JP3817848B2 - Lighting device - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an illumination device that illuminates an object to be illuminated (for example, for an exposure apparatus), and in particular, a circuit pattern on a photomask (mask or reticle) is reflected by a mirror projection method such as an X-ray optical system. The present invention relates to an illuminating device suitable for use in a soft X-ray projection exposure apparatus which is an apparatus for transferring onto a substrate such as a wafer via the imaging apparatus.
[0002]
[Prior art]
An exposure apparatus for manufacturing a semiconductor projects and transfers a circuit pattern formed on a photomask (hereinafter referred to as a mask) as an object surface onto a substrate such as a wafer via an imaging device.
[0003]
A resist is applied to the substrate, and the resist is exposed by exposure to obtain a resist pattern. In order to obtain a resist pattern in a desired area, the mask must be illuminated with light of uniform light intensity and uniform spread angle. Therefore, the illuminating device of the exposure apparatus has adopted the Koehler illumination optical system in order to satisfy this condition.
[0004]
When the exposure light is X-rays, the imaging device is composed of a reflecting mirror, and only the arc-shaped good image area outside the imaging optical system is used, and only the arc area on the mask is the wafer. Projected and transferred onto. Therefore, the circuit pattern of the entire mask is transferred onto the wafer by scanning the mask and the wafer in a certain direction.
[0005]
In this type of exposure, there is a demand for an illumination optical system that can illuminate the entire arc region on the mask uniformly and with a certain numerical aperture. Japanese Patent Application Laid-Open No. 7-235471 filed by the same applicant as the present applicant. Japanese Laid-Open Patent Publication (Kokai) discloses an illumination optical system that can uniformly illuminate a mask in an arc shape.
[0006]
The optical system disclosed in Japanese Patent Laid-Open No. 7-235471 is shown in FIGS. The X-rays 120 (121, 122) emitted from the light source (or light source image) 110 are reflected by the special reflecting mirror 130 and irradiated onto the arc region 140 on the mask.
[0007]
As an example of a method for forming the light source, Japanese Patent Application Laid-Open No. 8-148414, filed by the same applicant as the present applicant, proposes an illumination device with high illumination intensity. As shown in FIG. 8, the excitation energy light generation unit 101, the target member 103, and the illumination optical system 104 are configured as main components.
[0008]
Excitation energy light 102 emitted from the excitation energy light generation unit 101 is irradiated to a plurality of different locations on the target member 103. X-rays 120 are respectively generated from a plurality of locations on the target member irradiated with the excitation energy light 102, and a plurality of X-ray sources 110 are formed.
[0009]
[Problems to be solved by the invention]
Incidentally, as shown in FIG. 9, regarding the X-rays 121 and 122 emitted from the light source 110, focusing on the parallel light beam in the sagittal direction (paper surface direction), the diameter of the parallel light beam 121 when the emission angle is 0 degree is P ( When 0) = q, the diameter of the parallel light beam 122 when the emission angle is θ is P (θ) = qCOSθ, and the light beam diameter P (θ) in the paper surface direction decreases as the emission angle θ increases.
[0010]
Accordingly, the cross section of the parallel light beam 121 when the emission angle is 0 degrees is substantially circular as shown in FIG. 10A, for example, whereas the cross section of the parallel light beam 122 when the emission angle is θ. 10 (b) has a major axis of P (0) in the direction perpendicular to the paper surface of FIG. 9 (meridional direction) and a short length of P (θ) in the paper surface direction (sagittal direction) of FIG. It becomes an elliptical shape having a diameter.
[0011]
As a result, as shown in FIG. 11, the condensing state of the condensed light beam 124 when the parallel light beam 121 having an exit angle of 0 ° is subjected to the condensing action by the special reflecting mirror 130 is formed on the irradiated surface. In contrast to the condensing point p1 in the circular arc illumination area BF, the parallel light beam 122 having an exit angle of θ is focused by the special reflecting mirror 130 while condensing in a conical shape. The condensed light flux 125 at this time is condensed in an elliptical cone shape at a condensing point p2 in the arc illumination area BF on the irradiated surface.
[0012]
For this reason, in the radial direction R of the condensing point p2, the angle of the condensed light beam with respect to the condensing point p2 is equal to the condensed light beam of the parallel light beam 121, but in the tangential direction T of the condensing point p2, the condensing point. There is a problem that the angle at which the condensed light beam spreads with respect to p2 is smaller (COSθ times) than in the radial direction R of the condensing point p2. In addition, this problem becomes remarkable for a parallel light flux having a large exit angle θ with respect to the sagittal direction.
[0013]
In general, when an object to be illuminated is illuminated with an illuminating device that collects parallel light beams having different cross-sectional shapes and the image is formed with an imaging device, the resolution is generally non-uniform in the image plane. . This occurs because a part of the object to be illuminated is illuminated under conditions that do not satisfy the numerical aperture required by the imaging optical system.
[0014]
As a method for solving such a problem, Japanese Patent Laid-Open No. 6-267894 discloses a method of newly providing a re-imaging optical system. However, since this optical system is composed of a plurality of lenses, it is not useful in the X-ray region where the lenses cannot be used. Even if this optical system is composed entirely of reflecting mirrors, since a plurality of reflecting mirrors are required, the amount of X-rays obtained after reflection becomes extremely small.
[0015]
The present invention has been made to solve such problems. The illumination efficiency is remarkably higher than in the prior art, and the numerical aperture of X-rays in an illumination area formed in an arc shape is independent of the illumination position. The object is to provide a high-performance lighting device that is substantially uniform.
[0016]
[Means for Solving the Problems]
The first means for solving the above-described problems includes at least an excitation energy light generator that generates excitation energy light and irradiates a plurality of locations on the target member, and receives the excitation energy light at a plurality of locations. A plurality of X-ray sources, and an illumination optical system that irradiates an object to be illuminated with X-rays from the plurality of X-ray sources. An illuminating device (Claim 1) arranged above.
[0017]
In this apparatus, since the plurality of X-ray sources are arranged on the curved surface, the numerical aperture in the illumination area formed in an arc shape is substantially uniform regardless of the illumination position. Therefore, it does not occur that a part of the object to be illuminated does not satisfy the numerical aperture required by the imaging optical system, and the resolution does not become nonuniform in the image plane.
[0018]
A second means for solving the above-described problem is an illumination device according to the first means, wherein the curved surface is a cylindrical surface (Claim 2).
[0019]
The cylindrical surface can be easily manufactured, and the numerical aperture of X-rays in the illumination area formed in an arc shape can be easily made almost uniform regardless of the illumination position.
[0020]
According to a third means for solving the above-mentioned problem, in the first means or the second means, the target member is in the form of a tape and is provided along the curved surface (Claim 3). It is.
[0021]
In this way, the numerical aperture in the illumination area formed in an arc shape is substantially uniform regardless of the illumination position, and the tape-shaped target member is moved in accordance with the degree of wear of the target member. The excitation energy light can be received in the new part, and the lighting device can be used for a long time.
[0022]
A fourth means for solving the above problem is that the first or second means uses a particulate target member, and the plurality of target members are configured to form a curved surface. (Claim 4).
[0023]
In this way, the numerical aperture in the illumination area formed in an arc shape is substantially uniform regardless of the illumination position, and in addition, the target member can be continuously supplied and the target member can be scattered. The amount of things can be reduced.
[0024]
A fifth means for solving the above problem is an illuminating device (Claim 5) in which the target member is a liquid or a gas in the first means or the second means.
[0025]
Here, “being liquid or gas” means liquid or gas at normal temperature and normal pressure, and when used as a target member, it may be solid or liquid, respectively.
[0026]
Thereby, in addition to the numerical aperture in the illumination area formed in an arc shape being substantially uniform regardless of the illumination position, the occurrence of scattered objects can be reduced.
[0027]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic configuration diagram illustrating an example of a lighting device according to an embodiment of the present invention. The illumination device includes at least an excitation energy light generator 1, a target member 2, and an illumination optical system 3. Excitation energy light 5 emitted from the excitation energy light generator 1 is irradiated to a plurality of different locations on the target member 2. Since X-rays are generated from the portion irradiated with the excitation energy light 5, X-rays 7 are generated from a plurality of locations on the target member 2. That is, the X-ray light source is composed of a plurality of minute light sources 6. X-rays 7 emitted from the light source 6 pass through the illumination optical system 3 and are then irradiated onto the mask 4 as X-rays 8.
[0028]
FIG. 2 is an enlarged view of the vicinity of the target member 2 in FIG. By arranging a plurality of light sources 6 (61 to 66) on a curved surface, the width of the light beam of the X-ray 7 (71 to 73) can be controlled. For example, the light beam 71 is composed of X-rays emitted from a light source 61 and a light source 64 and a light source including a light source 62 and a light source 63 existing between them (other than the light source 62 and the light source 63 are not shown), and the light beam 72 is a light source 62 and a light source. 65, and a light source 63 including a light source 63 and a light source including a light source 64 (other than the light source 63 and the light source 64 are not shown). It comprises X-rays emitted from a light source including the light source 65 (other than the light source 64 and the light source 65 are not shown).
[0029]
By doing so, the width p1 of the light beam 71 in the sagittal direction is determined by the distance between the light source 61 and the light source 64, and the width p2 of the light beam 72 in the sagittal direction is determined by the distance between the light source 62 and the light source 65. The width p3 is determined by the distance between the light source 63 and the light source 66. Therefore, by forming the light source on a desired curved surface, the width of the X-ray beam emitted toward the illumination optical system can be set to a desired width.
[0030]
This curved surface is preferably shaped such that the X-rays 8 irradiated onto the mask 4 illuminate the mask with a substantially uniform numerical aperture.
[0031]
In particular, when an optical system as shown in FIGS. 6 and 7 is used as the illumination optical system, the curved surface is preferably cylindrical. By doing in this way, the X-rays emitted from the light source all have the same luminous flux width, and the arc illumination area 140 can be illuminated with a uniform numerical aperture.
[0032]
Referring to FIG. 2, when the surface of the target member 2 is a cylindrical surface, and thus the light sources 61 to 66 are arranged on the cylindrical surface, the distance between the light source 61 and the light source 64, the distance between the light source 62 and the light source 65. Since the interval and the interval between the light source 63 and the light source 66 are equal to a circular diameter having a cylindrical cross section, the parallel light beam 71, the parallel light beam 72, and the parallel light beam 73 form a light beam having the same width. That is, the shape of the curved surface is such that the widths of the parallel light beams are equal (or substantially equal).
[0033]
Therefore, the X-rays collected in the arc illumination area BF in FIG. 11 are collected in a conical shape while always extending an equal angle with respect to the condensing point in any part, so that the numerical aperture in the illumination area is It becomes equal regardless of the illumination position.
[0034]
The target member on which the X-ray source is formed may be, for example, a solid member 21 having a curved surface shape as shown in FIG. The shape in which the plurality of light sources 6 are arranged can be determined by the surface shape of the target member 21. Since the target member 21 having a desired curved surface shape has only to be prepared, it is easy to control the curved surface shape on which the light sources 6 are arranged.
[0035]
When the X-ray source is used for a long time, it is preferable that a new member can be supplied because the target member is consumed. As shown in FIG. 4, the target member can be continuously supplied by providing the tape-like target member 22 so as to be movable along the curved surface. The tape-shaped target member 22 can easily create a desired curved surface shape, for example, by pressing or winding the substrate 23 having a desired surface shape.
[0036]
Further, as the target member, a particulate target member 24 may be used as shown in FIG. The particulate target member 24 may be supplied by a target member supply unit (for example, nozzle) 25 and the particulate target member 24 may be arranged in a desired curved surface. Since the position of the particulate target member 24 can be controlled by, for example, the nozzle position, the angle at which the particles are ejected from the nozzle, the ejection speed of the particles, etc., it is easy to arrange the X-ray source in a desired curved surface shape. . In the case of this method, there is an advantage that the target member can be continuously supplied and the amount of scattered matter from the target member can be kept low.
[0037]
In addition, when a pulse laser is used as the excitation energy light generator 1 and X-rays are generated in a pulsed manner, the supply of the particulate target member 24 from the nozzle 25 and the generation timing of the pulse laser light are synchronized, X-rays can be generated by irradiating the pulsed laser beam onto the particulate target member 24 supplied intermittently.
[0038]
The illumination optical system 3 preferably illuminates the mask 4 with X-rays having a uniform intensity and a uniform spread angle. In particular, the target member 2 is preferably arranged in the vicinity of the front focal position of the illumination optical system 3. At this time, the X-rays 7 emitted from the respective X-ray sources 6 pass through the illumination optical system 3, are then converted into parallel light or the like, and are irradiated onto the mask 4. Further, the X-rays 7 emitted from the respective light sources 6 are irradiated onto the mask 4 at different angles. Therefore, the mask 4 is illuminated in a manner similar to Koehler illumination or Koehler illumination.
[0039]
The illumination optical system 3 is preferably composed of a reflecting mirror, and a multilayer film for increasing the reflectance is preferably provided on the reflecting mirror surface.
[0040]
As already described, the excitation energy light 5 is irradiated to a plurality of locations of the target member 2 and X-rays 7 are generated from each location. At this time, the irradiation with the excitation energy light 5 may be performed on all the portions simultaneously or separately or sequentially.
[0041]
The location of irradiation may be considered based on specifications required for the illumination optical system (for example, the intensity and spread angle of X-rays that illuminate the mask, and uniformity thereof).
[0042]
When the mask is illuminated in a lump like a conventional exposure apparatus, the micro light sources may be arranged two-dimensionally. Further, in the case of a soft X-ray exposure apparatus, exposure may be performed by scanning a ring-shaped or band-shaped field of view due to design limitations of the imaging optical system. In this case, as described in JP-A-7-235470, critical-Kohler illumination is preferably performed, and minute light sources may be arranged one-dimensionally. That is, the target members 2 may be arranged one-dimensionally or the target members 2 arranged in a planar shape may be irradiated with one-dimensional (linear) excitation energy light.
[0043]
As an excitation energy light generation unit for irradiating excitation energy light to a plurality of locations on the target member 2, an excitation energy light generation source capable of changing the excitation energy light waveguide path, the excitation energy light is converted into a plurality of target energy lights. It is preferable to use an excitation energy light generation unit having an excitation energy light generation source that can be divided or a plurality of excitation energy light generation sources.
[0044]
When changing the waveguide path of the excitation energy light by moving the optical element, for example, the optical element may be vibrated.
[0045]
When splitting the excitation energy light into a plurality of excitation energy lights, for example, a laser optical element such as a beam splitter may be used. Moreover, what is necessary is just to use optical elements, such as a micro lens array, as another example which divides | segments a laser beam into several laser beams.
[0046]
The intensity of X-rays emitted from a minute light source is mainly determined by the intensity of laser light. Therefore, the intensity of the micro light source can be freely adjusted by controlling the intensity of each laser beam.
[0047]
When a plurality of laser light sources are used, the intensity of the laser light can be increased because each laser light is supplied by a separate laser light source. Therefore, the X-ray intensity generated from the micro light source can be increased. In other words, this method may be adopted to increase the throughput of the soft X-ray reduction exposure apparatus.
[0048]
Although the laser beam generation source has been described above, these are representative examples, and the optical arrangement and the like are not limited to those already shown. When changing the laser light waveguide path or dividing the laser light, an optical element may be required, but this does not reduce the intensity of the laser light. This is because, in general, the reflectance and transmittance of laser light of a laser optical element are almost 100%. Accordingly, high-intensity X-rays are emitted from each X-ray source 6.
[0049]
The material of the target member 2 varies depending on the X-rays to be generated, and it is preferable to use a material having high X-ray generation efficiency. For example, tin, antimony, lead, tungsten, tantalum, gold and the like are preferable for generating X-rays with a wavelength of 13 nm.
[0050]
Alternatively, a material having a low melting point or a material that is liquid or gas at normal temperature may be used. These may be solidified by cooling or the like, or may be condensed, or may be used as a liquid or gas. In this case, since generation | occurrence | production of a scattered material (debris) can be suppressed low, it is preferable.
[0051]
When irradiating the target member 2 with the excitation energy light 5 to generate soft X-rays, it is preferable to use a laser plasma X-ray source. This uses laser light as excitation energy light, and can generate high-intensity soft X-rays.
[0052]
Further, the laser beam is preferably a high intensity laser, and each laser beam such as a YAG laser, excimer laser, glass laser, titanium sapphire laser is preferable for obtaining each X-ray source with high intensity.
[0053]
Moreover, the excitation energy light irradiated to a target is not restricted to a laser beam. Any material that can generate soft X-rays such as an electron beam may be used. A soft X-ray optical system is often placed in a vacuum because X-ray absorption by air or the like is large. Therefore, it is easy to use an electron beam for the irradiation device.
[0054]
The illumination device according to the present invention is excellent in that it can form a light source corresponding to a secondary light source of a conventional illumination device without using an X-ray integrator and can control the width of a light beam emitted from the light source.
[0055]
Since the loss of intensity of the laser beam due to the optical system is extremely small, it is possible to obtain a high-intensity X-ray light source. Further, according to the apparatus of the present invention, each illumination point on the mask can be obtained with a desired numerical aperture. Can be illuminated. Therefore, by using the illumination apparatus according to the present invention, it is possible to provide a soft X-ray exposure apparatus capable of supplying uniform illumination light with high intensity and capable of exposing a large area with high throughput.
[0056]
EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, this invention is not limited to these Examples.
[0057]
【Example】
<First Example>
1 and 2 are a schematic configuration diagram of an illuminating device of the present embodiment and an enlarged view of the vicinity of the light source.
The illumination device includes an excitation energy light generation unit 1, a target member 2, and an illumination optical system 3 as main components.
A plurality of excitation energy lights 5 are emitted from the excitation energy light generation unit 1 and irradiated to a plurality of different locations on the target member 2. A YAG laser beam was used as the excitation energy beam 5 and was split into a plurality of laser beams by a beam splitter (not shown).
[0058]
The target member 2 was formed into a cylindrical shape, and tin was used as the material. X-rays having a wavelength of at least 13 nm are generated from the portion irradiated with the excitation energy light 5, and X-rays 7 are generated from a plurality of locations on the target member 2. In this way, a plurality of minute light sources 6 arranged on the cylindrical surface were configured.
[0059]
X-rays 7 emitted from the X-ray light source are irradiated to the mask 4 as X-rays 8 through the illumination optical system 3. The illumination optical system 3 is composed of a reflecting mirror having a Mo / Si multilayer film on the surface, and reflects X-rays having a wavelength of around 13 nm.
[0060]
With this X-ray, a part of the mask 4 was irradiated in a circular arc shape over a region having a length of 120 mm and a width of 5 mm. At this time, the mask 4 is Koehler illuminated by arranging the target member 2 in the vicinity of the front focal position of the illumination optical system 3.
[0061]
As a result, the entire arcuate illumination area on the mask 4 could be illuminated with a uniform numerical aperture. Further, when the resist was exposed by the exposure apparatus provided with the illumination device according to the present invention, a resist pattern having a desired shape could be obtained over the entire exposed area. On the other hand, in an exposure apparatus provided with a conventional illumination device, a resist pattern having a desired shape cannot be obtained in a part of the exposure region.
[0062]
<Second Example>
1 and 2 are a schematic configuration diagram of an illuminating device of the present embodiment and an enlarged view of the vicinity of the light source.
The illuminating device includes an excitation energy light generation unit 1, a target member 2, and an illumination optical system 3 as main components.
A plurality of excitation energy lights 5 are emitted from the excitation energy light generation unit 1 and irradiated to a plurality of different locations on the target member 2. A YAG laser beam was used as the excitation energy beam 5 and was split into a plurality of laser beams by a beam splitter (not shown).
[0063]
The target member was a tape-like thin plate as shown in 22 of FIG. 4, and the material was tungsten. The tape-like target member 22 is wound around a cylindrical substrate 23 so that the surface shape forms a part of the cylindrical shape. Further, the tape-like target member 22 can be continuously supplied by shifting the position in the longitudinal direction. X-rays having a wavelength of at least 13 nm are generated from the portion irradiated with the excitation energy light 5, and X-rays 7 are generated from a plurality of locations on the tape-like target member 22. In this way, a plurality of minute light sources 6 arranged on the cylindrical surface were configured.
[0064]
X-rays 7 emitted from the X-ray light source are irradiated to the mask 4 as X-rays 8 through the illumination optical system 3. The illumination optical system 3 is composed of a reflecting mirror having a Mo / Si multilayer film on the surface, and reflects X-rays having a wavelength of around 13 nm.
[0065]
With this X-ray, a part of the mask 4 was irradiated in a circular arc shape over a region having a length of 120 mm and a width of 5 mm. At this time, the mask 4 is Koehler illuminated by arranging the tape-like target member 22 in the vicinity of the front focal position of the illumination optical system 3.
[0066]
As a result, the entire arcuate illumination area on the mask 4 could be illuminated with a uniform numerical aperture. Further, when the resist was exposed by the exposure apparatus provided with the illumination device according to the present invention, a resist pattern having a desired shape could be obtained over the entire exposed area. On the other hand, in an exposure apparatus provided with a conventional illumination device, a resist pattern having a desired shape cannot be obtained in a part of the exposure region.
[0067]
<Third embodiment>
1 and 2 are a schematic configuration diagram of an illuminating device of the present embodiment and an enlarged view of the vicinity of the light source.
The illuminating device includes an excitation energy light generation unit 1, a target member 2, and an illumination optical system 3 as main components.
A plurality of excitation energy lights 5 are emitted from the excitation energy light generation unit 1 and irradiated to a plurality of different locations on the target member 2. A YAG laser beam was used as the excitation energy beam 5 and was split into a plurality of laser beams by a beam splitter (not shown).
[0068]
The target member was ice particles having a diameter of about 100 μm, as indicated by 24 in FIG. The particulate target member 24 is supplied from a nozzle 25 so that a cylindrical surface is formed by a plurality of ice particles. When the particles are irradiated with excitation energy light 5, X-rays having a wavelength of at least 13 nm are generated, and X-rays 7 are generated from a plurality of locations on the particulate target member 24. In this way, a plurality of minute light sources 6 arranged on the cylindrical surface were configured.
[0069]
X-rays 7 emitted from the X-ray light source are irradiated to the mask 4 as X-rays 8 through the illumination optical system 3. The illumination optical system 3 is composed of a reflecting mirror having a Mo / Si multilayer film on the surface, and reflects X-rays having a wavelength of around 13 nm.
[0070]
With this X-ray, a part of the mask 4 was irradiated in a circular arc shape over a region having a length of 120 mm and a width of 5 mm. At this time, the mask 4 is Koehler illuminated by arranging the target member 2 in the vicinity of the front focal position of the illumination optical system 3.
[0071]
As a result, the entire arcuate illumination area on the mask 4 could be illuminated with a uniform numerical aperture. Further, when the resist was exposed by the exposure apparatus provided with the illumination device according to the present invention, a resist pattern having a desired shape could be obtained over the entire exposed area. On the other hand, in an exposure apparatus provided with a conventional illumination device, a resist pattern having a desired shape cannot be obtained in a part of the exposure region.
[0072]
The above embodiments are examples of the present invention and do not limit the present invention. In the present embodiment, ice particles are used for the target member. However, the present invention is not limited to this, and a gas generated from a nozzle and a cluster generated by adiabatic expansion may be used as the target member. It goes without saying that the number and arrangement of the micro light sources are not limited to those shown in this embodiment, and light sources arranged in a one-dimensional manner can be easily created and used in the present invention. Thus, the present invention is also applicable to critical-Kohler illumination.
[0073]
【The invention's effect】
As described above, according to the present invention, at least a plurality of excitation energy light generators that generate excitation energy light and irradiate a plurality of locations on the target member, and a plurality of portions by receiving irradiation of the excitation energy light at a plurality of locations. In an illuminating apparatus comprising a target member on which an X-ray source is formed and an illumination optical system that irradiates an object to be illuminated with X-rays from the plurality of X-ray sources, the plurality of X-ray sources are on a curved surface Since they are arranged, the irradiated surface can be Koehler illuminated with high illumination efficiency and uniform numerical aperture. That is, the irradiated surface can be illuminated with X-rays having uniform intensity and uniform spread.
[0074]
Further, the illumination device of the present invention can form a light source corresponding to a secondary light source of a conventional illumination device without using an X-ray integrator, so that the X-ray transmission rate is higher than that of the conventional illumination device. (Use efficiency) is high, and further, the production thereof is easy. As a result, the mask pattern can be faithfully transferred onto the substrate with high throughput.
[Brief description of the drawings]
FIG. 1 is a schematic view of a lighting device as an example of an embodiment of the present invention.
2 is an enlarged view showing a structure in the vicinity of a light source of the illumination device shown in FIG. 1. FIG.
FIG. 3 is a schematic view showing an example of a target member used in the illumination device according to the present invention.
FIG. 4 is a schematic view showing another example of a target member used in the illumination device according to the present invention.
FIG. 5 is a schematic view showing a third example of a target member used in the illumination device according to the present invention.
FIG. 6 is a schematic view showing an example of an optical system of an illumination apparatus according to an embodiment of the present invention, and is a cross-sectional view in the meridional direction of a light source, a special reflecting mirror, and an irradiated surface.
FIG. 7 is a schematic view showing an example of an optical system of an illumination apparatus according to an embodiment of the present invention, and is a perspective view of a light source, a special reflecting mirror, and an irradiated surface.
FIG. 8 is a schematic view of a conventional lighting device.
FIG. 9 is a diagram showing a part of a conventional illumination device, and is a partial cross-sectional view in the sagittal direction of an X-ray directed from a light source and a light source toward an illumination optical system.
FIGS. 10A and 10B are diagrams showing a cross section of a parallel light beam in a conventional illumination device, in which FIG. 10A is a cross sectional view of a parallel light beam emitted from a light source at an emission angle of 0 degrees, and FIG. It is sectional drawing of the parallel light beam inject | emitted by.
FIG. 11 is an explanatory diagram showing a state of a light beam condensed on a surface to be illuminated in a conventional illumination device.
[Explanation of symbols]
1. . . Excitation energy light generator (excitation energy light irradiation device)
2. . . Target member
21. . . Target member with a curved surface
22. . . Tape-like target member
23. . . Target material substrate
24. . . Particulate target member
25. . . Target member supply unit (for example, nozzle)
3. . . Illumination optics
4). . . Object to be irradiated (eg mask)
5). . . Excitation energy light (for example, laser light)
6, 61, 62, 63, 64, 65, 66. . . Minute light source (secondary light source, each X-ray source)
7,8. . . X-ray
71, 72, 73. . . X-ray (parallel light flux)
101. . . Excitation energy light generator
102. . . Excitation energy light
103. . . Target member
104. . . Illumination optics
105. . . Object to be irradiated
110. . . X-ray source (light source)
120, 123. . . X-ray
121, 122. . . X-ray (parallel light flux)
124, 125. . . X-ray (condensed light flux)
130. . . Special reflector
140. . . Arc area on mask

Claims (5)

at least,
An excitation energy light generating unit that generates a plurality of excitation energy lights and irradiates a plurality of locations on the target member;
A target member in which a plurality of X-ray sources are formed by receiving irradiation of the plurality of excitation energy lights at a plurality of locations;
In an illumination device including an illumination optical system that irradiates an object to be illuminated with X-rays from the plurality of X-ray sources,
It said plurality of X-ray sources are arranged on a curved surface,
An illumination device , wherein the shape of the curved surface and the arrangement of the X-ray sources are set such that the numerical aperture on the object to be illuminated is equal regardless of the illumination position . The lighting device according to claim 1, wherein the curved surface is a cylindrical surface.   The lighting device according to claim 1, wherein the target member has a tape shape and is provided along the curved surface.   The lighting device according to claim 1, wherein the target member has a particulate form, and a plurality of target members form the curved surface.   The lighting device according to claim 1, wherein the target member is a liquid or a gas.

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