ATE507505T1 - Verfahren zur herstellung von ätzresistenten polymerstrukturen unter verwendung von elektronenstrahl-lithographie - Google Patents
Verfahren zur herstellung von ätzresistenten polymerstrukturen unter verwendung von elektronenstrahl-lithographieInfo
- Publication number
- ATE507505T1 ATE507505T1 AT03700777T AT03700777T ATE507505T1 AT E507505 T1 ATE507505 T1 AT E507505T1 AT 03700777 T AT03700777 T AT 03700777T AT 03700777 T AT03700777 T AT 03700777T AT E507505 T1 ATE507505 T1 AT E507505T1
- Authority
- AT
- Austria
- Prior art keywords
- electron beam
- beam lithography
- resistant polymer
- polymer structures
- producing etch
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA002377081A CA2377081A1 (en) | 2002-03-15 | 2002-03-15 | Method of producing an etch-resistant polymer structure using electron beam lithography |
| PCT/CA2003/000136 WO2003079112A1 (en) | 2002-03-15 | 2003-01-31 | Method of producing an etch-resistant polymer structure using electron beam lithography |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE507505T1 true ATE507505T1 (de) | 2011-05-15 |
Family
ID=33163752
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT03700777T ATE507505T1 (de) | 2002-03-15 | 2003-01-31 | Verfahren zur herstellung von ätzresistenten polymerstrukturen unter verwendung von elektronenstrahl-lithographie |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP1485757B1 (de) |
| JP (1) | JP2005521082A (de) |
| KR (1) | KR20040099331A (de) |
| AT (1) | ATE507505T1 (de) |
| AU (1) | AU2003202379A1 (de) |
| DE (1) | DE60336892D1 (de) |
-
2003
- 2003-01-31 DE DE60336892T patent/DE60336892D1/de not_active Expired - Lifetime
- 2003-01-31 EP EP03700777A patent/EP1485757B1/de not_active Expired - Lifetime
- 2003-01-31 AU AU2003202379A patent/AU2003202379A1/en not_active Abandoned
- 2003-01-31 JP JP2003577054A patent/JP2005521082A/ja not_active Ceased
- 2003-01-31 KR KR10-2004-7014521A patent/KR20040099331A/ko not_active Application Discontinuation
- 2003-01-31 AT AT03700777T patent/ATE507505T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005521082A (ja) | 2005-07-14 |
| DE60336892D1 (de) | 2011-06-09 |
| KR20040099331A (ko) | 2004-11-26 |
| EP1485757A1 (de) | 2004-12-15 |
| AU2003202379A1 (en) | 2003-09-29 |
| EP1485757B1 (de) | 2011-04-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE460389T1 (de) | Verfahren zur herstellung von phenylalkanen | |
| DE60322537D1 (de) | Verfahren zur herstellung von kohlenstoffnanoröhren | |
| ATE315604T1 (de) | Verfahren zur herstellung von wasser-in-wasser- polymerdispersionen | |
| DE60308281D1 (de) | Verfahren zur Herstellung von elektrolysiertem Wasser | |
| ATE403641T1 (de) | Verfahren zur herstellung von o- desmethylvenlafaxin | |
| ATE322826T1 (de) | Verfahren zur herstellung von pastenextrudierten sulfonamidzusammensetzungen | |
| ATE453648T1 (de) | Verfahren zur herstellung von hexahydrofuroc2,3- büfuran-3-ol | |
| ATE281448T1 (de) | Verfahren zur herstellung von citalopram | |
| DE60304119D1 (de) | Verfahren zur Herstellung von dünnwandigen gleichartigen Gitterstrukturen | |
| DE60318600D1 (de) | Verfahren zur herstellung einer lithografischen druckplatte | |
| DE60327788D1 (de) | Verfahren zur herstellung von polytrimethylenterephthalt-fasern | |
| DE59902758D1 (de) | Verfahren zur herstellung von teilfluorierten fluorpolymeren | |
| DE60322331D1 (de) | Verfahren zur Herstellung eines Artikels unter Verwendung einer lithographischen Projektionsmaske | |
| ATE448209T1 (de) | Verfahren zur herstellung von pyrimidinverbindungen | |
| DE60328487D1 (de) | Verfahren zur herstellung einer asymmetrischen membran mit hohem durchsatz | |
| DE50308650D1 (de) | Verfahren zur herstellung von cellulosecarbamatformkörpern | |
| DE60329907D1 (de) | Verfahren zur herstellung von wasserlöslichem carboxyliertem polymer | |
| ATE296287T1 (de) | Verfahren zur herstellung von repaglinide | |
| ATE278050T1 (de) | Verfahren zur herstellung einer verdampfungsquelle | |
| ATE281429T1 (de) | Verfahren zur herstellung von substituierten phenylacetonitrilen | |
| ATE284875T1 (de) | Verfahren zur herstellung von mesylaten von piperazinderivaten | |
| ATE553103T1 (de) | Verfahren zur herstellung von (s)-pantoprazol | |
| ATE501104T1 (de) | Verfahren zur herstellung von 1,2,2,2-tetrafluor- ethyl-difluor-methylether | |
| ATE273315T1 (de) | Verfahren zur herstellung von n- phosphonomethyliminodiessigsäure | |
| ATE389645T1 (de) | Verfahren zur herstellung von citalopram |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |