AU2001285636A1 - Method and device for treating surfaces using a glow discharge plasma - Google Patents
Method and device for treating surfaces using a glow discharge plasmaInfo
- Publication number
- AU2001285636A1 AU2001285636A1 AU2001285636A AU8563601A AU2001285636A1 AU 2001285636 A1 AU2001285636 A1 AU 2001285636A1 AU 2001285636 A AU2001285636 A AU 2001285636A AU 8563601 A AU8563601 A AU 8563601A AU 2001285636 A1 AU2001285636 A1 AU 2001285636A1
- Authority
- AU
- Australia
- Prior art keywords
- glow discharge
- discharge plasma
- treating surfaces
- treating
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH1850/00 | 2000-09-22 | ||
CH01850/00A CH694949A5 (en) | 2000-09-22 | 2000-09-22 | Method and apparatus for the treatment of surfaces by means of a glow discharge plasma. |
PCT/CH2001/000559 WO2002025693A1 (en) | 2000-09-22 | 2001-09-17 | Method and device for treating surfaces using a glow discharge plasma |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001285636A1 true AU2001285636A1 (en) | 2002-04-02 |
Family
ID=4566500
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001285636A Abandoned AU2001285636A1 (en) | 2000-09-22 | 2001-09-17 | Method and device for treating surfaces using a glow discharge plasma |
Country Status (7)
Country | Link |
---|---|
US (1) | US6919107B2 (en) |
EP (1) | EP1325509B1 (en) |
JP (1) | JP2004535037A (en) |
AU (1) | AU2001285636A1 (en) |
CH (1) | CH694949A5 (en) |
DE (1) | DE50115255D1 (en) |
WO (1) | WO2002025693A1 (en) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8357242B2 (en) * | 2007-05-03 | 2013-01-22 | Jewett Russell F | Crystalline film devices, apparatuses for and methods of fabrication |
EP1705965A1 (en) * | 2005-03-21 | 2006-09-27 | Universiteit Gent | Method and system for plasma treatment under high pressure |
CH697933B1 (en) * | 2005-11-03 | 2009-03-31 | Tetra Laval Holdings & Finance | Method and apparatus for coating plastic films with an oxide layer. |
CN101765902B (en) * | 2007-08-31 | 2011-09-21 | 东芝三菱电机产业系统株式会社 | Apparatus for generating dielectric barrier discharge gas |
JP5491755B2 (en) * | 2009-03-26 | 2014-05-14 | パナソニック株式会社 | Deposition equipment |
EP3222749A1 (en) | 2009-05-13 | 2017-09-27 | SiO2 Medical Products, Inc. | Outgassing method for inspecting a coated surface |
US7985188B2 (en) | 2009-05-13 | 2011-07-26 | Cv Holdings Llc | Vessel, coating, inspection and processing apparatus |
WO2013170052A1 (en) | 2012-05-09 | 2013-11-14 | Sio2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
DE102010026722A1 (en) * | 2010-07-09 | 2012-01-12 | Ahlbrandt System Gmbh | Device for modifying surface area of e.g. sheet goods, has plasma generation device whose electrodes are arranged at front side, gap formed between electrodes, and another gap formed between electrodes and goods |
US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
US9554968B2 (en) | 2013-03-11 | 2017-01-31 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging |
EP2776603B1 (en) | 2011-11-11 | 2019-03-06 | SiO2 Medical Products, Inc. | PASSIVATION, pH PROTECTIVE OR LUBRICITY COATING FOR PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS |
CA2890066C (en) | 2012-11-01 | 2021-11-09 | Sio2 Medical Products, Inc. | Coating inspection method |
EP2920567B1 (en) | 2012-11-16 | 2020-08-19 | SiO2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
CN105705676B (en) | 2012-11-30 | 2018-09-07 | Sio2医药产品公司 | Control the uniformity of the PECVD depositions on injector for medical purpose, cylindrantherae etc. |
US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
US20160015898A1 (en) | 2013-03-01 | 2016-01-21 | Sio2 Medical Products, Inc. | Plasma or cvd pre-treatment for lubricated pharmaceutical package, coating process and apparatus |
US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
US9863042B2 (en) | 2013-03-15 | 2018-01-09 | Sio2 Medical Products, Inc. | PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases |
US9435028B2 (en) * | 2013-05-06 | 2016-09-06 | Lotus Applied Technology, Llc | Plasma generation for thin film deposition on flexible substrates |
EP3122917B1 (en) | 2014-03-28 | 2020-05-06 | SiO2 Medical Products, Inc. | Antistatic coatings for plastic vessels |
US9725802B2 (en) | 2014-11-11 | 2017-08-08 | Graham Packaging Company, L.P. | Method for making pet containers with enhanced silicon dioxide barrier coating |
WO2017031354A2 (en) | 2015-08-18 | 2017-02-23 | Sio2 Medical Products, Inc. | Pharmaceutical and other packaging with low oxygen transmission rate |
CN112175220B (en) * | 2020-09-03 | 2023-01-03 | 广东以色列理工学院 | High-temperature-resistant modified polypropylene film and preparation method and application thereof |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5930130B2 (en) * | 1979-09-20 | 1984-07-25 | 富士通株式会社 | Vapor phase growth method |
JPH07111957B2 (en) * | 1984-03-28 | 1995-11-29 | 圭弘 浜川 | Semiconductor manufacturing method |
US4854263B1 (en) * | 1987-08-14 | 1997-06-17 | Applied Materials Inc | Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films |
US4863755A (en) * | 1987-10-16 | 1989-09-05 | The Regents Of The University Of California | Plasma enhanced chemical vapor deposition of thin films of silicon nitride from cyclic organosilicon nitrogen precursors |
JP2589599B2 (en) * | 1989-11-30 | 1997-03-12 | 住友精密工業株式会社 | Blow-out type surface treatment device |
DE69032691T2 (en) | 1989-12-07 | 1999-06-10 | Japan Science & Tech Corp | Process and apparatus for plasma treatment under atmospheric pressure |
FR2666324B1 (en) * | 1990-09-03 | 1993-04-09 | Saint Gobain Vitrage Int | THIN FILMS OF SILICON NITRIDE WITH IMPROVED PROPERTIES. |
US5908565A (en) | 1995-02-03 | 1999-06-01 | Sharp Kabushiki Kaisha | Line plasma vapor phase deposition apparatus and method |
US5980999A (en) * | 1995-08-24 | 1999-11-09 | Nagoya University | Method of manufacturing thin film and method for performing precise working by radical control and apparatus for carrying out such methods |
JP3164019B2 (en) * | 1997-05-21 | 2001-05-08 | 日本電気株式会社 | Silicon oxide film, method for forming the same, and film forming apparatus |
JPH1129873A (en) * | 1997-07-11 | 1999-02-02 | Sekisui Chem Co Ltd | Formation of laminated film and forming device therefor |
JP3533094B2 (en) * | 1997-12-17 | 2004-05-31 | 積水化学工業株式会社 | Atmospheric pressure discharge plasma processing method and atmospheric pressure plasma processing apparatus |
NL1010287C2 (en) * | 1998-10-09 | 2000-04-11 | Fuji Photo Film Bv | A method for treating a photographic support with an atmospheric pressure glow discharge. |
JP3959906B2 (en) * | 1998-10-26 | 2007-08-15 | 松下電工株式会社 | Plasma processing apparatus and plasma processing method |
JP3555470B2 (en) * | 1998-12-04 | 2004-08-18 | セイコーエプソン株式会社 | Etching method by atmospheric pressure high frequency plasma |
JP2002110671A (en) * | 2000-07-28 | 2002-04-12 | Sekisui Chem Co Ltd | Method for manufacturing semiconductor element |
JP2002094221A (en) * | 2000-09-20 | 2002-03-29 | Sekisui Chem Co Ltd | Normal pressure pulse plasma treatment method and its device |
-
2000
- 2000-09-22 CH CH01850/00A patent/CH694949A5/en not_active IP Right Cessation
-
2001
- 2001-09-17 US US10/381,148 patent/US6919107B2/en not_active Expired - Lifetime
- 2001-09-17 EP EP01964792A patent/EP1325509B1/en not_active Expired - Lifetime
- 2001-09-17 JP JP2002529806A patent/JP2004535037A/en active Pending
- 2001-09-17 WO PCT/CH2001/000559 patent/WO2002025693A1/en active Application Filing
- 2001-09-17 DE DE50115255T patent/DE50115255D1/en not_active Expired - Lifetime
- 2001-09-17 AU AU2001285636A patent/AU2001285636A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20030185982A1 (en) | 2003-10-02 |
JP2004535037A (en) | 2004-11-18 |
US6919107B2 (en) | 2005-07-19 |
DE50115255D1 (en) | 2010-01-21 |
WO2002025693A1 (en) | 2002-03-28 |
EP1325509A1 (en) | 2003-07-09 |
CH694949A5 (en) | 2005-09-30 |
EP1325509B1 (en) | 2009-12-09 |
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