ATE487807T1 - Plasmareaktor - Google Patents

Plasmareaktor

Info

Publication number
ATE487807T1
ATE487807T1 AT06779552T AT06779552T ATE487807T1 AT E487807 T1 ATE487807 T1 AT E487807T1 AT 06779552 T AT06779552 T AT 06779552T AT 06779552 T AT06779552 T AT 06779552T AT E487807 T1 ATE487807 T1 AT E487807T1
Authority
AT
Austria
Prior art keywords
resonant cavity
plasma reactor
gas
plasma
gas outlet
Prior art date
Application number
AT06779552T
Other languages
English (en)
Inventor
Andrew Seeley
Marilena Radoiu
Original Assignee
Edwards Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards Ltd filed Critical Edwards Ltd
Application granted granted Critical
Publication of ATE487807T1 publication Critical patent/ATE487807T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/007—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/126—Microwaves
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/806—Microwaves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0809—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes employing two or more electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0869—Feeding or evacuating the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0871—Heating or cooling of the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0875—Gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0881—Two or more materials
    • B01J2219/0883—Gas-gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/12—Processes employing electromagnetic waves
    • B01J2219/1203—Incoherent waves
    • B01J2219/1206—Microwaves
    • B01J2219/1209—Features relating to the reactor or vessel
    • B01J2219/1221—Features relating to the reactor or vessel the reactor per se
    • B01J2219/1224—Form of the reactor
    • B01J2219/1227—Reactors comprising tubes with open ends
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/12—Processes employing electromagnetic waves
    • B01J2219/1203—Incoherent waves
    • B01J2219/1206—Microwaves
    • B01J2219/1209—Features relating to the reactor or vessel
    • B01J2219/1221—Features relating to the reactor or vessel the reactor per se
    • B01J2219/1239—Means for feeding and evacuation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/12—Processes employing electromagnetic waves
    • B01J2219/1203—Incoherent waves
    • B01J2219/1206—Microwaves
    • B01J2219/1209—Features relating to the reactor or vessel
    • B01J2219/1221—Features relating to the reactor or vessel the reactor per se
    • B01J2219/1242—Materials of construction
    • B01J2219/1245—Parts of the reactor being microwave absorbing, dielectric
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/12—Processes employing electromagnetic waves
    • B01J2219/1203—Incoherent waves
    • B01J2219/1206—Microwaves
    • B01J2219/1248—Features relating to the microwave cavity
    • B01J2219/1266—Microwave deflecting parts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/12—Processes employing electromagnetic waves
    • B01J2219/1203—Incoherent waves
    • B01J2219/1206—Microwaves
    • B01J2219/1248—Features relating to the microwave cavity
    • B01J2219/1269—Microwave guides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/12—Processes employing electromagnetic waves
    • B01J2219/1203—Incoherent waves
    • B01J2219/1206—Microwaves
    • B01J2219/1248—Features relating to the microwave cavity
    • B01J2219/1272—Materials of construction

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Treating Waste Gases (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
AT06779552T 2005-10-26 2006-09-26 Plasmareaktor ATE487807T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0521830.0A GB0521830D0 (en) 2005-10-26 2005-10-26 Plasma reactor
PCT/GB2006/003578 WO2007048994A1 (en) 2005-10-26 2006-09-26 Plasma reactor

Publications (1)

Publication Number Publication Date
ATE487807T1 true ATE487807T1 (de) 2010-11-15

Family

ID=35515752

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06779552T ATE487807T1 (de) 2005-10-26 2006-09-26 Plasmareaktor

Country Status (10)

Country Link
US (1) US8168128B2 (de)
EP (1) EP1937870B1 (de)
JP (1) JP5379482B2 (de)
KR (1) KR20080060255A (de)
CN (1) CN101297062B (de)
AT (1) ATE487807T1 (de)
DE (1) DE602006018173D1 (de)
GB (1) GB0521830D0 (de)
TW (1) TWI442836B (de)
WO (1) WO2007048994A1 (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0522088D0 (en) * 2005-10-28 2005-12-07 Boc Group Plc Plasma abatement device
US8863495B2 (en) 2007-07-12 2014-10-21 Imagineering, Inc. Ignition/chemical reaction promotion/flame holding device, speed-type internal combustion engine, and furnace
WO2009008519A1 (ja) * 2007-07-12 2009-01-15 Imagineering, Inc. ガス処理装置、ガス処理システム及びガス処理方法、並びにそれを用いた排気ガス処理システム及び内燃機関
US8696997B2 (en) * 2007-11-06 2014-04-15 Creo Medical Limited Hydroxyl radical producing plasma sterilisation apparatus
JP5374691B2 (ja) 2008-03-14 2013-12-25 イマジニアリング株式会社 複数放電のプラズマ装置
CN101496992B (zh) * 2009-01-15 2011-09-07 大连海事大学 去除全氟碳化物气体的系统和方法
FR2952786B1 (fr) * 2009-11-17 2012-06-08 Centre Nat Rech Scient Torche a plasma et procede de stabilisation d'une torche a plasma
KR101775608B1 (ko) 2010-01-21 2017-09-19 파워다인, 인코포레이티드 탄소질 물질로부터의 스팀의 발생 방법
EP2893326A4 (de) 2012-09-05 2016-05-18 Powerdyne Inc Verfahren zur kraftstofferzeugung mit elektrischen hochspannungsfeldern
EP2900353A4 (de) 2012-09-05 2016-05-18 Powerdyne Inc Verfahren zur sequestrierung von schwermetallpartikeln mittels h2o, co2, o2 und partikelquelle
EP2893325A4 (de) 2012-09-05 2016-05-18 Powerdyne Inc Verfahren zur kraftstofferzeugung mit elektrischen hochspannungsfeldern
EP2892984A4 (de) 2012-09-05 2016-05-11 Powerdyne Inc System zur erzeugung von brennstoffmateralien mit fischer-tropsch-katalysatoren und plasmaquellen
EP2893324A4 (de) 2012-09-05 2016-05-11 Powerdyne Inc Verfahren zur kraftstofferzeugung mit elektrischen hochspannungsfeldern
KR101581261B1 (ko) 2012-09-05 2015-12-31 파워다인, 인코포레이티드 H2o, co2, o2 및 탄소 공급 원료로부터 전력을 생성하는 방법
EP2892643A4 (de) 2012-09-05 2016-05-11 Powerdyne Inc Verfahren zur erzeugung von wasserstoffgas mittels plasmaquellen
CN103657370B (zh) * 2012-09-07 2015-09-30 韩国能量技术研究院 利用微波等离子体的硫化氢及硫化羰去除装置及方法
US9427821B2 (en) 2013-03-15 2016-08-30 Agilent Technologies, Inc. Integrated magnetron plasma torch, and related methods
US10987735B2 (en) 2015-12-16 2021-04-27 6K Inc. Spheroidal titanium metallic powders with custom microstructures
PL3389862T3 (pl) 2015-12-16 2024-03-04 6K Inc. Sferoidalne metale podlegające odwodornieniu oraz cząstki stopów metali
JP2019029333A (ja) * 2017-07-26 2019-02-21 東芝メモリ株式会社 プラズマ処理装置および半導体装置の製造方法
US10293303B2 (en) 2017-07-28 2019-05-21 Thrivaltech, Llc Modular plasma reformer treatment system
US10639712B2 (en) 2018-06-19 2020-05-05 Amastan Technologies Inc. Process for producing spheroidized powder from feedstock materials
JP7699057B2 (ja) 2019-04-30 2025-06-26 シックスケー インコーポレイテッド 機械的に合金化された粉末原料
SG11202111578UA (en) 2019-04-30 2021-11-29 6K Inc Lithium lanthanum zirconium oxide (llzo) powder
KR20220100861A (ko) 2019-11-18 2022-07-18 6케이 인크. 구형 분말을 위한 고유한 공급원료 및 제조 방법
US11590568B2 (en) 2019-12-19 2023-02-28 6K Inc. Process for producing spheroidized powder from feedstock materials
CN116034496A (zh) 2020-06-25 2023-04-28 6K有限公司 微观复合合金结构
CA3186082A1 (en) 2020-09-24 2022-03-31 6K Inc. Systems, devices, and methods for starting plasma
CA3196653A1 (en) 2020-10-30 2022-05-05 Sunil Bhalchandra BADWE Systems and methods for synthesis of spheroidized metal powders
AU2022206483A1 (en) 2021-01-11 2023-08-31 6K Inc. Methods and systems for reclamation of li-ion cathode materials using microwave plasma processing
EP4313449A1 (de) 2021-03-31 2024-02-07 6K Inc. Systeme und verfahren zur generativen fertigung von metallnitridkeramiken
AU2022285734A1 (en) 2021-06-02 2024-01-04 Rimere, Llc Systems and methods of plasma generation with microwaves
US12261023B2 (en) 2022-05-23 2025-03-25 6K Inc. Microwave plasma apparatus and methods for processing materials using an interior liner
US12040162B2 (en) 2022-06-09 2024-07-16 6K Inc. Plasma apparatus and methods for processing feed material utilizing an upstream swirl module and composite gas flows
WO2024044498A1 (en) 2022-08-25 2024-02-29 6K Inc. Plasma apparatus and methods for processing feed material utilizing a powder ingress preventor (pip)
US12195338B2 (en) 2022-12-15 2025-01-14 6K Inc. Systems, methods, and device for pyrolysis of methane in a microwave plasma for hydrogen and structured carbon powder production
CN119643772B (zh) * 2024-12-05 2025-10-10 西北工业大学 一种微波等离子体辅助金属与水反应的实验平台
CN120242663A (zh) * 2025-03-28 2025-07-04 拓荆科技(上海)有限公司 一种尾气处理装置及薄膜沉积设备

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9126179D0 (en) * 1991-12-10 1992-02-12 Atomic Energy Authority Uk The removal of organic materials from process gas streams
GB9224745D0 (en) 1992-11-26 1993-01-13 Atomic Energy Authority Uk Microwave plasma generator
ZA976292B (en) * 1996-07-29 1998-02-03 Aeci Ltd Process for decomposing a polymer to its monomer or monomers.
BR0114126A (pt) * 2000-09-11 2003-08-26 Dow Global Technologies Inc Reforço de pneu para rodar vazio e método de fabricação
FR2815888B1 (fr) * 2000-10-27 2003-05-30 Air Liquide Dispositif de traitement de gaz par plasma
US6620394B2 (en) * 2001-06-15 2003-09-16 Han Sup Uhm Emission control for perfluorocompound gases by microwave plasma torch
US6806439B2 (en) * 2003-01-13 2004-10-19 Han Sup Uhm Elimination of airborne chemical and biological warfare agents
GB0309932D0 (en) * 2003-04-30 2003-06-04 Boc Group Plc Apparatus and method for forming a plasma
GB0403797D0 (en) * 2004-02-20 2004-03-24 Boc Group Plc Gas abatement

Also Published As

Publication number Publication date
GB0521830D0 (en) 2005-12-07
KR20080060255A (ko) 2008-07-01
JP2009513329A (ja) 2009-04-02
US8168128B2 (en) 2012-05-01
EP1937870B1 (de) 2010-11-10
TW200731880A (en) 2007-08-16
TWI442836B (zh) 2014-06-21
DE602006018173D1 (de) 2010-12-23
CN101297062A (zh) 2008-10-29
WO2007048994A1 (en) 2007-05-03
CN101297062B (zh) 2011-04-27
US20090165953A1 (en) 2009-07-02
JP5379482B2 (ja) 2013-12-25
EP1937870A1 (de) 2008-07-02

Similar Documents

Publication Publication Date Title
DE602006018173D1 (de) Plasmareaktor
GB0516695D0 (en) Microwave plasma reactor
WO2006037991A3 (en) Microwave plasma apparatus with vorticular gas flow
WO2003096747A3 (en) Plasma heating apparatus and methods
DE60038811D1 (de) Behandlungsvorrichtungen
MY164564A (en) Plasma confinement rings including rf absorbing material for reducing polymer deposition
WO2006031251A3 (en) A portable arc-seeded microwave plasma torch
WO2009024860A3 (en) Euv radiation source
TW200739697A (en) Methods and apparatus for in-situ substrate processing
FR2953278B1 (fr) Procede et dispositif de destruction thermique de composes organiques par un plasma d'induction.
WO2010128301A3 (en) Light source powered by microwaves
EP1975144A4 (de) Chemische anlage mit aussparungswellenleitermikrowelle zur herstellung von ethen aus naturgas und das verfahren, bei dem diese anlage eingesetzt wird
GB0126419D0 (en) Microwave plasma generator
MX2007014397A (es) Unidad de organizacion de muestra.
NO20082686L (no) Innretning og fremgangsmate for mating av partikler inn i en strom
DE602006012474D1 (de) Reduktionsofen
LU90639B1 (de) Vorrichtung zum Einleiten von schwer fliessendem Schuettgut in eine Foerderleitung
DE60319676D1 (de) Mischvorrichtung
ATE441310T1 (de) Mikrowellen-durchlaufofen
ATE497826T1 (de) Umfangsluftmesser und anwendungen
WO2008055901A3 (de) Entladungslampe mit einem entladungsgefäss und einem mit dem entladungsgefäss verbundenen röhrenstück
DE502006008016D1 (de) Gasdichtes verbindungselement mit bajonettverschluss
TW200606118A (en) Method for manufacturing optical fiber
TW200734475A (en) Mask frame for holding a mask
TW200716782A (en) Apparatus for fabrication of carbon nanotubes

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties