ATE404990T1 - Ladungsträgerteilchenstrahlsystem mit dynamischer fokusierung - Google Patents

Ladungsträgerteilchenstrahlsystem mit dynamischer fokusierung

Info

Publication number
ATE404990T1
ATE404990T1 AT00105805T AT00105805T ATE404990T1 AT E404990 T1 ATE404990 T1 AT E404990T1 AT 00105805 T AT00105805 T AT 00105805T AT 00105805 T AT00105805 T AT 00105805T AT E404990 T1 ATE404990 T1 AT E404990T1
Authority
AT
Austria
Prior art keywords
lens
particle beam
charge carrier
beam system
focus coil
Prior art date
Application number
AT00105805T
Other languages
English (en)
Inventor
Hans C Pfeiffer
Joseph S Senesi
Maris Andris Sturans
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of ATE404990T1 publication Critical patent/ATE404990T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Particle Accelerators (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Photoreceptors In Electrophotography (AREA)
AT00105805T 1999-04-13 2000-03-18 Ladungsträgerteilchenstrahlsystem mit dynamischer fokusierung ATE404990T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/290,784 US6130432A (en) 1999-04-13 1999-04-13 Particle beam system with dynamic focusing

Publications (1)

Publication Number Publication Date
ATE404990T1 true ATE404990T1 (de) 2008-08-15

Family

ID=23117550

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00105805T ATE404990T1 (de) 1999-04-13 2000-03-18 Ladungsträgerteilchenstrahlsystem mit dynamischer fokusierung

Country Status (5)

Country Link
US (1) US6130432A (de)
EP (1) EP1045424B1 (de)
JP (1) JP3480829B2 (de)
AT (1) ATE404990T1 (de)
DE (1) DE60039810D1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6768117B1 (en) * 2000-07-25 2004-07-27 Applied Materials, Inc. Immersion lens with magnetic shield for charged particle beam system
JP2002343295A (ja) * 2001-05-21 2002-11-29 Canon Inc 電子線露光装置、縮小投影系及びデバイス製造方法
US6852982B1 (en) * 2003-07-14 2005-02-08 Fei Company Magnetic lens
EP1501115B1 (de) 2003-07-14 2009-07-01 FEI Company Zweistrahlsystem
US6979820B2 (en) * 2003-07-29 2005-12-27 Taiwan Semiconductor Manufacturing Co., Ltd. CD SEM automatic focus methodology and apparatus for constant electron beam dosage control
GB2404782B (en) * 2003-08-01 2005-12-07 Leica Microsys Lithography Ltd Pattern-writing equipment
GB2412232A (en) * 2004-03-15 2005-09-21 Ims Nanofabrication Gmbh Particle-optical projection system
EP2019414B1 (de) * 2007-07-27 2010-06-30 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Magnetische Linsenanordnung
US7705298B2 (en) * 2007-10-26 2010-04-27 Hermes Microvision, Inc. (Taiwan) System and method to determine focus parameters during an electron beam inspection
JP5702552B2 (ja) * 2009-05-28 2015-04-15 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ デュアルビームシステムの制御方法
CN109175371A (zh) * 2018-11-02 2019-01-11 西安赛隆金属材料有限责任公司 一种磁聚焦器及粉床电子束选区熔化成形设备

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4544846A (en) * 1983-06-28 1985-10-01 International Business Machines Corporation Variable axis immersion lens electron beam projection system
US4544847A (en) * 1983-07-28 1985-10-01 Varian Associates, Inc. Multi-gap magnetic imaging lens for charged particle beams
NL8801208A (nl) * 1988-05-09 1989-12-01 Philips Nv Geladen deeltjes bundel apparaat.

Also Published As

Publication number Publication date
JP3480829B2 (ja) 2003-12-22
EP1045424B1 (de) 2008-08-13
DE60039810D1 (de) 2008-09-25
US6130432A (en) 2000-10-10
JP2000331634A (ja) 2000-11-30
EP1045424A3 (de) 2001-05-30
EP1045424A2 (de) 2000-10-18

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties