ATE527576T1 - Drucklithographie unter verwendung des flüssig- /fest-übergangs von metallen und ihren legierungen - Google Patents
Drucklithographie unter verwendung des flüssig- /fest-übergangs von metallen und ihren legierungenInfo
- Publication number
- ATE527576T1 ATE527576T1 AT05757746T AT05757746T ATE527576T1 AT E527576 T1 ATE527576 T1 AT E527576T1 AT 05757746 T AT05757746 T AT 05757746T AT 05757746 T AT05757746 T AT 05757746T AT E527576 T1 ATE527576 T1 AT E527576T1
- Authority
- AT
- Austria
- Prior art keywords
- liquid
- alloys
- metals
- solid transition
- patternable layer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Manufacturing & Machinery (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/870,664 US7141275B2 (en) | 2004-06-16 | 2004-06-16 | Imprinting lithography using the liquid/solid transition of metals and their alloys |
PCT/US2005/020351 WO2006009626A2 (en) | 2004-06-16 | 2005-06-08 | Imprinting lithography using the liquid/solid transition of metals and their alloys |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE527576T1 true ATE527576T1 (de) | 2011-10-15 |
Family
ID=34978708
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT05757746T ATE527576T1 (de) | 2004-06-16 | 2005-06-08 | Drucklithographie unter verwendung des flüssig- /fest-übergangs von metallen und ihren legierungen |
Country Status (5)
Country | Link |
---|---|
US (2) | US7141275B2 (de) |
EP (1) | EP1756669B1 (de) |
JP (1) | JP2008503873A (de) |
AT (1) | ATE527576T1 (de) |
WO (1) | WO2006009626A2 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005101466A2 (en) | 2003-12-19 | 2005-10-27 | The University Of North Carolina At Chapel Hill | Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography |
US9040090B2 (en) | 2003-12-19 | 2015-05-26 | The University Of North Carolina At Chapel Hill | Isolated and fixed micro and nano structures and methods thereof |
US20060144274A1 (en) * | 2004-12-30 | 2006-07-06 | Asml Netherlands B.V. | Imprint lithography |
US20090304992A1 (en) * | 2005-08-08 | 2009-12-10 | Desimone Joseph M | Micro and Nano-Structure Metrology |
WO2009041510A1 (ja) * | 2007-09-25 | 2009-04-02 | Panasonic Electric Works Co., Ltd. | 樹脂成形体の製造方法、その製造方法により得られる樹脂成形体、光デバイス、マイクロレンズ、マイクロレンズアレイ、及びマイクロ流体デバイス |
JP5783714B2 (ja) * | 2010-12-17 | 2015-09-24 | キヤノン株式会社 | 光学素子の製造方法 |
DE102013111372B4 (de) * | 2013-10-15 | 2016-06-30 | Technische Universität Braunschweig | Verfahren zur Herstellung eines oberflächenstrukturierten Gegenstands |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB189717969A (en) * | 1897-07-31 | 1898-06-04 | New Press Printing Company Han | A New Method of Embossing Paper, Boards, Leather, Tin, and like Substances. |
US5772905A (en) * | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
JPH1096808A (ja) * | 1996-09-24 | 1998-04-14 | Nippon Telegr & Teleph Corp <Ntt> | 微細パタン形成法 |
US6048623A (en) | 1996-12-18 | 2000-04-11 | Kimberly-Clark Worldwide, Inc. | Method of contact printing on gold coated films |
US5920848A (en) | 1997-02-12 | 1999-07-06 | Citibank, N.A. | Method and system for using intelligent agents for financial transactions, services, accounting, and advice |
AU4554699A (en) | 1998-06-08 | 1999-12-30 | Borealis Technical Limited | Method for fabricating metal nanostructures |
US7074498B2 (en) * | 2002-03-22 | 2006-07-11 | Borealis Technical Limited | Influence of surface geometry on metal properties |
US6680214B1 (en) | 1998-06-08 | 2004-01-20 | Borealis Technical Limited | Artificial band gap |
EP1003078A3 (de) * | 1998-11-17 | 2001-11-07 | Corning Incorporated | Verfahren zur Vervielfältigung eines Nanomusters |
US6518156B1 (en) * | 1999-03-29 | 2003-02-11 | Hewlett-Packard Company | Configurable nanoscale crossbar electronic circuits made by electrochemical reaction |
US6165911A (en) * | 1999-12-29 | 2000-12-26 | Calveley; Peter Braden | Method of patterning a metal layer |
SE516194C2 (sv) * | 2000-04-18 | 2001-12-03 | Obducat Ab | Substrat för samt process vid tillverkning av strukturer |
KR20030040378A (ko) | 2000-08-01 | 2003-05-22 | 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 | 임프린트 리소그래피를 위한 투명한 템플릿과 기판사이의고정확성 갭 및 방향설정 감지 방법 |
US6964793B2 (en) * | 2002-05-16 | 2005-11-15 | Board Of Regents, The University Of Texas System | Method for fabricating nanoscale patterns in light curable compositions using an electric field |
US6432740B1 (en) | 2001-06-28 | 2002-08-13 | Hewlett-Packard Company | Fabrication of molecular electronic circuit by imprinting |
US6946410B2 (en) * | 2002-04-05 | 2005-09-20 | E. I. Du Pont De Nemours And Company | Method for providing nano-structures of uniform length |
US7179079B2 (en) * | 2002-07-08 | 2007-02-20 | Molecular Imprints, Inc. | Conforming template for patterning liquids disposed on substrates |
US20040112862A1 (en) * | 2002-12-12 | 2004-06-17 | Molecular Imprints, Inc. | Planarization composition and method of patterning a substrate using the same |
TW556031B (en) * | 2003-01-17 | 2003-10-01 | Chunghwa Picture Tubes Ltd | Non-rubbing liquid crystal alignment method |
-
2004
- 2004-06-16 US US10/870,664 patent/US7141275B2/en not_active Expired - Fee Related
-
2005
- 2005-04-14 US US11/107,136 patent/US20050280147A1/en not_active Abandoned
- 2005-06-08 WO PCT/US2005/020351 patent/WO2006009626A2/en not_active Application Discontinuation
- 2005-06-08 EP EP05757746A patent/EP1756669B1/de not_active Not-in-force
- 2005-06-08 JP JP2007516564A patent/JP2008503873A/ja active Pending
- 2005-06-08 AT AT05757746T patent/ATE527576T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US20050282388A1 (en) | 2005-12-22 |
EP1756669A2 (de) | 2007-02-28 |
WO2006009626A3 (en) | 2006-03-09 |
EP1756669B1 (de) | 2011-10-05 |
US7141275B2 (en) | 2006-11-28 |
WO2006009626A2 (en) | 2006-01-26 |
JP2008503873A (ja) | 2008-02-07 |
US20050280147A1 (en) | 2005-12-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |