ATE545695T1 - Ammoniakfreie alkalische mikroelektronische reinigungszusammensetzung mit verbesserter substratverträglickeit - Google Patents
Ammoniakfreie alkalische mikroelektronische reinigungszusammensetzung mit verbesserter substratverträglickeitInfo
- Publication number
- ATE545695T1 ATE545695T1 AT02749817T AT02749817T ATE545695T1 AT E545695 T1 ATE545695 T1 AT E545695T1 AT 02749817 T AT02749817 T AT 02749817T AT 02749817 T AT02749817 T AT 02749817T AT E545695 T1 ATE545695 T1 AT E545695T1
- Authority
- AT
- Austria
- Prior art keywords
- cleaning
- ammonia
- cleaning composition
- improved substrate
- free alkaline
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title abstract 8
- 239000000203 mixture Substances 0.000 title abstract 5
- 238000004377 microelectronic Methods 0.000 title abstract 3
- 239000000758 substrate Substances 0.000 title abstract 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 abstract 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- 150000001408 amides Chemical class 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 239000003989 dielectric material Substances 0.000 abstract 1
- 150000002484 inorganic compounds Chemical class 0.000 abstract 1
- 229910010272 inorganic material Inorganic materials 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 238000001465 metallisation Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000000269 nucleophilic effect Effects 0.000 abstract 1
- 150000002894 organic compounds Chemical class 0.000 abstract 1
- 150000002902 organometallic compounds Chemical class 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/28—Heterocyclic compounds containing nitrogen in the ring
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/0005—Other compounding ingredients characterised by their effect
- C11D3/0073—Anticorrosion compositions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/33—Amino carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3218—Alkanolamines or alkanolimines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3263—Amides or imides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5013—Organic solvents containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/34—Organic compounds containing sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US30431201P | 2001-07-09 | 2001-07-09 | |
| PCT/US2002/021374 WO2003006597A1 (en) | 2001-07-09 | 2002-07-08 | Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE545695T1 true ATE545695T1 (de) | 2012-03-15 |
Family
ID=23175967
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02749817T ATE545695T1 (de) | 2001-07-09 | 2002-07-08 | Ammoniakfreie alkalische mikroelektronische reinigungszusammensetzung mit verbesserter substratverträglickeit |
Country Status (17)
| Country | Link |
|---|---|
| EP (1) | EP1404796B1 (enExample) |
| JP (1) | JP4177758B2 (enExample) |
| KR (2) | KR20040018437A (enExample) |
| CN (2) | CN102399651A (enExample) |
| AT (1) | ATE545695T1 (enExample) |
| AU (1) | AU2002320305A1 (enExample) |
| BR (1) | BR0211054A (enExample) |
| CA (1) | CA2452884C (enExample) |
| IL (2) | IL159761A0 (enExample) |
| IN (1) | IN2004CH00042A (enExample) |
| MY (1) | MY139607A (enExample) |
| NO (1) | NO20040067L (enExample) |
| PL (1) | PL199501B1 (enExample) |
| RS (1) | RS904A (enExample) |
| TW (1) | TWI292437B (enExample) |
| WO (1) | WO2003006597A1 (enExample) |
| ZA (1) | ZA200400064B (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040192938A1 (en) | 2003-03-24 | 2004-09-30 | Manzer Leo Ernest | Production of 5-mehyl-N-aryl-2-pyrrolidone and 5-methyl-N-alkyl-2-pyrrolidone by reductive of levulinic acid esters with aryl and alkyl amines |
| KR101056544B1 (ko) * | 2003-08-19 | 2011-08-11 | 아반토르 퍼포먼스 머티리얼스, 인크. | 마이크로전자 기판용 박리 및 세정 조성물 |
| TWI393178B (zh) * | 2005-01-27 | 2013-04-11 | Advanced Tech Materials | 半導體基板處理用之組成物 |
| US7632796B2 (en) | 2005-10-28 | 2009-12-15 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and method for its use |
| US9329486B2 (en) | 2005-10-28 | 2016-05-03 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and method for its use |
| US8263539B2 (en) | 2005-10-28 | 2012-09-11 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and methods for its use |
| ES2356109T3 (es) * | 2007-02-14 | 2011-04-05 | Mallinckrodt Baker, Inc. | Formulaciones basadas en oxometalato activadas por peróxido para la eliminación de residuos de grabado. |
| US8481472B2 (en) | 2008-10-09 | 2013-07-09 | Avantor Performance Materials, Inc. | Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition |
| US8298751B2 (en) | 2009-11-02 | 2012-10-30 | International Business Machines Corporation | Alkaline rinse agents for use in lithographic patterning |
| WO2012161790A1 (en) * | 2011-02-24 | 2012-11-29 | John Moore | Concentrated chemical composition and method for removing photoresist during microelectric fabrication |
| US9158202B2 (en) | 2012-11-21 | 2015-10-13 | Dynaloy, Llc | Process and composition for removing substances from substrates |
| US10072237B2 (en) * | 2015-08-05 | 2018-09-11 | Versum Materials Us, Llc | Photoresist cleaning composition used in photolithography and a method for treating substrate therewith |
| US12441964B2 (en) * | 2019-02-15 | 2025-10-14 | Nissan Chemical Corporation | Cleaning agent composition and cleaning method |
| JP7530049B2 (ja) * | 2019-02-15 | 2024-08-07 | 日産化学株式会社 | 洗浄剤組成物及び洗浄方法 |
| KR102780281B1 (ko) * | 2019-08-30 | 2025-03-14 | 다우 글로벌 테크놀로지스 엘엘씨 | 포토레지스트 박리 조성물 |
| CN111519190B (zh) * | 2020-05-27 | 2022-03-18 | 湖北兴福电子材料有限公司 | 一种铜制程面板中稳定蚀刻锥角的蚀刻液及稳定方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4744834A (en) * | 1986-04-30 | 1988-05-17 | Noor Haq | Photoresist stripper comprising a pyrrolidinone, a diethylene glycol ether, a polyglycol and a quaternary ammonium hydroxide |
| EP0301044A4 (en) * | 1987-02-05 | 1989-03-29 | Macdermid Inc | ETCHING COMPOSITION FOR PHOTORESERVE. |
| US5091103A (en) * | 1990-05-01 | 1992-02-25 | Alicia Dean | Photoresist stripper |
| US6110881A (en) * | 1990-11-05 | 2000-08-29 | Ekc Technology, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| EP0578507B1 (en) * | 1992-07-09 | 2005-09-28 | Ekc Technology, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| JPH0959689A (ja) * | 1995-08-29 | 1997-03-04 | Mitsubishi Chem Corp | 研削剤除去用洗浄剤 |
| MXPA00011391A (es) * | 1998-05-18 | 2005-06-20 | Mallinckrodt Inc | Composiciones alcalinas que contienen silicato para limpiar substratos microelectronicos. |
| JP4565741B2 (ja) * | 1998-05-18 | 2010-10-20 | マリンクロッド・ベイカー・インコーポレイテッド | マイクロエレクトロニクス基板洗浄用珪酸塩含有アルカリ組成物 |
| US6558879B1 (en) * | 2000-09-25 | 2003-05-06 | Ashland Inc. | Photoresist stripper/cleaner compositions containing aromatic acid inhibitors |
-
2002
- 2002-07-05 MY MYPI20022558A patent/MY139607A/en unknown
- 2002-07-08 EP EP02749817A patent/EP1404796B1/en not_active Expired - Lifetime
- 2002-07-08 IL IL15976102A patent/IL159761A0/xx active IP Right Grant
- 2002-07-08 CN CN2010102990065A patent/CN102399651A/zh active Pending
- 2002-07-08 CN CNA028138759A patent/CN1526007A/zh active Pending
- 2002-07-08 RS YUP-9/04A patent/RS904A/sr unknown
- 2002-07-08 AU AU2002320305A patent/AU2002320305A1/en not_active Abandoned
- 2002-07-08 KR KR20047000266A patent/KR20040018437A/ko not_active Ceased
- 2002-07-08 KR KR1020097008556A patent/KR100944444B1/ko not_active Expired - Lifetime
- 2002-07-08 BR BR0211054-7A patent/BR0211054A/pt not_active IP Right Cessation
- 2002-07-08 PL PL367838A patent/PL199501B1/pl not_active IP Right Cessation
- 2002-07-08 JP JP2003512356A patent/JP4177758B2/ja not_active Expired - Fee Related
- 2002-07-08 CA CA2452884A patent/CA2452884C/en not_active Expired - Fee Related
- 2002-07-08 WO PCT/US2002/021374 patent/WO2003006597A1/en not_active Ceased
- 2002-07-08 AT AT02749817T patent/ATE545695T1/de active
- 2002-07-09 TW TW091115168A patent/TWI292437B/zh not_active IP Right Cessation
-
2004
- 2004-01-06 ZA ZA200400064A patent/ZA200400064B/en unknown
- 2004-01-07 IL IL159761A patent/IL159761A/en not_active IP Right Cessation
- 2004-01-08 NO NO20040067A patent/NO20040067L/no not_active Application Discontinuation
- 2004-01-08 IN IN42CH2004 patent/IN2004CH00042A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TWI292437B (en) | 2008-01-11 |
| JP2004536181A (ja) | 2004-12-02 |
| BR0211054A (pt) | 2004-07-20 |
| EP1404796B1 (en) | 2012-02-15 |
| IL159761A (en) | 2006-12-10 |
| AU2002320305A1 (en) | 2003-01-29 |
| IN2004CH00042A (enExample) | 2005-12-02 |
| PL199501B1 (pl) | 2008-09-30 |
| CN1526007A (zh) | 2004-09-01 |
| MY139607A (en) | 2009-10-30 |
| KR20040018437A (ko) | 2004-03-03 |
| CA2452884A1 (en) | 2003-01-23 |
| ZA200400064B (en) | 2004-10-27 |
| JP4177758B2 (ja) | 2008-11-05 |
| PL367838A1 (en) | 2005-03-07 |
| CA2452884C (en) | 2010-12-07 |
| NO20040067L (no) | 2004-03-05 |
| WO2003006597A1 (en) | 2003-01-23 |
| EP1404796A1 (en) | 2004-04-07 |
| IL159761A0 (en) | 2004-06-20 |
| RS904A (sr) | 2007-02-05 |
| CN102399651A (zh) | 2012-04-04 |
| KR20090076934A (ko) | 2009-07-13 |
| KR100944444B1 (ko) | 2010-02-26 |
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