ATE273565T1 - Schaltungsnetzwerk und verfahren für atomische ketten - Google Patents

Schaltungsnetzwerk und verfahren für atomische ketten

Info

Publication number
ATE273565T1
ATE273565T1 AT95941374T AT95941374T ATE273565T1 AT E273565 T1 ATE273565 T1 AT E273565T1 AT 95941374 T AT95941374 T AT 95941374T AT 95941374 T AT95941374 T AT 95941374T AT E273565 T1 ATE273565 T1 AT E273565T1
Authority
AT
Austria
Prior art keywords
atoms
chain
lattice
separation distance
insulated
Prior art date
Application number
AT95941374T
Other languages
English (en)
Inventor
Toshishige Yamada
Yoshihiro Takiguchi
Dehuan Huang
Yoshihisa Yamamoto
Original Assignee
Japan Science & Tech Agency
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Science & Tech Agency filed Critical Japan Science & Tech Agency
Application granted granted Critical
Publication of ATE273565T1 publication Critical patent/ATE273565T1/de

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82BNANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B1/00Nanostructures formed by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82BNANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/962Quantum dots and lines
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • Y10S977/701Integrated with dissimilar structures on a common substrate
    • Y10S977/707Integrated with dissimilar structures on a common substrate having different types of nanoscale structures or devices on a common substrate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • Y10S977/788Of specified organic or carbon-based composition
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/84Manufacture, treatment, or detection of nanostructure
    • Y10S977/849Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/855Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure
    • Y10S977/858Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure including positioning/mounting nanostructure
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/902Specified use of nanostructure
    • Y10S977/932Specified use of nanostructure for electronic or optoelectronic application
    • Y10S977/936Specified use of nanostructure for electronic or optoelectronic application in a transistor or 3-terminal device

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Composite Materials (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Optics & Photonics (AREA)
  • Recrystallisation Techniques (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Formation Of Insulating Films (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Stabilization Of Oscillater, Synchronisation, Frequency Synthesizers (AREA)
AT95941374T 1994-11-08 1995-11-08 Schaltungsnetzwerk und verfahren für atomische ketten ATE273565T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/336,852 US5981316A (en) 1994-11-08 1994-11-08 Method of fabrication of atomic chain circuit network
PCT/US1995/014574 WO1996014664A1 (en) 1994-11-08 1995-11-08 Atomic chain circuit network and method

Publications (1)

Publication Number Publication Date
ATE273565T1 true ATE273565T1 (de) 2004-08-15

Family

ID=23317954

Family Applications (1)

Application Number Title Priority Date Filing Date
AT95941374T ATE273565T1 (de) 1994-11-08 1995-11-08 Schaltungsnetzwerk und verfahren für atomische ketten

Country Status (5)

Country Link
US (1) US5981316A (de)
EP (1) EP0791229B1 (de)
AT (1) ATE273565T1 (de)
DE (1) DE69533365T2 (de)
WO (1) WO1996014664A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6331454B1 (en) * 1994-11-08 2001-12-18 Board Of Regents Of The Leland Stanford Junior University Atomic-level electronic network and method of fabrication
JPH1065145A (ja) * 1996-08-22 1998-03-06 Hitachi Ltd 電導性原子サイズ細線および原子サイズスイッチ
US6336084B1 (en) * 1999-05-11 2002-01-01 Ford Global Technologies, Inc. Three-way catalyst model for an engine air-to-fuel ratio control system
US7015546B2 (en) * 2000-02-23 2006-03-21 Semiconductor Research Corporation Deterministically doped field-effect devices and methods of making same
US6664559B1 (en) 2000-02-23 2003-12-16 Semiconductor Research Corporation Supermolecular structures and devices made from same
US20040072994A1 (en) * 2002-10-15 2004-04-15 Herr Daniel J.C. Nanostructures including controllably positioned and aligned synthetic nanotubes, and related methods

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3988823A (en) * 1974-08-26 1976-11-02 Hughes Aircraft Company Method for fabrication of multilayer interconnected microelectronic devices having small vias therein
US4122479A (en) * 1975-01-31 1978-10-24 Hitachi, Ltd. Optoelectronic device having control circuit for light emitting element and circuit for light receiving element integrated in a semiconductor body
US4589191A (en) * 1983-10-20 1986-05-20 Unisearch Limited Manufacture of high efficiency solar cells
US5459346A (en) * 1988-06-28 1995-10-17 Ricoh Co., Ltd. Semiconductor substrate with electrical contact in groove
US4987312A (en) * 1989-11-07 1991-01-22 International Business Machines Corporation Process for repositioning atoms on a surface using a scanning tunneling microscope
WO1992012528A1 (fr) * 1991-01-11 1992-07-23 Hitachi Limited Appareil et procede d'usinage d'atomes de surface
US5187113A (en) * 1991-05-17 1993-02-16 United Technologies Corporation Field oxide termination and gate oxide formation
DE69228524T2 (de) * 1991-12-24 1999-10-28 Hitachi, Ltd. Atomare Vorrichtungen und atomare logische Schaltungen
DE69301885T2 (de) * 1992-08-13 1996-10-31 Sony Corp Quantenbauelement und dessen Herstellungsverfahren
US5382815A (en) * 1993-12-23 1995-01-17 International Business Machines Corporation Carrier conduction conductor-insulator semiconductor (CIS) transistor
US5436499A (en) * 1994-03-11 1995-07-25 Spire Corporation High performance GaAs devices and method

Also Published As

Publication number Publication date
DE69533365T2 (de) 2005-02-17
EP0791229B1 (de) 2004-08-11
EP0791229A1 (de) 1997-08-27
EP0791229A4 (de) 1998-04-29
DE69533365D1 (de) 2004-09-16
WO1996014664A1 (en) 1996-05-17
US5981316A (en) 1999-11-09

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