ATE422097T1 - Plasmareaktor für hohe dichten - Google Patents

Plasmareaktor für hohe dichten

Info

Publication number
ATE422097T1
ATE422097T1 AT04733521T AT04733521T ATE422097T1 AT E422097 T1 ATE422097 T1 AT E422097T1 AT 04733521 T AT04733521 T AT 04733521T AT 04733521 T AT04733521 T AT 04733521T AT E422097 T1 ATE422097 T1 AT E422097T1
Authority
AT
Austria
Prior art keywords
plasma
high density
plasma source
coils
antenna
Prior art date
Application number
AT04733521T
Other languages
English (en)
Inventor
Eric Chevalier
Philippe Guittienne
Original Assignee
Helyssen S A R L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Helyssen S A R L filed Critical Helyssen S A R L
Application granted granted Critical
Publication of ATE422097T1 publication Critical patent/ATE422097T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Sealing Material Composition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
AT04733521T 2003-05-22 2004-05-18 Plasmareaktor für hohe dichten ATE422097T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03405360A EP1480250A1 (de) 2003-05-22 2003-05-22 Plasmareaktor für Plasmen hoher Dichte, und RF-Antenne für diesen Reaktor

Publications (1)

Publication Number Publication Date
ATE422097T1 true ATE422097T1 (de) 2009-02-15

Family

ID=33041145

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04733521T ATE422097T1 (de) 2003-05-22 2004-05-18 Plasmareaktor für hohe dichten

Country Status (9)

Country Link
US (1) US8974629B2 (de)
EP (2) EP1480250A1 (de)
JP (1) JP2007511867A (de)
KR (1) KR20060040588A (de)
CN (1) CN1809911B (de)
AT (1) ATE422097T1 (de)
DE (1) DE602004019281D1 (de)
TW (1) TWI383711B (de)
WO (1) WO2004105078A2 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1605493A1 (de) * 2004-06-07 2005-12-14 HELYSSEN S.à.r.l. Plasmaprozesskontrolle
GB0501460D0 (en) * 2005-01-25 2005-03-02 Univ Edinburgh Improved plasma cleaning method
KR100847007B1 (ko) * 2007-05-31 2008-07-17 세메스 주식회사 플라즈마를 이용한 기판 처리 장치 및 방법
EP2234649A4 (de) * 2007-11-21 2011-04-20 Univ Florida Selbststerilisierende vorrichtung mit plasmafeldern
WO2009096951A1 (en) * 2008-01-30 2009-08-06 Applied Materials, Inc. System and method for pre-ionization of surface wave launched plasma discharge sources
JP2010090434A (ja) * 2008-10-08 2010-04-22 Renesas Technology Corp 半導体集積回路装置の製造方法および半導体集積回路装置の製造装置
RU2507628C2 (ru) 2009-02-10 2014-02-20 ЭЛИССЕН Сарл Устройство для плазменной обработки больших площадей
ITMI20092107A1 (it) * 2009-11-30 2011-06-01 Milano Politecnico Metodo e apparato per la deposizione di strati sottili nanostrutturati con morfologia e nanostruttura controllata
KR20120004040A (ko) * 2010-07-06 2012-01-12 삼성전자주식회사 플라즈마 발생장치
EP2707598A4 (de) * 2011-05-12 2015-04-29 Roderick William Boswell Mikroplasmadüse
CN105340063A (zh) * 2013-05-31 2016-02-17 应用材料公司 用于等离子体处理系统的天线阵列配置
JP2015193863A (ja) * 2014-03-31 2015-11-05 株式会社Ｓｃｒｅｅｎホールディングス スパッタリング装置
JP6318447B2 (ja) 2014-05-23 2018-05-09 三菱重工業株式会社 プラズマ加速装置及びプラズマ加速方法
US10017857B2 (en) * 2015-05-02 2018-07-10 Applied Materials, Inc. Method and apparatus for controlling plasma near the edge of a substrate
US20180197718A1 (en) 2015-07-03 2018-07-12 Tetra Laval Holdings & Finance S.A. Device for the treatment of a web substrate in a plasma enhanced process
WO2017189234A1 (en) * 2016-04-29 2017-11-02 Retro-Semi Technologies, Llc Vhf z-coil plasma source
JP7036809B6 (ja) * 2016-10-10 2022-05-30 コーニンクレッカ フィリップス エヌ ヴェ 共平面ｒｆコイル給電
JP2018113522A (ja) 2017-01-10 2018-07-19 株式会社リコー アンテナ装置、通信装置、及びアンテナ装置の製造方法
US11551909B2 (en) * 2017-10-02 2023-01-10 Tokyo Electron Limited Ultra-localized and plasma uniformity control in a plasma processing system
CN109586716A (zh) * 2018-11-30 2019-04-05 新奥科技发展有限公司 相位分频器和射频电源系统
DE102019111908B4 (de) 2019-05-08 2021-08-12 Dreebit Gmbh ECR-Ionenquelle und Verfahren zum Betreiben einer ECR-Ionenquelle
CN113285223B (zh) * 2021-05-24 2023-10-10 中国科学院合肥物质科学研究院 一种分立式π/2相位差离子回旋共振加热天线

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3629000C1 (de) 1986-08-27 1987-10-29 Nukem Gmbh Verfahren und Vorrichtung zum Ausbilden einer Schicht durch plasmachemischen Prozess
US4990229A (en) 1989-06-13 1991-02-05 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
DE3942964A1 (de) * 1989-12-23 1991-06-27 Leybold Ag Einrichtung fuer die erzeugung eines plasmas
NL9000809A (nl) * 1990-04-06 1991-11-01 Philips Nv Plasmagenerator.
US6024826A (en) * 1996-05-13 2000-02-15 Applied Materials, Inc. Plasma reactor with heated source of a polymer-hardening precursor material
US5728253A (en) * 1993-03-04 1998-03-17 Tokyo Electron Limited Method and devices for detecting the end point of plasma process
JP2770753B2 (ja) * 1994-09-16 1998-07-02 日本電気株式会社 プラズマ処理装置およびプラズマ処理方法
US5811022A (en) * 1994-11-15 1998-09-22 Mattson Technology, Inc. Inductive plasma reactor
US5643639A (en) * 1994-12-22 1997-07-01 Research Triangle Institute Plasma treatment method for treatment of a large-area work surface apparatus and methods
US5888413A (en) * 1995-06-06 1999-03-30 Matsushita Electric Industrial Co., Ltd. Plasma processing method and apparatus
JP2845199B2 (ja) * 1996-06-14 1999-01-13 日本電気株式会社 ドライエッチング装置およびドライエッチング方法
JP3646901B2 (ja) * 1996-08-26 2005-05-11 株式会社アルバック プラズマ励起用アンテナ、プラズマ処理装置
US6164241A (en) * 1998-06-30 2000-12-26 Lam Research Corporation Multiple coil antenna for inductively-coupled plasma generation systems
JP2000150483A (ja) * 1998-11-16 2000-05-30 C Bui Res:Kk プラズマ処理装置
GB2344930B (en) * 1998-12-17 2003-10-01 Trikon Holdings Ltd Inductive coil assembly
US6257168B1 (en) * 1999-06-30 2001-07-10 Lam Research Corporation Elevated stationary uniformity ring design
US6441555B1 (en) * 2000-03-31 2002-08-27 Lam Research Corporation Plasma excitation coil
KR20010108968A (ko) * 2000-06-01 2001-12-08 황 철 주 플라즈마 공정장치
KR100396214B1 (ko) * 2001-06-19 2003-09-02 주성엔지니어링(주) 초단파 병렬 공명 안테나를 구비하는 플라즈마 공정장치

Also Published As

Publication number Publication date
US20070056515A1 (en) 2007-03-15
WO2004105078A2 (en) 2004-12-02
TW200505296A (en) 2005-02-01
KR20060040588A (ko) 2006-05-10
JP2007511867A (ja) 2007-05-10
DE602004019281D1 (de) 2009-03-19
CN1809911A (zh) 2006-07-26
EP1627413A2 (de) 2006-02-22
TWI383711B (zh) 2013-01-21
EP1627413B1 (de) 2009-01-28
WO2004105078A3 (en) 2005-05-12
EP1480250A1 (de) 2004-11-24
CN1809911B (zh) 2011-06-15
US8974629B2 (en) 2015-03-10

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