ATE490282T1 - Adamantylmonomere und polymere für low-k- dielektrik anwendungen - Google Patents

Adamantylmonomere und polymere für low-k- dielektrik anwendungen

Info

Publication number
ATE490282T1
ATE490282T1 AT04805194T AT04805194T ATE490282T1 AT E490282 T1 ATE490282 T1 AT E490282T1 AT 04805194 T AT04805194 T AT 04805194T AT 04805194 T AT04805194 T AT 04805194T AT E490282 T1 ATE490282 T1 AT E490282T1
Authority
AT
Austria
Prior art keywords
low
polymers
adamantyl
dielectric applications
compounds
Prior art date
Application number
AT04805194T
Other languages
English (en)
Inventor
Jyri Paulasaari
Juha Rantala
Original Assignee
Silecs Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Silecs Oy filed Critical Silecs Oy
Application granted granted Critical
Publication of ATE490282T1 publication Critical patent/ATE490282T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • H10P14/6682—
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • H10P95/00—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Formation Of Insulating Films (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AT04805194T 2003-12-23 2004-12-23 Adamantylmonomere und polymere für low-k- dielektrik anwendungen ATE490282T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US53165903P 2003-12-23 2003-12-23
PCT/FI2004/000799 WO2005061587A1 (en) 2003-12-23 2004-12-23 Adamantyl monomers and polymers for low-k-dielectric applications

Publications (1)

Publication Number Publication Date
ATE490282T1 true ATE490282T1 (de) 2010-12-15

Family

ID=34710244

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04805194T ATE490282T1 (de) 2003-12-23 2004-12-23 Adamantylmonomere und polymere für low-k- dielektrik anwendungen

Country Status (5)

Country Link
EP (1) EP1711550B1 (de)
KR (1) KR101219548B1 (de)
AT (1) ATE490282T1 (de)
DE (1) DE602004030379D1 (de)
WO (1) WO2005061587A1 (de)

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU763347A1 (ru) * 1978-06-19 1980-09-15 Институт Химии Башкирского Филиала Ан Ссср Способ получени триметилсилилдиметиладамантана
JPS63267624A (ja) * 1988-04-05 1988-11-04 Ricoh Co Ltd 複写機等における中間トレイ
JPH0726193A (ja) * 1993-06-25 1995-01-27 Matsushita Electric Ind Co Ltd 誘電体用塗料及びフィルムコンデンサ
US6639015B1 (en) * 1998-09-01 2003-10-28 Catalysts & Chemicals Industries Co., Ltd. Coating liquid for forming a silica-containing film with a low-dielectric constant
JP2000302791A (ja) * 1999-04-20 2000-10-31 Fujitsu Ltd シリコン化合物、絶縁膜形成材料及び半導体装置
US20030064154A1 (en) * 2001-08-06 2003-04-03 Laxman Ravi K. Low-K dielectric thin films and chemical vapor deposition method of making same
WO2003059990A1 (en) * 2002-01-17 2003-07-24 Silecs Oy Thin films and methods for the preparation thereof
US7060634B2 (en) * 2002-01-17 2006-06-13 Silecs Oy Materials and methods for forming hybrid organic-inorganic dielectric materials for integrated circuit applications
TW200415167A (en) * 2002-07-25 2004-08-16 Sumitomo Chemical Co Adamantane compounds and insulating film forming coating solutions
JP4204880B2 (ja) * 2003-03-04 2009-01-07 出光興産株式会社 ビス（３−アミノ−４−ヒドロキシフェニル）アダマンタン誘導体及びその製造方法
JP4236495B2 (ja) * 2003-03-26 2009-03-11 ダイセル化学工業株式会社 アダマンタントリカルボン酸誘導体
JP2004307803A (ja) * 2003-03-26 2004-11-04 Daicel Chem Ind Ltd 絶縁膜形成材料及び絶縁膜
JP2004315461A (ja) * 2003-04-18 2004-11-11 Rikogaku Shinkokai 自己組織化単分子膜の製造方法
US7622399B2 (en) * 2003-09-23 2009-11-24 Silecs Oy Method of forming low-k dielectrics using a rapid curing process

Also Published As

Publication number Publication date
DE602004030379D1 (de) 2011-01-13
KR101219548B1 (ko) 2013-01-21
EP1711550A1 (de) 2006-10-18
EP1711550B1 (de) 2010-12-01
KR20060127905A (ko) 2006-12-13
WO2005061587A1 (en) 2005-07-07

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Legal Events

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