ATE485598T1 - Verfahren zum verschliessen einer mikrokavität und gehäuse mit mindestens einer mikrokavität - Google Patents

Verfahren zum verschliessen einer mikrokavität und gehäuse mit mindestens einer mikrokavität

Info

Publication number
ATE485598T1
ATE485598T1 AT03795528T AT03795528T ATE485598T1 AT E485598 T1 ATE485598 T1 AT E485598T1 AT 03795528 T AT03795528 T AT 03795528T AT 03795528 T AT03795528 T AT 03795528T AT E485598 T1 ATE485598 T1 AT E485598T1
Authority
AT
Austria
Prior art keywords
wafer
bonding material
microcavity
patterned intermediate
closing
Prior art date
Application number
AT03795528T
Other languages
English (en)
Inventor
Frank Niklaus
Goeran Stemme
Joachim Oberhammer
Original Assignee
Niklaus Consulting
Bonsens Ab
Joachim Oberhammer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Niklaus Consulting, Bonsens Ab, Joachim Oberhammer filed Critical Niklaus Consulting
Application granted granted Critical
Publication of ATE485598T1 publication Critical patent/ATE485598T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/16Fillings or auxiliary members in containers or encapsulations, e.g. centering rings
    • H01L23/18Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device
    • H01L23/26Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device including materials for absorbing or reacting with moisture or other undesired substances, e.g. getters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00261Processes for packaging MEMS devices
    • B81C1/00269Bonding of solid lids or wafers to the substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • H01L23/10Containers; Seals characterised by the material or arrangement of seals between parts, e.g. between cap and base of the container or between leads and walls of the container
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/01Packaging MEMS
    • B81C2203/0118Bonding a wafer on the substrate, i.e. where the cap consists of another wafer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/01Packaging MEMS
    • B81C2203/0172Seals
    • B81C2203/019Seals characterised by the material or arrangement of seals between parts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/03Bonding two components
    • B81C2203/038Bonding techniques not provided for in B81C2203/031 - B81C2203/037
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • H01L2924/143Digital devices
    • H01L2924/1433Application-specific integrated circuit [ASIC]
AT03795528T 2002-09-10 2003-09-10 Verfahren zum verschliessen einer mikrokavität und gehäuse mit mindestens einer mikrokavität ATE485598T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE0202681A SE0202681D0 (sv) 2002-09-10 2002-09-10 Hermetic sealing with combined adhesive bonding and sealing rings
PCT/SE2003/001408 WO2004025727A1 (en) 2002-09-10 2003-09-10 Method for sealing a microcavity and package comprising at least one microcavity

Publications (1)

Publication Number Publication Date
ATE485598T1 true ATE485598T1 (de) 2010-11-15

Family

ID=20288952

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03795528T ATE485598T1 (de) 2002-09-10 2003-09-10 Verfahren zum verschliessen einer mikrokavität und gehäuse mit mindestens einer mikrokavität

Country Status (7)

Country Link
EP (1) EP1540727B1 (de)
AT (1) ATE485598T1 (de)
AU (1) AU2003258943A1 (de)
DE (1) DE60334628D1 (de)
ES (1) ES2353869T3 (de)
SE (1) SE0202681D0 (de)
WO (1) WO2004025727A1 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7422962B2 (en) * 2004-10-27 2008-09-09 Hewlett-Packard Development Company, L.P. Method of singulating electronic devices
CA2584851C (en) * 2004-11-04 2015-04-07 Microchips, Inc. Compression and cold weld sealing methods and devices
US7576426B2 (en) * 2005-04-01 2009-08-18 Skyworks Solutions, Inc. Wafer level package including a device wafer integrated with a passive component
WO2007120887A2 (en) * 2006-04-13 2007-10-25 Qualcomm Mems Technologies, Inc Packaging a mems device using a frame
US7829438B2 (en) 2006-10-10 2010-11-09 Tessera, Inc. Edge connect wafer level stacking
US8513789B2 (en) 2006-10-10 2013-08-20 Tessera, Inc. Edge connect wafer level stacking with leads extending along edges
US7901989B2 (en) 2006-10-10 2011-03-08 Tessera, Inc. Reconstituted wafer level stacking
US7952195B2 (en) 2006-12-28 2011-05-31 Tessera, Inc. Stacked packages with bridging traces
US8461672B2 (en) 2007-07-27 2013-06-11 Tessera, Inc. Reconstituted wafer stack packaging with after-applied pad extensions
WO2009020572A2 (en) 2007-08-03 2009-02-12 Tessera Technologies Hungary Kft. Stack packages using reconstituted wafers
US8043895B2 (en) 2007-08-09 2011-10-25 Tessera, Inc. Method of fabricating stacked assembly including plurality of stacked microelectronic elements
WO2009038686A2 (en) * 2007-09-14 2009-03-26 Tessera Technologies Hungary Kft. Hermetic wafer level cavity package
DE102007058951B4 (de) 2007-12-07 2020-03-26 Snaptrack, Inc. MEMS Package
US8680662B2 (en) 2008-06-16 2014-03-25 Tessera, Inc. Wafer level edge stacking
GB0817309D0 (en) * 2008-09-19 2008-10-29 Univ Heriot Watt Encapsulation method
US8466542B2 (en) 2009-03-13 2013-06-18 Tessera, Inc. Stacked microelectronic assemblies having vias extending through bond pads
DE102009002363B4 (de) * 2009-04-14 2019-03-07 Robert Bosch Gmbh Verfahren zum Befestigen einer ersten Trägereinrichtung an einer zweiten Trägereinrichtung
SE537499C2 (sv) 2009-04-30 2015-05-26 Silex Microsystems Ab Bondningsmaterialstruktur och process med bondningsmaterialstruktur
US10427153B2 (en) 2011-08-25 2019-10-01 Microchips Biotech, Inc. Systems and methods for sealing a plurality of reservoirs of a microchip element with a sealing grid
CN107049243A (zh) 2011-08-25 2017-08-18 微芯片生物科技公司 省空间的封闭装置及其制造方法
JP2013165212A (ja) * 2012-02-13 2013-08-22 Adwelds:Kk 電子デバイスの封止構造および接合装置
US8900906B2 (en) 2012-03-08 2014-12-02 Robert Bosch Gmbh Atomic layer deposition strengthening members and method of manufacture
DE102012206869B4 (de) * 2012-04-25 2021-05-27 Robert Bosch Gmbh Mikromechanisches Bauelement und Verfahren zur Herstellung eines mikromechanischen Bauelements
SG11201504886SA (en) 2012-12-21 2015-07-30 Microchips Biotech Inc Implantable medical device for minimally-invasive insertion
EP2961466B1 (de) 2013-02-28 2018-12-19 Microchips Biotech, Inc. Implantierbare medizinische vorrichtung zur minimal invasiven einführung
US9199838B2 (en) 2013-10-25 2015-12-01 Robert Bosch Gmbh Thermally shorted bolometer
US20190202684A1 (en) * 2017-12-29 2019-07-04 Texas Instruments Incorporated Protective bondline control structure
CN109545766B (zh) * 2018-11-14 2020-08-21 长江存储科技有限责任公司 三维存储器及其制造方法
US10759658B2 (en) 2018-12-10 2020-09-01 Texas Instruments Incorporated Hermetic vertical shear weld wafer bonding

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6499354B1 (en) * 1998-05-04 2002-12-31 Integrated Sensing Systems (Issys), Inc. Methods for prevention, reduction, and elimination of outgassing and trapped gases in micromachined devices
US6062461A (en) * 1998-06-03 2000-05-16 Delphi Technologies, Inc. Process for bonding micromachined wafers using solder
US6519075B2 (en) * 2000-11-03 2003-02-11 Agere Systems Inc. Packaged MEMS device and method for making the same

Also Published As

Publication number Publication date
WO2004025727A1 (en) 2004-03-25
EP1540727A1 (de) 2005-06-15
DE60334628D1 (de) 2010-12-02
SE0202681D0 (sv) 2002-09-10
EP1540727B1 (de) 2010-10-20
ES2353869T3 (es) 2011-03-07
AU2003258943A8 (en) 2004-04-30
WO2004025727A8 (en) 2004-12-23
AU2003258943A1 (en) 2004-04-30

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