process
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US7677877B2 (en) * 2005-11-04 2010-03-16 Asml Netherlands B.V. Imprint lithography
KR100699270B1 (en) 2005-11-19 2007-03-28 삼성전자주식회사 Apparatus for making pattern
KR100699092B1 (en) * 2005-11-22 2007-03-23 삼성전자주식회사 Apparatus and method for making pattern
US7803308B2 (en) 2005-12-01 2010-09-28 Molecular Imprints, Inc. Technique for separating a mold from solidified imprinting material
US7906058B2 (en) 2005-12-01 2011-03-15 Molecular Imprints, Inc. Bifurcated contact printing technique
US20070125475A1 (en) * 2005-12-05 2007-06-07 Huber Engineered Woods Llc Handheld tape applicator and components thereof, and their methods of use
US7670530B2 (en) 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
JP4987012B2 (en) 2005-12-08 2012-07-25 モレキュラー・インプリンツ・インコーポレーテッド Method and system for patterning both sides of a substrate
US20070138699A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) * 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
US7943080B2 (en) * 2005-12-23 2011-05-17 Asml Netherlands B.V. Alignment for imprint lithography
US7377765B2 (en) 2006-02-14 2008-05-27 Hitachi Global Storage Technologies System, method, and apparatus for non-contact and diffuse curing exposure for making photopolymer nanoimprinting stamper
CA2643510C (en) 2006-02-27 2014-04-29 Microcontinuum, Inc. Formation of pattern replicating tools
JP2007250685A (en) * 2006-03-14 2007-09-27 Engineering System Kk Die pressing mechanism for nano-imprint device
US7862756B2 (en) * 2006-03-30 2011-01-04 Asml Netherland B.V. Imprint lithography
US8001924B2 (en) 2006-03-31 2011-08-23 Asml Netherlands B.V. Imprint lithography
US8142850B2 (en) 2006-04-03 2012-03-27 Molecular Imprints, Inc. Patterning a plurality of fields on a substrate to compensate for differing evaporation times
WO2007117524A2 (en) 2006-04-03 2007-10-18 Molecular Imprints, Inc. Method of concurrently patterning a substrate having a plurality of fields and alignment marks
US7802978B2 (en) 2006-04-03 2010-09-28 Molecular Imprints, Inc. Imprinting of partial fields at the edge of the wafer
US8850980B2 (en) 2006-04-03 2014-10-07 Canon Nanotechnologies, Inc. Tessellated patterns in imprint lithography
EP2001602B1 (en) * 2006-04-03 2011-06-22 Molecular Imprints, Inc. Lithography imprinting system
JP4814682B2 (en) * 2006-04-18 2011-11-16 株式会社日立ハイテクノロジーズ Fine structure pattern transfer method and transfer apparatus
US8012395B2 (en) 2006-04-18 2011-09-06 Molecular Imprints, Inc. Template having alignment marks formed of contrast material
WO2007124007A2 (en) * 2006-04-21 2007-11-01 Molecular Imprints, Inc. Method for detecting a particle in a nanoimprint lithography system
JP4830170B2 (en) * 2006-05-15 2011-12-07 学校法人早稲田大学 Transfer device
US7998651B2 (en) 2006-05-15 2011-08-16 Asml Netherlands B.V. Imprint lithography
US8215946B2 (en) 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
KR100857521B1 (en) * 2006-06-13 2008-09-08 엘지디스플레이 주식회사 Manufacturing apparatus and method thereof for TFT
US8318253B2 (en) * 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) * 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
KR20080004983A (en) * 2006-07-07 2008-01-10 삼성전자주식회사 Appratus for forming pattern for light-guide-plate and manufacturing method for light-guide-plate
JP4996150B2 (en) * 2006-07-07 2012-08-08 株式会社日立ハイテクノロジーズ Fine structure transfer apparatus and fine structure transfer method
US20080020303A1 (en) * 2006-07-24 2008-01-24 Wei Wu Alignment for contact lithography
JP5002207B2 (en) * 2006-07-26 2012-08-15 キヤノン株式会社 Method for manufacturing structure having pattern
WO2008014519A2 (en) * 2006-07-28 2008-01-31 Microcontinuum, Inc. Addressable flexible patterns
CN104316987A (en) * 2006-08-09 2015-01-28 光学解决方案纳米光子学有限责任公司 Optical filter and method for the production of the same, and device for the examination of electromagnetic radiation
JP4654299B2 (en) * 2006-09-15 2011-03-16 株式会社日立ハイテクノロジーズ Scanning electron microscope point aberration measurement alignment chip
US7830498B2 (en) * 2006-10-10 2010-11-09 Hewlett-Packard Development Company, L.P. Hydraulic-facilitated contact lithography apparatus, system and method
KR100772441B1 (en) * 2006-10-12 2007-11-01 삼성전기주식회사 Manufacturing method for imprinting stamper
US7618752B2 (en) * 2006-10-12 2009-11-17 Hewlett-Packard Development Company, L.P. Deformation-based contact lithography systems, apparatus and methods
US7768628B2 (en) * 2006-10-12 2010-08-03 Hewlett-Packard Development Company, L.P. Contact lithography apparatus and method
US20080089470A1 (en) * 2006-10-13 2008-04-17 Walmsley Robert G Alignment for contact lithography
US20080090160A1 (en) * 2006-10-13 2008-04-17 Jason Blackstock Alignment for contact lithography
US7957175B2 (en) * 2006-12-22 2011-06-07 Samsung Electronics Co., Ltd. Information storage devices using movement of magnetic domain walls and methods of manufacturing the same
KR100846510B1 (en) * 2006-12-22 2008-07-17 삼성전자주식회사 Information storage device using magnetic domain wall moving and method for manufacturing the same
KR101319325B1 (en) * 2006-12-29 2013-10-16 엘지디스플레이 주식회사 Method for Forming Pattern
KR100930925B1 (en) 2006-12-30 2009-12-10 고려대학교 산학협력단 Composite Imprint Stamp and Manufacturing Method
EP2121992A4 (en) 2007-02-13 2015-07-08 Univ Yale Method for imprinting and erasing amorphous metal alloys
US8940117B2 (en) 2007-02-27 2015-01-27 Microcontinuum, Inc. Methods and systems for forming flexible multilayer structures
JP4985946B2 (en) * 2007-03-08 2012-07-25 セイコーエプソン株式会社 Manufacturing method of electronic device
CN103305402A (en) * 2007-03-28 2013-09-18 博纳基因技术有限公司 Method of macromolecular analysis using nanochannel arrays
JP5064078B2 (en) * 2007-03-30 2012-10-31 株式会社日立産機システム Mold for fine pattern transfer and method for producing resin transfer product using the same
JP2009001002A (en) 2007-05-24 2009-01-08 Univ Waseda Mold, its manufacturing method, and manufacturing method for base material having transfer micro-pattern
US20090115094A1 (en) * 2007-05-29 2009-05-07 Chou Stephen Y Methods for making continuous nanochannels
US8557082B2 (en) * 2007-07-18 2013-10-15 Watlow Electric Manufacturing Company Reduced cycle time manufacturing processes for thick film resistive devices
US20090038636A1 (en) * 2007-08-09 2009-02-12 Asml Netherlands B.V. Cleaning method
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
KR101289337B1 (en) * 2007-08-29 2013-07-29 시게이트 테크놀로지 엘엘씨 Imprint lithography systm for dual side imprinting
US8144309B2 (en) * 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography
US20100215794A1 (en) * 2007-09-06 2010-08-26 Entire Technology Co., Ltd. Diffusion film molding tool & manufacturing process thereof
KR100856559B1 (en) 2007-09-20 2008-09-04 국민대학교산학협력단 Temperature controler of equipment for nano imprint lithography and nano imprint equipment involving this
JP2009083125A (en) * 2007-09-27 2009-04-23 Fujifilm Corp Method and apparatus for producing functional film
JP4885816B2 (en) * 2007-09-27 2012-02-29 富士フイルム株式会社 Method and apparatus for producing functional film
US8278047B2 (en) 2007-10-01 2012-10-02 Nabsys, Inc. Biopolymer sequencing by hybridization of probes to form ternary complexes and variable range alignment
TWI444282B (en) 2007-10-19 2014-07-11 Showa Denko Kk Method and apparatus for manufacturing resin stamper, imprint method, magnetic recording medium, and magnetic recording/reproducing apparatus
US20100297228A1 (en) * 2007-10-29 2010-11-25 Nanolnk, Inc. Universal coating for imprinting identification features
JP5464753B2 (en) * 2007-12-06 2014-04-09 インテバック・インコーポレイテッド System and method for double-sided sputter etching of substrates
KR100887529B1 (en) 2007-12-20 2009-03-06 주식회사 디엠에스 A surface treatment apparatus and process for stamp
JP4578517B2 (en) * 2007-12-26 2010-11-10 Ｓｃｉｖａｘ株式会社 Imprint apparatus and imprint method
TW200932502A (en) * 2008-01-18 2009-08-01 Univ Nat Taiwan An improved embossing apparatus
TW201001624A (en) * 2008-01-24 2010-01-01 Soligie Inc Silicon thin film transistors, systems, and methods of making same
TWI342862B (en) 2008-01-31 2011-06-01 Univ Nat Taiwan Method of micro/nano imprinting
CN101960559A (en) 2008-03-07 2011-01-26 昭和电工株式会社 UV nanoimprint method, resin replica mold and method for producing the same, magnetic recording medium and method for producing the same, and magnetic recording/reproducing apparatus
US20090244762A1 (en) * 2008-03-31 2009-10-01 Fujifilm Corporation Resist pattern forming method, mold structure producing method, magnetic recording medium producing method, magnetic transfer method and magnetic recording medium
WO2010004006A2 (en) * 2008-07-10 2010-01-14 Singulus Technologies Ag Device and method for impressing structures in a substrate, in particular in optical data storage media, semiconductor structures and microstructures
US20100015270A1 (en) * 2008-07-15 2010-01-21 Molecular Imprints, Inc. Inner cavity system for nano-imprint lithography
US8262879B2 (en) 2008-09-03 2012-09-11 Nabsys, Inc. Devices and methods for determining the length of biopolymers and distances between probes bound thereto
US9650668B2 (en) 2008-09-03 2017-05-16 Nabsys 2.0 Llc Use of longitudinally displaced nanoscale electrodes for voltage sensing of biomolecules and other analytes in fluidic channels
WO2010028140A2 (en) 2008-09-03 2010-03-11 Nabsys, Inc. Use of longitudinally displaced nanoscale electrodes for voltage sensing of biomolecules and other analytes in fluidic channels
US20100096764A1 (en) * 2008-10-20 2010-04-22 Molecular Imprints, Inc. Gas Environment for Imprint Lithography
US8309003B2 (en) * 2008-10-30 2012-11-13 Lg Display Co., Ltd. In-plane printing resin material and method of manufacturing liquid crystal display device using the same
EP2194428A1 (en) * 2008-12-08 2010-06-09 Jung-Chung Hung Uniform pressing apparatus for use in a micro-nano imprint process
TWI384287B (en) * 2008-12-15 2013-02-01 Taiwan Name Plate Co Ltd Hot pressing light guide plate device
TWI395655B (en) * 2009-01-16 2013-05-11 Chenming Mold Ind Corp Microstructure forming device and method thereof
WO2010098102A1 (en) 2009-02-27 2010-09-02 三井化学株式会社 Transfer body and method for producing the same
JP2012522327A (en) * 2009-03-23 2012-09-20 インテバック・インコーポレイテッド Method for optimization of patterned media groove to island ratio
WO2010151886A2 (en) * 2009-06-26 2010-12-29 The Arizona Board Of Regents On Behalf Of The University Of Arizona Nano-architectured carbon structures and methods for fabricating same
NL2004685A (en) 2009-07-27 2011-01-31 Asml Netherlands Bv Imprint lithography apparatus and method.
CN102482364B (en) 2009-08-26 2013-08-28 三井化学株式会社 Fluorine-containing cyclic olefin polymer composition, transcript obtained from said composition, and manufacturing method therefor
JP5540628B2 (en) * 2009-09-28 2014-07-02 大日本印刷株式会社 Nanoimprint pattern forming method
DK2483744T3 (en) 2009-10-02 2016-07-18 Univ Danmarks Tekniske INJECTION MOLDING TOOL WITH micro / nano-METER PATTERNS
US8496466B1 (en) 2009-11-06 2013-07-30 WD Media, LLC Press system with interleaved embossing foil holders for nano-imprinting of recording media
US8402638B1 (en) 2009-11-06 2013-03-26 Wd Media, Inc. Press system with embossing foil free to expand for nano-imprinting of recording media
US9330685B1 (en) * 2009-11-06 2016-05-03 WD Media, LLC Press system for nano-imprinting of recording media with a two step pressing method
US8747092B2 (en) 2010-01-22 2014-06-10 Nanonex Corporation Fast nanoimprinting apparatus using deformale mold
DE102010007970A1 (en) * 2010-02-15 2011-08-18 Suss MicroTec Lithography GmbH, 85748 Method and device for active wedge error compensation between two objects which can be positioned substantially parallel to one another
US20110203656A1 (en) * 2010-02-24 2011-08-25 Iowa State University Research Foundation, Inc. Nanoscale High-Aspect-Ratio Metallic Structure and Method of Manufacturing Same
WO2011139782A1 (en) * 2010-04-27 2011-11-10 Molecular Imprints, Inc. Separation control substrate/template for nanoimprint lithography
US20110291330A1 (en) 2010-05-27 2011-12-01 Mircea Despa Replication method and articles of the method
JP5504054B2 (en) 2010-05-27 2014-05-28 株式会社東芝 Imprint mask, manufacturing method thereof, and manufacturing method of semiconductor device
JP5539113B2 (en) * 2010-08-30 2014-07-02 キヤノン株式会社 Imprint apparatus and article manufacturing method
US8715933B2 (en) 2010-09-27 2014-05-06 Nabsys, Inc. Assay methods using nicking endonucleases
US8859201B2 (en) 2010-11-16 2014-10-14 Nabsys, Inc. Methods for sequencing a biomolecule by detecting relative positions of hybridized probes
US8845912B2 (en) 2010-11-22 2014-09-30 Microcontinuum, Inc. Tools and methods for forming semi-transparent patterning masks
US11274341B2 (en) 2011-02-11 2022-03-15 NABsys, 2.0 LLC Assay methods using DNA binding proteins
FR2972298B1 (en) * 2011-03-04 2015-07-31 Commissariat Energie Atomique METHOD FOR METALLIZING TEXTURED SURFACES
JP2012190877A (en) * 2011-03-09 2012-10-04 Fujifilm Corp Nanoimprint method and nanoimprint device for use therein
AU2012283745B2 (en) * 2011-07-08 2016-03-10 Xtek Limited Process for the manufacture of multilayer articles
US9064808B2 (en) 2011-07-25 2015-06-23 Synopsys, Inc. Integrated circuit devices having features with reduced edge curvature and methods for manufacturing the same
RU2476917C1 (en) * 2011-08-12 2013-02-27 Открытое акционерное общество "НИИ молекулярной электроники и завод "Микрон" Method of making die for nanoimprint lithography
US8609550B2 (en) * 2011-09-08 2013-12-17 Synopsys, Inc. Methods for manufacturing integrated circuit devices having features with reduced edge curvature
US10549476B2 (en) * 2011-09-23 2020-02-04 1366 Technologies, Inc. Methods and apparati for handling, heating and cooling a substrate upon which a pattern is made by a tool in heat flowable material coating, including substrate transport, tool laydown, tool tensioning and tool retraction
JP5203493B2 (en) 2011-09-29 2013-06-05 シャープ株式会社 Molding apparatus and molding method
FR2990384B1 (en) * 2012-05-14 2015-05-15 Saint Gobain METHOD FOR TEXTURING ON A LARGE SURFACE SUBSTRATE
US20130337176A1 (en) * 2012-06-19 2013-12-19 Seagate Technology Llc Nano-scale void reduction
US20140239529A1 (en) * 2012-09-28 2014-08-28 Nanonex Corporation System and Methods For Nano-Scale Manufacturing
JP5949430B2 (en) 2012-10-18 2016-07-06 富士通株式会社 Imprint apparatus and imprint method
US8834146B2 (en) 2012-10-24 2014-09-16 Massachusetts Institute Of Technology System for passive alignment of surfaces
US9914966B1 (en) 2012-12-20 2018-03-13 Nabsys 2.0 Llc Apparatus and methods for analysis of biomolecules using high frequency alternating current excitation
WO2014113557A1 (en) 2013-01-18 2014-07-24 Nabsys, Inc. Enhanced probe binding
WO2014145360A1 (en) * 2013-03-15 2014-09-18 Nanonex Corporation Imprint lithography system and method for manufacturing
WO2014145826A2 (en) 2013-03-15 2014-09-18 Nanonex Corporation System and methods of mold/substrate separation for imprint lithography
US9728802B2 (en) * 2013-05-14 2017-08-08 Giner, Inc. Micromold methods for fabricating perforated substrates and for preparing solid polymer electrolyte composite membranes
US9589797B2 (en) 2013-05-17 2017-03-07 Microcontinuum, Inc. Tools and methods for producing nanoantenna electronic devices
JP2017010962A (en) 2015-06-16 2017-01-12 株式会社東芝 Device substrate and method of manufacturing device substrate, and method of manufacturing semiconductor device
CN106597811B (en) * 2015-10-16 2019-03-08 中芯国际集成电路制造(上海)有限公司 Method for monitoring litho machine imaging plane exception
US10687642B2 (en) 2016-02-05 2020-06-23 Havi Global Solutions, Llc Microstructured packaging surfaces for enhanced grip
KR102168460B1 (en) 2016-02-05 2020-10-21 하비 글로벌 솔루션즈 엘엘씨 Microstructured surface with improved insulation and condensation resistance
US10752415B2 (en) 2016-04-07 2020-08-25 Havi Global Solutions, Llc Fluid pouch with inner microstructure
JP6220918B2 (en) * 2016-04-22 2017-10-25 株式会社写真化学 Transfer device for electronic device and transfer method for electronic device
WO2017204260A1 (en) 2016-05-25 2017-11-30 大日本印刷株式会社 Template, template blank and imprint template board making method, imprint template making method, and template
TWI672212B (en) * 2016-08-25 2019-09-21 國立成功大學 Nano imprinting assembly and imprinting method thereof
US10895806B2 (en) * 2017-09-29 2021-01-19 Canon Kabushiki Kaisha Imprinting method and apparatus
FR3073322B1 (en) * 2017-11-07 2021-12-03 Commissariat Energie Atomique PROCESS FOR MAKING AT LEAST ONE CURVED ELECTRONIC CIRCUIT
WO2019210976A1 (en) * 2018-05-04 2019-11-07 Ev Group E. Thallner Gmbh Stamp and method for embossing
US11139402B2 (en) 2018-05-14 2021-10-05 Synopsys, Inc. Crystal orientation engineering to achieve consistent nanowire shapes
DE102018215939A1 (en) * 2018-09-19 2020-03-19 Profol GmbH Tool for applying a film
US11264458B2 (en) 2019-05-20 2022-03-01 Synopsys, Inc. Crystal orientation engineering to achieve consistent nanowire shapes
JPWO2020246457A1 (en) * 2019-06-05 2020-12-10
KR20220120579A (en) * 2019-12-25 2022-08-30 싸이백스 가부시키가이샤 Imprint apparatus and imprint method
CN111640651A (en) * 2020-01-19 2020-09-08 中国科学技术大学 Sub-wavelength surface nano structure based on ion bombardment technology and preparation method thereof
CN111562719B (en) * 2020-06-15 2022-06-21 京东方科技集团股份有限公司 Nano-imprinting template, manufacturing method and demolding method thereof

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3922134A (en) * 1973-12-17 1975-11-25 Robintech Inc Pipe bending mandrel
US4268238A (en) * 1978-03-13 1981-05-19 Clint, Inc. Flow molding
US4325779A (en) * 1979-04-17 1982-04-20 Beatrice Foods Co. Method for shaping and finishing a workpiece
US4504341A (en) * 1982-09-20 1985-03-12 Ppg Industries, Inc. Fabricating shaped laminated transparencies
DE3484876D1 (en) * 1983-02-04 1991-09-12 Solar Control France IMPACT RESISTANT AND BULLETPROOF COMPOSITE DISC AND METHOD FOR THE PRODUCTION THEREOF.
US4642255A (en) * 1984-12-20 1987-02-10 Frank C. Dlubak Laminated article and process for making same
NL8600809A (en) * 1986-03-28 1987-10-16 Philips Nv METHOD OF FILLING A DIE WITH A LOOSE LAYER.
DE3643817A1 (en) * 1986-12-20 1988-06-30 Agfa Gevaert Ag Contact copier
US5079057A (en) * 1986-12-29 1992-01-07 Owens-Illinois Plastic Products Inc. Plastic container with multilayer label applied by in-mold labeling
US4731155A (en) * 1987-04-15 1988-03-15 General Electric Company Process for forming a lithographic mask
DE3719200A1 (en) * 1987-06-09 1988-12-29 Ibm Deutschland OPTICAL DISK AND METHOD FOR THEIR PRODUCTION
JPH01196749A (en) * 1988-01-30 1989-08-08 Hoya Corp Manufacture of substrate for optical information recording medium
US5234717A (en) * 1990-06-14 1993-08-10 Nippon Sheet Glass Co., Ltd. Process for producing a minute-patterned substrate
CA2052273C (en) * 1990-09-29 1995-02-14 Katsumi Kohama Sheet for molding fiber-reinforced resin and method for producing it
JPH0818336B2 (en) * 1991-02-06 1996-02-28 松下電器産業株式会社 Molding member and manufacturing method thereof
CN2128495Y (en) * 1991-07-22 1993-03-24 徐建明 Automatic energy input device for two-purpose bedding mattress in winter and summer
US5466146A (en) * 1992-06-29 1995-11-14 Fritz; Michael L. Hydroforming platen and seal
JP2976717B2 (en) * 1992-09-29 1999-11-10 株式会社村田製作所 Manufacturing method of multilayer ceramic electronic component
FR2722303B1 (en) * 1994-07-07 1996-09-06 Corning Inc METHOD AND DEVICE FOR MANUFACTURING OPTICAL MICROLENTIAL NETWORKS
US5643522A (en) * 1994-12-12 1997-07-01 Park; James F. Method and system for curing fiber reinforced composite structures
US5648109A (en) * 1995-05-03 1997-07-15 Massachusetts Institute Of Technology Apparatus for diaphragm forming
US5997273A (en) * 1995-08-01 1999-12-07 Laquer; Henry Louis Differential pressure HIP forging in a controlled gaseous environment
US5824418A (en) * 1995-09-05 1998-10-20 Northrop Grumman Corporation Optically transparent, electrically conductive semiconductor windows
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US5669303A (en) * 1996-03-04 1997-09-23 Motorola Apparatus and method for stamping a surface
JPH09312361A (en) * 1996-05-22 1997-12-02 Hitachi Metals Ltd Composite material for electronic component and its manufacture
IT1287480B1 (en) * 1996-09-24 1998-08-06 Unifill Int Ag APPARATUS FOR HEATING A PAIR OF THERMOFORMABLE MATERIAL SHEETS
SE508968C2 (en) * 1996-12-19 1998-11-23 Ericsson Telefon Ab L M Procedure for making elastic balls
US5863452A (en) * 1997-04-17 1999-01-26 Northrop Grumman Corporation Isostatic pressure resin transfer molding
US6162705A (en) * 1997-05-12 2000-12-19 Silicon Genesis Corporation Controlled cleavage process and resulting device using beta annealing
US6425972B1 (en) * 1997-06-18 2002-07-30 Calipher Technologies Corp. Methods of manufacturing microfabricated substrates
US6099940A (en) * 1997-07-16 2000-08-08 The Procter & Gamble Company Selectively-activatible three-dimensional sheet material having multi-stage progressive activation to deliver a substance to a target surface
JP3403016B2 (en) * 1997-08-04 2003-05-06 住友化学工業株式会社 Method for producing synthetic resin molded article having hollow part
US5958326A (en) * 1997-09-05 1999-09-28 Caferro; Ronald N. Process for producing a lighting louver
US5947027A (en) * 1998-09-08 1999-09-07 Motorola, Inc. Printing apparatus with inflatable means for advancing a substrate towards the stamping surface
KR100378078B1 (en) * 1999-07-20 2003-03-29 주식회사 미뉴타텍 Method for forming a pattern layer with ductile material by direct pressing
US6190929B1 (en) * 1999-07-23 2001-02-20 Micron Technology, Inc. Methods of forming semiconductor devices and methods of forming field emission displays
SE515607C2 (en) 1999-12-10 2001-09-10 Obducat Ab Device and method for fabrication of structures
US6533986B1 (en) * 2000-02-16 2003-03-18 Howmet Research Corporation Method and apparatus for making ceramic cores and other articles
US6365059B1 (en) * 2000-04-28 2002-04-02 Alexander Pechenik Method for making a nano-stamp and for forming, with the stamp, nano-size elements on a substrate
US6319745B1 (en) * 2000-05-31 2001-11-20 International Business Machines Corporation Formation of charge-coupled-device with image pick-up array

Also Published As

Publication number Publication date
WO2002007199A1 (en) 2002-01-24
US20020177319A1 (en) 2002-11-28
KR20030064370A (en) 2003-07-31
US20020132482A1 (en) 2002-09-19
US6482742B1 (en) 2002-11-19
JP2004504718A (en) 2004-02-12
US6946360B2 (en) 2005-09-20
US7137803B2 (en) 2006-11-21
JP3987795B2 (en) 2007-10-10
CN1457505A (en) 2003-11-19
KR100873587B1 (en) 2008-12-11
EP1325513A4 (en) 2006-05-03
EP1325513A1 (en) 2003-07-09
CN1299332C (en) 2007-02-07

Similar Documents

Publication Publication Date Title
AU2001273136A1 (en) Fluid pressure imprint lithography
AU3625600A (en) Fluid pressure reduction device
AU2002366036A1 (en) Pressure release valve
AU2001260921A1 (en) Molecular imprinting
AU2001297642A1 (en) Template for room temperature, low pressure micro- and nano-imprint lithography
AU2001268358A1 (en) Self retained pressure connection
AU2001234959A1 (en) Oil-less differential pressure sensor
AU2001237776A1 (en) Hydraulic pressure booster cylinder
AU2001281571A1 (en) Hydraulic valve
AU2001271057A1 (en) Fluid cutoff valve device
AUPR045600A0 (en) Fluid devices
AU2002214601A1 (en) Pressure sensor
AU7381801A (en) Hydraulic pressure intensifier
AU2001233327A1 (en) Hydraulic pressure transformer
AU1989400A (en) Pressure release valve
AU2001253864A1 (en) Differential pressure generator
AU2002212498A1 (en) Fluid machine
GB2359340B (en) Fluid pressure cylinder
AU4095001A (en) Device actuated by a pressure medium
AU2001269306A1 (en) Pressure transducer
AU2002225650A1 (en) Hydraulic pressure transformer
AU4672501A (en) Low pressure valve
AU2002216197A1 (en) Brake pressure limiting
AU2003287355A1 (en) Single fluid lithographic ink
GB0023992D0 (en) A fluid pressure providing system