AU1801700A - Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device - Google Patents
Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and deviceInfo
- Publication number
- AU1801700A AU1801700A AU18017/00A AU1801700A AU1801700A AU 1801700 A AU1801700 A AU 1801700A AU 18017/00 A AU18017/00 A AU 18017/00A AU 1801700 A AU1801700 A AU 1801700A AU 1801700 A AU1801700 A AU 1801700A
- Authority
- AU
- Australia
- Prior art keywords
- exposure
- cleaning optical
- exposure apparatus
- manufacturing
- optical device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Atmospheric Sciences (AREA)
- Plasma & Fusion (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10/372627 | 1998-12-28 | ||
JP37262798 | 1998-12-28 | ||
PCT/JP1999/007321 WO2000041225A1 (fr) | 1998-12-28 | 1999-12-27 | Procede de nettoyage d'un dispositif optique, appareil et procede d'exposition, procede de fabrication du dispositif et dispositif proprement dit |
Publications (1)
Publication Number | Publication Date |
---|---|
AU1801700A true AU1801700A (en) | 2000-07-24 |
Family
ID=18500770
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU18017/00A Abandoned AU1801700A (en) | 1998-12-28 | 1999-12-27 | Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR20010085194A (ko) |
AU (1) | AU1801700A (ko) |
WO (1) | WO2000041225A1 (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100694554B1 (ko) | 1999-03-25 | 2007-03-13 | 아사히 가라스 가부시키가이샤 | 광학부재용 합성석영유리와 그 제조방법 및 사용방법 |
US6571057B2 (en) | 2000-03-27 | 2003-05-27 | Nikon Corporation | Optical instrument, gas replacement method and cleaning method of optical instrument, exposure apparatus, exposure method and manufacturing method for devices |
JPWO2003036696A1 (ja) * | 2001-10-24 | 2005-02-17 | 株式会社ニコン | 濃度計測方法及びその装置、露光方法及びその装置、並びにデバイスの製造方法 |
US6724460B2 (en) * | 2001-11-19 | 2004-04-20 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects |
US6828569B2 (en) * | 2001-11-19 | 2004-12-07 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
AU2003246243A1 (en) * | 2002-07-03 | 2004-01-23 | Nikon Corporation | Method of exposure and aligner |
JP4510433B2 (ja) * | 2003-12-03 | 2010-07-21 | キヤノン株式会社 | 露光装置及び洗浄方法 |
KR100634376B1 (ko) * | 2004-07-07 | 2006-10-16 | 삼성전자주식회사 | 기판 건조 장치 |
JP2006049758A (ja) * | 2004-08-09 | 2006-02-16 | Nikon Corp | 露光装置の制御方法、並びに、これを用いた露光方法及び装置 |
US9573111B1 (en) | 2012-07-09 | 2017-02-21 | Kla-Tencor Corporation | High purity ozone generator for optics cleaning and recovery |
JP6878459B2 (ja) * | 2016-11-29 | 2021-05-26 | ギガフォトン株式会社 | レーザ加工システム |
CN108816963B (zh) * | 2018-08-01 | 2024-02-06 | 中山普宏光电科技有限公司 | 一种紫外光和紫外激光双光源清洗设备 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE1007907A3 (nl) * | 1993-12-24 | 1995-11-14 | Asm Lithography Bv | Lenzenstelsel met in gasgevulde houder aangebrachte lenselementen en fotolithografisch apparaat voorzien van een dergelijk stelsel. |
JP3823408B2 (ja) * | 1997-01-10 | 2006-09-20 | 株式会社ニコン | 光学素子の製造方法及び光学素子の洗浄方法 |
JPH10303097A (ja) * | 1997-04-23 | 1998-11-13 | Nikon Corp | 投影露光装置、露光方法、半導体デバイスの製造方法、および投影光学系の製造方法 |
-
1999
- 1999-12-27 AU AU18017/00A patent/AU1801700A/en not_active Abandoned
- 1999-12-27 WO PCT/JP1999/007321 patent/WO2000041225A1/ja not_active Application Discontinuation
- 1999-12-27 KR KR1020007008413A patent/KR20010085194A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
KR20010085194A (ko) | 2001-09-07 |
WO2000041225A1 (fr) | 2000-07-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |