ATE234368T1 - Verfahren und vorrichtung zur herstellung einer absorbierenden schicht für sonnenkollektoren - Google Patents

Verfahren und vorrichtung zur herstellung einer absorbierenden schicht für sonnenkollektoren

Info

Publication number
ATE234368T1
ATE234368T1 AT97941308T AT97941308T ATE234368T1 AT E234368 T1 ATE234368 T1 AT E234368T1 AT 97941308 T AT97941308 T AT 97941308T AT 97941308 T AT97941308 T AT 97941308T AT E234368 T1 ATE234368 T1 AT E234368T1
Authority
AT
Austria
Prior art keywords
chromium
metallic material
layer
metal
nickel
Prior art date
Application number
AT97941308T
Other languages
English (en)
Inventor
Goeran Hultmark
Original Assignee
Sunstrip Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sunstrip Ab filed Critical Sunstrip Ab
Application granted granted Critical
Publication of ATE234368T1 publication Critical patent/ATE234368T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0063—Reactive sputtering characterised by means for introducing or removing gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/085—Oxides of iron group metals
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
    • F24S70/00—Details of absorbing elements
    • F24S70/20—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption
    • F24S70/225—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption for spectrally selective absorption
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
    • F24S70/00—Details of absorbing elements
    • F24S70/20—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption
    • F24S70/25—Coatings made of metallic material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/40—Solar thermal energy, e.g. solar towers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P80/00—Climate change mitigation technologies for sector-wide applications
    • Y02P80/20—Climate change mitigation technologies for sector-wide applications using renewable energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Thermal Sciences (AREA)
  • Sustainable Energy (AREA)
  • Sustainable Development (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Hybrid Cells (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
AT97941308T 1996-09-16 1997-09-15 Verfahren und vorrichtung zur herstellung einer absorbierenden schicht für sonnenkollektoren ATE234368T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE9603393A SE509933C2 (sv) 1996-09-16 1996-09-16 Sätt och anordning att framställa ett spektralselektivt absorberande skikt till solkollektorer samt framställt skikt
PCT/SE1997/001545 WO1998011271A1 (en) 1996-09-16 1997-09-15 A method for manufacturing an absorbent layer for solar collectors, a device for performing the method and an absorbent layer for solar collectors

Publications (1)

Publication Number Publication Date
ATE234368T1 true ATE234368T1 (de) 2003-03-15

Family

ID=20403923

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97941308T ATE234368T1 (de) 1996-09-16 1997-09-15 Verfahren und vorrichtung zur herstellung einer absorbierenden schicht für sonnenkollektoren

Country Status (9)

Country Link
US (1) US6171458B1 (de)
EP (1) EP0948662B1 (de)
JP (1) JP2001506698A (de)
AT (1) ATE234368T1 (de)
AU (1) AU724684B2 (de)
DE (1) DE69719801T2 (de)
ES (1) ES2195172T3 (de)
SE (1) SE509933C2 (de)
WO (1) WO1998011271A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3735461B2 (ja) * 1998-03-27 2006-01-18 株式会社シンクロン 複合金属の化合物薄膜形成方法及びその薄膜形成装置
JP3650079B2 (ja) * 2002-04-25 2005-05-18 株式会社鈴寅 機能性繊維シート
DE102004006131B4 (de) * 2004-02-07 2005-12-15 Applied Films Gmbh & Co. Kg Bandbeschichtungsanlage mit einer Vakuumkammer und einer Beschichtungswalze
DE102004019062B4 (de) * 2004-04-20 2009-10-01 The Most from California LLC, , Thousand Oaks Vorrichtung zum Beschichten von schweren Bändern im Vakuum
DE102004019061B4 (de) * 2004-04-20 2008-11-27 Peter Lazarov Selektiver Absorber zur Umwandlung von Sonnenlicht in Wärme, ein Verfahren und eine Vorrichtung zu dessen Herstellung
CN101086059B (zh) * 2006-06-05 2011-07-20 黄鸣 太阳能集热管真空磁控溅射连续镀膜线系统
DE102006037872A1 (de) * 2006-08-11 2008-02-14 Viessmann Werke Gmbh & Co Kg Absorber, Vorrichtung zur Herstellung eines Absorbers und Verfahren zur Herstellung eines Absorbers
CN101343726B (zh) * 2007-07-09 2010-11-03 殷志强 太阳能集热管连续自动溅射镀膜方法及装置
JP5643748B2 (ja) * 2009-03-31 2014-12-17 ステラケミファ株式会社 光学部材およびその製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3022714C2 (de) * 1980-06-18 1982-09-09 Bfg Glassgroup, Paris Verfahren zum Herstellen einer selektiv absorbierenden Beschichtung für Solarkollektoren und danach hergestellte Beschichtung
JPS5713172A (en) 1980-06-28 1982-01-23 Agency Of Ind Science & Technol Formation of selective absorption menbrane for solar energy by vacuum plating method
JPS58189372A (ja) 1982-04-30 1983-11-05 Toshiba Corp マグネトロンスパツタ装置
NL8401721A (nl) * 1984-05-29 1985-12-16 Leer Koninklijke Emballage Werkwijze en stelsel voor het produceren van een reactief gesputterde geleidende transparante metaaloxidefilm op een doorlopende materiaalbaan.
EP0265512A1 (de) 1986-05-02 1988-05-04 MSC Specialty Films, Inc. Sputterbeschichtete, dünne glasschicht in rollenform und verfahren zu deren kontinuierlichen herstellung
US4885070A (en) * 1988-02-12 1989-12-05 Leybold Aktiengesellschaft Method and apparatus for the application of materials
US4885010A (en) * 1988-10-03 1989-12-05 Gallagher-Kaiser Corporation Spray booth
DE3926877A1 (de) * 1989-08-16 1991-02-21 Leybold Ag Verfahren zum beschichten eines dielektrischen substrats mit kupfer
GB9102976D0 (en) * 1991-02-13 1991-03-27 Secr Defence Matrix-coated reinforcement for production of metal matrix composites
US5135581A (en) * 1991-04-08 1992-08-04 Minnesota Mining And Manufacturing Company Light transmissive electrically conductive oxide electrode formed in the presence of a stabilizing gas
JPH07110401A (ja) 1993-10-08 1995-04-25 Olympus Optical Co Ltd 光学部材の製造方法及び光学部材
DE19543781A1 (de) * 1995-11-24 1997-05-28 Leybold Ag Vakuumbeschichtungsanlage mit einem in der Vakuumkammer angeordneten Tiegel zur Aufnahme von zu verdampfendem Material

Also Published As

Publication number Publication date
ES2195172T3 (es) 2003-12-01
JP2001506698A (ja) 2001-05-22
SE509933C2 (sv) 1999-03-22
EP0948662B1 (de) 2003-03-12
DE69719801T2 (de) 2003-12-18
US6171458B1 (en) 2001-01-09
SE9603393D0 (sv) 1996-09-16
AU4324897A (en) 1998-04-02
DE69719801D1 (de) 2003-04-17
EP0948662A1 (de) 1999-10-13
WO1998011271A1 (en) 1998-03-19
AU724684B2 (en) 2000-09-28
SE9603393L (sv) 1998-03-17

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