AU1801700A - Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device - Google Patents

Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device

Info

Publication number
AU1801700A
AU1801700A AU18017/00A AU1801700A AU1801700A AU 1801700 A AU1801700 A AU 1801700A AU 18017/00 A AU18017/00 A AU 18017/00A AU 1801700 A AU1801700 A AU 1801700A AU 1801700 A AU1801700 A AU 1801700A
Authority
AU
Australia
Prior art keywords
exposure
cleaning optical
exposure apparatus
manufacturing
optical device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU18017/00A
Other languages
English (en)
Inventor
Yasushi Mizuno
Kiyoshi Motegi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU1801700A publication Critical patent/AU1801700A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Atmospheric Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU18017/00A 1998-12-28 1999-12-27 Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device Abandoned AU1801700A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP10/372627 1998-12-28
JP37262798 1998-12-28
PCT/JP1999/007321 WO2000041225A1 (fr) 1998-12-28 1999-12-27 Procede de nettoyage d'un dispositif optique, appareil et procede d'exposition, procede de fabrication du dispositif et dispositif proprement dit

Publications (1)

Publication Number Publication Date
AU1801700A true AU1801700A (en) 2000-07-24

Family

ID=18500770

Family Applications (1)

Application Number Title Priority Date Filing Date
AU18017/00A Abandoned AU1801700A (en) 1998-12-28 1999-12-27 Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device

Country Status (3)

Country Link
KR (1) KR20010085194A (ko)
AU (1) AU1801700A (ko)
WO (1) WO2000041225A1 (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100694554B1 (ko) 1999-03-25 2007-03-13 아사히 가라스 가부시키가이샤 광학부재용 합성석영유리와 그 제조방법 및 사용방법
US6571057B2 (en) 2000-03-27 2003-05-27 Nikon Corporation Optical instrument, gas replacement method and cleaning method of optical instrument, exposure apparatus, exposure method and manufacturing method for devices
JPWO2003036696A1 (ja) * 2001-10-24 2005-02-17 株式会社ニコン 濃度計測方法及びその装置、露光方法及びその装置、並びにデバイスの製造方法
US6724460B2 (en) * 2001-11-19 2004-04-20 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
US6828569B2 (en) * 2001-11-19 2004-12-07 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method and device manufactured thereby
AU2003246243A1 (en) * 2002-07-03 2004-01-23 Nikon Corporation Method of exposure and aligner
JP4510433B2 (ja) * 2003-12-03 2010-07-21 キヤノン株式会社 露光装置及び洗浄方法
KR100634376B1 (ko) * 2004-07-07 2006-10-16 삼성전자주식회사 기판 건조 장치
JP2006049758A (ja) * 2004-08-09 2006-02-16 Nikon Corp 露光装置の制御方法、並びに、これを用いた露光方法及び装置
US9573111B1 (en) 2012-07-09 2017-02-21 Kla-Tencor Corporation High purity ozone generator for optics cleaning and recovery
JP6878459B2 (ja) * 2016-11-29 2021-05-26 ギガフォトン株式会社 レーザ加工システム
CN108816963B (zh) * 2018-08-01 2024-02-06 中山普宏光电科技有限公司 一种紫外光和紫外激光双光源清洗设备

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE1007907A3 (nl) * 1993-12-24 1995-11-14 Asm Lithography Bv Lenzenstelsel met in gasgevulde houder aangebrachte lenselementen en fotolithografisch apparaat voorzien van een dergelijk stelsel.
JP3823408B2 (ja) * 1997-01-10 2006-09-20 株式会社ニコン 光学素子の製造方法及び光学素子の洗浄方法
JPH10303097A (ja) * 1997-04-23 1998-11-13 Nikon Corp 投影露光装置、露光方法、半導体デバイスの製造方法、および投影光学系の製造方法

Also Published As

Publication number Publication date
KR20010085194A (ko) 2001-09-07
WO2000041225A1 (fr) 2000-07-13

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase