AU2001257581A1 - Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma - Google Patents

Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma

Info

Publication number
AU2001257581A1
AU2001257581A1 AU2001257581A AU5758101A AU2001257581A1 AU 2001257581 A1 AU2001257581 A1 AU 2001257581A1 AU 2001257581 A AU2001257581 A AU 2001257581A AU 5758101 A AU5758101 A AU 5758101A AU 2001257581 A1 AU2001257581 A1 AU 2001257581A1
Authority
AU
Australia
Prior art keywords
plasma
volume
control
inner magnetic
forming inner
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001257581A
Other languages
English (en)
Inventor
Andrew D. Bailey Iii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lam Research Corp
Original Assignee
Lam Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Research Corp filed Critical Lam Research Corp
Publication of AU2001257581A1 publication Critical patent/AU2001257581A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/16—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32688—Multi-cusp fields

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
AU2001257581A 2000-03-27 2001-03-13 Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma Abandoned AU2001257581A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/536,347 US7067034B2 (en) 2000-03-27 2000-03-27 Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma
US09536347 2000-03-27
PCT/US2001/040285 WO2001073812A2 (en) 2000-03-27 2001-03-13 Method and apparatus for forming inner magnetic bucket to control a volume of a plasma

Publications (1)

Publication Number Publication Date
AU2001257581A1 true AU2001257581A1 (en) 2001-10-08

Family

ID=24138142

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001257581A Abandoned AU2001257581A1 (en) 2000-03-27 2001-03-13 Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma

Country Status (7)

Country Link
US (1) US7067034B2 (zh)
EP (1) EP1269516A2 (zh)
KR (1) KR100743871B1 (zh)
CN (1) CN1255851C (zh)
AU (1) AU2001257581A1 (zh)
TW (1) TW521298B (zh)
WO (1) WO2001073812A2 (zh)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2838020B1 (fr) * 2002-03-28 2004-07-02 Centre Nat Rech Scient Dispositif de confinement de plasma
JP3611324B2 (ja) 2002-06-03 2005-01-19 信越化学工業株式会社 マグネトロンプラズマ用磁場発生装置
WO2004088710A2 (en) * 2003-04-02 2004-10-14 Nkt Research & Innovation A/S Method and apparatus for gas plasma treatment with controlled extent of gas plasma, and use thereof
KR100561848B1 (ko) * 2003-11-04 2006-03-16 삼성전자주식회사 헬리컬 공진기형 플라즈마 처리 장치
US7294224B2 (en) * 2003-12-01 2007-11-13 Applied Materials, Inc. Magnet assembly for plasma containment
KR100886029B1 (ko) * 2004-01-28 2009-02-26 도쿄엘렉트론가부시키가이샤 기판 처리 장치의 처리실 청정화 방법, 기판 처리 장치 및기판 처리 방법
JP4527431B2 (ja) * 2004-04-08 2010-08-18 東京エレクトロン株式会社 プラズマ処理装置
KR100693820B1 (ko) * 2005-09-06 2007-03-12 삼성전자주식회사 포토레지스트 코팅 장치 및 방법
US20080124670A1 (en) * 2006-11-29 2008-05-29 Frank Jansen Inductively heated trap
US7758718B1 (en) 2006-12-29 2010-07-20 Lam Research Corporation Reduced electric field arrangement for managing plasma confinement
US7824519B2 (en) * 2007-05-18 2010-11-02 Lam Research Corporation Variable volume plasma processing chamber and associated methods
MX345403B (es) 2009-05-13 2017-01-30 Sio2 Medical Products Inc Revestimiento por pecvd utilizando un precursor organosilícico.
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US20110226617A1 (en) * 2010-03-22 2011-09-22 Applied Materials, Inc. Dielectric deposition using a remote plasma source
KR101039232B1 (ko) * 2010-04-27 2011-06-13 김정태 고밀도 플라즈마 발생장치
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
CN102573258B (zh) * 2010-12-15 2014-11-05 北京北方微电子基地设备工艺研究中心有限责任公司 感应耦合等离子体装置
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
EP2776603B1 (en) 2011-11-11 2019-03-06 SiO2 Medical Products, Inc. PASSIVATION, pH PROTECTIVE OR LUBRICITY COATING FOR PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
CA2887352A1 (en) 2012-05-09 2013-11-14 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
EP2914762B1 (en) 2012-11-01 2020-05-13 SiO2 Medical Products, Inc. Coating inspection method
US9903782B2 (en) 2012-11-16 2018-02-27 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
WO2014085348A2 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
KR102472240B1 (ko) 2013-03-11 2022-11-30 에스아이오2 메디컬 프로덕츠, 인크. 코팅된 패키징
WO2014144926A1 (en) 2013-03-15 2014-09-18 Sio2 Medical Products, Inc. Coating method
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
US11077233B2 (en) 2015-08-18 2021-08-03 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5370765A (en) * 1989-03-09 1994-12-06 Applied Microwave Plasma Concepts, Inc. Electron cyclotron resonance plasma source and method of operation
US5032205A (en) 1989-05-05 1991-07-16 Wisconsin Alumni Research Foundation Plasma etching apparatus with surface magnetic fields
US4990229A (en) 1989-06-13 1991-02-05 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
US5122251A (en) 1989-06-13 1992-06-16 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
US5091049A (en) 1989-06-13 1992-02-25 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
US5429070A (en) 1989-06-13 1995-07-04 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
US5421891A (en) 1989-06-13 1995-06-06 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
US4948458A (en) 1989-08-14 1990-08-14 Lam Research Corporation Method and apparatus for producing magnetically-coupled planar plasma
JPH03257159A (ja) * 1990-03-05 1991-11-15 Shin Etsu Chem Co Ltd ダイポールリング型磁気回路を用いたスパッタ装置
US5304279A (en) 1990-08-10 1994-04-19 International Business Machines Corporation Radio frequency induction/multipole plasma processing tool
US5192849A (en) 1990-08-10 1993-03-09 Texas Instruments Incorporated Multipurpose low-thermal-mass chuck for semiconductor processing equipment
JPH04236770A (ja) 1991-01-17 1992-08-25 Kobe Steel Ltd 真空アーク蒸着のアークスポットの制御方法及び蒸発源
CA2102201A1 (en) 1991-05-21 1992-11-22 Ebrahim Ghanbari Cluster tool soft etch module and ecr plasma generator therefor
US6077384A (en) * 1994-08-11 2000-06-20 Applied Materials, Inc. Plasma reactor having an inductive antenna coupling power through a parallel plate electrode
EP0537950B1 (en) 1991-10-17 1997-04-02 Applied Materials, Inc. Plasma reactor
US5444207A (en) * 1992-03-26 1995-08-22 Kabushiki Kaisha Toshiba Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field
US5660744A (en) 1992-03-26 1997-08-26 Kabushiki Kaisha Toshiba Plasma generating apparatus and surface processing apparatus
US5286297A (en) 1992-06-24 1994-02-15 Texas Instruments Incorporated Multi-electrode plasma processing apparatus
US5399253A (en) * 1992-12-23 1995-03-21 Balzers Aktiengesellschaft Plasma generating device
JPH06251896A (ja) 1992-12-28 1994-09-09 Hitachi Ltd プラズマ処理方法及び装置
JPH07130495A (ja) * 1993-11-05 1995-05-19 Tokyo Electron Ltd マグネトロン型プラズマ処理装置
US5518547A (en) 1993-12-23 1996-05-21 International Business Machines Corporation Method and apparatus for reducing particulates in a plasma tool through steady state flows
JP3365067B2 (ja) * 1994-02-10 2003-01-08 ソニー株式会社 プラズマ装置およびこれを用いたプラズマ処理方法
JP3124204B2 (ja) 1994-02-28 2001-01-15 株式会社東芝 プラズマ処理装置
US5587038A (en) 1994-06-16 1996-12-24 Princeton University Apparatus and process for producing high density axially extending plasmas
JP3585578B2 (ja) * 1995-05-30 2004-11-04 アネルバ株式会社 プラズマ処理装置
JP3585591B2 (ja) 1995-07-29 2004-11-04 株式会社半導体エネルギー研究所 エッチング装置及びエッチング方法
US6054013A (en) 1996-02-02 2000-04-25 Applied Materials, Inc. Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density
US5783102A (en) 1996-02-05 1998-07-21 International Business Machines Corporation Negative ion deductive source for etching high aspect ratio structures
US5669975A (en) 1996-03-27 1997-09-23 Sony Corporation Plasma producing method and apparatus including an inductively-coupled plasma source
US5707452A (en) * 1996-07-08 1998-01-13 Applied Microwave Plasma Concepts, Inc. Coaxial microwave applicator for an electron cyclotron resonance plasma source
US6113731A (en) * 1997-01-02 2000-09-05 Applied Materials, Inc. Magnetically-enhanced plasma chamber with non-uniform magnetic field
JP3343200B2 (ja) * 1997-05-20 2002-11-11 東京エレクトロン株式会社 プラズマ処理装置
US6178920B1 (en) * 1997-06-05 2001-01-30 Applied Materials, Inc. Plasma reactor with internal inductive antenna capable of generating helicon wave
US5795451A (en) * 1997-06-12 1998-08-18 Read-Rite Corporation Sputtering apparatus with a rotating magnet array
SE511139C2 (sv) * 1997-11-20 1999-08-09 Hana Barankova Plasmabearbetningsapparat med vridbara magneter
US6015476A (en) * 1998-02-05 2000-01-18 Applied Materials, Inc. Plasma reactor magnet with independently controllable parallel axial current-carrying elements
JPH11297673A (ja) 1998-04-15 1999-10-29 Hitachi Ltd プラズマ処理装置及びクリーニング方法
US6153977A (en) * 1999-04-06 2000-11-28 Tokyo Seihinkaihatsu Kenkyusho ECR type plasma generating apparatus
US6341574B1 (en) * 1999-11-15 2002-01-29 Lam Research Corporation Plasma processing systems

Also Published As

Publication number Publication date
KR100743871B1 (ko) 2007-07-30
KR20020088408A (ko) 2002-11-27
TW521298B (en) 2003-02-21
US20030047140A1 (en) 2003-03-13
CN1255851C (zh) 2006-05-10
US7067034B2 (en) 2006-06-27
WO2001073812A2 (en) 2001-10-04
WO2001073812A3 (en) 2002-03-07
EP1269516A2 (en) 2003-01-02
CN1432188A (zh) 2003-07-23

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