ATE398193T1 - Verfahren und vorrichtung zur stückweisen und zur kontinuierlichen verdichtung durch chemische dampfphaseninfitration (cvi) - Google Patents

Verfahren und vorrichtung zur stückweisen und zur kontinuierlichen verdichtung durch chemische dampfphaseninfitration (cvi)

Info

Publication number
ATE398193T1
ATE398193T1 AT03024294T AT03024294T ATE398193T1 AT E398193 T1 ATE398193 T1 AT E398193T1 AT 03024294 T AT03024294 T AT 03024294T AT 03024294 T AT03024294 T AT 03024294T AT E398193 T1 ATE398193 T1 AT E398193T1
Authority
AT
Austria
Prior art keywords
cvi
furnace
porous material
pitchwise
infitration
Prior art date
Application number
AT03024294T
Other languages
English (en)
Inventor
Lowell D Bok
Mark Purdy
Gary Clark
Afshin Bazshushtari
Original Assignee
Goodrich Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Goodrich Corp filed Critical Goodrich Corp
Application granted granted Critical
Publication of ATE398193T1 publication Critical patent/ATE398193T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45593—Recirculation of reactive gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
AT03024294T 2002-10-24 2003-10-23 Verfahren und vorrichtung zur stückweisen und zur kontinuierlichen verdichtung durch chemische dampfphaseninfitration (cvi) ATE398193T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US42139302P 2002-10-24 2002-10-24

Publications (1)

Publication Number Publication Date
ATE398193T1 true ATE398193T1 (de) 2008-07-15

Family

ID=32771710

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03024294T ATE398193T1 (de) 2002-10-24 2003-10-23 Verfahren und vorrichtung zur stückweisen und zur kontinuierlichen verdichtung durch chemische dampfphaseninfitration (cvi)

Country Status (4)

Country Link
US (1) US20040253377A1 (de)
EP (1) EP1452624B1 (de)
AT (1) ATE398193T1 (de)
DE (1) DE60321535D1 (de)

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US20050158468A1 (en) * 2004-01-20 2005-07-21 John Gaffney Method for manufacturing carbon composites
US7374709B2 (en) * 2005-01-11 2008-05-20 Dieter Bauer Method of making carbon/ceramic matrix composites
US20070184179A1 (en) * 2006-02-09 2007-08-09 Akshay Waghray Methods and apparatus to monitor a process of depositing a constituent of a multi-constituent gas during production of a composite brake disc
US20070269597A1 (en) * 2006-05-17 2007-11-22 Honeywell International Inc. Modified CVD cooling loop
US7302989B1 (en) 2006-06-06 2007-12-04 Siemens Power Generation, Inc. Modular mold system with ceramic inserts
TW200826745A (en) * 2006-08-07 2008-06-16 Messier Bugatti Power control for densification of one or more porous articles
CN101671190B (zh) * 2009-09-23 2012-07-18 北京航空航天大学 一种炭基复合材料快速定向渗积微观结构调控的方法
DE102010000388A1 (de) * 2010-02-11 2011-08-11 Aixtron Ag, 52134 Gaseinlassorgan mit Prallplattenanordnung
CN101831621B (zh) * 2010-04-08 2012-10-17 湖南金博复合材料科技有限公司 化学气相增密炉炉体
WO2012030792A1 (en) * 2010-08-30 2012-03-08 First Solar, Inc. Vapor deposition system
FR2993555B1 (fr) * 2012-07-19 2015-02-20 Herakles Installation d'infiltration chimique en phase vapeur a haute capacite de chargement
US11326255B2 (en) * 2013-02-07 2022-05-10 Uchicago Argonne, Llc ALD reactor for coating porous substrates
CN103628041A (zh) * 2013-11-21 2014-03-12 青岛赛瑞达电子科技有限公司 常压cvd薄膜连续生长炉
US10407769B2 (en) * 2016-03-18 2019-09-10 Goodrich Corporation Method and apparatus for decreasing the radial temperature gradient in CVI/CVD furnaces
US10899671B2 (en) * 2016-08-24 2021-01-26 Westinghouse Electric Company Llc Process for manufacturing SiC composite ceramics
FR3059679B1 (fr) * 2016-12-07 2021-03-12 Safran Ceram Outillage de conformation et installation pour l'infiltration chimique en phase gazeuse de preformes fibreuses
KR102218855B1 (ko) * 2017-07-12 2021-02-23 주식회사 엘지화학 다공성 기재의 표면 코팅 장치 및 방법
DE102018215102A1 (de) * 2018-05-28 2019-11-28 Sms Group Gmbh Vakuumbeschichtungsanlage, und Verfahren zum Beschichten eines bandförmigen Materials
US20190368040A1 (en) * 2018-06-01 2019-12-05 Asm Ip Holding B.V. Infiltration apparatus and methods of infiltrating an infiltrateable material
US11111578B1 (en) 2020-02-13 2021-09-07 Uchicago Argonne, Llc Atomic layer deposition of fluoride thin films
FR3107283B1 (fr) * 2020-02-19 2024-05-17 Safran Ceram Conformateur pour infiltration en phase gazeuse
CN112570189A (zh) * 2020-12-18 2021-03-30 上海骐杰碳素材料有限公司 一种连续式热喷涂沉积炉及其工作方法
CN112553604A (zh) * 2020-12-18 2021-03-26 上海骐杰碳素材料有限公司 一种连续式化学气相沉积炉及其工作方法
US12065738B2 (en) 2021-10-22 2024-08-20 Uchicago Argonne, Llc Method of making thin films of sodium fluorides and their derivatives by ALD
US11901169B2 (en) 2022-02-14 2024-02-13 Uchicago Argonne, Llc Barrier coatings
US20240110281A1 (en) * 2022-09-30 2024-04-04 Raytheon Technologies Corporation Stacking tool fixture for forced flow chemical vapor infiltration

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GB1586959A (en) * 1976-08-11 1981-03-25 Dunlop Ltd Method and apparatus for the production of carbon/carbon composite material
US4291794A (en) * 1979-10-10 1981-09-29 The B. F. Goodrich Company Power transmission and energy absorbing systems
US4580524A (en) * 1984-09-07 1986-04-08 The United States Of America As Represented By The United States Department Of Energy Process for the preparation of fiber-reinforced ceramic composites by chemical vapor deposition
US4596208A (en) * 1984-11-05 1986-06-24 Spire Corporation CVD reaction chamber
US5016562A (en) * 1988-04-27 1991-05-21 Glasstech Solar, Inc. Modular continuous vapor deposition system
US4895108A (en) * 1988-06-22 1990-01-23 The Babcock & Wilcox Company CVD apparatus and process for the preparation of fiber-reinforced ceramic composites
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FR2711646B1 (fr) * 1993-10-27 1996-02-09 Europ Propulsion Procédé d'infiltration chimique en phase vapeur d'une matrice pyrocarbone au sein d'un substrat poreux avec établissement d'un gradient de température dans le substrat.
ATE172753T1 (de) * 1994-11-16 1998-11-15 Goodrich Co B F Vorrichtung zur druckfeld cvd/cvi, verfahren und produkt
US5480678A (en) * 1994-11-16 1996-01-02 The B. F. Goodrich Company Apparatus for use with CVI/CVD processes
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Also Published As

Publication number Publication date
US20040253377A1 (en) 2004-12-16
DE60321535D1 (de) 2008-07-24
EP1452624A2 (de) 2004-09-01
EP1452624A3 (de) 2006-06-21
EP1452624B1 (de) 2008-06-11

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