ATE475907T1 - Projektionsobjektiv für die halbleiter- lithographie - Google Patents

Projektionsobjektiv für die halbleiter- lithographie

Info

Publication number
ATE475907T1
ATE475907T1 AT03785715T AT03785715T ATE475907T1 AT E475907 T1 ATE475907 T1 AT E475907T1 AT 03785715 T AT03785715 T AT 03785715T AT 03785715 T AT03785715 T AT 03785715T AT E475907 T1 ATE475907 T1 AT E475907T1
Authority
AT
Austria
Prior art keywords
projection lens
semiconductor lithography
optical
bearing points
optical surface
Prior art date
Application number
AT03785715T
Other languages
English (en)
Inventor
Willi Heintel
Harald Kirchner
Wolfgang Keller
Yim-Bun Kwan
Andreas Frommeyer
Fraser Morrison
Original Assignee
Zeiss Carl Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag filed Critical Zeiss Carl Smt Ag
Application granted granted Critical
Publication of ATE475907T1 publication Critical patent/ATE475907T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Silicon Compounds (AREA)
  • Electron Beam Exposure (AREA)
  • Lens Barrels (AREA)
AT03785715T 2003-10-02 2003-12-03 Projektionsobjektiv für die halbleiter- lithographie ATE475907T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10346046 2003-10-02
PCT/EP2003/013606 WO2005040926A2 (en) 2003-10-02 2003-12-03 Optical subassembly and projection objective for semiconductor lithography

Publications (1)

Publication Number Publication Date
ATE475907T1 true ATE475907T1 (de) 2010-08-15

Family

ID=34484700

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03785715T ATE475907T1 (de) 2003-10-02 2003-12-03 Projektionsobjektiv für die halbleiter- lithographie

Country Status (8)

Country Link
US (1) US7448763B2 (de)
EP (1) EP1668419B1 (de)
JP (1) JP4237755B2 (de)
KR (1) KR101134210B1 (de)
AT (1) ATE475907T1 (de)
AU (1) AU2003296244A1 (de)
DE (1) DE60333600D1 (de)
WO (1) WO2005040926A2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5008551B2 (ja) * 2004-02-26 2012-08-22 カール・ツァイス・エスエムティー・ゲーエムベーハー ハウジング構造体
TWI372271B (en) * 2005-09-13 2012-09-11 Zeiss Carl Smt Gmbh Optical element unit, optical element holder, method of manufacturing an optical element holder, optical element module, optical exposure apparatus, and method of manufacturing a semiconductor device
JP5043468B2 (ja) * 2007-02-23 2012-10-10 キヤノン株式会社 保持装置
KR101490191B1 (ko) * 2007-08-23 2015-03-17 칼 짜이스 에스엠테 게엠베하 기생 부하가 최소화된 광학 소자 모듈
NL1036701A1 (nl) * 2008-04-15 2009-10-19 Asml Holding Nv Apparatus for supporting an optical element, and method of making same.
DE102009045163B4 (de) 2009-09-30 2017-04-06 Carl Zeiss Smt Gmbh Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage
US20130052919A1 (en) * 2011-08-25 2013-02-28 Space Administrationo Graphite composite panel polishing fixture and assembly
CN102368113B (zh) * 2011-10-31 2013-01-02 中国科学院长春光学精密机械与物理研究所 高精度光学元件装配装置的无应力装配方法
CN103246040B (zh) * 2013-04-25 2015-04-22 中国科学院长春光学精密机械与物理研究所 用于光刻投影物镜中可快速更换的高重复定位精度结构
DE102014202737A1 (de) * 2014-02-14 2015-08-20 Carl Zeiss Smt Gmbh Lagerelement und system zum lagern eines optischen elements
JP5848470B2 (ja) * 2015-02-05 2016-01-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 寄生負荷最小化光学素子モジュール
AR105616A1 (es) 2015-05-07 2017-10-25 Lilly Co Eli Proteínas de fusión
DE102017220306A1 (de) 2017-11-14 2018-09-20 Carl Zeiss Smt Gmbh Befestigungsanordnung für eine optische Komponente
US11187871B2 (en) * 2017-12-18 2021-11-30 Raytheon Company 2D bi-pod flexure design, mount technique and process for implementation
WO2021009897A1 (ja) * 2019-07-18 2021-01-21 株式会社島津製作所 分光素子
WO2023228181A1 (en) * 2022-05-23 2023-11-30 Elbit Systems Electro-Optics Elop Ltd. A kinematic mount having three points of contact
KR102577850B1 (ko) * 2023-02-21 2023-09-13 국방과학연구소 광학부용 일체형 유연 힌지 마운트

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US4037944A (en) * 1976-01-23 1977-07-26 Systron Donner Corporation Low stress optical mounting structure and method
US4147413A (en) * 1977-03-07 1979-04-03 Hewlett-Packard Company Temperature compensated lens mount
US4268123A (en) * 1979-02-26 1981-05-19 Hughes Aircraft Company Kinematic mount
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US4929073A (en) * 1984-10-24 1990-05-29 Hughes Aircraft Company Kinematic mount
US4733945A (en) * 1986-01-15 1988-03-29 The Perkin-Elmer Corporation Precision lens mounting
US4681408A (en) * 1986-04-28 1987-07-21 The Perkin-Elmer Corporation Adjustable mount for large mirrors
US4726671A (en) * 1986-06-19 1988-02-23 The Perkin-Elmer Corporation High resonance adjustable mirror mount
GB8622515D0 (en) * 1986-09-18 1986-10-22 Univ Strathclyde Mirror assemblies
US5249082A (en) * 1991-05-08 1993-09-28 Eastman Kodak Company Exact constraint arrangement for and methods of mounting an element such as a lens
US5428482A (en) 1991-11-04 1995-06-27 General Signal Corporation Decoupled mount for optical element and stacked annuli assembly
JPH085807A (ja) * 1994-06-16 1996-01-12 Toshiba Corp 平面鏡
DE19825716A1 (de) 1998-06-09 1999-12-16 Zeiss Carl Fa Baugruppe aus optischem Element und Fassung
US5986827A (en) * 1998-06-17 1999-11-16 The Regents Of The University Of California Precision tip-tilt-piston actuator that provides exact constraint
EP1137054B1 (de) 1999-09-20 2006-03-15 Nikon Corporation Belichtungssystem mit einem parallelen Verbindungsmechanismus und Belichtungsverfahren
TW569055B (en) * 2000-06-17 2004-01-01 Zeiss Stiftung Device for mounting an optical element, for example a lens element in a lens
KR20010113527A (ko) 2000-06-19 2001-12-28 시마무라 테루오 투영 광학계, 그 제조 방법 및 투영 노광 장치
US6400516B1 (en) * 2000-08-10 2002-06-04 Nikon Corporation Kinematic optical mounting
WO2002016993A1 (fr) * 2000-08-18 2002-02-28 Nikon Corporation Dispositif de maintien d'element optique
DE10115914A1 (de) 2001-03-30 2002-10-02 Zeiss Carl Vorrichtung zur Lagerung eines optischen Elementes in einer Optik
JP2002318334A (ja) * 2001-04-24 2002-10-31 Nikon Corp 反射鏡の保持方法、反射鏡及び露光装置
DE10134387A1 (de) 2001-07-14 2003-01-23 Zeiss Carl Optisches System mit mehreren optischen Elementen
JP4565261B2 (ja) * 2002-06-24 2010-10-20 株式会社ニコン 光学素子保持機構、光学系鏡筒及び露光装置

Also Published As

Publication number Publication date
WO2005040926A3 (en) 2005-09-09
AU2003296244A8 (en) 2005-05-11
JP2007515658A (ja) 2007-06-14
WO2005040926A2 (en) 2005-05-06
KR20060096493A (ko) 2006-09-11
US20070014037A1 (en) 2007-01-18
DE60333600D1 (de) 2010-09-09
EP1668419B1 (de) 2010-07-28
JP4237755B2 (ja) 2009-03-11
KR101134210B1 (ko) 2012-04-09
AU2003296244A1 (en) 2005-05-11
EP1668419A2 (de) 2006-06-14
US7448763B2 (en) 2008-11-11

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