ATE440308T1 - METHOD AND APPARATUS FOR ACHIEVEING REPEATED MULTIPHOTON ABSORPTION - Google Patents

METHOD AND APPARATUS FOR ACHIEVEING REPEATED MULTIPHOTON ABSORPTION

Info

Publication number
ATE440308T1
ATE440308T1 AT01944514T AT01944514T ATE440308T1 AT E440308 T1 ATE440308 T1 AT E440308T1 AT 01944514 T AT01944514 T AT 01944514T AT 01944514 T AT01944514 T AT 01944514T AT E440308 T1 ATE440308 T1 AT E440308T1
Authority
AT
Austria
Prior art keywords
transit
achieveing
repeated
multiphoton absorption
photoreactive composition
Prior art date
Application number
AT01944514T
Other languages
German (de)
Inventor
Patrick Fleming
Robert Devoe
Catherine Leatherdale
Todd Ballen
Jeffrey Florczak
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Application granted granted Critical
Publication of ATE440308T1 publication Critical patent/ATE440308T1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Laser Beam Processing (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cultivation Of Seaweed (AREA)
  • Holo Graphy (AREA)

Abstract

A method of increasing the efficiency of a multiphoton absorption process and apparatus. The method includes: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons; exposing the photoreactive composition to at least one transit of light from the light source; and directing at least a portion of the first transit of the light back into the photoreactive composition using at least one optical element, wherein a plurality of photons not absorbed in at least one transit are used to expose the photoreactive composition in a subsequent transit.
AT01944514T 2000-06-15 2001-06-14 METHOD AND APPARATUS FOR ACHIEVEING REPEATED MULTIPHOTON ABSORPTION ATE440308T1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US21170400P 2000-06-15 2000-06-15
PCT/US2001/019125 WO2001096961A2 (en) 2000-06-15 2001-06-14 Multipass multiphoton absorption method and apparatus

Publications (1)

Publication Number Publication Date
ATE440308T1 true ATE440308T1 (en) 2009-09-15

Family

ID=22788012

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01944514T ATE440308T1 (en) 2000-06-15 2001-06-14 METHOD AND APPARATUS FOR ACHIEVEING REPEATED MULTIPHOTON ABSORPTION

Country Status (8)

Country Link
US (2) US7166409B2 (en)
EP (1) EP1292862B1 (en)
JP (1) JP2004503831A (en)
KR (1) KR100754813B1 (en)
AT (1) ATE440308T1 (en)
AU (1) AU2001266919A1 (en)
DE (1) DE60139620D1 (en)
WO (1) WO2001096961A2 (en)

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US6852766B1 (en) 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
US6441356B1 (en) 2000-07-28 2002-08-27 Optical Biopsy Technologies Fiber-coupled, high-speed, angled-dual-axis optical coherence scanning microscopes
JP3876281B2 (en) 2000-08-31 2007-01-31 独立行政法人産業技術総合研究所 Information recording method
US6541591B2 (en) 2000-12-21 2003-04-01 3M Innovative Properties Company High refractive index microreplication resin from naphthyloxyalkylmethacrylates or naphthyloxyacrylates polymers
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system

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EP1292862A2 (en) 2003-03-19
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US7166409B2 (en) 2007-01-23
KR20030076236A (en) 2003-09-26
WO2001096961A3 (en) 2002-04-18
EP1292862B1 (en) 2009-08-19
US20070087284A1 (en) 2007-04-19
AU2001266919A1 (en) 2001-12-24
JP2004503831A (en) 2004-02-05
DE60139620D1 (en) 2009-10-01
US20040124563A1 (en) 2004-07-01

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