ATE409107T1 - Verfahren zur herstellung einer verpackten halbleitervorrichtung, mit solch einem verfahren erhaltene verpackte halbleitervorrichtung und zur verwendung in solch einem verfahren geeigneter metallträger - Google Patents

Verfahren zur herstellung einer verpackten halbleitervorrichtung, mit solch einem verfahren erhaltene verpackte halbleitervorrichtung und zur verwendung in solch einem verfahren geeigneter metallträger

Info

Publication number
ATE409107T1
ATE409107T1 AT03784423T AT03784423T ATE409107T1 AT E409107 T1 ATE409107 T1 AT E409107T1 AT 03784423 T AT03784423 T AT 03784423T AT 03784423 T AT03784423 T AT 03784423T AT E409107 T1 ATE409107 T1 AT E409107T1
Authority
AT
Austria
Prior art keywords
semiconductor device
metal
packaged semiconductor
diamond grains
dicing blade
Prior art date
Application number
AT03784423T
Other languages
English (en)
Inventor
T Veld Frederik In
Johannes Savenije
Original Assignee
Nxp Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nxp Bv filed Critical Nxp Bv
Application granted granted Critical
Publication of ATE409107T1 publication Critical patent/ATE409107T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0076—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
    • B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
AT03784423T 2002-08-05 2003-07-31 Verfahren zur herstellung einer verpackten halbleitervorrichtung, mit solch einem verfahren erhaltene verpackte halbleitervorrichtung und zur verwendung in solch einem verfahren geeigneter metallträger ATE409107T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02078269 2002-08-05

Publications (1)

Publication Number Publication Date
ATE409107T1 true ATE409107T1 (de) 2008-10-15

Family

ID=31502788

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03784423T ATE409107T1 (de) 2002-08-05 2003-07-31 Verfahren zur herstellung einer verpackten halbleitervorrichtung, mit solch einem verfahren erhaltene verpackte halbleitervorrichtung und zur verwendung in solch einem verfahren geeigneter metallträger

Country Status (10)

Country Link
US (1) US7115443B2 (de)
EP (1) EP1549472B1 (de)
JP (1) JP2005535140A (de)
KR (1) KR20050042144A (de)
CN (1) CN100557781C (de)
AT (1) ATE409107T1 (de)
AU (1) AU2003255956A1 (de)
DE (1) DE60323758D1 (de)
TW (1) TWI310960B (de)
WO (1) WO2004014626A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7972940B2 (en) * 2007-12-28 2011-07-05 Micron Technology, Inc. Wafer processing
CN102009433B (zh) * 2010-11-03 2012-11-21 江苏省宜兴电子器件总厂 陶瓷外壳刻槽模具及用该模具加工无引线陶瓷外壳的方法
CN105471405B (zh) * 2014-09-30 2018-08-28 日本特殊陶业株式会社 布线基板及多连片式布线基板

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62114254A (ja) * 1985-11-13 1987-05-26 Mitsui Haitetsuku:Kk リ−ドフレ−ムの製造方法
DE4309134C2 (de) 1993-03-22 1999-03-04 Wilfried Wahl Verfahren zur Schmierung und Kühlung von Schneiden und/oder Werkstücken bei zerspanenden Arbeitsprozessen
US5682062A (en) * 1995-06-05 1997-10-28 Harris Corporation System for interconnecting stacked integrated circuits
US5646315A (en) * 1995-06-07 1997-07-08 National Starch And Chemical Investment Holding Corporation Polyglydicylphenyl ethers of alkyloxy chains for use in microelectronics adhesives
US6284566B1 (en) * 1996-05-17 2001-09-04 National Semiconductor Corporation Chip scale package and method for manufacture thereof
US5832585A (en) * 1996-08-13 1998-11-10 National Semiconductor Corporation Method of separating micro-devices formed on a substrate
KR100222299B1 (ko) * 1996-12-16 1999-10-01 윤종용 웨이퍼 레벨 칩 스케일 패키지 및 그의 제조 방법
KR100225909B1 (ko) * 1997-05-29 1999-10-15 윤종용 웨이퍼 소잉 장치
DE69736630D1 (de) * 1997-06-19 2006-10-19 St Microelectronics Srl Hermetisch abgeschlossener Sensor mit beweglicher Mikrostruktur
SG70097A1 (en) * 1997-08-15 2000-01-25 Disio Corp Apparatus and method for machining workpieces by flushing working liquid to the tool-and-workpiece interface
US6407360B1 (en) * 1998-08-26 2002-06-18 Samsung Electronics, Co., Ltd. Laser cutting apparatus and method
JP4583603B2 (ja) * 1998-11-20 2010-11-17 三京ダイヤモンド工業株式会社 ダイヤモンドブレード
JP3398721B2 (ja) 1999-05-20 2003-04-21 アムコー テクノロジー コリア インコーポレーティド 半導体パッケージ及びその製造方法
US6413150B1 (en) 1999-05-27 2002-07-02 Texas Instruments Incorporated Dual dicing saw blade assembly and process for separating devices arrayed a substrate
US6463920B1 (en) * 1999-11-22 2002-10-15 Sumitomo Special Metals Co., Ltd. Work cutting apparatus and work cutting method
US6400004B1 (en) * 2000-08-17 2002-06-04 Advanced Semiconductor Engineering, Inc. Leadless semiconductor package
US6467278B1 (en) * 2000-11-15 2002-10-22 National Semiconductor Corporation Cooling for singulation of composite materials in molded semiconductor packages
JP3619773B2 (ja) * 2000-12-20 2005-02-16 株式会社ルネサステクノロジ 半導体装置の製造方法
JP3628971B2 (ja) 2001-02-15 2005-03-16 松下電器産業株式会社 リードフレーム及びそれを用いた樹脂封止型半導体装置の製造方法
WO2002103792A2 (en) * 2001-06-19 2002-12-27 Koninklijke Philips Electronics N.V. Method of manufacturing a semiconductor device and semiconductor device
US6849523B2 (en) * 2003-03-12 2005-02-01 Taiwan Semiconductor Manufacturing Co., Ltd Process for separating dies on a wafer

Also Published As

Publication number Publication date
CN1675041A (zh) 2005-09-28
US20050255630A1 (en) 2005-11-17
AU2003255956A1 (en) 2004-02-25
EP1549472A1 (de) 2005-07-06
KR20050042144A (ko) 2005-05-04
TWI310960B (en) 2009-06-11
US7115443B2 (en) 2006-10-03
JP2005535140A (ja) 2005-11-17
TW200416776A (en) 2004-09-01
EP1549472B1 (de) 2008-09-24
WO2004014626A1 (en) 2004-02-19
DE60323758D1 (de) 2008-11-06
CN100557781C (zh) 2009-11-04

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