ATE222541T1 - Verfahren zur herstellung von elektronischen bauteilen - Google Patents
Verfahren zur herstellung von elektronischen bauteilenInfo
- Publication number
- ATE222541T1 ATE222541T1 AT99949163T AT99949163T ATE222541T1 AT E222541 T1 ATE222541 T1 AT E222541T1 AT 99949163 T AT99949163 T AT 99949163T AT 99949163 T AT99949163 T AT 99949163T AT E222541 T1 ATE222541 T1 AT E222541T1
- Authority
- AT
- Austria
- Prior art keywords
- hydrogen atom
- alkyl group
- electronic components
- producing electronic
- patternwise
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 3
- 125000002768 hydroxyalkyl group Chemical group 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
- B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/165—Thermal imaging composition
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Ceramic Capacitors (AREA)
- Thermistors And Varistors (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Paints Or Removers (AREA)
- Developing Agents For Electrophotography (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9821756A GB2342460A (en) | 1998-10-07 | 1998-10-07 | Method of making an electronic part |
PCT/GB1999/003308 WO2000020222A1 (en) | 1998-10-07 | 1999-10-06 | Method for manufacture of electronic parts |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE222541T1 true ATE222541T1 (de) | 2002-09-15 |
Family
ID=10840081
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT99949163T ATE222541T1 (de) | 1998-10-07 | 1999-10-06 | Verfahren zur herstellung von elektronischen bauteilen |
Country Status (8)
Country | Link |
---|---|
US (1) | US6423456B1 (de) |
EP (1) | EP1123212B1 (de) |
JP (1) | JP2002526800A (de) |
AT (1) | ATE222541T1 (de) |
AU (1) | AU6214999A (de) |
DE (1) | DE69902598T2 (de) |
GB (1) | GB2342460A (de) |
WO (1) | WO2000020222A1 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6558787B1 (en) | 1999-12-27 | 2003-05-06 | Kodak Polychrome Graphics Llc | Relation to manufacture of masks and electronic parts |
WO2002011984A1 (en) | 2000-08-04 | 2002-02-14 | Kodak Polychrome Graphics Co. Ltd. | Lithographic printing form and method of preparation and use thereof |
US6451502B1 (en) | 2000-10-10 | 2002-09-17 | Kodak Polychrome Graphics Llc | manufacture of electronic parts |
US6673514B2 (en) * | 2001-09-07 | 2004-01-06 | Kodak Polychrome Graphics Llc | Imagable articles and compositions, and their use |
US7989146B2 (en) * | 2007-10-09 | 2011-08-02 | Eastman Kodak Company | Component fabrication using thermal resist materials |
US20100227269A1 (en) * | 2009-03-04 | 2010-09-09 | Simpson Christopher D | Imageable elements with colorants |
JP2013041156A (ja) * | 2011-08-17 | 2013-02-28 | Mitsubishi Chemicals Corp | 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機el表示装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4708925A (en) * | 1984-12-11 | 1987-11-24 | Minnesota Mining And Manufacturing Company | Photosolubilizable compositions containing novolac phenolic resin |
US5641608A (en) * | 1995-10-23 | 1997-06-24 | Macdermid, Incorporated | Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates |
PL324248A1 (en) * | 1996-04-23 | 1998-05-11 | Horsell Graphic Ind Ltd | Composition sensitive to heat and method of making lithographic formes incorporating such compositions |
-
1998
- 1998-10-07 GB GB9821756A patent/GB2342460A/en not_active Withdrawn
-
1999
- 1999-10-06 AT AT99949163T patent/ATE222541T1/de not_active IP Right Cessation
- 1999-10-06 EP EP99949163A patent/EP1123212B1/de not_active Expired - Lifetime
- 1999-10-06 DE DE69902598T patent/DE69902598T2/de not_active Expired - Lifetime
- 1999-10-06 WO PCT/GB1999/003308 patent/WO2000020222A1/en active IP Right Grant
- 1999-10-06 AU AU62149/99A patent/AU6214999A/en not_active Abandoned
- 1999-10-06 JP JP2000573559A patent/JP2002526800A/ja not_active Withdrawn
- 1999-10-09 US US09/807,084 patent/US6423456B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
GB2342460A (en) | 2000-04-12 |
DE69902598D1 (de) | 2002-09-26 |
AU6214999A (en) | 2000-04-26 |
GB9821756D0 (en) | 1998-12-02 |
WO2000020222A1 (en) | 2000-04-13 |
US6423456B1 (en) | 2002-07-23 |
JP2002526800A (ja) | 2002-08-20 |
EP1123212B1 (de) | 2002-08-21 |
EP1123212A1 (de) | 2001-08-16 |
DE69902598T2 (de) | 2003-04-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |