AU2001264866A1 - A process and apparatus for plasma activated deposition in vacuum - Google Patents

A process and apparatus for plasma activated deposition in vacuum

Info

Publication number
AU2001264866A1
AU2001264866A1 AU2001264866A AU6486601A AU2001264866A1 AU 2001264866 A1 AU2001264866 A1 AU 2001264866A1 AU 2001264866 A AU2001264866 A AU 2001264866A AU 6486601 A AU6486601 A AU 6486601A AU 2001264866 A1 AU2001264866 A1 AU 2001264866A1
Authority
AU
Australia
Prior art keywords
vacuum
plasma activated
activated deposition
deposition
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001264866A
Inventor
James F. Groves
Derek Hass
Goesta Mattausch
Henry Morgner
Siegfried Schiller
Haydn N. G. Wadley
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
UVA Licensing and Ventures Group
Original Assignee
Fraunhofer Institut fuer Organische Elektronik, Elektronenstrahl und Plasmatechnik FEP
University of Virginia UVA
University of Virginia Patent Foundation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Institut fuer Organische Elektronik, Elektronenstrahl und Plasmatechnik FEP, University of Virginia UVA, University of Virginia Patent Foundation filed Critical Fraunhofer Institut fuer Organische Elektronik, Elektronenstrahl und Plasmatechnik FEP
Publication of AU2001264866A1 publication Critical patent/AU2001264866A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3132—Evaporating
    • H01J2237/3137—Plasma-assisted co-operation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00—Aeronautics or air transport
    • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
AU2001264866A 2000-05-23 2001-05-23 A process and apparatus for plasma activated deposition in vacuum Abandoned AU2001264866A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US20637900P 2000-05-23 2000-05-23
US60206379 2000-05-23
US23186900P 2000-09-12 2000-09-12
US60231869 2000-09-12
PCT/US2001/016693 WO2001090438A1 (en) 2000-05-23 2001-05-23 A process and apparatus for plasma activated deposition in a vacuum

Publications (1)

Publication Number Publication Date
AU2001264866A1 true AU2001264866A1 (en) 2001-12-03

Family

ID=26901286

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001264866A Abandoned AU2001264866A1 (en) 2000-05-23 2001-05-23 A process and apparatus for plasma activated deposition in vacuum

Country Status (5)

Country Link
US (1) US7014889B2 (en)
EP (1) EP1409762A4 (en)
AU (1) AU2001264866A1 (en)
CA (1) CA2411174C (en)
WO (1) WO2001090438A1 (en)

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US20060057418A1 (en) * 2004-09-16 2006-03-16 Aeromet Technologies, Inc. Alluminide coatings containing silicon and yttrium for superalloys and method of forming such coatings
US9133718B2 (en) 2004-12-13 2015-09-15 Mt Coatings, Llc Turbine engine components with non-aluminide silicon-containing and chromium-containing protective coatings and methods of forming such non-aluminide protective coatings
US8084086B2 (en) * 2005-06-30 2011-12-27 University Of Virginia Patent Foundation Reliant thermal barrier coating system and related methods and apparatus of making the same
US20070207266A1 (en) * 2006-02-15 2007-09-06 Lemke Harald K Method and apparatus for coating particulates utilizing physical vapor deposition
US7601294B2 (en) * 2006-05-02 2009-10-13 Babcock & Wilcox Technical Services Y-12, Llc High volume production of nanostructured materials
US20080292903A1 (en) * 2007-05-25 2008-11-27 United Technologies Corporation Coated gas turbine engine component repair
US8784512B2 (en) * 2007-08-13 2014-07-22 University Of Virginia Patent Foundation Thin film battery synthesis by directed vapor deposition
WO2009149563A1 (en) * 2008-06-13 2009-12-17 Fablab Inc. A system and method for fabricating macroscopic objects, and nano-assembled objects obtained therewith
US8709160B2 (en) * 2008-08-22 2014-04-29 United Technologies Corporation Deposition apparatus having thermal hood
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US8449950B2 (en) * 2009-08-24 2013-05-28 Applied Materials, Inc. In-situ deposition of battery active lithium materials by plasma spraying
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US20130011578A1 (en) * 2011-07-07 2013-01-10 Hass Derek D Method and apparatus for applying a coating at a high rate onto non-line-of-sight regions of a substrate
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CN104769698B (en) * 2011-12-29 2017-03-08 埃尔瓦有限公司 The performance optimization of field emission apparatus
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US9659734B2 (en) 2012-09-12 2017-05-23 Elwha Llc Electronic device multi-layer graphene grid
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Also Published As

Publication number Publication date
EP1409762A4 (en) 2007-02-28
US20040118347A1 (en) 2004-06-24
CA2411174C (en) 2008-05-06
CA2411174A1 (en) 2001-11-29
US7014889B2 (en) 2006-03-21
WO2001090438A1 (en) 2001-11-29
EP1409762A1 (en) 2004-04-21

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