ATE22933T1 - Geraet zum gleichmaessigen erwaermen eines substrats. - Google Patents

Geraet zum gleichmaessigen erwaermen eines substrats.

Info

Publication number
ATE22933T1
ATE22933T1 AT83303995T AT83303995T ATE22933T1 AT E22933 T1 ATE22933 T1 AT E22933T1 AT 83303995 T AT83303995 T AT 83303995T AT 83303995 T AT83303995 T AT 83303995T AT E22933 T1 ATE22933 T1 AT E22933T1
Authority
AT
Austria
Prior art keywords
substrate
radiation
intensity
onto
transverse width
Prior art date
Application number
AT83303995T
Other languages
English (en)
Inventor
Robert Frank Edgerton
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Application granted granted Critical
Publication of ATE22933T1 publication Critical patent/ATE22933T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0033—Heating devices using lamps
    • H05B3/0038—Heating devices using lamps for industrial applications
    • H05B3/0047—Heating devices using lamps for industrial applications for semiconductor manufacture

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Chemical Vapour Deposition (AREA)
AT83303995T 1982-07-12 1983-07-08 Geraet zum gleichmaessigen erwaermen eines substrats. ATE22933T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/397,189 US4470369A (en) 1982-07-12 1982-07-12 Apparatus for uniformly heating a substrate
EP83303995A EP0099257B1 (de) 1982-07-12 1983-07-08 Gerät zum gleichmässigen Erwärmen eines Substrats

Publications (1)

Publication Number Publication Date
ATE22933T1 true ATE22933T1 (de) 1986-11-15

Family

ID=23570180

Family Applications (1)

Application Number Title Priority Date Filing Date
AT83303995T ATE22933T1 (de) 1982-07-12 1983-07-08 Geraet zum gleichmaessigen erwaermen eines substrats.

Country Status (7)

Country Link
US (1) US4470369A (de)
EP (1) EP0099257B1 (de)
JP (1) JPH0817244B2 (de)
AT (1) ATE22933T1 (de)
AU (1) AU556134B2 (de)
CA (1) CA1189602A (de)
DE (1) DE3366970D1 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3427057A1 (de) * 1984-07-23 1986-01-23 Standard Elektrik Lorenz Ag, 7000 Stuttgart Anlage zum herstellen von halbleiter-schichtstrukturen durch epitaktisches wachstum
EP0356528A4 (en) * 1988-02-22 1991-07-31 Rovicc Incorporated Cooking range
GB2226939A (en) * 1989-01-09 1990-07-11 Colin Davidson Arthur Uniform surface heating using short-wave infra-red radiation
US5093557A (en) * 1989-05-16 1992-03-03 Microscience, Inc. Substrate heater and heating element
US6016383A (en) * 1990-01-19 2000-01-18 Applied Materials, Inc. Rapid thermal heating apparatus and method including an infrared camera to measure substrate temperature
US5155336A (en) * 1990-01-19 1992-10-13 Applied Materials, Inc. Rapid thermal heating apparatus and method
US5179677A (en) * 1990-08-16 1993-01-12 Applied Materials, Inc. Apparatus and method for substrate heating utilizing various infrared means to achieve uniform intensity
US5418885A (en) * 1992-12-29 1995-05-23 North Carolina State University Three-zone rapid thermal processing system utilizing wafer edge heating means
JP3571785B2 (ja) * 1993-12-28 2004-09-29 キヤノン株式会社 堆積膜形成方法及び堆積膜形成装置
US5595241A (en) * 1994-10-07 1997-01-21 Sony Corporation Wafer heating chuck with dual zone backplane heating and segmented clamping member
CA2489818C (en) 1995-10-13 2007-07-24 Nordson Corporation A system for dispensing a viscous material onto a substrate
US6072160A (en) * 1996-06-03 2000-06-06 Applied Materials, Inc. Method and apparatus for enhancing the efficiency of radiant energy sources used in rapid thermal processing of substrates by energy reflection
US5960158A (en) * 1997-07-11 1999-09-28 Ag Associates Apparatus and method for filtering light in a thermal processing chamber
US6014082A (en) * 1997-10-03 2000-01-11 Sony Corporation Temperature monitoring and calibration system for control of a heated CVD chuck
US5930456A (en) * 1998-05-14 1999-07-27 Ag Associates Heating device for semiconductor wafers
US5970214A (en) * 1998-05-14 1999-10-19 Ag Associates Heating device for semiconductor wafers
US6210484B1 (en) 1998-09-09 2001-04-03 Steag Rtp Systems, Inc. Heating device containing a multi-lamp cone for heating semiconductor wafers
US6771895B2 (en) 1999-01-06 2004-08-03 Mattson Technology, Inc. Heating device for heating semiconductor wafers in thermal processing chambers
US6173864B1 (en) 1999-04-23 2001-01-16 Nordson Corporation Viscous material dispensing system and method with feedback control
JP3437118B2 (ja) * 1999-04-23 2003-08-18 東芝機械株式会社 ウエーハ加熱装置及びその制御方法
US6541063B1 (en) 1999-11-04 2003-04-01 Speedline Technologies, Inc. Calibration of a dispensing system
US20040148763A1 (en) * 2002-12-11 2004-08-05 Peacock David S. Dispensing system and method
US20090034944A1 (en) * 2007-07-30 2009-02-05 Burtea Sanda Conveyor oven with multiple heating zones
ES1067976Y (es) * 2008-04-30 2008-11-01 Violante Gutierrez Ascanio S L Aparato de calefaccion
CN103222041B (zh) * 2010-07-27 2016-01-20 东电电子太阳能股份公司 用于加热基板的加热装置和方法
US8637792B2 (en) 2011-05-18 2014-01-28 Prince Castle, LLC Conveyor oven with adjustable air vents
DE102013215799B4 (de) 2013-08-09 2018-10-25 Maschinenfabrik Kemper Gmbh & Co. Kg Maschine zum Mähen von stängelartigem Erntegut
JP7018882B2 (ja) * 2015-12-31 2022-02-14 アプライド マテリアルズ インコーポレイテッド 処理チャンバのための高温ヒータ
EP3542687A1 (de) * 2018-03-22 2019-09-25 Koninklijke Philips N.V. Nahrungsverarbeitungsvorrichtung
WO2020078557A1 (en) * 2018-10-18 2020-04-23 Applied Materials, Inc. Deposition apparatus, system and method for depositing a material on a substrate
CN113473653B (zh) * 2021-06-04 2024-01-09 佛山市龙之声电热科技股份有限公司 一种热辐射构件的辐射孔设计方法和热辐射构件

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3180973A (en) * 1961-12-15 1965-04-27 Robertson Photo Mechanix Inc Apparatus for fusing master plates
US3275799A (en) * 1963-10-17 1966-09-27 Henry E Meltzer Heat shrinking apparatus
US3471682A (en) * 1968-02-07 1969-10-07 Armstrong Cork Co Radiant heating apparatus
JPS5745714B2 (de) * 1972-09-12 1982-09-29
DE2343499C3 (de) * 1973-08-29 1980-07-10 Schladitz-Whiskers Ag, Zug (Schweiz) Verfahren und Vorrichtung zum Metallisieren von bewegtem flächigem Gut
US3956612A (en) * 1974-10-04 1976-05-11 Irex Corporation Radiant heating modular unit
JPS5522140A (en) * 1978-08-02 1980-02-16 Kubota Ltd Indication holding method of electronic weighing device
US4369730A (en) * 1981-03-16 1983-01-25 Energy Conversion Devices, Inc. Cathode for generating a plasma
US4389970A (en) * 1981-03-16 1983-06-28 Energy Conversion Devices, Inc. Apparatus for regulating substrate temperature in a continuous plasma deposition process

Also Published As

Publication number Publication date
US4470369A (en) 1984-09-11
EP0099257B1 (de) 1986-10-15
JPS5931076A (ja) 1984-02-18
CA1189602A (en) 1985-06-25
JPH0817244B2 (ja) 1996-02-21
DE3366970D1 (en) 1986-11-20
EP0099257A1 (de) 1984-01-25
AU556134B2 (en) 1986-10-23
AU1644183A (en) 1984-01-19

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties