ATE320660T1 - Mikrowellen-plasmagenerator - Google Patents

Mikrowellen-plasmagenerator

Info

Publication number
ATE320660T1
ATE320660T1 AT02770115T AT02770115T ATE320660T1 AT E320660 T1 ATE320660 T1 AT E320660T1 AT 02770115 T AT02770115 T AT 02770115T AT 02770115 T AT02770115 T AT 02770115T AT E320660 T1 ATE320660 T1 AT E320660T1
Authority
AT
Austria
Prior art keywords
plasma generator
microwave plasma
gap
microwave
excited
Prior art date
Application number
AT02770115T
Other languages
English (en)
Inventor
Robert Frew Gillespie
Stephen Ivor Hall
James Timothy Shawcross
Original Assignee
Accentus Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Accentus Plc filed Critical Accentus Plc
Application granted granted Critical
Publication of ATE320660T1 publication Critical patent/ATE320660T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
AT02770115T 2001-11-03 2002-10-25 Mikrowellen-plasmagenerator ATE320660T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB0126419.1A GB0126419D0 (en) 2001-11-03 2001-11-03 Microwave plasma generator

Publications (1)

Publication Number Publication Date
ATE320660T1 true ATE320660T1 (de) 2006-04-15

Family

ID=9925084

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02770115T ATE320660T1 (de) 2001-11-03 2002-10-25 Mikrowellen-plasmagenerator

Country Status (7)

Country Link
US (1) US7381290B2 (de)
EP (1) EP1449233B1 (de)
JP (1) JP2005509254A (de)
AT (1) ATE320660T1 (de)
DE (1) DE60209926D1 (de)
GB (1) GB0126419D0 (de)
WO (1) WO2003041111A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005235464A (ja) * 2004-02-17 2005-09-02 Toshio Goto プラズマ発生装置
GB0523947D0 (en) * 2005-11-24 2006-01-04 Boc Group Plc Microwave plasma system
US7811665B2 (en) 2008-02-29 2010-10-12 The Procter & Gamble Compmany Embossed fibrous structures
US7719694B1 (en) 2008-06-23 2010-05-18 Hrl Laboratories, Llc System and method of surface wave imaging to detect ice on a surface or damage to a surface
US7931858B1 (en) 2008-06-23 2011-04-26 Hrl Laboratories, Llc System and method for surface decontamination using electromagnetic surface waves
US8124013B1 (en) 2008-06-23 2012-02-28 Hrl Laboratories, Llc System and method for large scale atmospheric plasma generation
US8009276B1 (en) 2008-06-23 2011-08-30 Hrl Laboratories, Llc System and method of surface wave imaging to map pressure on a surface
US9752281B2 (en) * 2010-10-27 2017-09-05 The Procter & Gamble Company Fibrous structures and methods for making same
US8932435B2 (en) * 2011-08-12 2015-01-13 Harris Corporation Hydrocarbon resource processing device including radio frequency applicator and related methods
US9041408B2 (en) 2013-01-16 2015-05-26 Hrl Laboratories, Llc Removable surface-wave networks for in-situ material health monitoring
CN112509901B (zh) * 2020-11-19 2022-03-22 北京北方华创微电子装备有限公司 工艺腔室及半导体工艺设备
US12009511B2 (en) 2022-02-18 2024-06-11 International Business Machines Corporation Method to protect a lithium metal anode in a rechargeable lithium metal battery

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4393333A (en) * 1979-12-10 1983-07-12 Hitachi, Ltd. Microwave plasma ion source
JPS6087200U (ja) * 1983-11-15 1985-06-15 新日本無線株式会社 マイクロ波プラズマ発生装置
JPH0361371A (ja) * 1989-07-28 1991-03-18 Nec Corp 薄膜形成装置
DE69021821T2 (de) * 1989-09-20 1996-05-30 Sumitomo Electric Industries Verfahren und Anlage zum Herstellen von Hartstoff.
US5425832A (en) * 1990-10-05 1995-06-20 Bridgestone Corporation Surface treatment of fluoropolymer members and preparation of composite products therefrom
US5273587A (en) * 1992-09-04 1993-12-28 United Solar Systems Corporation Igniter for microwave energized plasma processing apparatus
GB9224745D0 (en) * 1992-11-26 1993-01-13 Atomic Energy Authority Uk Microwave plasma generator
WO1994017835A1 (en) * 1993-02-02 1994-08-18 United Kingdom Atomic Energy Authority Gas activation
JP3147137B2 (ja) * 1993-05-14 2001-03-19 セイコーエプソン株式会社 表面処理方法及びその装置、半導体装置の製造方法及びその装置、並びに液晶ディスプレイの製造方法
GB9414561D0 (en) * 1994-07-19 1994-09-07 Ea Tech Ltd Method of and apparatus for microwave-plasma production
JPH09246251A (ja) * 1996-03-01 1997-09-19 Sony Corp 半導体製造装置及び半導体製造方法
US6388381B2 (en) * 1996-09-10 2002-05-14 The Regents Of The University Of California Constricted glow discharge plasma source
EP0845287B1 (de) * 1996-11-28 2003-12-17 Accentus plc Verfahren und Vorrichtung zur plasmachemischen Behandlung von Gasen
JPH11102901A (ja) * 1997-09-26 1999-04-13 Ricoh Co Ltd マイクロ波励起ドライエッチング装置
GB9801286D0 (en) 1998-01-21 1998-03-18 Univ Cambridge Tech Sensor
GB9819319D0 (en) 1998-09-05 1998-10-28 Aea Technology Plc Assay of chemical binding
US6204606B1 (en) 1998-10-01 2001-03-20 The University Of Tennessee Research Corporation Slotted waveguide structure for generating plasma discharges
GB0021815D0 (en) * 2000-09-06 2000-10-18 Lofting Marcus J Plasma enhanced gas reactor

Also Published As

Publication number Publication date
EP1449233B1 (de) 2006-03-15
DE60209926D1 (de) 2006-05-11
US7381290B2 (en) 2008-06-03
EP1449233A1 (de) 2004-08-25
WO2003041111A1 (en) 2003-05-15
US20040256056A1 (en) 2004-12-23
JP2005509254A (ja) 2005-04-07
GB0126419D0 (en) 2002-01-02

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Legal Events

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