AU2001272873A1 - Method and apparatus for generating x-ray or euv radiation - Google Patents

Method and apparatus for generating x-ray or euv radiation

Info

Publication number
AU2001272873A1
AU2001272873A1 AU2001272873A AU7287301A AU2001272873A1 AU 2001272873 A1 AU2001272873 A1 AU 2001272873A1 AU 2001272873 A AU2001272873 A AU 2001272873A AU 7287301 A AU7287301 A AU 7287301A AU 2001272873 A1 AU2001272873 A1 AU 2001272873A1
Authority
AU
Australia
Prior art keywords
ray
jet
euv radiation
generating
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001272873A
Inventor
Oscar Hemberg
Hans Hertz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jettec AB
Original Assignee
Jettec AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SE0002785A external-priority patent/SE0002785D0/en
Priority claimed from SE0003073A external-priority patent/SE522150C2/en
Application filed by Jettec AB filed Critical Jettec AB
Publication of AU2001272873A1 publication Critical patent/AU2001272873A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/081—Target material
    • H01J2235/082—Fluids, e.g. liquids, gases
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

In a method and an apparatus for generating X-ray or EUV radiation, an electron beam is brought to interact with a propagating target jet, typically in a vacuum chamber. The target jet is formed by urging a liquid substance under pressure through an outlet opening. Hard X-ray radiation may be generated by converting the electron-beam energy to Bremsstrahlung and characteristic line emission, essentially without heating the jet to a plasma-forming temperature. Soft X-ray or EUV radiation may be generated by the electron beam heating the jet to a plasma-forming temperature.
AU2001272873A 2000-07-28 2001-07-18 Method and apparatus for generating x-ray or euv radiation Abandoned AU2001272873A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
SE0002785A SE0002785D0 (en) 2000-07-28 2000-07-28 Method and apparatus for generating x-ray or EUV radiation as well as use thereof
SE0002785 2000-07-28
SE0003073 2000-08-31
SE0003073A SE522150C2 (en) 2000-08-31 2000-08-31 Generating X=ray or extreme UV radiation by directing electron beams onto liquid metal or liquefied noble gas to generate soft radiation
PCT/SE2001/001646 WO2002011499A1 (en) 2000-07-28 2001-07-18 Method and apparatus for generating x-ray or euv radiation

Publications (1)

Publication Number Publication Date
AU2001272873A1 true AU2001272873A1 (en) 2002-02-13

Family

ID=26655193

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001272873A Abandoned AU2001272873A1 (en) 2000-07-28 2001-07-18 Method and apparatus for generating x-ray or euv radiation

Country Status (7)

Country Link
EP (1) EP1305984B1 (en)
JP (1) JP5073146B2 (en)
CN (1) CN1272989C (en)
AT (1) ATE489838T1 (en)
AU (1) AU2001272873A1 (en)
DE (1) DE60143527D1 (en)
WO (1) WO2002011499A1 (en)

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DE10339495B4 (en) * 2002-10-08 2007-10-04 Xtreme Technologies Gmbh Arrangement for the optical detection of a moving target current for pulsed energy-jet-pumped radiation generation
US6933515B2 (en) * 2003-06-26 2005-08-23 University Of Central Florida Research Foundation Laser-produced plasma EUV light source with isolated plasma
DE102004003854A1 (en) * 2004-01-26 2005-08-18 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Methods and apparatus for producing solid filaments in a vacuum chamber
JP4337648B2 (en) * 2004-06-24 2009-09-30 株式会社ニコン EUV LIGHT SOURCE, EUV EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
US7557366B2 (en) * 2006-05-04 2009-07-07 Asml Netherlands B.V. Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
SE530094C2 (en) * 2006-05-11 2008-02-26 Jettec Ab Method for generating X-rays by electron irradiation of a liquid substance
KR101437583B1 (en) * 2007-07-03 2014-09-12 삼성전자주식회사 Lithography apparatus and lithography method
DE102008026938A1 (en) 2008-06-05 2009-12-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Radiation source and method for generating X-radiation
EP2415065A1 (en) 2009-04-03 2012-02-08 Excillum AB Supply of a liquid-metal target in x-ray generation
CN104681378B (en) * 2009-04-03 2017-04-12 伊克斯拉姆公司 Liquid metal target supply during x-ray production
JP2011054376A (en) * 2009-09-01 2011-03-17 Ihi Corp Lpp type euv light source and generation method of the same
WO2012005338A2 (en) * 2010-07-09 2012-01-12 有限会社アドテックセンシングリサーチ X-ray generating device
JP5347138B2 (en) * 2010-12-27 2013-11-20 双葉電子工業株式会社 Photodisinfection device and ultraviolet X-ray generator
JP5167475B2 (en) * 2010-12-27 2013-03-21 双葉電子工業株式会社 Photodisinfection device and ultraviolet X-ray generator
US20140161233A1 (en) 2012-12-06 2014-06-12 Bruker Axs Gmbh X-ray apparatus with deflectable electron beam
CN103079327B (en) * 2013-01-05 2015-09-09 中国科学院微电子研究所 Target source pre-shaping enhanced extreme ultraviolet light generating device
US9767982B2 (en) * 2013-02-13 2017-09-19 Koninklijke Philips N.V. Multiple X-ray beam tube
CN103209536A (en) * 2013-03-22 2013-07-17 中国科学院上海光学精密机械研究所 Method for producing soft X ray
DE102013209447A1 (en) * 2013-05-22 2014-11-27 Siemens Aktiengesellschaft X-ray source and method for generating X-ray radiation
DE102013220189A1 (en) 2013-10-07 2015-04-23 Siemens Aktiengesellschaft X-ray source and method for generating X-ray radiation
US10085702B2 (en) 2014-01-07 2018-10-02 Jettec Ab X-ray micro imaging
CN103871832B (en) * 2014-03-21 2016-08-24 中国科学院空间科学与应用研究中心 A kind of extreme ultraviolet pulse generation manipulator
WO2016010448A1 (en) 2014-07-17 2016-01-21 Siemens Aktiengesellschaft Fluid injector for x-ray tubes and method to provide a liquid anode by liquid metal injection
US9301381B1 (en) * 2014-09-12 2016-03-29 International Business Machines Corporation Dual pulse driven extreme ultraviolet (EUV) radiation source utilizing a droplet comprising a metal core with dual concentric shells of buffer gas
DE102014226814B4 (en) * 2014-12-22 2023-05-11 Siemens Healthcare Gmbh metal beam x-ray tube
DE102014226813A1 (en) * 2014-12-22 2016-06-23 Siemens Aktiengesellschaft Metal beam X-ray tube
EP3214635A1 (en) * 2016-03-01 2017-09-06 Excillum AB Liquid target x-ray source with jet mixing tool
RU2709183C1 (en) * 2019-04-26 2019-12-17 Общество С Ограниченной Ответственностью "Эуф Лабс" X-ray source with liquid metal target and method of radiation generation
RU2670273C2 (en) * 2017-11-24 2018-10-22 Общество с ограниченной ответственностью "РнД-ИСАН" Device and method for emission generation from laser plasma
EP3493239A1 (en) * 2017-12-01 2019-06-05 Excillum AB X-ray source and method for generating x-ray radiation
KR102447685B1 (en) * 2020-07-22 2022-09-27 포항공과대학교 산학협력단 Apparatus and method for generating light source with range of specific wavelength
US11882642B2 (en) 2021-12-29 2024-01-23 Innovicum Technology Ab Particle based X-ray source
WO2023128856A1 (en) 2021-12-29 2023-07-06 Innovicum Technology Ab Particle based x-ray source

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JPS61153935A (en) * 1984-12-26 1986-07-12 Toshiba Corp Plasma x-ray generator
US4953191A (en) * 1989-07-24 1990-08-28 The United States Of America As Represented By The United States Department Of Energy High intensity x-ray source using liquid gallium target
US5052034A (en) * 1989-10-30 1991-09-24 Siemens Aktiengesellschaft X-ray generator
JPH03283398A (en) * 1990-03-30 1991-12-13 Shimadzu Corp X-ray generator
JPH05258692A (en) * 1992-03-10 1993-10-08 Nikon Corp X-ray generating method and x-ray generating device
JP2552433B2 (en) * 1994-06-30 1996-11-13 関西電力株式会社 Method and apparatus for removing debris from laser plasma X-ray source
JPH08162286A (en) * 1994-12-07 1996-06-21 Olympus Optical Co Ltd Laser plasma source
SE510133C2 (en) * 1996-04-25 1999-04-19 Jettec Ab Laser plasma X-ray source utilizing fluids as radiation target
JPH10221499A (en) * 1997-02-07 1998-08-21 Hitachi Ltd Laser plasma x-ray source and device and method for exposing semiconductor using the same
US6031241A (en) * 1997-03-11 2000-02-29 University Of Central Florida Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
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JP3602356B2 (en) * 1998-12-02 2004-12-15 三菱電機株式会社 Electromagnetic wave generator

Also Published As

Publication number Publication date
JP5073146B2 (en) 2012-11-14
CN1272989C (en) 2006-08-30
CN1466860A (en) 2004-01-07
ATE489838T1 (en) 2010-12-15
WO2002011499A1 (en) 2002-02-07
EP1305984A1 (en) 2003-05-02
DE60143527D1 (en) 2011-01-05
EP1305984B1 (en) 2010-11-24
JP2004505421A (en) 2004-02-19

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