ATE457080T1 - Vorrichtung zur plasmaverarbeitung ein- oder zweidimensionaler artikel - Google Patents

Vorrichtung zur plasmaverarbeitung ein- oder zweidimensionaler artikel

Info

Publication number
ATE457080T1
ATE457080T1 AT07112506T AT07112506T ATE457080T1 AT E457080 T1 ATE457080 T1 AT E457080T1 AT 07112506 T AT07112506 T AT 07112506T AT 07112506 T AT07112506 T AT 07112506T AT E457080 T1 ATE457080 T1 AT E457080T1
Authority
AT
Austria
Prior art keywords
gas
discharge region
plasma
dimensional articles
article
Prior art date
Application number
AT07112506T
Other languages
English (en)
Inventor
Giorgio Apostolo
Original Assignee
Giorgio Apostolo
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Giorgio Apostolo filed Critical Giorgio Apostolo
Application granted granted Critical
Publication of ATE457080T1 publication Critical patent/ATE457080T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32825—Working under atmospheric pressure or higher

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Manufacture And Refinement Of Metals (AREA)
AT07112506T 2006-07-17 2007-07-16 Vorrichtung zur plasmaverarbeitung ein- oder zweidimensionaler artikel ATE457080T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT000522A ITTO20060522A1 (it) 2006-07-17 2006-07-17 Apparecchiatura per il trattamento al plasma di articoli uni- o bi-dimensionali

Publications (1)

Publication Number Publication Date
ATE457080T1 true ATE457080T1 (de) 2010-02-15

Family

ID=38537558

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07112506T ATE457080T1 (de) 2006-07-17 2007-07-16 Vorrichtung zur plasmaverarbeitung ein- oder zweidimensionaler artikel

Country Status (4)

Country Link
EP (1) EP1887609B1 (de)
AT (1) ATE457080T1 (de)
DE (1) DE602007004656D1 (de)
IT (1) ITTO20060522A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202008006477U1 (de) * 2008-05-06 2008-07-24 Forschungs- Und Applikationslabor Plasmatechnik Gmbh Dresden Vorrichtung zur Modifizierung von Substratoberflächen

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6116185A (en) * 1996-05-01 2000-09-12 Rietzel; James G. Gas injector for plasma enhanced chemical vapor deposition
EP1115141A1 (de) * 2000-01-06 2001-07-11 TePla AG Verfahren und Vorrichtung zur Plasmabehandlung eines drahtförmigen Körpers
WO2004087991A1 (ja) 2003-03-31 2004-10-14 Konica Minolta Holdings, Inc. 薄膜形成装置及び薄膜形成方法

Also Published As

Publication number Publication date
EP1887609B1 (de) 2010-02-03
ITTO20060522A1 (it) 2008-01-18
EP1887609A1 (de) 2008-02-13
DE602007004656D1 (de) 2010-03-25

Similar Documents

Publication Publication Date Title
TW201130032A (en) Plasma processing apparatus and plasma processing method
ATE453206T1 (de) Abgestufte obere elektrode für plasmabehandlungsgleichmässigkeit
TW200644117A (en) Plasma processing apparatus and plasma processing method
KR960032595A (ko) 플라즈마 처리 장치 및 그 방법
TWI346145B (en) Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates
TW200501215A (en) Plasma processor, manufacturing method of plasma reactor, and processing method of plasma
EP1810626A3 (de) System zur Behandlung biologischen Gewebes mit einer Plasmagasentladung
TW200629389A (en) Method for treating a substrate
DE60304167D1 (de) Atmosphärendruck-plasmavorrichtung
TN2009000477A1 (en) Treatment system for flat substrates
EP1595974A3 (de) Regelung der Plasma-Uniformität durch Formgebung der Gasverteiler-Löcher
BR112014019439A8 (pt) Eletrodo e método para manufaturar um eletrodo
WO2008118738A3 (en) Apparatus and methods of forming a gas cluster ion beam using a low-pressure source
TW200614365A (en) Method for providing uniform removal of organic material
TW200729311A (en) Liquid processing method and liquid processing apparatus
EP2141511A3 (de) Strahlungsdetektor mit Gasverstärkung und Herstellungsverfahren dafür
WO2012073142A3 (de) Verfahren und vorrichtung zur ionenimplantation
ATE407447T1 (de) Mikroplasmaarray
TWI257130B (en) Plasma processing apparatus and method of designing the same
EA201491038A1 (ru) Нетепловая плазменная ячейка
TW200503062A (en) Surface processing apparatus and method for plasma treatment
ATE381800T1 (de) Multimode-behandlungsvorrichtung mit luftkühlungssystem
RU2008101310A (ru) Способ комбинированной вакуумной ионно-плазменной обработки изделий
ATE457080T1 (de) Vorrichtung zur plasmaverarbeitung ein- oder zweidimensionaler artikel
TW200614366A (en) Plasma processing system

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties