JP2001053309A - Method for manufacturing thin-film solar cell panel and device for draining off rinsing water of thin-film solar cell panel - Google Patents

Method for manufacturing thin-film solar cell panel and device for draining off rinsing water of thin-film solar cell panel

Info

Publication number
JP2001053309A
JP2001053309A JP11228521A JP22852199A JP2001053309A JP 2001053309 A JP2001053309 A JP 2001053309A JP 11228521 A JP11228521 A JP 11228521A JP 22852199 A JP22852199 A JP 22852199A JP 2001053309 A JP2001053309 A JP 2001053309A
Authority
JP
Japan
Prior art keywords
substrate
solar cell
electrode layer
cell panel
draining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11228521A
Other languages
Japanese (ja)
Inventor
Katsuhiko Hayashi
克彦 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP11228521A priority Critical patent/JP2001053309A/en
Priority to EP00105316A priority patent/EP1054457B1/en
Priority to DE60044762T priority patent/DE60044762D1/en
Priority to AT00105316T priority patent/ATE476754T1/en
Priority to AU22338/00A priority patent/AU775032B2/en
Priority to US09/531,549 priority patent/US6271149B1/en
Publication of JP2001053309A publication Critical patent/JP2001053309A/en
Priority to US09/837,004 priority patent/US20010014542A1/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/362Laser etching
    • B23K26/364Laser etching for making a groove or trench, e.g. for scribing a break initiation groove

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Photovoltaic Devices (AREA)
  • Laser Beam Processing (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method for satisfactorily draining off washing water while avoiding particles dispersed in the rinsing water from adhering a gain to a substrate, and manufacturing a thin film solar cell panel with an improved photoelelctric conversion characteristic. SOLUTION: A first electrode layer formed on a substrate 1 and a photoelectric conversion semiconductor layer or a second electrode layer are laser scribed and washed, and then the water is drained off. At least two air cutters, 7a, 7b, and 7c inclined in the orthogonal direction to the substrate transfer direction are arranged above and below the substrate 1 so that their most proximal ends of neighboring air cutters are apart from each other as viewed from the substrate transfer direction and overlapped as viewed from the orthogonal direction to the substrate transfer direction, and compressed air is jetted from each air cutter 7a, 7b, and 7c to the substrate 1 to drain off water.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、薄膜太陽電池パネ
ルの製造方法、より詳しくは薄膜太陽電池パネルのレー
ザースクライブおよび洗浄後の洗浄水の水切りを行う方
法、およびこの工程で用いられる水切り装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a thin-film solar cell panel, and more particularly, to a method for performing laser scribing of a thin-film solar cell panel and draining cleaning water after cleaning, and a drainer used in this step. .

【0002】[0002]

【従来の技術】薄膜型太陽電池パネルは、図2に示すよ
うに、ガラス基板1上に形成された第1の電極層(透明
電極層)2をレーザースクライブして分離し、第1の電
極層2上に光電変換半導体層3を製膜した後にレーザー
スクライブして分離し、光電変換半導体層3上に第2の
電極層(裏面金属電極層)4を製膜した後にレーザース
クライブして分離することにより製造される。
2. Description of the Related Art As shown in FIG. 2, a thin-film type solar cell panel separates a first electrode layer (transparent electrode layer) 2 formed on a glass substrate 1 by laser scribing to form a first electrode layer. After the photoelectric conversion semiconductor layer 3 is formed on the layer 2 and separated by laser scribing, the second electrode layer (backside metal electrode layer) 4 is formed on the photoelectric conversion semiconductor layer 3 and then separated by laser scribing. It is manufactured by doing.

【0003】上記の製造工程において、基板上にレーザ
ースクライブにより生じた切り滓などのパーティクルが
付着した状態で光電変換半導体層または裏面電極層を製
膜すると、パーティクルの個所で欠陥が発生し、太陽電
池の光電変換特性を低下させる原因となる。このため、
各レーザースクライブ工程後に、基板を洗浄して基板上
からパーティクルを除去する工程が行われる。この洗浄
工程は、洗浄槽内の洗浄水に基板を浸漬して超音波洗浄
したり、シャワーノズルから基板に洗浄水を噴射して洗
浄することにより行われる。また、洗浄工程後には、基
板上に残留しているパーティクルを洗浄水とともに除去
し、かつ洗浄水中に分散したパーティクルが再付着する
のを防止するために、基板上の水切りを完全に行った後
に基板を搬出する必要がある。
In the above manufacturing process, when a photoelectric conversion semiconductor layer or a back electrode layer is formed in a state where particles such as swarf generated by laser scribing adhere to a substrate, a defect is generated at a position of the particles, and the This may cause the photoelectric conversion characteristics of the battery to deteriorate. For this reason,
After each laser scribe step, a step of cleaning the substrate and removing particles from the substrate is performed. This cleaning step is performed by immersing the substrate in cleaning water in a cleaning tank to perform ultrasonic cleaning, or by spraying cleaning water onto the substrate from a shower nozzle to perform cleaning. After the cleaning step, after removing the particles remaining on the substrate together with the cleaning water, and after completely draining the substrate to prevent the particles dispersed in the cleaning water from reattaching, It is necessary to carry out the substrate.

【0004】従来、洗浄水の水切り工程は、基板の上下
に基板搬送方向に直交するように基板の幅全体をカバー
するエアーカッターをそれぞれ1本ずつ設置し、エアー
カッターのノズルから圧縮空気を噴射して基板上下に残
留している洗浄水を基板搬送方向の後方に押し流すこと
により行われていた。
Conventionally, in the step of draining the washing water, one air cutter is provided above and below the substrate so as to cover the entire width of the substrate so as to be orthogonal to the substrate transfer direction, and compressed air is injected from a nozzle of the air cutter. Then, the cleaning water remaining above and below the substrate is flushed backward in the substrate transport direction.

【0005】また、図3(A)および(B)に示すよう
に、基板1を搬送ローラー6により搬送し、基板1の上
下に基板搬送方向に直交する方向から若干傾斜するよう
に基板1の幅全体をカバーするエアーカッター7をそれ
ぞれ1本ずつ設置し、エアーカッター7のノズル8から
圧縮空気を噴射する方法も行われている。この方法で
は、たとえば基板1をそのスクライブライン5が搬送方
向に直交する状態で搬送しながら行われる。この方法
は、基板1の搬送方向に直交するスクライブライン5の
溝に沿って、残留した洗浄水とともにパーティクルを一
方向に押し流そうとするものである。
As shown in FIGS. 3A and 3B, the substrate 1 is transported by a transport roller 6, and the substrate 1 is moved up and down over the substrate 1 so as to be slightly inclined from a direction perpendicular to the substrate transport direction. A method of installing one air cutter 7 covering the entire width and injecting compressed air from a nozzle 8 of the air cutter 7 is also used. In this method, for example, the substrate 1 is transported while the scribe line 5 is perpendicular to the transport direction. In this method, the particles are flushed in one direction along with the remaining cleaning water along the grooves of the scribe line 5 perpendicular to the transport direction of the substrate 1.

【0006】しかし、図3の方法で、基板1の裏側搬送
面で搬送ローラー6の間の領域で完全に水切りを終了さ
せようとすると、搬送ローラー6の間隔を超える範囲ま
でエアーカッター7を斜めに配置することはできない。
このため、基板1上に残留している洗浄水を基板搬送方
向に直交する方向へ押し流す力が十分に発生せず、スク
ライブライン5の溝に水が残留しやすくなる。また、図
3のように、基板1の上下にそれぞれ1本ずつ設けられ
た基板1の幅全体をカバーするエアーカッター7を用い
て大面積の基板の水切りを行う場合、スクライブライン
5の溝内(特に端部側)で圧縮空気により押された水の
層の厚みが厚くなる。この状態で圧縮空気が当たると洗
浄水の流れが乱れて、水切りが終了した部分にパーティ
クルを含む洗浄水が再付着することがある。たとえて言
えば、スクライブライン5の溝内で洗浄水の「波」が高
くなり、この「波」が壊れることによってパーティクル
を含む洗浄水が他の部分に広がる現象が生じる。この結
果、パーティクルの除去が不完全になり、太陽電池の光
電変換特性を低下させる原因となる。
However, in the method shown in FIG. 3, when the draining is to be completely completed in the area between the transport rollers 6 on the rear transport surface of the substrate 1, the air cutter 7 is obliquely moved to a range exceeding the interval between the transport rollers 6. Can not be placed in
For this reason, a force for flushing the cleaning water remaining on the substrate 1 in a direction orthogonal to the substrate transfer direction is not generated sufficiently, and water is likely to remain in the groove of the scribe line 5. Also, as shown in FIG. 3, when draining a large area substrate using an air cutter 7 that covers the entire width of the substrate 1 provided one above and below the substrate 1, the inside of the groove of the scribe line 5 The thickness of the layer of water pushed by the compressed air (especially at the end) is increased. When compressed air is applied in this state, the flow of the cleaning water is disturbed, and the cleaning water containing particles may adhere again to the portion where the drainage has been completed. For example, the “wave” of the cleaning water increases in the groove of the scribe line 5, and the phenomenon that the cleaning water including particles spreads to other portions due to the breakage of the “wave”. As a result, the removal of particles becomes incomplete, which causes a deterioration in the photoelectric conversion characteristics of the solar cell.

【0007】[0007]

【発明が解決しようとする課題】本発明の目的は、洗浄
水中に分散しているパーティクルが基板に再付着するの
を避けながら、十分に水切りを実施でき、従来よりも光
電変換特性が改善された薄膜太陽電池パネルを製造でき
る方法および装置を提供することにある。
SUMMARY OF THE INVENTION It is an object of the present invention to sufficiently drain water while preventing particles dispersed in cleaning water from re-adhering to a substrate, and to improve photoelectric conversion characteristics as compared with the prior art. It is an object of the present invention to provide a method and an apparatus capable of manufacturing a thin film solar cell panel.

【0008】[0008]

【課題を解決するための手段】本発明の薄膜太陽電池パ
ネルの製造方法は、基板上に形成された第1の電極層を
レーザースクライブし、洗浄した後、水切りを行う工程
と、第1の電極層上に光電変換半導体層を製膜してレー
ザースクライブし、洗浄した後、水切りを行う工程と、
光電変換半導体層上に第2の電極層を製膜してレーザー
スクライブし、洗浄した後、水切りを行う工程とを具備
した薄膜太陽電池パネルの製造方法において、前記各水
切り工程は、基板の上下にそれぞれ基板搬送方向に直交
する方向に対して傾斜するように2本以上のエアーカッ
ターを、互いに隣り合うエアーカッターの最近接の端部
どうしが基板搬送方向で見て離間し基板搬送方向に直交
する方向で見て重なるように設置し、各エアーカッター
から基板に対して圧縮空気を噴射することにより行われ
ることを特徴とする。
According to the present invention, there is provided a method for manufacturing a thin-film solar cell panel, comprising the steps of laser scribing a first electrode layer formed on a substrate, cleaning the electrode layer, and then draining the first electrode layer. Forming a photoelectric conversion semiconductor layer on the electrode layer, laser scribing, washing, and then draining,
Forming a second electrode layer on the photoelectric conversion semiconductor layer, performing laser scribing, washing, and then draining the water. The two or more air cutters are tilted with respect to the direction orthogonal to the substrate transport direction. The closest ends of the air cutters adjacent to each other are separated from each other when viewed in the substrate transport direction, and are orthogonal to the substrate transport direction. In this case, the air cutters are installed so as to overlap each other when viewed in the direction in which the air is blown, and compressed air is injected from each air cutter to the substrate.

【0009】本発明の方法において、前記各水切り工程
は、基板を第1の電極層、光電変換半導体層または第2
の電極層のスクライブラインが搬送方向に直交する状態
で搬送しながら行われることが好ましい。
In the method of the present invention, in each of the draining steps, the substrate is provided with a first electrode layer, a photoelectric conversion semiconductor layer, or a second electrode layer.
It is preferable to carry out the transfer while the scribe line of the electrode layer is perpendicular to the transfer direction.

【0010】本発明の薄膜太陽電池パネルの洗浄水の水
切り装置は、第1の電極層、光電変換半導体層、または
第2の電極層が形成され、レーザースクライブおよび洗
浄を経た薄膜太陽電池パネル基板を搬送する搬送機構
と、搬送される基板の上下にそれぞれ2本以上のエアー
カッターを備えた水切り機構であって、前記2本以上の
エアーカッターは基板搬送方向に直交する方向に対して
傾斜し、かつ互いに隣り合うエアーカッターの最近接の
端部どうしが基板搬送方向で見て離間し基板搬送方向に
直交する方向で見て重なるように設置されている水切り
機構とを具備したことを特徴とする。
The apparatus for draining cleaning water of a thin-film solar cell panel according to the present invention is a thin-film solar cell panel substrate on which a first electrode layer, a photoelectric conversion semiconductor layer, or a second electrode layer is formed and which has undergone laser scribing and cleaning. And a draining mechanism having two or more air cutters above and below the substrate to be transported, wherein the two or more air cutters are inclined with respect to a direction orthogonal to the substrate transport direction. And a draining mechanism installed such that the nearest ends of the air cutters adjacent to each other are separated from each other when viewed in the substrate transport direction and overlap when viewed in a direction perpendicular to the substrate transport direction. I do.

【0011】本発明の方法および装置を用いれば、洗浄
水中に分散しているパーティクルが基板に再付着するの
を避けながら、十分に水切りが行えるので、従来よりも
光電変換特性が改善された薄膜太陽電池パネルを製造す
ることができる。
By using the method and apparatus of the present invention, it is possible to sufficiently drain the water while avoiding particles dispersed in the cleaning water from re-adhering to the substrate. A solar panel can be manufactured.

【0012】[0012]

【発明の実施の形態】以下、本発明を図1を参照してよ
り詳細に説明する。図1(A)および(B)はそれぞれ
本発明に係る薄膜太陽電池パネルの洗浄水の水切り方法
を示す平面図および側面図である。
DETAILED DESCRIPTION OF THE INVENTION Hereinafter, the present invention will be described in more detail with reference to FIG. FIGS. 1A and 1B are a plan view and a side view, respectively, showing a method of draining cleaning water for a thin-film solar cell panel according to the present invention.

【0013】図1に示すように、基板1は第1の電極
層、光電変換半導体層または第2の電極層のレーザース
クライブの後に洗浄され、本発明の水切り装置の搬送ロ
ーラー6により搬送される。この場合、基板1はスクラ
イブライン5(図1には一部のスクライブラインのみを
表示している)が基板1の搬送方向に直交した状態で搬
送される。この水切り装置では、基板1の上下にそれぞ
れ基板搬送方向に直交する方向に対して傾斜するように
3本のエアーカッター7a、7b、7cが設置されてお
り、これらの3本のエアーカッターで基板1の幅全体を
カバーするようになっている。基板搬送方向に沿うエア
ーカッター7aの一端からエアーカッター7cの他端ま
での長さは搬送ローラー6の間隔を超えており、基板搬
送方向に直交する方向に対する各エアーカッターの傾斜
は従来よりも大きくなっている。また、互いに隣り合う
エアーカッター(図1の7aと7bまたは7bと7c)
は、最近接の端部どうしが基板搬送方向で見て離間し基
板搬送方向に直交する方向で見て重なるように設置され
ている。具体的には、図1におけるエアーカッター7a
の下端とエアーカッター7bの上端は、基板搬送方向で
見ると図1にSで示す間隔を隔てて離間している。ま
た、図1におけるエアーカッター7aの下端とエアーカ
ッター7bの上端は、基板搬送方向に直交する方向で見
ると図1にLで示す重なり部分がある。そして、各エア
ーカッター7a、7b、7cのほぼ全長にわたって形成
されたスリット状のノズル8から基板1に対して図1の
矢印で示す方向に圧縮空気を噴射することにより水切り
が行われる。
As shown in FIG. 1, the substrate 1 is cleaned after laser scribing of the first electrode layer, the photoelectric conversion semiconductor layer or the second electrode layer, and is conveyed by the conveying roller 6 of the drainer of the present invention. . In this case, the substrate 1 is transported in a state where the scribe lines 5 (only some of the scribe lines are shown in FIG. 1) are orthogonal to the transport direction of the substrate 1. In this drainer, three air cutters 7a, 7b, and 7c are provided above and below the substrate 1 so as to be inclined with respect to a direction orthogonal to the substrate transport direction. 1 to cover the entire width. The length from one end of the air cutter 7a to the other end of the air cutter 7c along the substrate transfer direction exceeds the distance between the transfer rollers 6, and the inclination of each air cutter with respect to the direction orthogonal to the substrate transfer direction is larger than before. Has become. Air cutters adjacent to each other (7a and 7b or 7b and 7c in FIG. 1)
Are installed such that the closest ends are separated from each other when viewed in the substrate transport direction and overlap when viewed in a direction perpendicular to the substrate transport direction. Specifically, the air cutter 7a in FIG.
1 and the upper end of the air cutter 7b are separated from each other by a distance indicated by S in FIG. 1 when viewed in the substrate transfer direction. In addition, the lower end of the air cutter 7a and the upper end of the air cutter 7b in FIG. 1 have an overlapping portion indicated by L in FIG. 1 when viewed in a direction orthogonal to the substrate transport direction. Draining is performed by injecting compressed air from the slit-shaped nozzle 8 formed over substantially the entire length of each of the air cutters 7a, 7b, 7c to the substrate 1 in the direction indicated by the arrow in FIG.

【0014】本発明の方法では、3本のエアーカッター
7a、7b、7cを搬送ローラー6の間隔を超える範囲
まで基板搬送方向に直交する方向に対して大きく傾斜さ
せて配置しているが、エアーカッターの基板搬送方向に
直交する方向に重なり部分を設けて搬送ローラー6の間
隔に相当する長さの領域に確実に圧縮空気を噴射できる
ようにしているので、十分に水切りが行える。このよう
にエアーカッターの傾斜が大きいため、基板1上に残留
している洗浄水を基板搬送方向に直交する方向へ押し流
す十分な力を発生させることができる。
In the method of the present invention, the three air cutters 7a, 7b, 7c are arranged at a large angle with respect to the direction perpendicular to the substrate transfer direction up to a range exceeding the interval between the transfer rollers 6, Since the overlapping portion is provided in the direction orthogonal to the substrate transport direction of the cutter so that the compressed air can be reliably jetted to the region having a length corresponding to the interval between the transport rollers 6, the drainage can be sufficiently performed. Since the inclination of the air cutter is large as described above, it is possible to generate a sufficient force to flush the cleaning water remaining on the substrate 1 in a direction orthogonal to the substrate transport direction.

【0015】また、基板1上の洗浄水はまずエアーカッ
ター7aのノズル8から噴射される圧縮空気によりスク
ライブライン5の溝内を押し流されていくが、基板1が
基板搬送方向に沿うエアーカッター7aとエアーカッタ
ー7bとの中間領域(間隔Sの領域)に移動してきた時
には圧縮空気が当たらなくなり、短時間の間、洗浄水に
これを押し流す力が加わらなくなる。しかし、その直後
(洗浄水が完全に逆流する前)に洗浄水はエアーカッタ
ー7bのノズル8から噴射される圧縮空気によりスクラ
イブライン5の溝内を再び押し流されていく。このよう
な動作はエアーカッター7bとエアーカッター7cとの
間でも起こる。たとえて言えば、圧縮空気を吹き付ける
ことによりスクライブライン5の溝内で洗浄水の「波」
が発生するが、1本のエアーカッターからの圧縮空気に
よる力だけでは「波」はそれほど高くなることなく、
「波」が壊れる前にエアーカッターどうしの中間領域で
平らに戻ろうとし、その直後に後続のエアーカッターか
らの圧縮空気により再び洗浄水を押し流して洗浄水を基
板1の外へうまく排出することができる。このため、従
来のように水切りが終了した部分にパーティクルを含む
洗浄水が広がる現象が生じることがなく、太陽電池の光
電変換特性の改善に有利になる。
The cleaning water on the substrate 1 is first flushed through the groove of the scribe line 5 by compressed air injected from the nozzle 8 of the air cutter 7a. When the air moves to the intermediate area (area of the interval S) between the air and the air cutter 7b, the compressed air does not hit and no force is applied to flush the cleaning water for a short time. However, immediately after that (before the cleaning water completely flows back), the cleaning water is again flushed in the groove of the scribe line 5 by the compressed air injected from the nozzle 8 of the air cutter 7b. Such an operation also occurs between the air cutter 7b and the air cutter 7c. For example, by blowing compressed air, the “waves” of the washing water in the grooves of the scribe line 5
Is generated, but the "wave" is not so high only by the force of the compressed air from one air cutter,
Attempt to return to the flat area in the middle area between the air cutters before the "wave" breaks, and immediately after that, flush the cleaning water again with compressed air from the subsequent air cutter and discharge the cleaning water out of the substrate 1 successfully. Can be. For this reason, the phenomenon in which the cleaning water containing particles does not spread to the portion where draining has been completed unlike the related art does not occur, which is advantageous for improving the photoelectric conversion characteristics of the solar cell.

【0016】本発明の方法により製造された太陽電池パ
ネルについて、100mW/cm2のAM1.5ソーラ
ーシミュレーターを用いて、電流電圧特性を測定した。
その結果、曲線因子FFは67%であった。一方、図3
に示す従来の方法により製造された太陽電池パネルの曲
線因子FFは65%であった。このように本発明の方法
は、太陽電池の光電変換特性の改善に効果がある。
The current-voltage characteristics of the solar cell panel manufactured by the method of the present invention were measured using an AM1.5 solar simulator of 100 mW / cm 2 .
As a result, the fill factor FF was 67%. On the other hand, FIG.
The fill factor FF of the solar cell panel manufactured by the conventional method shown in FIG. Thus, the method of the present invention is effective in improving the photoelectric conversion characteristics of a solar cell.

【0017】[0017]

【発明の効果】以上詳述したように本発明の方法および
装置を用いれば、洗浄水中に分散しているパーティクル
が基板に再付着するのを避けながら、十分に水切りを実
施でき、従来よりも光電変換特性が改善された薄膜太陽
電池パネルを製造することができる。
As described above in detail, by using the method and the apparatus of the present invention, it is possible to sufficiently drain the water while avoiding the particles dispersed in the cleaning water from re-adhering to the substrate. A thin-film solar cell panel with improved photoelectric conversion characteristics can be manufactured.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る薄膜太陽電池パネルの洗浄水の水
切り方法を示す平面図および側面図。
FIG. 1 is a plan view and a side view showing a method for draining cleaning water of a thin-film solar cell panel according to the present invention.

【図2】薄膜太陽電池パネルの断面図。FIG. 2 is a cross-sectional view of a thin-film solar cell panel.

【図3】従来の薄膜太陽電池パネルの洗浄水の水切り方
法を示す平面図および側面図。
FIG. 3 is a plan view and a side view showing a conventional method for draining cleaning water for a thin-film solar cell panel.

【符号の説明】[Explanation of symbols]

1…基板 2…第1の電極層(透明電極層) 3…光電変換半導体層 4…第2の電極層(裏面金属電極層) 5…スクライブライン 6…搬送ローラー 7、7a、7b、7c…エアーカッター 8…ノズル DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... 1st electrode layer (transparent electrode layer) 3 ... Photoelectric conversion semiconductor layer 4 ... 2nd electrode layer (backside metal electrode layer) 5 ... Scribe line 6 ... Transport roller 7, 7a, 7b, 7c ... Air cutter 8 ... Nozzle

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 基板上に形成された第1の電極層をレー
ザースクライブし、洗浄した後、水切りを行う工程と、
第1の電極層上に光電変換半導体層を製膜してレーザー
スクライブし、洗浄した後、水切りを行う工程と、光電
変換半導体層上に第2の電極層を製膜してレーザースク
ライブし、洗浄した後、水切りを行う工程とを具備した
薄膜太陽電池パネルの製造方法において、 前記各水切り工程は、基板の上下にそれぞれ基板搬送方
向に直交する方向に対して傾斜するように2本以上のエ
アーカッターを、互いに隣り合うエアーカッターの最近
接の端部どうしが基板搬送方向で見て離間し基板搬送方
向に直交する方向で見て重なるように設置し、各エアー
カッターから基板に対して圧縮空気を噴射することによ
り行われることを特徴とする薄膜太陽電池パネルの製造
方法。
A step of laser scribing and cleaning a first electrode layer formed on a substrate and then draining the first electrode layer;
Forming a photoelectric conversion semiconductor layer on the first electrode layer, performing laser scribing, washing, and draining; forming a second electrode layer on the photoelectric conversion semiconductor layer, performing laser scribing; A method of manufacturing a thin-film solar cell panel, comprising a step of draining after cleaning, wherein each of the draining steps is performed so that two or more of the draining steps are tilted above and below the substrate with respect to a direction orthogonal to the substrate transport direction. Install the air cutters so that the closest ends of the adjacent air cutters are separated from each other when viewed in the board transfer direction and overlap when viewed in the direction perpendicular to the board transfer direction. A method for producing a thin-film solar cell panel, which is performed by injecting air.
【請求項2】 前記各水切り工程は、基板を第1の電極
層、光電変換半導体層または第2の電極層のスクライブ
ラインが搬送方向に直交する状態で搬送しながら行われ
ることを特徴とする請求項1記載の薄膜太陽電池パネル
の製造方法。
2. The method according to claim 1, wherein each of the draining steps is performed while the substrate is transported in a state where scribe lines of the first electrode layer, the photoelectric conversion semiconductor layer, or the second electrode layer are orthogonal to the transport direction. A method for manufacturing a thin-film solar cell panel according to claim 1.
【請求項3】 第1の電極層、光電変換半導体層、また
は第2の電極層が形成され、レーザースクライブおよび
洗浄を経た薄膜太陽電池パネル基板を搬送する搬送機構
と、 搬送される基板の上下にそれぞれ2本以上のエアーカッ
ターを備えた水切り機構であって、前記2本以上のエア
ーカッターは基板搬送方向に直交する方向に対して傾斜
し、かつ互いに隣り合うエアーカッターの最近接の端部
どうしが基板搬送方向で見て離間し基板搬送方向に直交
する方向で見て重なるように設置されている水切り機構
とを具備したことを特徴とする薄膜太陽電池パネルの洗
浄水の水切り装置。
3. A transport mechanism for transporting a thin-film solar cell panel substrate on which a first electrode layer, a photoelectric conversion semiconductor layer, or a second electrode layer has been formed and which has undergone laser scribing and cleaning; A water draining mechanism provided with two or more air cutters, wherein the two or more air cutters are inclined with respect to a direction perpendicular to the substrate transfer direction, and are closest end portions of adjacent air cutters. A flushing mechanism for flushing water from a thin-film solar cell panel, wherein the flushing mechanism is provided so as to be separated from each other when viewed in the substrate transport direction and overlap each other when viewed in a direction perpendicular to the substrate transport direction.
JP11228521A 1999-05-20 1999-08-12 Method for manufacturing thin-film solar cell panel and device for draining off rinsing water of thin-film solar cell panel Pending JP2001053309A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP11228521A JP2001053309A (en) 1999-08-12 1999-08-12 Method for manufacturing thin-film solar cell panel and device for draining off rinsing water of thin-film solar cell panel
EP00105316A EP1054457B1 (en) 1999-05-20 2000-03-16 Method and apparatus for manufacturing a semiconductor device
DE60044762T DE60044762D1 (en) 1999-05-20 2000-03-16 Method and device for producing a semiconductor component
AT00105316T ATE476754T1 (en) 1999-05-20 2000-03-16 METHOD AND DEVICE FOR PRODUCING A SEMICONDUCTOR COMPONENT
AU22338/00A AU775032B2 (en) 1999-05-20 2000-03-17 Method and apparatus for manufacturing a semiconductor device
US09/531,549 US6271149B1 (en) 1999-05-20 2000-03-20 Method of forming a thin film on a substrate of a semiconductor device
US09/837,004 US20010014542A1 (en) 1999-05-20 2001-04-17 Method and apparatus for manufacturing a semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11228521A JP2001053309A (en) 1999-08-12 1999-08-12 Method for manufacturing thin-film solar cell panel and device for draining off rinsing water of thin-film solar cell panel

Publications (1)

Publication Number Publication Date
JP2001053309A true JP2001053309A (en) 2001-02-23

Family

ID=16877734

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11228521A Pending JP2001053309A (en) 1999-05-20 1999-08-12 Method for manufacturing thin-film solar cell panel and device for draining off rinsing water of thin-film solar cell panel

Country Status (1)

Country Link
JP (1) JP2001053309A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010103170A (en) * 2008-10-21 2010-05-06 Mitsubishi Electric Corp Method of manufacturing thin film solar cell and device of manufacturing thin film solar cell
US20120006389A1 (en) * 2009-06-29 2012-01-12 Kyocera Corporation Method of Manufacturing Photoelectric Conversion Device, Apparatus for Manufacturing Photoelectric Conversion Device, and Photoelectric Conversion Device
JP2014116515A (en) * 2012-12-11 2014-06-26 Mitsubishi Electric Corp Liquid draining device and liquid draining method for semiconductor device
JP2017064623A (en) * 2015-09-30 2017-04-06 芝浦メカトロニクス株式会社 Substrate drying device and substrate treatment apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010103170A (en) * 2008-10-21 2010-05-06 Mitsubishi Electric Corp Method of manufacturing thin film solar cell and device of manufacturing thin film solar cell
US20120006389A1 (en) * 2009-06-29 2012-01-12 Kyocera Corporation Method of Manufacturing Photoelectric Conversion Device, Apparatus for Manufacturing Photoelectric Conversion Device, and Photoelectric Conversion Device
JP2014116515A (en) * 2012-12-11 2014-06-26 Mitsubishi Electric Corp Liquid draining device and liquid draining method for semiconductor device
JP2017064623A (en) * 2015-09-30 2017-04-06 芝浦メカトロニクス株式会社 Substrate drying device and substrate treatment apparatus

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