ATE226868T1 - Polier- oder schleifvorrichtung - Google Patents

Polier- oder schleifvorrichtung

Info

Publication number
ATE226868T1
ATE226868T1 AT99956065T AT99956065T ATE226868T1 AT E226868 T1 ATE226868 T1 AT E226868T1 AT 99956065 T AT99956065 T AT 99956065T AT 99956065 T AT99956065 T AT 99956065T AT E226868 T1 ATE226868 T1 AT E226868T1
Authority
AT
Austria
Prior art keywords
polishing
lapping
abrasive suspension
parts
partitions
Prior art date
Application number
AT99956065T
Other languages
English (en)
Inventor
Georges Henri Guy Broido
Original Assignee
Lam Plan S A Soc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Plan S A Soc filed Critical Lam Plan S A Soc
Application granted granted Critical
Publication of ATE226868T1 publication Critical patent/ATE226868T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/12—Lapping plates for working plane surfaces
    • B24B37/16—Lapping plates for working plane surfaces characterised by the shape of the lapping plate surface, e.g. grooved
AT99956065T 1998-11-19 1999-11-17 Polier- oder schleifvorrichtung ATE226868T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9814563A FR2786118B1 (fr) 1998-11-19 1998-11-19 Dispositif de rodage ou polissage
PCT/FR1999/002817 WO2000030806A1 (fr) 1998-11-19 1999-11-17 Dispositif de rodage ou polissage

Publications (1)

Publication Number Publication Date
ATE226868T1 true ATE226868T1 (de) 2002-11-15

Family

ID=9532934

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99956065T ATE226868T1 (de) 1998-11-19 1999-11-17 Polier- oder schleifvorrichtung

Country Status (7)

Country Link
US (1) US6837780B1 (de)
EP (1) EP1131186B1 (de)
AT (1) ATE226868T1 (de)
DE (1) DE69903748T2 (de)
DK (1) DK1131186T3 (de)
FR (1) FR2786118B1 (de)
WO (1) WO2000030806A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMC20070237A1 (it) * 2007-12-12 2009-06-13 Ghines Srl Utensile abrasivo perfezionato.
JP6188286B2 (ja) * 2012-07-13 2017-08-30 スリーエム イノベイティブ プロパティズ カンパニー 研磨パッド及びガラス、セラミックス、及び金属材料の研磨方法
JP7165719B2 (ja) * 2017-08-04 2022-11-04 スリーエム イノベイティブ プロパティズ カンパニー 平坦性が向上された微細複製研磨表面
DE102017216033A1 (de) * 2017-09-12 2019-03-14 Carl Zeiss Smt Gmbh Verfahren zum Bearbeiten eines Werkstücks bei der Herstellung eines optischen Elements
USD1004393S1 (en) * 2021-11-09 2023-11-14 Ehwa Diamond Industrial Co., Ltd. Grinding pad
USD1000928S1 (en) * 2022-06-03 2023-10-10 Beng Youl Cho Polishing pad

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2043501B (en) * 1979-02-28 1982-11-24 Interface Developments Ltd Abrading member
US4866886A (en) * 1987-11-23 1989-09-19 Magnetic Peripherals Inc. Textured lapping plate and process for its manufacture
FR2639278B1 (fr) 1988-11-22 1991-01-11 Lam Plan Sa Plateau de polissage
US5020283A (en) * 1990-01-22 1991-06-04 Micron Technology, Inc. Polishing pad with uniform abrasion
US5441598A (en) * 1993-12-16 1995-08-15 Motorola, Inc. Polishing pad for chemical-mechanical polishing of a semiconductor substrate
US5888119A (en) * 1997-03-07 1999-03-30 Minnesota Mining And Manufacturing Company Method for providing a clear surface finish on glass
FR2761289B1 (fr) * 1997-03-25 1999-05-21 Lam Plan Sa Outil de polissage deformable
US5882251A (en) * 1997-08-19 1999-03-16 Lsi Logic Corporation Chemical mechanical polishing pad slurry distribution grooves
US6206759B1 (en) * 1998-11-30 2001-03-27 Micron Technology, Inc. Polishing pads and planarizing machines for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods for making and using such pads and machines
US6217426B1 (en) * 1999-04-06 2001-04-17 Applied Materials, Inc. CMP polishing pad
US6238273B1 (en) * 1999-08-31 2001-05-29 Micron Technology, Inc. Methods for predicting polishing parameters of polishing pads and methods and machines for planarizing microelectronic substrate assemblies in mechanical or chemical-mechanical planarization
US6328632B1 (en) * 1999-08-31 2001-12-11 Micron Technology, Inc. Polishing pads and planarizing machines for mechanical and/or chemical-mechanical planarization of microelectronic substrate assemblies
US6439986B1 (en) * 1999-10-12 2002-08-27 Hunatech Co., Ltd. Conditioner for polishing pad and method for manufacturing the same

Also Published As

Publication number Publication date
DE69903748D1 (de) 2002-12-05
DK1131186T3 (da) 2003-01-20
DE69903748T2 (de) 2003-07-24
FR2786118B1 (fr) 2000-12-22
FR2786118A1 (fr) 2000-05-26
EP1131186B1 (de) 2002-10-30
WO2000030806A1 (fr) 2000-06-02
US6837780B1 (en) 2005-01-04
EP1131186A1 (de) 2001-09-12

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Legal Events

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