AU1241401A - Method and radiation generating system using microtargets - Google Patents

Method and radiation generating system using microtargets

Info

Publication number
AU1241401A
AU1241401A AU12414/01A AU1241401A AU1241401A AU 1241401 A AU1241401 A AU 1241401A AU 12414/01 A AU12414/01 A AU 12414/01A AU 1241401 A AU1241401 A AU 1241401A AU 1241401 A AU1241401 A AU 1241401A
Authority
AU
Australia
Prior art keywords
microtargets
generating system
radiation generating
radiation
generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU12414/01A
Other languages
English (en)
Inventor
John H. Carosella
Richard M. Foster
James H. Morris
Carey A. Pico
Michael F. Powers
I. C. Edmond Turcu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JMAR Research Inc
Original Assignee
JMAR Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JMAR Research Inc filed Critical JMAR Research Inc
Publication of AU1241401A publication Critical patent/AU1241401A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H6/00—Targets for producing nuclear reactions

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU12414/01A 1999-10-27 2000-10-27 Method and radiation generating system using microtargets Abandoned AU1241401A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16189199P 1999-10-27 1999-10-27
US60161891 1999-10-27
PCT/US2000/029743 WO2001031678A1 (fr) 1999-10-27 2000-10-27 Procede et systeme de generation de rayonnements au moyen de microcibles

Publications (1)

Publication Number Publication Date
AU1241401A true AU1241401A (en) 2001-05-08

Family

ID=22583229

Family Applications (1)

Application Number Title Priority Date Filing Date
AU12414/01A Abandoned AU1241401A (en) 1999-10-27 2000-10-27 Method and radiation generating system using microtargets

Country Status (4)

Country Link
EP (1) EP1232516A4 (fr)
JP (1) JP2003513418A (fr)
AU (1) AU1241401A (fr)
WO (1) WO2001031678A1 (fr)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6493423B1 (en) * 1999-12-24 2002-12-10 Koninklijke Philips Electronics N.V. Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
IT1316249B1 (it) * 2000-12-01 2003-04-03 Enea Ente Nuove Tec Procedimento di abbattimento del flusso di ioni e di piccoli detritiin sorgenti di raggi-x molli da plasma, tramite l'uso di kripton.
US6714624B2 (en) * 2001-09-18 2004-03-30 Euv Llc Discharge source with gas curtain for protecting optics from particles
US8653437B2 (en) 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
JP2010182698A (ja) * 2002-04-10 2010-08-19 Cymer Inc 極紫外線光源
EP1606980B1 (fr) 2003-03-18 2010-08-04 Philips Intellectual Property & Standards GmbH Dispositif et procede de generation d'un rayonnement de rayons x mous et/ou ultraviolet extreme a l'aide d'un plasma
KR101010584B1 (ko) * 2003-03-26 2011-01-24 고꾸리쯔 다이가꾸 호우징 오사까 다이가꾸 극단 자외광원 및 극단 자외광원용 타깃
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
WO2006001459A1 (fr) * 2004-06-24 2006-01-05 Nikon Corporation Source de lumiere euv, equipement d’exposition euv et procede de fabrication de dispositif semi-conducteur
JP4337648B2 (ja) 2004-06-24 2009-09-30 株式会社ニコン Ｅｕｖ光源、ｅｕｖ露光装置、及び半導体デバイスの製造方法
FR2874785B1 (fr) * 2004-08-27 2006-12-01 Commissariat Energie Atomique Procede et dispositif de generation de rayonnement ou de particules par interaction entre un faisceau laser et une cible
JP2006128157A (ja) * 2004-10-26 2006-05-18 Komatsu Ltd 極端紫外光源装置用ドライバレーザシステム
JP4565194B2 (ja) * 2004-12-17 2010-10-20 国立大学法人大阪大学 極端紫外光・ｘ線源用ターゲット及びその製造方法
JP2006202671A (ja) * 2005-01-24 2006-08-03 Ushio Inc 極端紫外光光源装置及び極端紫外光光源装置で発生するデブリの除去方法
JP4710463B2 (ja) * 2005-07-21 2011-06-29 ウシオ電機株式会社 極端紫外光発生装置
US8901521B2 (en) 2007-08-23 2014-12-02 Asml Netherlands B.V. Module and method for producing extreme ultraviolet radiation
US7763871B2 (en) 2008-04-02 2010-07-27 Asml Netherlands B.V. Radiation source
NL1035846A1 (nl) * 2007-08-23 2009-02-24 Asml Netherlands Bv Radiation source.
DE102007056872A1 (de) * 2007-11-26 2009-05-28 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Berlin Strahlungserzeugung mittels Laserbestrahlung eines freien Tröpfchentargets
US8837662B2 (en) * 2007-12-28 2014-09-16 Phoenix Nuclear Labs Llc High energy proton or neutron source
CN102084434B (zh) 2008-05-02 2016-01-20 阳光医疗技术公司 用于产生医用同位素的装置和方法
JP2010103499A (ja) 2008-09-29 2010-05-06 Komatsu Ltd 極端紫外光源装置および極端紫外光生成方法
US8399867B2 (en) * 2008-09-29 2013-03-19 Gigaphoton Inc. Extreme ultraviolet light source apparatus
DE102009020776B4 (de) * 2009-05-08 2011-07-28 XTREME technologies GmbH, 37077 Anordnung zur kontinuierlichen Erzeugung von flüssigem Zinn als Emittermaterial in EUV-Strahlungsquellen
JP5574470B2 (ja) * 2009-06-12 2014-08-20 国立大学法人 宮崎大学 極端紫外光源および極端紫外光発生方法
JP6002579B2 (ja) 2009-12-15 2016-10-05 フェニックス ニュークリア ラブズ エルエルシー 貨物専用コンテナの内容物を検査する装置及び貨物専用コンテナ内の物質を識別する方法
US10978214B2 (en) 2010-01-28 2021-04-13 SHINE Medical Technologies, LLC Segmented reaction chamber for radioisotope production
JP5075951B2 (ja) * 2010-07-16 2012-11-21 ギガフォトン株式会社 極端紫外光源装置及びドライバレーザシステム
US10734126B2 (en) 2011-04-28 2020-08-04 SHINE Medical Technologies, LLC Methods of separating medical isotopes from uranium solutions
JP5881345B2 (ja) * 2011-09-13 2016-03-09 ギガフォトン株式会社 極端紫外光生成装置
RU2649662C2 (ru) 2012-04-05 2018-04-05 Шайн Медикал Текнолоджиз, Инк. Водная сборка и способ управления
GB2525957B (en) * 2013-03-04 2020-02-26 Inst Of Modern Physics Target device for neutron generating device, accelerator-excited neutron generating device and beam coupling method thereof
US9699876B2 (en) * 2013-03-14 2017-07-04 Asml Netherlands, B.V. Method of and apparatus for supply and recovery of target material
DE102013209447A1 (de) * 2013-05-22 2014-11-27 Siemens Aktiengesellschaft Röntgenquelle und Verfahren zur Erzeugung von Röntgenstrahlung
US10237960B2 (en) 2013-12-02 2019-03-19 Asml Netherlands B.V. Apparatus for and method of source material delivery in a laser produced plasma EUV light source
US9301382B2 (en) * 2013-12-02 2016-03-29 Asml Netherlands B.V. Apparatus for and method of source material delivery in a laser produced plasma EUV light source
CN106471599B (zh) * 2014-07-17 2018-05-22 西门子公司 用于x射线管的流体注射器和通过液体金属注射来提供液体阳极的方法
JP5964400B2 (ja) * 2014-12-04 2016-08-03 ギガフォトン株式会社 極端紫外光源装置及びそのターゲット供給システム
DE102014226814B4 (de) * 2014-12-22 2023-05-11 Siemens Healthcare Gmbh Metallstrahlröntgenröhre
GB201522590D0 (en) * 2015-12-22 2016-02-03 Sck Cen Target assembly for generation of radioactive isotopes
US10310380B2 (en) 2016-12-07 2019-06-04 Taiwan Semiconductor Manufacturing Co., Ltd. High-brightness light source
US10395881B2 (en) 2017-10-11 2019-08-27 HIL Applied Medical, Ltd. Systems and methods for providing an ion beam
US10847340B2 (en) 2017-10-11 2020-11-24 HIL Applied Medical, Ltd. Systems and methods for directing an ion beam using electromagnets
KR102430082B1 (ko) * 2020-03-13 2022-08-04 경희대학교 산학협력단 전자빔을 이용한 극자외선 광원 장치
DE102021004714A1 (de) 2021-08-23 2023-02-23 Hochschule Mittweida (FH), Körperschaft des öffentlichen Rechts Einrichtung zur Beeinflussung der Röntgenemission bei der Lasermaterialbearbeitung eines Werkstücks mittels eines Lasers
WO2023128856A1 (fr) * 2021-12-29 2023-07-06 Innovicum Technology Ab Source de rayons x à base de particules
US11882642B2 (en) 2021-12-29 2024-01-23 Innovicum Technology Ab Particle based X-ray source

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3586244T2 (de) * 1984-12-26 2000-04-20 Kabushiki Kaisha Toshiba Vorrichtung zur Erzeugung von Weich-Röntgenstrahlen durch ein Hochenergiebündel.
US4866517A (en) * 1986-09-11 1989-09-12 Hoya Corp. Laser plasma X-ray generator capable of continuously generating X-rays
US4953191A (en) * 1989-07-24 1990-08-28 The United States Of America As Represented By The United States Department Of Energy High intensity x-ray source using liquid gallium target
US5052034A (en) * 1989-10-30 1991-09-24 Siemens Aktiengesellschaft X-ray generator
US5459771A (en) * 1994-04-01 1995-10-17 University Of Central Florida Water laser plasma x-ray point source and apparatus
US5577092A (en) * 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
JPH10221499A (ja) * 1997-02-07 1998-08-21 Hitachi Ltd レーザプラズマｘ線源およびそれを用いた半導体露光装置並びに半導体露光方法
US6285743B1 (en) * 1998-09-14 2001-09-04 Nikon Corporation Method and apparatus for soft X-ray generation
FR2799667B1 (fr) * 1999-10-18 2002-03-08 Commissariat Energie Atomique Procede et dispositif de generation d'un brouillard dense de gouttelettes micrometriques et submicrometriques, application a la generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie

Also Published As

Publication number Publication date
EP1232516A4 (fr) 2003-03-12
EP1232516A1 (fr) 2002-08-21
JP2003513418A (ja) 2003-04-08
WO2001031678A1 (fr) 2001-05-03

Similar Documents

Publication Publication Date Title
AU1241401A (en) Method and radiation generating system using microtargets
AU4653999A (en) Exposure method and system
AU4197200A (en) System and method for dimensioning objects
AU7331700A (en) Software rehosting system and method
AU2617399A (en) Interception method and system
AU3517899A (en) Interception system and method
AU6629400A (en) Authentication system and method
AU5164100A (en) Portable locator system and method
AU2459601A (en) X-ray system and method
AU1160801A (en) Apparatus and method
AU7484500A (en) Cargo-transfer apparatus and method
AU3598500A (en) System and method for generating recovery code
AU2173300A (en) Radiation dosimetry method and associated apparatus
WO2000065773A8 (fr) Systeme de portail et procede associe
AU2320299A (en) Device and method for radiation therapy
AUPP855599A0 (en) Apparatus and method
AU6213900A (en) System and method for energy management
AU5878200A (en) External system interface method and system
AU3248700A (en) Implant positioning system and method
AU2742200A (en) System and method for generating dependent data
AU5876000A (en) Dosimeter apparatus and method
AU1803401A (en) Methods and systems for generating tractograms
AU3035399A (en) Interception system and method
AU6433798A (en) Energy-depleted radiation apparatus and method
AU4400399A (en) Method and device for generating optical radiation

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase