ATE499157T1 - Verfahren zum lokalisierten elektropfropfen auf lichtempfindliche halbleitersubstrate - Google Patents
Verfahren zum lokalisierten elektropfropfen auf lichtempfindliche halbleitersubstrateInfo
- Publication number
- ATE499157T1 ATE499157T1 AT08804378T AT08804378T ATE499157T1 AT E499157 T1 ATE499157 T1 AT E499157T1 AT 08804378 T AT08804378 T AT 08804378T AT 08804378 T AT08804378 T AT 08804378T AT E499157 T1 ATE499157 T1 AT E499157T1
- Authority
- AT
- Austria
- Prior art keywords
- electroplugting
- localized
- light sensitive
- semiconductor substrates
- sensitive semiconductor
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 4
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 239000006193 liquid solution Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/44—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
- C09D5/4476—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications comprising polymerisation in situ
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14685—Process for coatings or optical elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/32—Processes for applying liquids or other fluent materials using means for protecting parts of a surface not to be coated, e.g. using stencils, resists
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Life Sciences & Earth Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Wood Science & Technology (AREA)
- Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- Molecular Biology (AREA)
- Organic Chemistry (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photovoltaic Devices (AREA)
- Light Receiving Elements (AREA)
- Electrodes Of Semiconductors (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Formation Of Insulating Films (AREA)
- Optical Integrated Circuits (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0757723A FR2921516B1 (fr) | 2007-09-20 | 2007-09-20 | Procede d'electrogreffage localise sur des substrats semi-conducteurs photosensibles |
PCT/EP2008/062438 WO2009037311A1 (fr) | 2007-09-20 | 2008-09-18 | Procédé d'électrogreffage localisé sur des substrats semi-conducteurs photosensibles |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE499157T1 true ATE499157T1 (de) | 2011-03-15 |
Family
ID=39021036
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT08804378T ATE499157T1 (de) | 2007-09-20 | 2008-09-18 | Verfahren zum lokalisierten elektropfropfen auf lichtempfindliche halbleitersubstrate |
Country Status (7)
Country | Link |
---|---|
US (1) | US8466072B2 (de) |
EP (1) | EP2195121B1 (de) |
JP (1) | JP5599710B2 (de) |
AT (1) | ATE499157T1 (de) |
DE (1) | DE602008005171D1 (de) |
FR (1) | FR2921516B1 (de) |
WO (1) | WO2009037311A1 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2943688B1 (fr) * | 2009-03-27 | 2012-07-20 | Alchimer | Dispositif et procede pour realiser une reaction electrochimique sur une surface d'un substrat semi-conducteur |
FR2943930B1 (fr) | 2009-04-02 | 2011-09-30 | Commissariat Energie Atomique | Procede pour modifier l'energie de surface d'un solide |
FR2950353B1 (fr) | 2009-09-18 | 2012-01-13 | Commissariat Energie Atomique | Procede pour ameliorer les proprietes de resistance au frottement. |
FR3017743B1 (fr) * | 2014-02-17 | 2017-10-20 | Centre Nat Rech Scient | Dispositif et appareil electrochimique et procedes mettant en œuvre un tel appareil |
CN109860042B (zh) * | 2019-01-29 | 2022-10-18 | 上海交通大学 | 一种半导体表面制备自交联有机聚合物的方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2613911B2 (ja) * | 1988-03-26 | 1997-05-28 | 日本ペイント株式会社 | 導電性膜の形成法 |
US6706388B2 (en) | 2001-02-12 | 2004-03-16 | Arnold B. Finestone | Self-closing packaging material |
JP4172149B2 (ja) * | 2000-09-22 | 2008-10-29 | 富士ゼロックス株式会社 | 低電位電着用電着液及びこれを用いた電着方法 |
FR2829046B1 (fr) | 2001-08-28 | 2005-01-14 | Commissariat Energie Atomique | Procede de greffage et de croissance d'un film organique conducteur sur une surface |
FR2860523B1 (fr) | 2003-10-01 | 2006-01-13 | Commissariat Energie Atomique | Procede de formation d'un film polymere sur une surface conductrice ou semi-conductrice de l'electricite par electro-greffage, surfaces obtenues et applications |
FR2883299B1 (fr) | 2005-03-15 | 2007-06-15 | Commissariat Energie Atomique | Formation de films ultraminces greffes sur des surfaces conductrices ou semi-conductrices de l'electricite |
EP3613813A1 (de) * | 2006-02-28 | 2020-02-26 | Alchimer | Bildung von organischen elektrogepfropften folien auf der oberfläche von elektrisch leitfähigen oder halbleitenden oberflächen |
-
2007
- 2007-09-20 FR FR0757723A patent/FR2921516B1/fr not_active Expired - Fee Related
-
2008
- 2008-09-18 WO PCT/EP2008/062438 patent/WO2009037311A1/fr active Application Filing
- 2008-09-18 EP EP08804378A patent/EP2195121B1/de not_active Not-in-force
- 2008-09-18 AT AT08804378T patent/ATE499157T1/de not_active IP Right Cessation
- 2008-09-18 JP JP2010525349A patent/JP5599710B2/ja not_active Expired - Fee Related
- 2008-09-18 US US12/678,993 patent/US8466072B2/en active Active
- 2008-09-18 DE DE602008005171T patent/DE602008005171D1/de active Active
Also Published As
Publication number | Publication date |
---|---|
US20110281441A1 (en) | 2011-11-17 |
EP2195121A1 (de) | 2010-06-16 |
DE602008005171D1 (de) | 2011-04-07 |
FR2921516A1 (fr) | 2009-03-27 |
JP2011503346A (ja) | 2011-01-27 |
EP2195121B1 (de) | 2011-02-23 |
WO2009037311A1 (fr) | 2009-03-26 |
WO2009037311A9 (fr) | 2009-07-09 |
FR2921516B1 (fr) | 2010-03-12 |
US8466072B2 (en) | 2013-06-18 |
JP5599710B2 (ja) | 2014-10-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE499157T1 (de) | Verfahren zum lokalisierten elektropfropfen auf lichtempfindliche halbleitersubstrate | |
SG126044A1 (en) | Coating and developing system | |
WO2012048108A3 (en) | Radiation patternable cvd film | |
TW201129667A (en) | Fabricating method of film adhesive, adhesive sheet, semiconductor device and fabricating method thereof | |
WO2012074816A3 (en) | Method and apparatus for modulating wafer treatment profile in uv chamber | |
WO2008089168A3 (en) | Plasma immersion chamber | |
MX2010002079A (es) | Manipulacion de esferas en un inyector de gotas. | |
EP2171537A4 (de) | Ausrichtungssystem und -verfahren für ein substrat in einem nanodruckverfahren | |
TW201407763A (zh) | 可撓式顯示模組的製作方法 | |
IN2014DN03390A (de) | ||
TW200717587A (en) | Semiconductor substrate process using an optically writable carbon-containing mask | |
ATE548479T1 (de) | Biologisches laserdrucken mittels indirekter photon-biomaterial-wechselwirkungen | |
TW200736693A (en) | Electro-optic device, method for manufacturing electro-optic device, projector, and electronic apparatus | |
TW200628952A (en) | Method for manufacturing array board for display device | |
TW200702801A (en) | Method of forming bank, method of forming film pattern, semiconductor device, electro optic device, and electronic apparatus | |
DE60330543D1 (de) | Verfahren zur abscheidung anorganischer/organischer filme | |
CN103985665B (zh) | 一种柔性显示器的制作方法 | |
EP2319892A4 (de) | Lichtempfindliche haftzusammensetzung, lichtemfindlicher haftfilm, haftstruktur, halbleiterwafer mit haftschicht, halbleiterbauelement und elektronisches bauteil | |
TW200629008A (en) | Liquid removing apparatus, exposure apparatus and device manufacturing method | |
MX2012003087A (es) | Metodo para marcado por laser y sistema de marcado por laser. | |
TW201614368A (en) | Pattern forming method, method for manufacturing electronic device, and electronic device | |
ATE554149T1 (de) | Klebefolie zum abschleifen der oberfläche eines halbleiterwafers und verfahren zum abschleifen der oberfläche eines halbleiterwafers unter verwendung der klebefolie | |
TW200801815A (en) | Method for forming pattern and composition for forming organic thin film using therefor | |
TW200705023A (en) | A method for manufacturing a light compensation film, and a polarizer having the light compensation film | |
TW200712798A (en) | Novel method and system for advanced reticle contaimination cleaning |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |