ATE407098T1 - Verfahren zur herstellung von mustern auf einer substratfläche - Google Patents
Verfahren zur herstellung von mustern auf einer substratflächeInfo
- Publication number
- ATE407098T1 ATE407098T1 AT04770195T AT04770195T ATE407098T1 AT E407098 T1 ATE407098 T1 AT E407098T1 AT 04770195 T AT04770195 T AT 04770195T AT 04770195 T AT04770195 T AT 04770195T AT E407098 T1 ATE407098 T1 AT E407098T1
- Authority
- AT
- Austria
- Prior art keywords
- substrate
- elastomeric stamp
- ink
- protruding features
- contact
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
- B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
- B05D1/283—Transferring monomolecular layers or solutions of molecules adapted for forming monomolecular layers from carrying elements
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Materials Engineering (AREA)
- Composite Materials (AREA)
- Theoretical Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB0323902.7A GB0323902D0 (en) | 2003-10-11 | 2003-10-11 | Method for patterning a substrate surface |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE407098T1 true ATE407098T1 (de) | 2008-09-15 |
Family
ID=29433771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT04770195T ATE407098T1 (de) | 2003-10-11 | 2004-10-07 | Verfahren zur herstellung von mustern auf einer substratfläche |
Country Status (10)
Country | Link |
---|---|
US (1) | US8714082B2 (de) |
EP (1) | EP1675802B1 (de) |
JP (1) | JP4649412B2 (de) |
KR (1) | KR101098317B1 (de) |
CN (1) | CN1863729B (de) |
AT (1) | ATE407098T1 (de) |
DE (1) | DE602004016360D1 (de) |
GB (1) | GB0323902D0 (de) |
TW (1) | TWI362687B (de) |
WO (1) | WO2005035438A1 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB0323903D0 (en) * | 2003-10-11 | 2003-11-12 | Koninkl Philips Electronics Nv | Elastomeric stamp,patterning method using such a stamp and method for producing such a stamp |
US7632087B2 (en) * | 2003-12-19 | 2009-12-15 | Wd Media, Inc. | Composite stamper for imprint lithography |
KR100784827B1 (ko) * | 2006-12-29 | 2007-12-14 | 한국기계연구원 | 적층 탄성체를 이용한 스템프와 웨이퍼의 균일접촉 임프린팅 장치 |
WO2009108771A2 (en) | 2008-02-28 | 2009-09-03 | 3M Innovative Properties Company | Methods of patterning a conductor on a substrate |
KR101822351B1 (ko) | 2008-02-28 | 2018-03-08 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 터치 스크린 센서 |
EP2260366B1 (de) | 2008-02-28 | 2018-09-19 | 3M Innovative Properties Company | Berührungsschirmsensor mit veränderlichem flächenwiderstand |
US8284332B2 (en) | 2008-08-01 | 2012-10-09 | 3M Innovative Properties Company | Touch screen sensor with low visibility conductors |
CN102016766B (zh) | 2008-02-28 | 2014-05-14 | 3M创新有限公司 | 具有低可见度导体的触屏传感器 |
KR20100046778A (ko) * | 2008-10-28 | 2010-05-07 | 삼성전자주식회사 | 프린트용 몰드, 그의 제조 방법 및 이를 이용한 박막 패턴 형성 방법 |
US8647522B2 (en) * | 2009-06-25 | 2014-02-11 | 3M Innovative Properties Company | Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles |
JP2011054683A (ja) * | 2009-08-31 | 2011-03-17 | Asahi Kasei E-Materials Corp | 金属配線基板の製造方法、及び金属配線基板 |
JP5224203B1 (ja) | 2012-07-11 | 2013-07-03 | 大日本印刷株式会社 | タッチパネルセンサ、タッチパネル装置および表示装置 |
CN107175939B (zh) * | 2016-03-09 | 2020-02-28 | 华邦电子股份有限公司 | 用于印刷线路制程的印章及其制造方法以及印刷线路制程 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6048623A (en) | 1996-12-18 | 2000-04-11 | Kimberly-Clark Worldwide, Inc. | Method of contact printing on gold coated films |
US6517995B1 (en) * | 1999-09-14 | 2003-02-11 | Massachusetts Institute Of Technology | Fabrication of finely featured devices by liquid embossing |
US6380101B1 (en) | 2000-04-18 | 2002-04-30 | International Business Machines Corporation | Method of forming patterned indium zinc oxide and indium tin oxide films via microcontact printing and uses thereof |
US7476523B2 (en) * | 2000-08-14 | 2009-01-13 | Surface Logix, Inc. | Method of patterning a surface using a deformable stamp |
US6596346B2 (en) | 2000-09-29 | 2003-07-22 | International Business Machines Corporation | Silicone elastomer stamp with hydrophilic surfaces and method of making same |
GB0105145D0 (en) * | 2001-03-02 | 2001-04-18 | Koninkl Philips Electronics Nv | Thin film transistors and method of manufacture |
WO2002085639A1 (en) | 2001-04-25 | 2002-10-31 | The Trustees Of Columbia University In The City Of New York | Edge transfer lithography |
US7338613B2 (en) * | 2001-09-10 | 2008-03-04 | Surface Logix, Inc. | System and process for automated microcontact printing |
US6860956B2 (en) * | 2003-05-23 | 2005-03-01 | Agency For Science, Technology & Research | Methods of creating patterns on substrates and articles of manufacture resulting therefrom |
-
2003
- 2003-10-11 GB GBGB0323902.7A patent/GB0323902D0/en not_active Ceased
-
2004
- 2004-10-07 DE DE602004016360T patent/DE602004016360D1/de active Active
- 2004-10-07 US US10/575,437 patent/US8714082B2/en active Active
- 2004-10-07 KR KR1020067006964A patent/KR101098317B1/ko active IP Right Grant
- 2004-10-07 AT AT04770195T patent/ATE407098T1/de not_active IP Right Cessation
- 2004-10-07 JP JP2006530986A patent/JP4649412B2/ja active Active
- 2004-10-07 WO PCT/IB2004/052009 patent/WO2005035438A1/en active IP Right Grant
- 2004-10-07 CN CN2004800295784A patent/CN1863729B/zh active Active
- 2004-10-07 EP EP04770195A patent/EP1675802B1/de active Active
- 2004-10-08 TW TW093130627A patent/TWI362687B/zh active
Also Published As
Publication number | Publication date |
---|---|
US8714082B2 (en) | 2014-05-06 |
KR101098317B1 (ko) | 2011-12-26 |
DE602004016360D1 (de) | 2008-10-16 |
CN1863729B (zh) | 2010-06-16 |
JP4649412B2 (ja) | 2011-03-09 |
EP1675802A1 (de) | 2006-07-05 |
GB0323902D0 (en) | 2003-11-12 |
TW200524000A (en) | 2005-07-16 |
JP2007508453A (ja) | 2007-04-05 |
EP1675802B1 (de) | 2008-09-03 |
CN1863729A (zh) | 2006-11-15 |
WO2005035438A1 (en) | 2005-04-21 |
KR20060126953A (ko) | 2006-12-11 |
US20070125255A1 (en) | 2007-06-07 |
TWI362687B (en) | 2012-04-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |