ATE532202T1 - Abbildungsfehlerkorrektor und damit ausgerüstetes teilchenstrahlsystem - Google Patents

Abbildungsfehlerkorrektor und damit ausgerüstetes teilchenstrahlsystem

Info

Publication number
ATE532202T1
ATE532202T1 AT09252208T AT09252208T ATE532202T1 AT E532202 T1 ATE532202 T1 AT E532202T1 AT 09252208 T AT09252208 T AT 09252208T AT 09252208 T AT09252208 T AT 09252208T AT E532202 T1 ATE532202 T1 AT E532202T1
Authority
AT
Austria
Prior art keywords
poles
exciting coils
magnetic fields
particle beam
beam system
Prior art date
Application number
AT09252208T
Other languages
English (en)
Inventor
Hidetaka Sawada
Yukihito Kondoh
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Application granted granted Critical
Publication of ATE532202T1 publication Critical patent/ATE532202T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1532—Astigmatism
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Tubes For Measurement (AREA)
AT09252208T 2008-09-24 2009-09-17 Abbildungsfehlerkorrektor und damit ausgerüstetes teilchenstrahlsystem ATE532202T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008244927A JP5237734B2 (ja) 2008-09-24 2008-09-24 収差補正装置および該収差補正装置を備える荷電粒子線装置

Publications (1)

Publication Number Publication Date
ATE532202T1 true ATE532202T1 (de) 2011-11-15

Family

ID=41505898

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09252208T ATE532202T1 (de) 2008-09-24 2009-09-17 Abbildungsfehlerkorrektor und damit ausgerüstetes teilchenstrahlsystem

Country Status (4)

Country Link
US (1) US9793088B2 (de)
EP (1) EP2169702B1 (de)
JP (1) JP5237734B2 (de)
AT (1) ATE532202T1 (de)

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JP5502595B2 (ja) * 2010-05-18 2014-05-28 日本電子株式会社 球面収差補正装置および球面収差補正方法
JP5677081B2 (ja) * 2010-12-28 2015-02-25 株式会社日立ハイテクノロジーズ 荷電粒子線装置
DE102011009954A1 (de) * 2011-02-01 2012-08-02 Ceos Corrected Electron Optical Systems Gmbh Korrektor
US8536538B2 (en) * 2011-02-16 2013-09-17 Kla-Tencor Corporation Multiple-pole electrostatic deflector for improving throughput of focused electron beam instruments
CN103688333B (zh) * 2011-02-18 2016-10-19 应用材料以色列公司 聚焦带电粒子成像系统
CN102867546B (zh) * 2012-09-11 2015-01-21 中国科学技术大学 简化十二极场磁铁装置及其制造方法
CN103345957B (zh) * 2013-06-26 2015-10-21 中国科学技术大学 一种圆孔径反对称简化六极场磁铁装置及其制造方法
JP6254445B2 (ja) 2014-01-09 2017-12-27 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置
CN104681230B (zh) * 2014-12-16 2017-03-29 中国原子能科学研究院 一种加速器用束流均匀化六极磁铁
JP6326380B2 (ja) * 2015-01-20 2018-05-16 日本電子株式会社 多極子レンズおよび荷電粒子ビーム装置
US9922796B1 (en) * 2016-12-01 2018-03-20 Applied Materials Israel Ltd. Method for inspecting a specimen and charged particle multi-beam device
US10453645B2 (en) * 2016-12-01 2019-10-22 Applied Materials Israel Ltd. Method for inspecting a specimen and charged particle multi-beam device
JP6868480B2 (ja) * 2017-06-20 2021-05-12 日本電子株式会社 歪み補正方法および電子顕微鏡
JP7124216B2 (ja) * 2019-05-15 2022-08-23 株式会社日立ハイテク 荷電粒子線装置
US11056312B1 (en) * 2020-02-05 2021-07-06 Kla Corporation Micro stigmator array for multi electron beam system
US11239045B1 (en) * 2020-09-30 2022-02-01 Fei Company Method and system for correcting two-fold, fifth-order parasitic aberrations in charged particle systems

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US4962309A (en) * 1989-08-21 1990-10-09 Rockwell International Corporation Magnetic optics adaptive technique
EP0451370B1 (de) * 1990-04-12 1996-03-27 Koninklijke Philips Electronics N.V. Korrekturvorrichtung für ein teilchengeladenes Strahlgerät
JPH11219678A (ja) * 1998-01-30 1999-08-10 Nikon Corp 荷電粒子線装置の収差補正方法および荷電粒子線装置
JP2002042707A (ja) * 2000-07-25 2002-02-08 Jeol Ltd 非点収差補正装置
US20030043358A1 (en) * 2001-08-31 2003-03-06 Nikon Corporation Methods for determining focus and astigmatism in charged-particle-beam microlithography
JP3914750B2 (ja) * 2001-11-20 2007-05-16 日本電子株式会社 収差補正装置を備えた荷電粒子線装置
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US7015481B2 (en) * 2003-02-14 2006-03-21 Jeol Ltd. Charged-particle optical system
JP4313691B2 (ja) * 2003-02-14 2009-08-12 日本電子株式会社 荷電粒子光学装置
US7138629B2 (en) * 2003-04-22 2006-11-21 Ebara Corporation Testing apparatus using charged particles and device manufacturing method using the testing apparatus
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JP4328192B2 (ja) * 2003-12-12 2009-09-09 日本電子株式会社 荷電粒子光学系における多極場発生装置および収差補正装置
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JP4851148B2 (ja) * 2005-09-27 2012-01-11 日本電子株式会社 電子顕微鏡
JP2007128656A (ja) * 2005-11-01 2007-05-24 Jeol Ltd 収差補正装置を備えた荷電粒子ビーム装置
JP4988216B2 (ja) * 2006-02-03 2012-08-01 株式会社日立ハイテクノロジーズ 収差補正装置を搭載した荷電粒子線装置
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US8242457B2 (en) * 2007-03-15 2012-08-14 Multibeam Corporation Charged particle optics with azimuthally-varying third-order aberrations for generation of shaped beams
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Also Published As

Publication number Publication date
JP5237734B2 (ja) 2013-07-17
US9793088B2 (en) 2017-10-17
JP2010080136A (ja) 2010-04-08
EP2169702A1 (de) 2010-03-31
EP2169702B1 (de) 2011-11-02
US20100072387A1 (en) 2010-03-25

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