WO2006084118A3 - Imprint lithography template and method to facilitate control of liquid movement - Google Patents

Imprint lithography template and method to facilitate control of liquid movement Download PDF

Info

Publication number
WO2006084118A3
WO2006084118A3 PCT/US2006/003821 US2006003821W WO2006084118A3 WO 2006084118 A3 WO2006084118 A3 WO 2006084118A3 US 2006003821 W US2006003821 W US 2006003821W WO 2006084118 A3 WO2006084118 A3 WO 2006084118A3
Authority
WO
WIPO (PCT)
Prior art keywords
template
substrate
liquid
forces
imprint lithography
Prior art date
Application number
PCT/US2006/003821
Other languages
French (fr)
Other versions
WO2006084118A2 (en
Inventor
Ian M Mcmackin
Edward B Fletcher
Pankaj B Lad
Michael N Miller
Van N Truskett
Nicholas A Stacey
Frank Y Xu
Wesley Martin
Christopher J Mackay
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/051,941 external-priority patent/US20060177535A1/en
Priority claimed from US11/051,533 external-priority patent/US20060177532A1/en
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Publication of WO2006084118A2 publication Critical patent/WO2006084118A2/en
Publication of WO2006084118A3 publication Critical patent/WO2006084118A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Abstract

The present invention is directed to a template that features a control surface extending from a periphery of a mold toward a recessed surface of the template forming an oblique angle between a portion of the control surface disposed proximate to the periphery. Further, the present invention is directed to a method of controlling a quantity of liquid from extruding from a volumetric gap defined between a mold included in the substrate and a region of the substrate in superimposition therewith that features varying the capillary forces between the liquid and one of the template and the substrate. To that end, the method includes generating capillary forces between the liquid and one of the template and the substrate; and varying a magnitude of the forces to create a gradient of forces.
PCT/US2006/003821 2005-02-04 2006-02-01 Imprint lithography template and method to facilitate control of liquid movement WO2006084118A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US11/051,533 2005-02-04
US11/051,941 US20060177535A1 (en) 2005-02-04 2005-02-04 Imprint lithography template to facilitate control of liquid movement
US11/051,533 US20060177532A1 (en) 2005-02-04 2005-02-04 Imprint lithography method to control extrusion of a liquid from a desired region on a substrate
US11/051,941 2005-02-04

Publications (2)

Publication Number Publication Date
WO2006084118A2 WO2006084118A2 (en) 2006-08-10
WO2006084118A3 true WO2006084118A3 (en) 2008-01-31

Family

ID=36777962

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/003821 WO2006084118A2 (en) 2005-02-04 2006-02-01 Imprint lithography template and method to facilitate control of liquid movement

Country Status (2)

Country Link
TW (1) TW200639577A (en)
WO (1) WO2006084118A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6571656B2 (en) * 2013-12-10 2019-09-04 キャノン・ナノテクノロジーズ・インコーポレーテッド Imprint lithography template and method for zero gap imprinting
US10991582B2 (en) 2016-12-21 2021-04-27 Canon Kabushiki Kaisha Template for imprint lithography including a recession, an apparatus of using the template, and a method of fabricating an article
CN111240151B (en) * 2020-02-27 2024-04-09 京东方科技集团股份有限公司 Template transfer printing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3577593A (en) * 1968-10-29 1971-05-04 Bird & Son Apparatus for heat and vacuum-pressure machine molding
US20060172031A1 (en) * 2005-01-31 2006-08-03 Molecular Imprints, Inc. Chucking system for nano-manufacturing

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3577593A (en) * 1968-10-29 1971-05-04 Bird & Son Apparatus for heat and vacuum-pressure machine molding
US20060172031A1 (en) * 2005-01-31 2006-08-03 Molecular Imprints, Inc. Chucking system for nano-manufacturing

Also Published As

Publication number Publication date
WO2006084118A2 (en) 2006-08-10
TW200639577A (en) 2006-11-16

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