ATE476754T1 - METHOD AND DEVICE FOR PRODUCING A SEMICONDUCTOR COMPONENT - Google Patents
METHOD AND DEVICE FOR PRODUCING A SEMICONDUCTOR COMPONENTInfo
- Publication number
- ATE476754T1 ATE476754T1 AT00105316T AT00105316T ATE476754T1 AT E476754 T1 ATE476754 T1 AT E476754T1 AT 00105316 T AT00105316 T AT 00105316T AT 00105316 T AT00105316 T AT 00105316T AT E476754 T1 ATE476754 T1 AT E476754T1
- Authority
- AT
- Austria
- Prior art keywords
- producing
- semiconductor component
- substrate
- washing liquid
- washing
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 3
- 238000005406 washing Methods 0.000 abstract 3
- 239000007788 liquid Substances 0.000 abstract 2
- 239000010409 thin film Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
A substrate is washed with a washing liquid. Compressed air is blown to the substrate (10) to remove the washing liquid. A thin film is formed on the substrate from which the washing solution has been removed.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11139820A JP2000331981A (en) | 1999-05-20 | 1999-05-20 | Method and device for manufacturing semiconductor device |
JP11228521A JP2001053309A (en) | 1999-08-12 | 1999-08-12 | Method for manufacturing thin-film solar cell panel and device for draining off rinsing water of thin-film solar cell panel |
JP28026699A JP2001102606A (en) | 1999-09-30 | 1999-09-30 | Washing device of solar cell substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE476754T1 true ATE476754T1 (en) | 2010-08-15 |
Family
ID=27317953
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT00105316T ATE476754T1 (en) | 1999-05-20 | 2000-03-16 | METHOD AND DEVICE FOR PRODUCING A SEMICONDUCTOR COMPONENT |
Country Status (5)
Country | Link |
---|---|
US (2) | US6271149B1 (en) |
EP (1) | EP1054457B1 (en) |
AT (1) | ATE476754T1 (en) |
AU (1) | AU775032B2 (en) |
DE (1) | DE60044762D1 (en) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6372389B1 (en) | 1999-11-19 | 2002-04-16 | Oki Electric Industry Co, Ltd. | Method and apparatus for forming resist pattern |
JP2005517308A (en) * | 2002-02-15 | 2005-06-09 | エイエスエム ニュートゥール インコーポレイテッド | Integrated semiconductor wafer processing system |
JP3862615B2 (en) * | 2002-06-10 | 2006-12-27 | キヤノン株式会社 | Silicon-based thin film forming apparatus and silicon-based thin film forming method |
DE10394095D2 (en) * | 2003-07-09 | 2006-11-02 | Rena Sondermaschinen Gmbh | Apparatus for cleaning wafers after the CMP process |
JP4647378B2 (en) * | 2005-04-20 | 2011-03-09 | 協和化工株式会社 | Drying equipment |
DE102008055889A1 (en) * | 2008-11-05 | 2010-01-14 | Siltronic Ag | Semiconductor wafer i.e. silicon wafer, treating method for producing microelectronic component, involves transporting semiconductor wafer away from output opening of liquid container in transporting direction by transporting device |
DE102008061521B4 (en) * | 2008-12-10 | 2011-12-08 | Siltronic Ag | Process for the treatment of a semiconductor wafer |
DE102009008371A1 (en) * | 2009-02-11 | 2010-08-12 | Schott Solar Ag | Integral process from wafer fabrication to module production for the production of wafers, solar cells and solar modules |
US8418418B2 (en) | 2009-04-29 | 2013-04-16 | 3Form, Inc. | Architectural panels with organic photovoltaic interlayers and methods of forming the same |
GB201018141D0 (en) | 2010-10-27 | 2010-12-08 | Pilkington Group Ltd | Polishing coated substrates |
US20130196466A1 (en) * | 2012-01-30 | 2013-08-01 | First Solar, Inc | Method and apparatus for producing a transparent conductive oxide |
FR2995728B1 (en) * | 2012-09-14 | 2014-10-24 | Commissariat Energie Atomique | DEVICE AND METHOD FOR RESTORING SILICON-BASED SOLAR CELLS WITH ULTRASONIC TRANSDUCER |
JP6302700B2 (en) * | 2013-03-18 | 2018-03-28 | 芝浦メカトロニクス株式会社 | Substrate processing apparatus and substrate processing method |
JP6455962B2 (en) | 2013-03-18 | 2019-01-23 | 芝浦メカトロニクス株式会社 | Substrate processing apparatus and substrate processing method |
JP6351993B2 (en) | 2013-03-18 | 2018-07-04 | 芝浦メカトロニクス株式会社 | Substrate processing apparatus and substrate processing method |
JP6367763B2 (en) * | 2015-06-22 | 2018-08-01 | 株式会社荏原製作所 | Wafer drying apparatus and wafer drying method |
US9640495B2 (en) | 2015-07-08 | 2017-05-02 | Deca Technologies Inc. | Semiconductor device processing method for material removal |
CA2946415C (en) * | 2015-11-11 | 2023-11-07 | Engineered Abrasives, Inc. | Part processing and cleaning apparatus and method of same |
US20190044021A1 (en) * | 2016-02-22 | 2019-02-07 | Applied Materials Italia S.R.L. | Apparatus for processing of a solar cell substrate, system for processing of a solar cell substrate and method for processing of a solar cell substrate |
CN107030057A (en) * | 2017-05-11 | 2017-08-11 | 惠科股份有限公司 | Vibrating belt cleaning device |
CN110892518B (en) * | 2017-07-14 | 2023-12-05 | 雷纳技术有限责任公司 | Drying device and method for drying substrate |
CN110744208A (en) * | 2018-07-23 | 2020-02-04 | 杭州纤纳光电科技有限公司 | Production line laser marking device and using method thereof |
US11373885B2 (en) * | 2019-05-16 | 2022-06-28 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Wet etching apparatus |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4017982A (en) * | 1975-07-28 | 1977-04-19 | Chemcut Corporation | Drying apparatus |
US4370356A (en) * | 1981-05-20 | 1983-01-25 | Integrated Technologies, Inc. | Method of meniscus coating |
EP0408216A3 (en) * | 1989-07-11 | 1991-09-18 | Hitachi, Ltd. | Method for processing wafers and producing semiconductor devices and apparatus for producing the same |
JPH03283429A (en) * | 1990-03-30 | 1991-12-13 | Hitachi Ltd | Cleaning device |
US5501744A (en) * | 1992-01-13 | 1996-03-26 | Photon Energy, Inc. | Photovoltaic cell having a p-type polycrystalline layer with large crystals |
US5587226A (en) * | 1993-01-28 | 1996-12-24 | Regents, University Of California | Porcelain-coated antenna for radio-frequency driven plasma source |
JP2581396B2 (en) * | 1993-06-23 | 1997-02-12 | 日本電気株式会社 | Substrate drying equipment |
KR960002534A (en) * | 1994-06-07 | 1996-01-26 | 이노우에 아키라 | Pressure reducing and atmospheric pressure treatment device |
JP3057599B2 (en) * | 1994-07-06 | 2000-06-26 | キヤノン株式会社 | Cleaning device and cleaning method |
US5762749A (en) * | 1995-07-21 | 1998-06-09 | Dainippon Screen Mfg. Co., Ltd. | Apparatus for removing liquid from substrates |
JP3704411B2 (en) * | 1996-12-26 | 2005-10-12 | 富士通株式会社 | Substrate processing method and processing apparatus |
JP3762013B2 (en) * | 1997-01-16 | 2006-03-29 | 株式会社カネカ | Manufacturing method of integrated thin film photoelectric conversion device |
JP3070511B2 (en) * | 1997-03-31 | 2000-07-31 | 日本電気株式会社 | Substrate drying equipment |
JPH10309666A (en) * | 1997-05-09 | 1998-11-24 | Speedfam Co Ltd | Edge polishing device and method for it |
JP3890153B2 (en) * | 1997-12-26 | 2007-03-07 | キヤノン株式会社 | Method and apparatus for producing electrophotographic photosensitive member |
US6143374A (en) * | 1998-02-04 | 2000-11-07 | E. I. Du Pont De Nemours And Company | Method for precise placement of an array of single particles on a surface |
AU772539B2 (en) * | 1999-07-29 | 2004-04-29 | Kaneka Corporation | Method for cleaning photovoltaic module and cleaning apparatus |
US6461444B1 (en) * | 1999-08-20 | 2002-10-08 | Kaneka Corporation | Method and apparatus for manufacturing semiconductor device |
-
2000
- 2000-03-16 EP EP00105316A patent/EP1054457B1/en not_active Expired - Lifetime
- 2000-03-16 DE DE60044762T patent/DE60044762D1/en not_active Expired - Lifetime
- 2000-03-16 AT AT00105316T patent/ATE476754T1/en not_active IP Right Cessation
- 2000-03-17 AU AU22338/00A patent/AU775032B2/en not_active Expired
- 2000-03-20 US US09/531,549 patent/US6271149B1/en not_active Expired - Lifetime
-
2001
- 2001-04-17 US US09/837,004 patent/US20010014542A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20010014542A1 (en) | 2001-08-16 |
US6271149B1 (en) | 2001-08-07 |
DE60044762D1 (en) | 2010-09-16 |
EP1054457A2 (en) | 2000-11-22 |
EP1054457A3 (en) | 2006-04-26 |
EP1054457B1 (en) | 2010-08-04 |
AU775032B2 (en) | 2004-07-15 |
AU2233800A (en) | 2000-11-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |