ATE357737T1 - Behandlungsmethode für eine diamantoberfläche und entsprechende oberfläche - Google Patents

Behandlungsmethode für eine diamantoberfläche und entsprechende oberfläche

Info

Publication number
ATE357737T1
ATE357737T1 AT01907726T AT01907726T ATE357737T1 AT E357737 T1 ATE357737 T1 AT E357737T1 AT 01907726 T AT01907726 T AT 01907726T AT 01907726 T AT01907726 T AT 01907726T AT E357737 T1 ATE357737 T1 AT E357737T1
Authority
AT
Austria
Prior art keywords
ions
treatment method
diamond surface
diamond
diameter smaller
Prior art date
Application number
AT01907726T
Other languages
English (en)
Inventor
Jean-Pierre Briand
Nicolas Bechu
Alix Gicquel
Jocelyn Achard
Original Assignee
Univ Paris Curie
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Paris Curie filed Critical Univ Paris Curie
Application granted granted Critical
Publication of ATE357737T1 publication Critical patent/ATE357737T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/0405—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising semiconducting carbon, e.g. diamond, diamond-like carbon
    • H01L21/041—Making n- or p-doped regions
    • H01L21/0415—Making n- or p-doped regions using ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/0405—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising semiconducting carbon, e.g. diamond, diamond-like carbon
    • H01L21/0425—Making electrodes
    • H01L21/043—Ohmic electrodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Physical Vapour Deposition (AREA)
AT01907726T 2000-02-09 2001-02-07 Behandlungsmethode für eine diamantoberfläche und entsprechende oberfläche ATE357737T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0001604A FR2804623B1 (fr) 2000-02-09 2000-02-09 Procede de traitement d'une surface de diamant et surface de diamant correspondante

Publications (1)

Publication Number Publication Date
ATE357737T1 true ATE357737T1 (de) 2007-04-15

Family

ID=8846808

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01907726T ATE357737T1 (de) 2000-02-09 2001-02-07 Behandlungsmethode für eine diamantoberfläche und entsprechende oberfläche

Country Status (9)

Country Link
US (1) US6841249B2 (de)
EP (1) EP1258029B1 (de)
JP (1) JP2003522710A (de)
AT (1) ATE357737T1 (de)
AU (1) AU2001235624A1 (de)
CA (1) CA2399588A1 (de)
DE (1) DE60127383T2 (de)
FR (1) FR2804623B1 (de)
WO (1) WO2001059817A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6878403B2 (en) * 2002-10-04 2005-04-12 Guardian Industries Corp. Method of ion beam treatment of DLC in order to reduce contact angle
US6878405B2 (en) 2002-10-04 2005-04-12 Guardian Industries Corp. Method of treating DLC on substrate with oxygen and/or hot water
US7387816B2 (en) * 2003-12-15 2008-06-17 Guardian Industries Corp. Scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s), and method of making article using combustion CVD
US7455883B2 (en) * 2004-10-19 2008-11-25 Guardian Industries Corp. Hydrophilic DLC on substrate with flame pyrolysis treatment
US20060246218A1 (en) * 2005-04-29 2006-11-02 Guardian Industries Corp. Hydrophilic DLC on substrate with barrier discharge pyrolysis treatment
FR2890231B1 (fr) * 2005-08-29 2009-10-09 Jean Pierre Briand Methode de fabrication de cathodes froides fonctionnant sous faibles tensions par irradiation de films minces de dlc avec des ions multicharges et surfaces emettrices correspondantes
DE102006017153B3 (de) * 2006-04-04 2007-08-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung von Oberflächenstrukturen und Element mit Oberflächenstruktur zur Verwendung für Biosensoren oder die Herstellung von Zellleitstrukturen
US20090124159A1 (en) * 2007-03-02 2009-05-14 Jean Pierre Briand Method of fabrication of cold cathodes on thin diamondlike carbon films irradiated with multicharged ions and field emissive corresponding surfaces
US8003164B2 (en) * 2008-09-19 2011-08-23 Guardian Industries Corp. Method of making a scratch-and etch-resistant coated glass article

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5141460A (en) * 1991-08-20 1992-08-25 Jaskie James E Method of making a field emission electron source employing a diamond coating
US5399238A (en) * 1991-11-07 1995-03-21 Microelectronics And Computer Technology Corporation Method of making field emission tips using physical vapor deposition of random nuclei as etch mask
US5659224A (en) * 1992-03-16 1997-08-19 Microelectronics And Computer Technology Corporation Cold cathode display device
US5608283A (en) * 1994-06-29 1997-03-04 Candescent Technologies Corporation Electron-emitting devices utilizing electron-emissive particles which typically contain carbon
US5628659A (en) * 1995-04-24 1997-05-13 Microelectronics And Computer Corporation Method of making a field emission electron source with random micro-tip structures
US5713775A (en) * 1995-05-02 1998-02-03 Massachusetts Institute Of Technology Field emitters of wide-bandgap materials and methods for their fabrication
CN1103110C (zh) * 1995-08-04 2003-03-12 可印刷发射体有限公司 场电子发射材料和装置
US5729094A (en) * 1996-04-15 1998-03-17 Massachusetts Institute Of Technology Energetic-electron emitters
FR2757881B1 (fr) * 1996-12-31 1999-04-09 Univ Paris Curie Procede de traitement d'une surface d'un semi-conducteur, dispositif correspondant et semi-conducteur associe
GB9702348D0 (en) * 1997-02-05 1997-03-26 Smiths Industries Plc Electron emitter devices
FR2764110B1 (fr) * 1997-05-28 1999-08-20 Univ Paris Curie Dispositif et procede de gravure par ions

Also Published As

Publication number Publication date
JP2003522710A (ja) 2003-07-29
FR2804623A1 (fr) 2001-08-10
DE60127383D1 (de) 2007-05-03
DE60127383T2 (de) 2007-11-29
WO2001059817A1 (fr) 2001-08-16
US6841249B2 (en) 2005-01-11
EP1258029B1 (de) 2007-03-21
EP1258029A1 (de) 2002-11-20
CA2399588A1 (fr) 2001-08-16
FR2804623B1 (fr) 2002-05-03
AU2001235624A1 (en) 2001-08-20
US20030118828A1 (en) 2003-06-26

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