ATE222541T1 - Verfahren zur herstellung von elektronischen bauteilen - Google Patents

Verfahren zur herstellung von elektronischen bauteilen

Info

Publication number
ATE222541T1
ATE222541T1 AT99949163T AT99949163T ATE222541T1 AT E222541 T1 ATE222541 T1 AT E222541T1 AT 99949163 T AT99949163 T AT 99949163T AT 99949163 T AT99949163 T AT 99949163T AT E222541 T1 ATE222541 T1 AT E222541T1
Authority
AT
Austria
Prior art keywords
hydrogen atom
alkyl group
electronic components
producing electronic
patternwise
Prior art date
Application number
AT99949163T
Other languages
English (en)
Inventor
Anthony Paul Kitson
Peter Andrew Reath Bennett
Kevin Barry Ray
Original Assignee
Kodak Polychrome Graphics Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Polychrome Graphics Co filed Critical Kodak Polychrome Graphics Co
Application granted granted Critical
Publication of ATE222541T1 publication Critical patent/ATE222541T1/de

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/36Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
    • B41M5/368Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/11Vinyl alcohol polymer or derivative
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/111Polymer of unsaturated acid or ester
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing
    • Y10S430/121Nitrogen in heterocyclic ring
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165Thermal imaging composition

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Thermistors And Varistors (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Ceramic Capacitors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Paints Or Removers (AREA)
AT99949163T 1998-10-07 1999-10-06 Verfahren zur herstellung von elektronischen bauteilen ATE222541T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB9821756A GB2342460A (en) 1998-10-07 1998-10-07 Method of making an electronic part
PCT/GB1999/003308 WO2000020222A1 (en) 1998-10-07 1999-10-06 Method for manufacture of electronic parts

Publications (1)

Publication Number Publication Date
ATE222541T1 true ATE222541T1 (de) 2002-09-15

Family

ID=10840081

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99949163T ATE222541T1 (de) 1998-10-07 1999-10-06 Verfahren zur herstellung von elektronischen bauteilen

Country Status (8)

Country Link
US (1) US6423456B1 (de)
EP (1) EP1123212B1 (de)
JP (1) JP2002526800A (de)
AT (1) ATE222541T1 (de)
AU (1) AU6214999A (de)
DE (1) DE69902598T2 (de)
GB (1) GB2342460A (de)
WO (1) WO2000020222A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6558787B1 (en) 1999-12-27 2003-05-06 Kodak Polychrome Graphics Llc Relation to manufacture of masks and electronic parts
WO2002011984A1 (en) 2000-08-04 2002-02-14 Kodak Polychrome Graphics Co. Ltd. Lithographic printing form and method of preparation and use thereof
US6451502B1 (en) 2000-10-10 2002-09-17 Kodak Polychrome Graphics Llc manufacture of electronic parts
US6673514B2 (en) * 2001-09-07 2004-01-06 Kodak Polychrome Graphics Llc Imagable articles and compositions, and their use
US7989146B2 (en) * 2007-10-09 2011-08-02 Eastman Kodak Company Component fabrication using thermal resist materials
US20100227269A1 (en) * 2009-03-04 2010-09-09 Simpson Christopher D Imageable elements with colorants
JP2013041156A (ja) * 2011-08-17 2013-02-28 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機el表示装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4708925A (en) * 1984-12-11 1987-11-24 Minnesota Mining And Manufacturing Company Photosolubilizable compositions containing novolac phenolic resin
US5641608A (en) * 1995-10-23 1997-06-24 Macdermid, Incorporated Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates
ATE183136T1 (de) * 1996-04-23 1999-08-15 Kodak Polychrome Graphics Co Vorläufer einer lithographischen druckform und ihre verwendung bei der bebilderung durch wärme

Also Published As

Publication number Publication date
US6423456B1 (en) 2002-07-23
AU6214999A (en) 2000-04-26
JP2002526800A (ja) 2002-08-20
GB9821756D0 (en) 1998-12-02
DE69902598T2 (de) 2003-04-17
EP1123212A1 (de) 2001-08-16
GB2342460A (en) 2000-04-12
EP1123212B1 (de) 2002-08-21
WO2000020222A1 (en) 2000-04-13
DE69902598D1 (de) 2002-09-26

Similar Documents

Publication Publication Date Title
TWI263866B (en) Chemical amplification type positive resist composition
KR880002258A (ko) 기판의 린스처리방법
TW200702916A (en) Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board
TWI256525B (en) Photo resist material and method for pattern formation
ATE191799T1 (de) Stabile ionomere photolackemulsionen, verfahren zur herstellung und verwendung derselben
ATE354818T1 (de) Strahlungsempfindliche polysilazan- zusammensetzung, daraus erzeugte muster sowie ein verfahren zur veraschung eines entsprechenden beschichtungsfilms
TW200705121A (en) Developing liquid composition, manufacturing method thereof and method for resist pattern
ATE222541T1 (de) Verfahren zur herstellung von elektronischen bauteilen
MY141765A (en) Photosensitive resin composition, photosensitive element using the same, process for producing resist pattern, and process for producing printed wiring board
MY118218A (en) Polymer for photoresist, photoresist composition containing the same, and preparation method thereof
KR850003394A (ko) 신규의 벤젠설포닐-락탐을 활성물질로서 포함하는 약학적 조성물과 그 제조방법
DE60306567D1 (de) Härtbare Farbstoff-enthaltende Zusammensetzung, daraus hergestellter Farbfilter, und Verfahren zur Herstellung eines Farbfilters
ATE237831T1 (de) Fotoempfindliche harzzusammensetzungen, verfahren zur herstellung eines harzmusters, damit hergestellte elektronische vorrichtungen und verfahren zur deren herstellung
MY129908A (en) Photoresist compositions
KR970076092A (ko) 감광성 조성물, 패턴 형성방법 및 전자부품의 제조방법
WO2005001578A3 (en) Developer composition for resists and method for formation of resist pattern
KR960024674A (ko) 방사선-민감성 조성물에 사용되는 광산 생성 조성물
JP2002006495A5 (de)
ATE236280T1 (de) Cellulosische partikel und verfahren zur herstellung derselben
DK0429331T3 (da) Fremgangsmåde til fremstilling af perfluoralkylbromider
DE69518252T2 (de) Verfahren zur herstellung von 5,6-dihydroxy-2-amino-1,2,3,4-tetrahydronaphthalin-derivaten
TW328083B (en) New derivatives of β-methoxy acrylic acid, their preparation process and their use as pesticides
ATE25073T1 (de) Verfahren zur herstellung von alpha-deltadiethylenischen carbonylverbindungen.
TW200502686A (en) Developer composition for resists and method for formation of resist pattern
KR940012544A (ko) 레지스트 패턴 형성방법

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties