JP2004505421A - X-ray or EUV radiation generation method and apparatus - Google Patents

Abstract

In a method and an apparatus for generating X-ray or EUV radiation, an electron beam is brought to interact with a propagating target jet, typically in a vacuum chamber. The target jet is formed by urging a liquid substance under pressure through an outlet opening. Hard X-ray radiation may be generated by converting the electron-beam energy to Bremsstrahlung and characteristic line emission, essentially without heating the jet to a plasma-forming temperature. Soft X-ray or EUV radiation may be generated by the electron beam heating the jet to a plasma-forming temperature.

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention generally relates to a method and apparatus for generating X-ray or extreme ultraviolet (hereinafter referred to as EUV-extreme ultra-violet) radiation, and more particularly to a method and apparatus having high brightness. The generated radiation can be used, for example, in medical diagnostics, non-destructive inspection, lithography (patterning technology), microscopy, material science, or other X-ray or extreme ultraviolet applications.
[0002]
[Prior art]
High-power and high-intensity X-ray sources are applied in many fields such as medical diagnosis, non-destructive inspection, crystal structure analysis, surface physics, lithography, X-ray fluorescence and microscopy.
[0003]
In some applications, X-rays are used to image the interior of objects that do not pass visible light, for example in medical diagnostics and material inspection, where 10-1000 keV X-ray radiation, i.e. Hard X-ray radiation has been put into practical use. Conventional hard x-ray sources in which the electron beam is accelerated relative to the solid anode (anode) generate relatively low brightness x-ray radiation. In imaging with hard X-rays, the resolution of the obtained image depends on the distance to the X-ray source and the size of the source. The exposure time depends on the distance to the radiation source and the output of the radiation source. Actually, this exposure time is exchanged between the resolution and the exposure time for imaging with X-rays. This attempt has always been to extract the largest possible X-ray output from the smallest possible source, i.e. to achieve high brightness. In conventional solid target sources, X-rays are emitted as a series of both Bremsstrahlung and characteristic linear radiation, where the specific radiation characteristics depend on the material used for the target. ing. The energy that is not converted to X-ray irradiation is stored primarily as heat in the solid target. The main element of X-ray irradiation emitted from conventional X-ray tubes that limits output and brightness is to heat the anode (anode). More specifically, the output of the electron beam should be limited to a range such that the anode material does not melt. Several different methods (schemes) have been introduced to increase output limits. One such scheme involves cooling and rotating the anode, for example, by E. Krestel from Siemens Actienguesselshaft in Berlin and Munich in 1990. See Chapters 3 and 7 of “Medical Imaging System”, authored by. Although the cooled and rotating anode can maintain a higher electron beam power, its brightness is still limited by locally heating the focus of the electron beam. Since the same target material is used for each rotation, the average output load is also limited. Specifically, a very high intensity radiation source for medical diagnosis is 100 kW / mm ² In the current state of the art, the low-power microfocus device operates at 150 kW / mm ² Works with.
[0004]
Implementations in the region of soft X-ray and EUV wavelengths (from tens of eV to several keV) include, for example, next generation lithography and X-ray microscope systems. Ever since the 1960s, the size of the structures that form the basis of integrated electronic circuits has been continually shrinking. Its advantages are faster and more complex circuits that require less power. At present, photographic exposure apparatuses are used for industrial production of such circuits having a line width of approximately 0.13 μm. It can be expected that this technique should be applied by reducing it to approximately 0.1 to 0.07 μm. Other methods will probably be needed to further reduce linewidths, and EUV irradiation lithography will be a strong candidate for that method. For example, in 1999, International Sematech, Austin TX See International Technology Roadmap for The use of EUV irradiation lithography is achieved by reducing the number of EUV target systems in the wavelength region around 10 to 20 nm.
[0005]
In the soft x-ray and EUV regions, the conventional efficiency for soft x-ray radiation from the electron beam energy at the solid target is generally too low compared to the conventional generation of hard x-ray radiation described above. So different methods for the generation of radiation are usually used. D. T. T. et al. As disclosed in Chapter 6 of Atward, Cambridge University Press, 1999, "Soft X-rays and Ultra-UV radiation: Principles and applications" (approximately 10 ¹⁰ -10 ²³ W / cm ² In order to generate a hot and dense plasma, such as using extremely intense laser radiation, conventional techniques have been substituted for the generation of soft x-ray and EUV radiation based on heating the target material. Has been done. These so-called plasma generated lasers (LPPs) emit both continuous and characteristic radiation, and the specific radiation characteristics depend on the target material and the temperature of the plasma. Traditional LPPX sources that use solid target materials are limited in terms of repetition rate and uninterrupted use, because the transport of the target material is a limiting factor, and due to unwanted release of decay deposits. Be disturbed. This is the case with gas jets (eg, US Pat. No. 5,577,092 and 1996, Optics and Optical Communications, Vol. 4, p. 66, OSA Trends publication, paper by Kubiak et al. EUV source released from sediment ") and liquid jets (eg, US Pat. No. 6,002,744 and 1996, Review of Scientific Instruments, Vol. 67, No. 4150). Leading to the development of renewable and collapsible deposits, including a paper by Malmukvist et al. (See "Liquid jet for soft x-ray generated laser plasma"). These targets were frequently used with LPP soft x-ray and EUV radiation sources. However, the applicability of LPP sources is limited by the relatively low conversion efficiency of electrical energy into laser light, which also limits the conversion efficiency of laser light into X-ray radiation, An inevitable result involved the use of expensive high power lasers.
[0006]
Most recently, the excitation of an electron beam in a gas jet target has been tested for the direct generation of soft x-ray radiation without the use of heat, even if the resulting radiation is relatively low power. See Ter Abbatsian et al., 2000, SPIE Proceedings No. 4060, pages 204-208.
[0007]
Larger installations such as synchrotron light sources have also been proposed, which produce X-ray radiation with high average power and brightness. However, there are many applications that require small, small-scale systems that produce x-ray radiation with relatively high average power and brightness. Smaller and less expensive systems provide better usability for the applied user, and are therefore potentially of greater value to science and society.
[0008]
Summary of the Invention
An object of the present invention is to solve or reduce the above-described problems. More particularly, the present invention aims to provide a method and apparatus for generating X-ray or EUV radiation with very high brightness combined with a relatively high average output.
[0009]
It is a further object of the present invention to provide a small and relatively inexpensive apparatus for producing X-ray or EUV radiation.
[0010]
Inventive technology should also provide for stable and simple generation of X-ray or EUV radiation, with minimal generation of decay deposits.
[0011]
It is a further object of the present invention to provide a method and apparatus for generating stable radiation for medical diagnosis and material inspection.
[0012]
Still other objects of the present invention include lithography (exposure apparatus), destructive inspection, electron microscope, crystal analysis, surface physics, material science, X-ray photospectroscopy, protein structure determination by X-ray diffraction, and other It is an object of the present invention to provide a method and apparatus for stabilizing the use in X-ray applications.
[0013]
The above and other objects, which will become apparent from the following detailed description, are achieved in whole or in part by methods and apparatus according to the independent claims of the appended claims. The dependent claims define preferred embodiments.
[0014]
Accordingly, the present invention is a method for generating X-ray or EUV radiation that enhances through a region of interaction by ejecting a liquid substance under pressure through an opening in an ejection opening. Forming a jet; directing at least one electron beam relative to the target jet in the region of interaction and the electron beam interacting with the target jet to produce X-rays or EUV radiation A method comprising the steps of:
[0015]
Depending on the material of the target jet, the temperature, velocity and diameter of the jet as well as the current, voltage and focus size of the electron beam, the inventive method and apparatus has two modes. Either operation is allowed. In the first mode of operation, hard X-ray radiation converts the energy of the electron beam directly to Bremströng and characteristic linear irradiation, essentially without heating the jet to the plasma formation temperature. It is generated by. In the second mode of operation, soft x-ray or EUV radiation is generated by heating the jet to the plasma formation temperature. In any mode of operation, the present invention provides a significant improvement over the prior art level.
[0016]
In the first mode of operation, the target jet offers several advantages over the solid anode (anode) conventionally used in the generation of hard x-ray radiation. More particularly, the liquid jet has a sufficiently high density to allow high brightness and output of the generated radiation. In addition, the jet can be regenerated to its nature, so there is no need to cool the target material. In practice, the target material can be destroyed, in other words, due to the reproducible nature of the target jet, it can be heated to a temperature above its melting temperature. Therefore, the power density of the electron beam at the target may increase significantly compared to a target with no reproducibility. In addition, this jet can be given a very fast propagation velocity through the region of interaction. Because of the corresponding high speed of the material moving into the area of interaction compared to a conventional stationary or rotating anode, more energy can be expended in the propagation of jets at such high speeds. is there. The combination of these features allows a significant improvement in the brightness of the generated hard X-ray radiation. Therefore, the use of a high-speed target that can be reproduced in a small, high-density manner in the form of a jet formed by discharging a liquid material under pressure through the opening of the discharge port is specifically a conventional technique. Compared to the above, a 100-fold improvement in the brightness of the generated hard X-ray radiation should be allowed.
[0017]
Thus, in order to achieve the power density allowed by the new and reproducible target, the electron beam should preferably be properly focused (focused) on the target. Specifically, the acceleration voltage used for generating the electron beam will be in the order of 5 to 500 kV, but may be higher. The beam current will specifically be in the range of the order of 10 to 1000 mA, but may be higher.
[0018]
A second mode of operation has arisen from basic insights that can be used in place of a laser beam to form soft x-ray or EUV radiation that is irradiated with plasma by at least one electron beam. Compared to the conventional device based on the LPP concept described above, the method and device according to the present invention has a wall-plug wall-plug as well as lower cost and configuration complexity. Giving a noticeable increase in conversion efficiency. Other attractive features include reducing collapse sediment emissions, essentially without being limited by repetition rates or uninterrupted use.
[0019]
In the second mode of operation, the source of electrons is specifically 10 to establish the desired plasma temperature. ¹⁰ -10 ¹³ W / cm ² Should be fed into the area of interaction on the order of This can be easily achieved by controlling the electron source for generating the pulsed electron beam, where the pulse wavelength is preferably matched to the jet size. Thus, the repetition rate of the electron source determines the average output of the generated X-ray or EUV radiation. When using a pulsed beam, the jet may be dispersed by the discontinuous interaction associated with the electron beam. For this reason, the jet propagation speed should preferably be fast enough to allow the jet to stabilize between each pulse of the electron beam.
[0020]
It should be noted that the electron beam can be continuous and pulsed in the first and second modes.
[0021]
In any mode of operation, the beam is focused on the jet so that the beam size is essentially matched to the jet size for optimal utilization of the accessible electron beam power. Is desirable. In this connection, it is possible to use a line focus instead of a point focus, and the lateral dimension of this line focus matches the lateral dimension of the jet. The jet is preferably formed with a diameter of about 1 to 100 μm, but may be as large as a millimeter. This radiation will therefore be illuminated with high brightness from a narrow region of interaction. In order to make the generated radiation better practical, the apparatus and method according to the invention are essentially combined with X-ray optics such as, for example, a number of capillary lenses, a compound refractive lens, and an X-ray mirror. May be used.
[0022]
Preferably, the target jet is pumped and / or pressurized to generate a pressure in the specific range of 0.5-500 MPa to carry at a jet propagation speed of approximately 10-1000 m / s from the opening of the outlet. For example, the liquid substance is generated by blowing the liquid substance through the opening of the discharge port such as a nozzle or an orifice by a specific means of the reservoir. This substance is not limited to a normal liquid substance, and may be a solid substance that is heated to become liquid before being blown out through the opening of the discharge port, or the opening of the discharge port. It may be a gaseous substance that is cooled to be liquid before being blown out through the section. Alternatively, the substance can include a material dissolved in the liquid of the carrier for transportation. It is also conceivable that a gaseous substance is blown out through the opening of the discharge port, and this gaseous substance can form a liquid jet after being blown out through the opening of the discharge port. Provided as possible. After this formation, the jet may achieve different hydrodynamic conditions. Slow jets are usually laminar and dispersed into a large number of droplets under the influence of surface tension, while high speed jets become more or less turbulent and before they turn into a spray There is no spatial break in the transition region. Any type of hydrodynamic state of this jet may be used as a recognized art. In other creatable embodiments, the jet is allowed to freeze into a solid state before interacting with the electron beam.
[0023]
Further, depending on the type of material, the jet may or may not be electrically conductive. This is closely related to the transport of charge attached to the jet in the region of interaction. If the jet is electrically conductive, charge can be removed from the jet itself so that the jet remains substantially at ground potential. On the other hand, if the jet is non-conductive, the attached charge is removed from the area of interaction by the movement of the jet itself. Any increase in charge in the area of interaction will affect the focusing of the electron beam. For non-conductive jets, a high jet propagation velocity is advantageous to minimize charge buildup.
[0024]
The gas atmosphere may vary within the apparatus according to the invention. The required spread of the gas atmosphere within the device depends on both the desired wavelength of the generated radiation and the type of source of electrons. Specifically, the necessity for the electron generation source is higher than the necessity for the vacuum environment in the mutual region. In order to maintain different pressures at different parts of the device, localized gas pressures and differentiated pumping methods can be used.
[0025]
DETAILED DESCRIPTION OF THE INVENTION
Preferred embodiments will be described below with reference to the accompanying drawings for the purpose of illustrating the present invention.
[0026]
The apparatus shown in FIG. 1 includes a chamber 1, an electron generation source 2, and a target generation unit 3. The electron generation source 2 is provided in order to focus the beam 4 on the target 5 by irradiating the chamber 1 with a pulsed or continuous electron beam 4, and the target 5 is a target generator 3. Is generated by Although not shown in FIG. 1, more than one electron beam 4 may be generated and these beams 4 are focused on the target 5 from one or more directions. The electron source 2 cooperating with an accelerating and focusing element (not shown) can be of conventional construction and is powered by a voltage power source 6. Depending on the desired properties of the electron beam 4, the electron source 2 can be anything from a simple cathode source to a complex high-energy source such as a racetrack (ellipse). It may be.
[0027]
As described further below, X-ray or EUV radiation (indicated by arrows in the figure) is generated by a beam 4 that interacts with a target 5 inside the chamber 1. Usually, a vacuum environment is provided in the chamber 1 based on a request from the electron source 2. Furthermore, the high absorption of soft X-rays and EUV radiation into the material often results in a high vacuum environment.
[0028]
In order to generate a target that is so fine and spatially stable as to be visible with a microscope in a vacuum environment, the target generator 3 is provided to generate a spatially continuous jet 5 from a liquid state substance. ing. The target generation unit 3 shown in FIG. 1 is connected to a liquid discharge port of a reservoir 7, specifically a nozzle opening such as a nozzle opening, and has a discharge port opening 8 for forming a jet that opens into the chamber 1. And. The reservoir 7 holds the substance from which the jet 5 is to be formed. Depending on the type of substance, the reservoir 7 is usually at a high pressure of 0.5 to 500 MPa, specifically by supplying a high pressure gas to the gas inlet 7 ′ of the reservoir 7, thereby opening the outlet opening 8. It is also possible to provide a cooling or heating element (not shown) in order to maintain the liquid state of the substance while it is being blown through. Specifically, the diameter of the discharge opening 8 is smaller than about 100 μm. The resulting jet 5, which is stable and microscopic and has substantially the same diameter as the outlet opening 8, spreads in the chamber 1 at a speed of about 10-1000 m / s. Although not shown in the drawing, the jet 5 can extend to a collapse point that spontaneously collapses to a water droplet or spray state depending on the control parameters of the target generator 3. The distance to this collapse point is essentially determined by the hydrodynamic properties of the liquid substance, the dimensions of the outlet 8 and the speed of the liquid substance.
[0029]
When the liquid substance leaves the outlet opening 8, the substance is cooled by evaporation. Therefore, it is also conceivable that the jet 5 is not frozen to form water droplets or sprays.
[0030]
As shown in the drawing, the electron beam 4 is jetted before the jet 5 collapses into water droplets spontaneously or by stimulation, ie while it is still a small parallel jet. Collide with. Accordingly, the region 9 of interaction between the beam 4 and the jet 5 is arranged in a spatially continuous part of the jet 5, ie a part having a length significantly exceeding the diameter. Thus, the apparatus can be controlled continuously or semi-continuously to produce X-ray or EUV radiation, as described below. Furthermore, such a solution results in a sufficient spatial stability of the jet 5 as a result to allow a focal spot of the electron beam 4 on the jet 5 which should be approximately as large as the diameter of the jet 5. Bringing sex. In the case of a pulsed electron beam 4, this solution also alleviates the need for some temporary synchronization between the electron source 2 and the target generator 3. In some cases, similar advantages can be obtained with a jet composed of separated spatially continuous portions. However, any formation of the liquefied material generated from the liquid jet is within the scope of this invention, whether it is a liquid or solid, a water droplet, or a spray or combination of water droplets. It should be particularly important to be able to be used as a target for an electron beam that is continuously continuous.
[0031]
By appropriately diverting the characteristics of the electron beam 4 in relation to the characteristics of the target 5, the interaction of the beam 4 with the jet 5 is such that the radiation in the first mode of operation is essentially the jet 5. This results in irradiation from the range of interaction 9 by direct conversion without heating to the plasma formation temperature. In the second mode of operation, these characteristics are applied so that the jet 5 is heated to the appropriate plasma formation temperature. The choice of mode depends on the desired wavelength range of the generated radiation. Plasma-based operation is most effective for generating soft x-ray and EUV radiation, i.e., essentially as non-plasma in the range of tens to several keV, whereas Direct conversion is more effective for the generation of hard X-rays, specifically in the range of about 10 keV to about 1000 keV.
[0032]
Hereinafter, the operation of the apparatus in the first and second modes will be described in general terms. Examples of imaginable implementations are also presented, but the disclosure of this specification is not limited to these examples.
[0033]
In the first mode of operation, which is mainly aimed at producing hard X-rays that are to be used in medical diagnostics in particular, the electron source 2 is associated with the nature of the target 5 in the region of interaction 9. It is controlled so that essentially no plasma is formed. Thereby, hard X-ray radiation is obtained via Blemströng and characteristic radiation. Specifically, the distance from the opening 8 of the discharge port to the interaction region 9 is preferably sufficiently long, specifically 0.5 to 10 mm, so that the beam-jet interaction does not impact the discharge port. In one imaginable embodiment, a jet 5 having a diameter of about 30 μm and a propagation velocity of about 600 m / s is used, which is opened at the outlet by an electron beam 4 of about 100 mA and 100 keV. Being emitted about 10 mm away from the part 8, the beam 4 is about 10 MW / mm within the interaction region 9. ² In order to obtain a power density of This power density is roughly a factor of 100, better than the conventional solid target system, as mentioned at the beginning of the specification. According to the present invention, a high-resolution image can be obtained with a low exposure time. In this first mode of operation, the jet 5 is preferably formed from a metal that has been heated to a liquid state. In this regard, other metals and alloys have been used to produce radiation within the desired wavelength range, but tin (Sn) is easy to use. Furthermore, it is also conceivable to use completely different substances to produce the jet 5, for example a material cooled to a liquid state or a material melted in a liquid for a carrier. . The device operating in the first mode may comprise a window (not shown) that transmits X-rays to extract radiation generated from the chamber 1 to the outside where a patient or other object can be imaged. good. By using a microscopic liquid jet 5 as a target, the magnitude of the X-ray radiation is generated from a very small range of the interaction region 9, resulting in high brightness.
[0034]
In a second mode of operation, which is mainly aimed at producing soft X-rays and / or EUV radiation to be used in particular in EUV projection lithography apparatus, the electron source 2 is related to the properties of the target 5, It is controlled so that a plasma at an appropriate temperature is formed in the interaction region 9. Thereby, soft X-rays and / or EUV radiation is obtained via continuous characteristic radiation. Preferably, the pulsed electron beam 4 irradiates the jet 5 so that the electron source 2 is controlled to form a plasma by each electron beam pulse. Since the distance from the opening 8 of the discharge port to the point of the interaction region 9 is preferably sufficiently long, specifically 0.5 to 10 mm, the generated plasma does not impact the discharge port. In one imaginable embodiment, a liquid noble (noble) gas jet 5 having a diameter of about 30 μm and a propagation velocity of about 50 m / s is used, and this jet 5 has a pulse length of about 5 ns. It is emitted about 10 mm away from the outlet opening 8 by a 1 MeV pulsed electron beam 4 at about 10 A controlled at a repetition rate of about 50 kHz, and the beam 4 is pulsed in the interaction region 9. About 10 per hit ¹² W / cm ² Is focused on the jet 5 in order to obtain a power density of 2.5 kW and an average electron beam power of 2.5 kW. Such a system will generally provide the EUV output required for the next generation EUV projection lithography system.
[0035]
In the second mode of operation, the particular nature of the electron beam 4 is not fatal as long as its average power is sufficiently high, and the power of the pulse and the time of the pulse are not suitable for proper plasma formation in the interaction region 9. Match the target to get the temperature. In the second mode of operation, the jet 5 is preferably formed from a liquid state cooled from a noble gas to avoid coating sensitive components in the apparatus. For example, it is known from laser plasma studies that liquefied xenon results in strong X-ray radiation in the wavelength range of 10-15 nm (eg, Hanson published in SPIE 3997, 2000). (See the document "Xenon liquid jet laser plasma source for EUV lithography" by others). In addition to the liquefied noble gas, it is also conceivable to use completely different substances for producing jets, such as transport carrier liquids or materials melted in liquefied metal.
[0036]
An apparatus operating in a second mode designed to be used in a lithography apparatus or microscope collects most of the generated EUV or soft x-ray radiation and collects it in the illumination optics and lithography / electron microscope system. A condensing system for a multilayer mirror (not shown) that transports to the rest may be included. By using an electron microscopic fine target in the form of a jet 5 generated from a liquid material, the formation of sedimentary collapse will be very low. The device according to the invention operating in the second mode offers the same performance as an LPP system, but has the ability to be offered at a low price since many kilowatt lasers are very complex and expensive. Yes. Furthermore, it is an electron source higher than the wall plug (outlet) conversion effect laser.
[0037]
When the electron source 2 is operated for generating X-rays in the first mode and / or irradiates pulsed electron radiation, most of the liquid material remains unaffected by the electron beam 4. It should also be noted that this condition is maintained and spreads uninterrupted through the chamber 1. This results in an increase in the pressure in the vacuum chamber 1 due to evaporation. This problem can be solved, for example, by using different pumping methods, as shown in FIG. 1, where the jet 5 is collected at a small aperture (opening) 10 and the collected material is compressed to compress the reservoir 7 Recycled in the reservoir 7 by means of the pump 11 for feedback to
[0038]
The method and apparatus according to the present invention provides medical diagnostics, non-destructive inspection, pattern transfer (lithography), crystal analysis, microscopic inspection, materials science, microscopic surface physics, protein structure determination by X-ray diffraction, X-ray photography It should be realized that it can be used to provide radiation for spectroscopy (XPS), X-ray fluorescence, or other X-ray or EUV applications.
[Brief description of the drawings]
FIG. 1 is a schematic configuration diagram of an X-ray or EUV radiation generation apparatus based on an interaction between an electron beam and a liquid jet according to a presently preferred embodiment of the present invention.
[Explanation of symbols]
2 electron source
3 Target generator
4 Electron beam
5 Target jet
7 Reservoir
8 Discharge port opening
9 Areas of interaction

Claims (35)

A method for generating X-ray or EUV radiation comprising:
Forming a target jet (5) to be strengthened through the interaction region (9) by discharging a liquid substance under pressure through the opening of the discharge port;
Directing at least one electron beam (4) to the target jet (5) in the region of interaction (9), the electron beam (4) generating the X-ray or EUV radiation Interacting with the jet (5);
A method for generating X-ray or EUV radiation comprising: 2. A method according to claim 1, wherein the substance comprises a solid material, preferably metallic, which is heated to a liquid state. 2. A method according to claim 1, wherein the substance comprises a gas, preferably a noble gas, which is cooled to a liquid state. Essentially the intensity of the Bremsstrahlung and characteristic linear radiation generated in the hard X-ray region without heating the jet (5) to the plasma formation temperature. 4. A method according to any of claims 1 to 3, further comprising the step of controlling the electron beam (4) to interact with it. The electron beam (4) is controlled to interact with the jet (5) at such an intensity that the jet is superheated to the plasma formation temperature so that soft X-ray radiation or EUV radiation is generated. The method according to claim 1, further comprising the step of: 6. The method according to claim 1, wherein the jet (5) is in a solid state in the area of interaction (9). 6. The method according to claim 1, wherein the jet (5) is in a liquid state in the area of interaction (9). A method according to any of the preceding claims, wherein the beam (4) interacts with a spatially continuous portion of the jet (5) in the interaction region (9). The method according to claim 7, wherein the beam (4) interacts with at least one water droplet in the area of interaction (9). 10. A method according to any one of claims 7 to 9, wherein the beam (4) interacts with a plurality of water droplets or sprays of clusters in the area of interaction (9). 11. The electron beam (4) interacts with the jet (5) at a distance in the range of 0.5 to 10 mm from the outlet opening (8). The method described. The electron beam (4) is focused on the jet (5) such that the cross section of the electron beam (4) essentially matches the cross section of the jet (5). The method in any one of thru | or 11. 13. A method according to any of the preceding claims, wherein the jet (5) is formed with a diameter of about 1 to 10000 [mu] m. The method according to any of the preceding claims, wherein the electron beam (4) is generated by means of an acceleration voltage in the range of 5 to 500 kV with a beam current in the range of 10 to 1000 mA. 15. A method according to any of the preceding claims, wherein at least one pulsed electron beam (4) is directed onto the jet (5). The method according to any of the preceding claims, wherein at least one continuous electron beam (4) is directed onto the jet (5). An apparatus for generating X-ray or EUV radiation,
A target generator (3) provided to form a target jet by acting on a liquid substance under pressure through an outlet opening, the target jet being extended through an area of interaction;
An electron source (2) for providing at least one electron beam (4) in the jet (5) in a region of interaction (9),
The device wherein the radiation is generated by the beam (4) interacting with the jet (5). 18. Apparatus according to claim 17, wherein the substance comprises a solid, preferably a metal, which is heated to a liquid state. 18. Apparatus according to claim 17, wherein the substance comprises a gas, preferably a noble gas, that is cooled to a liquid state. The electron generation source (2) essentially generates Bremsstrahlung and characteristic linear radiation in the hard X-ray region without heating the jet (5) to the plasma formation temperature. 20. Method according to any of claims 17 to 19, which is controllable in order to achieve the interaction of the electron beam (4) with the jet (5) at a high intensity. The electron source (2) results in an interaction with the jet (5) at such an intensity that the jet is superheated to the plasma formation temperature so that soft X-ray radiation or EUV radiation is generated. 20. A device according to any of claims 17 to 19, which is controllable. 22. A device according to any of claims 17 to 21, wherein the target generator (3) is controllable to provide condensed material in the area of interaction (9). The target generator (3) provides a spatially continuous portion of the jet (5) in the region of interaction (9) by at least one water droplet or by spraying a plurality of water droplets or a combination thereof. The device according to claim 17, which is controllable as described above. The electron source (2) is controllable to direct the electron beam (4) onto the jet (5) at a distance in the range of 0.5 to 10 mm from the opening (8) of the discharge port. 24. An apparatus according to any of claims 17 to 23. The electron generation source (2) has a cross section of the electron beam (4) and a cross section of the jet (5) by focusing the electron beam (4) on the jet (5). 25. An apparatus as claimed in any one of claims 17 to 24, which is controllable to automatically match. 26. Apparatus according to any of claims 17 to 25, wherein the target generator (3) is adapted to generate a jet (5) having a diameter of about 1 to 10000 [mu] m. The electron source (2) generates an electron beam (4) by means of an acceleration voltage in the range of 5 to 500 kV and an electron beam (4) having an average beam current in the range of 10 to 1000 mA. 27. A device according to any of claims 17 to 26, which is controllable. 28. Apparatus according to any of claims 17 to 27, wherein the electron source (2) is controllable for the generation of at least one pulsed electron beam (4). 29. Apparatus according to any of claims 17 to 28, wherein the electron source (2) is controllable for the production of at least one continuous electron beam (4). 30. A method of using radiation generated by a method according to any of claims 1 to 16 or a medical diagnostic device according to any of claims 17 to 29. 30. A method of using radiation generated by a method according to any of claims 1 to 16 or an apparatus for non-destructive inspection according to any of claims 17 to 29. 30. A method of using radiation generated by a method according to any of claims 1 to 16 or an apparatus for EUV projection pattern writing apparatus (lithography) according to any of claims 17 to 29. 30. A method of using radiation generated by a method according to any of claims 1 to 16 or an apparatus for liquid crystal analysis according to any of claims 17 to 29. 30. Use of radiation generated by the method according to any of claims 1 to 16 or the microscope apparatus according to any of claims 17 to 29. 30. Use of radiation generated by the method according to any of claims 1 to 16 or the apparatus for protein structure determination by X-ray diffraction according to any of claims 17 to 29.