ATE431366T1 - Verfahren zur herstellung von polymerverbindungen durch eliminierungsreaktion - Google Patents

Verfahren zur herstellung von polymerverbindungen durch eliminierungsreaktion

Info

Publication number
ATE431366T1
ATE431366T1 AT03004995T AT03004995T ATE431366T1 AT E431366 T1 ATE431366 T1 AT E431366T1 AT 03004995 T AT03004995 T AT 03004995T AT 03004995 T AT03004995 T AT 03004995T AT E431366 T1 ATE431366 T1 AT E431366T1
Authority
AT
Austria
Prior art keywords
elimination reaction
polymer compounds
producing polymer
chem
following formula
Prior art date
Application number
AT03004995T
Other languages
English (en)
Inventor
Kazuhiro Fujimaki
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of ATE431366T1 publication Critical patent/ATE431366T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/26—Removing halogen atoms or halogen-containing groups from the molecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/10—Copolymer characterised by the proportions of the comonomers expressed as molar percentages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/20—Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
AT03004995T 2002-03-11 2003-03-11 Verfahren zur herstellung von polymerverbindungen durch eliminierungsreaktion ATE431366T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002065667 2002-03-11

Publications (1)

Publication Number Publication Date
ATE431366T1 true ATE431366T1 (de) 2009-05-15

Family

ID=27764468

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03004995T ATE431366T1 (de) 2002-03-11 2003-03-11 Verfahren zur herstellung von polymerverbindungen durch eliminierungsreaktion

Country Status (4)

Country Link
US (1) US6919411B2 (de)
EP (1) EP1344783B1 (de)
AT (1) ATE431366T1 (de)
DE (1) DE60327571D1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE345928T1 (de) * 2000-08-21 2006-12-15 Fuji Photo Film Co Ltd Bildaufzeichnungsmaterial
JP2004012706A (ja) * 2002-06-05 2004-01-15 Fuji Photo Film Co Ltd 平版印刷版原版
EP1369231A3 (de) * 2002-06-05 2009-07-08 FUJIFILM Corporation Infrarotempfindliche Zusammensetzung und Bildaufzeichnungsmaterial für IR-Strahlung
US7351773B2 (en) * 2003-07-31 2008-04-01 Fujifilm Corporation Polymerizable composition
JP4401262B2 (ja) * 2004-02-02 2010-01-20 富士フイルム株式会社 平版印刷版原版
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
EP1684117A3 (de) 2005-01-21 2009-10-14 FUJIFILM Corporation Lichtempfindliche Flachdruckplatte
JP5344790B2 (ja) * 2006-12-28 2013-11-20 富士フイルム株式会社 硬化性組成物、カラーフィルタ及びその製造方法
JP4855299B2 (ja) * 2007-02-27 2012-01-18 富士フイルム株式会社 着色感光性組成物、カラーフィルター及びその製造方法
US20080254387A1 (en) * 2007-04-13 2008-10-16 Jianfei Yu Negative-working imageable elements and methods of use
US20080308003A1 (en) * 2007-06-13 2008-12-18 Krol Andrew M UV inkjet resist
JP4890388B2 (ja) * 2007-08-22 2012-03-07 富士フイルム株式会社 着色感光性組成物、カラーフィルタ及びその製造方法
KR101612982B1 (ko) 2008-12-02 2016-04-15 스미또모 세이까 가부시키가이샤 술포렌 화합물의 제조 방법 및 술포란 화합물의 제조 방법
US9201302B2 (en) 2013-10-03 2015-12-01 Eastman Kodak Company Negative-working lithographic printing plate precursor
KR20180037981A (ko) * 2015-08-06 2018-04-13 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 화소-구분 층을 형성하는 조성물 및 방법
JPWO2017163816A1 (ja) 2016-03-24 2018-12-13 富士フイルム株式会社 感活性光線性又は感放射線性組成物、感活性光線性又は感放射線性組成物の製造方法、パターン形成方法、及び電子デバイスの製造方法
CN116003817B (zh) * 2022-12-31 2023-12-12 长江师范学院 一种基于苝四羧酸酐的聚集体材料及其制备方法和应用

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5137316A (ja) * 1974-09-27 1976-03-29 Honda Motor Co Ltd Kakyushikienjin
FR2414213A1 (fr) 1978-01-09 1979-08-03 Rhone Poulenc Graphic Polymeres photosensibles colores
US4444868A (en) 1981-08-06 1984-04-24 Agency Of Industrial Science & Technology Photosensitive composition
DE68922631T2 (de) 1988-02-08 1995-10-05 Allied Colloids Ltd Wasserlösliche polymerisierbare Acrylmaterialien, deren Polymere und Verfahren zu deren Herstellung.
DE4333682A1 (de) 1993-10-02 1995-04-06 Basf Ag Zusammensetzungen auf der Basis substituierter Polyethylene
US6232038B1 (en) * 1998-10-07 2001-05-15 Mitsubishi Chemical Corporation Photosensitive composition, image-forming material and image-forming method employing it
JP4218851B2 (ja) 1999-02-25 2009-02-04 大日本印刷株式会社 カラーフィルタ保護膜形成用感光性樹脂組成物
WO2001070832A2 (en) 2000-03-20 2001-09-27 Fmc Corporation Terminal olefin functionalized macromonomers

Also Published As

Publication number Publication date
EP1344783B1 (de) 2009-05-13
US20030215745A1 (en) 2003-11-20
US6919411B2 (en) 2005-07-19
DE60327571D1 (de) 2009-06-25
EP1344783A1 (de) 2003-09-17

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