ATE549746T1 - Verfahren zur herstellung einer matrix zur detektion elektromagnetischer strahlung insbesondere infrarotstrahlung - Google Patents
Verfahren zur herstellung einer matrix zur detektion elektromagnetischer strahlung insbesondere infrarotstrahlungInfo
- Publication number
- ATE549746T1 ATE549746T1 AT08300187T AT08300187T ATE549746T1 AT E549746 T1 ATE549746 T1 AT E549746T1 AT 08300187 T AT08300187 T AT 08300187T AT 08300187 T AT08300187 T AT 08300187T AT E549746 T1 ATE549746 T1 AT E549746T1
- Authority
- AT
- Austria
- Prior art keywords
- matrix
- producing
- detecting electromagnetic
- radiation
- particular infrared
- Prior art date
Links
- 239000011159 matrix material Substances 0.000 title abstract 2
- 230000005670 electromagnetic radiation Effects 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000005855 radiation Effects 0.000 title 1
- 238000001514 detection method Methods 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 3
- 239000003292 glue Substances 0.000 abstract 2
- 238000005253 cladding Methods 0.000 abstract 1
- 230000001939 inductive effect Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
Classifications
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- H—ELECTRICITY
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- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14618—Containers
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
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- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
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- H01L24/93—Batch processes
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- H01L27/144—Devices controlled by radiation
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- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0657—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
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- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
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- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L25/0657—Stacked arrangements of devices
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- H01L27/144—Devices controlled by radiation
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- H01L27/144—Devices controlled by radiation
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- H01L27/14643—Photodiode arrays; MOS imagers
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- H01L2924/00011—Not relevant to the scope of the group, the symbol of which is combined with the symbol of this group
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- H01L2924/01057—Lanthanum [La]
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
- H01L2924/10158—Shape being other than a cuboid at the passive surface
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1089—Methods of surface bonding and/or assembly therefor of discrete laminae to single face of additional lamina
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1089—Methods of surface bonding and/or assembly therefor of discrete laminae to single face of additional lamina
- Y10T156/1092—All laminae planar and face to face
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Ceramic Engineering (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Light Receiving Elements (AREA)
- Radiation Pyrometers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0754677A FR2915573B1 (fr) | 2007-04-25 | 2007-04-25 | Procede pour la realisation d'une matrice de detection de rayonnements electromagnetiques et notamment de rayonnements infrarouges |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE549746T1 true ATE549746T1 (de) | 2012-03-15 |
Family
ID=38895849
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT08300187T ATE549746T1 (de) | 2007-04-25 | 2008-04-21 | Verfahren zur herstellung einer matrix zur detektion elektromagnetischer strahlung insbesondere infrarotstrahlung |
Country Status (4)
Country | Link |
---|---|
US (1) | US7807010B2 (de) |
EP (1) | EP1986239B9 (de) |
AT (1) | ATE549746T1 (de) |
FR (1) | FR2915573B1 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2918212B1 (fr) * | 2007-06-27 | 2009-09-25 | Fr De Detecteurs Infrarouges S | Procede pour la realisation d'une matrice de rayonnements electromagnetiques et procede pour remplacer un module elementaire d'une telle matrice de detection. |
US8117741B2 (en) * | 2009-04-07 | 2012-02-21 | Oy Ajat Ltd | Method for manufacturing a radiation imaging panel comprising imaging tiles |
US9012262B2 (en) * | 2011-04-19 | 2015-04-21 | Teledyne Rad-Icon Imaging Corp. | Method of direct tiling of an image sensor array |
FR3025359B1 (fr) | 2014-09-01 | 2016-11-04 | Soc Francaise De Detecteurs Infrarouges - Sofradir | Procede de positionnement d'elements, notamment optiques sur la face arriere d'un detecteur infrarouge de type hybride |
DE102014225396B3 (de) * | 2014-12-10 | 2016-04-28 | Siemens Aktiengesellschaft | Sensorboard für ein Detektormodul und Verfahren zu dessen Herstellung |
JP6380069B2 (ja) * | 2014-12-11 | 2018-08-29 | 住友電気工業株式会社 | 光送信モジュール |
EP3405927B1 (de) | 2016-01-20 | 2024-10-16 | Carrier Corporation | Gebäudemanagementsystem mit objekterkennung und -verfolgung in einem grossen raum mit einem niedrigauflösenden sensor |
EP3414595A1 (de) | 2016-02-10 | 2018-12-19 | Carrier Corporation | Präsenzdetektionssystem |
CN107632473B (zh) * | 2017-10-18 | 2020-05-12 | 深圳市华星光电半导体显示技术有限公司 | Psva液晶显示面板 |
TWI679441B (zh) * | 2018-06-07 | 2019-12-11 | 大陸商友達頤康信息科技(蘇州)有限公司 | 無線射頻定位系統、辨識標籤及其通訊方法 |
WO2023186785A1 (en) * | 2022-03-28 | 2023-10-05 | Trinamix Gmbh | Method of manufacturing a spectrometer device |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4039833A (en) * | 1976-08-17 | 1977-08-02 | The United States Of America As Represented By The Secretary Of The Navy | High density infrared detector array |
US5308980A (en) * | 1991-02-20 | 1994-05-03 | Amber Engineering, Inc. | Thermal mismatch accommodated infrared detector hybrid array |
US5270255A (en) * | 1993-01-08 | 1993-12-14 | Chartered Semiconductor Manufacturing Pte, Ltd. | Metallization process for good metal step coverage while maintaining useful alignment mark |
US6949158B2 (en) * | 2001-05-14 | 2005-09-27 | Micron Technology, Inc. | Using backgrind wafer tape to enable wafer mounting of bumped wafers |
US6582990B2 (en) * | 2001-08-24 | 2003-06-24 | International Rectifier Corporation | Wafer level underfill and interconnect process |
TW571409B (en) * | 2002-12-03 | 2004-01-11 | Advanced Semiconductor Eng | Optical device and packaging method thereof |
FR2857504B1 (fr) * | 2003-07-08 | 2006-01-06 | Atmel Grenoble Sa | Capteur d'image de grande dimension et procede de fabrication |
-
2007
- 2007-04-25 FR FR0754677A patent/FR2915573B1/fr not_active Expired - Fee Related
-
2008
- 2008-04-21 EP EP08300187.5A patent/EP1986239B9/de not_active Not-in-force
- 2008-04-21 AT AT08300187T patent/ATE549746T1/de active
- 2008-04-24 US US12/108,944 patent/US7807010B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US7807010B2 (en) | 2010-10-05 |
FR2915573A1 (fr) | 2008-10-31 |
FR2915573B1 (fr) | 2010-04-02 |
EP1986239B9 (de) | 2013-09-11 |
EP1986239B1 (de) | 2012-03-14 |
EP1986239A3 (de) | 2011-03-23 |
US20090321013A1 (en) | 2009-12-31 |
EP1986239A2 (de) | 2008-10-29 |
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Publication | Publication Date | Title |
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